Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2007
06/07/2007US20070125963 Radiation system and lithographic apparatus
06/07/2007US20070125956 Particle-optical projection system
06/07/2007US20070125263 Pigment compositions consisting of a yellow disazo pigment and an organic pigment
06/07/2007US20070125260 pigmenting electrophotographic toners, developers, inks, aqueous binders or color filters, by mixing with monoazo dyes and dispersants
06/07/2007US20070125255 Method for patterning a substrate surface
06/06/2007EP1793417A1 Substrate cleaning method and developing apparatus
06/06/2007EP1793279A2 Lithographic apparatus and device manufacturing method
06/06/2007EP1793278A2 Illumination system
06/06/2007EP1793277A1 Radiation system and lithographic apparatus
06/06/2007EP1793276A2 A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
06/06/2007EP1793275A2 Method for preparation of lithographic printing plate and lithographic printing plate precursor
06/06/2007EP1793274A2 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same
06/06/2007EP1793273A1 Method of direct microcontact printing of a pattern on a substrate, the substrate obtainable and the use of such substrate
06/06/2007EP1478976A4 Critical dimension control using full phase and trim masks
06/06/2007EP1397651B1 Birefringence measurement at deep-ultraviolet wavelengths
06/06/2007EP1319197B1 Antireflective composition
06/06/2007DE102006029720A1 Verfahren und System zur Verhinderung von Defektbildung in der Immersionslithographie Method and system for preventing formation of defects in immersion lithography
06/06/2007DE102005057909A1 Optical unit, e.g. projection lens, for use in, e.g., microlithography, has crystalline coating applied on surface of unit at inclined angle, where coating has birefringence characteristics and has sub-layers superimposed one above another
06/06/2007DE102005057860A1 Objektiv, insbesondere Projektionsobjektiv für die Halbleiterlithographie Objective, in particular projection objective for semiconductor lithography
06/06/2007DE10147953B4 CARL für Bioelektronik: Substratanbindung über isolierende Schicht CARL bioelectronics: substrate connection via insulating layer
06/06/2007CN1977360A Exposure apparatus, exposure method, and exposure mask
06/06/2007CN1977221A Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display
06/06/2007CN1977220A Lower layer film forming composition for lithography including naphthalene ring having halogen atom
06/06/2007CN1977219A Manufacturing method for microstructure, manufacturing method for liquid ejecting head, and liquid ejecting head
06/06/2007CN1977218A Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head
06/06/2007CN1977217A Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head
06/06/2007CN1977216A Energy harvesting molecules and photoresist technology
06/06/2007CN1977144A Sensor device and stage device
06/06/2007CN1976962A Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon
06/06/2007CN1976961A Thermally curable resin composition with extended storage stability and good adhesive property
06/06/2007CN1976913A Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same
06/06/2007CN1976811A Manufacturing method for liquid ejecting head and liquid ejecting head obtained by this method
06/06/2007CN1976021A Multipurpose measurement marking, and method, system and computer program product using the same
06/06/2007CN1975983A Substrate processing device, substrate processing method and substrate manufacture method
06/06/2007CN1975585A Substrate processing method and substrate processing apparatus
06/06/2007CN1975584A Structure, system and method for analyzing dimensionally unstable layer for forming pattern
06/06/2007CN1975583A Method and system to restore transverse magnetic wave contrast in lithographic processing
06/06/2007CN1975582A Lithographic apparatus and device manufacturing method
06/06/2007CN1975581A Radiation system and lithographic apparatus
06/06/2007CN1975580A System and method to increase surface tension and contact angle in immersion lithography
06/06/2007CN1975579A Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU
06/06/2007CN1975578A Coating and developing system and coating and developing method
06/06/2007CN1975577A 光敏组合物 The photosensitive composition
06/06/2007CN1975576A Colored photosensitive resin composition
06/06/2007CN1975575A Lithographic glue composition
06/06/2007CN1975574A 辐射敏感性树脂组合物 The radiation-sensitive resin composition of the
06/06/2007CN1975573A Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element
06/06/2007CN1975572A 抗蚀剂组合物 The resist composition
06/06/2007CN1975571A Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same
06/06/2007CN1975570A Substrate for pattern forming, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device
06/06/2007CN1975569A Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector
06/06/2007CN1975568A Pattern forming method using photomask
06/06/2007CN1975544A Method for producing liquid crystal display device substrate
06/06/2007CN1975517A Display substrate, method of manufacturing the same and display panel having the same
06/06/2007CN1975471A Black composition and its production method
06/06/2007CN1974697A Organic anti-reflective coating polymer, anti-reflective coating composition and method of preparation thereof
06/06/2007CN1974028A Apparatus and method for substrate coating
06/06/2007CN1320602C Pattern formation method
06/06/2007CN1320601C Manufacturing method of electron device
06/06/2007CN1320543C Spin-coating device and method of producing disk-like recording medium
06/06/2007CN1320407C Method for restoring chromium pollution point on mask and used positioning board
06/06/2007CN1320406C Method for forming thick resist pattern
06/06/2007CN1320405C Light shield processor and method for processing light shield using same
06/06/2007CN1320375C Diffusion reflector, its mfg. method and proximity exposure method
06/06/2007CN1320076C Adhesive for sealing organic electroluminescent element and use thereof
06/06/2007CN1320015C Polymer for heat-sensitive lithographic printing plate precursor
06/06/2007CN1320014C Polymer for heat-sensitive lithographic printing plate precursor
06/06/2007CN1320007C Film formed resin with copolymer of containing silicon coupling agent and 193 nm photo-etching glue
06/06/2007CN1319734C Pre-sensitized lithographic plate comprising microcapsules
06/05/2007US7228034 Interference patterning
06/05/2007US7227690 Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect
06/05/2007US7227679 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
06/05/2007US7227619 Lithographic apparatus and device manufacturing method
06/05/2007US7227616 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
06/05/2007US7227615 Exposure apparatus and method
06/05/2007US7227284 Alignment apparatus and exposure apparatus using the same
06/05/2007US7226866 Etching method for making a reticle
06/05/2007US7226865 Process for forming pattern and method for producing liquid crystal display apparatus
06/05/2007US7226726 Aqueous surfactant solution for developing coating film layer
06/05/2007US7226725 Using the negative resist composition in a bilayer resist process to form fine patterns
06/05/2007US7226724 Positive-type photosensitive composition
06/05/2007US7226723 Providing a substrate having a resist thereon;exposing the resist to at least one generally rectangular-shaped shot from an electron beam, rotating at least one of the substrate and a path of the generally rectangular-shaped shot; andexposing the resist with rectangular-shaped shot from electron beam
06/05/2007US7226722 Imaging members with IR-sensitive polymer imageable layer
06/05/2007US7226721 Having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, manufacture of semiconductor device
06/05/2007US7226718 Forming a photoresist layer comprising branched polymers coupled with acetal linkages over substrate, cleaving the acetal linkages to separate the branched polymers; andbaking the photoresist layer, wherein the separated branched polymers are too large to outgass from the photoresist layer
06/05/2007US7226717 Resin composition comprising: an alkali-soluble resin (A); an infrared absorbing agent (B); and a thiol compound (C), wherein a solubility thereof in an alkaline aqueous solution is changed by exposure with a infrared laser ray, and a
06/05/2007US7226716 Laser addressable thermal transfer imaging element with an interlayer
06/05/2007US7226715 Image recording material
06/05/2007US7226710 Prepolymer having a carboxyl group in combination with at least two unsaturated bonds in its molecule, a polymerization initiator, a diluent, a di- or polyoxetane compound, and a curing promoter, suitable for the formation of a solder resist
06/05/2007US7226707 Methods of printing structures
06/05/2007US7226706 using a blocker to prevent electron beams from hitting the outer region for an area more than 90 percent of the outer region when patterning a predetermined feature on the substrate; comprising: a non-conductive substrate; and a layer of conductive material on substrate
06/05/2007US7226705 Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
06/05/2007US7226637 Optical recording media
06/05/2007US7226177 Catoptric projection optical system
06/05/2007US7225772 Method, control unit and program code for a control unit for controlling a camshaft control device
06/05/2007CA2298354C Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
06/05/2007CA2261425C Method and apparatus for three-dimensional micro-fabrication and processing on flexible filamentary substrates
06/05/2007CA2253242C Photopolymerizable thermosetting resin composition
05/2007
05/31/2007WO2007062111A1 Process for removing material from substrates
05/31/2007WO2007061483A1 Apparatus for recycling alkane immersion liquids and methods of employment
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