| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/13/2007 | CN1979340A Method for making surface acoustic wave element of matching and mixing nano impression and optical photo etching |
| 06/13/2007 | CN1979339A Multi-channel developing liquid developing control signal monitoring system |
| 06/13/2007 | CN1979338A Coating-developing apparatus, coating-developing method, computer program and computer-readable recording medium |
| 06/13/2007 | CN1979337A Method for producing liquid ejecting recording head |
| 06/13/2007 | CN1979336A Apparatus for transferring a pattern with intermediate stamp |
| 06/13/2007 | CN1979321A Iris aperture and making method thereof |
| 06/13/2007 | CN1979290A Light-guide board and method for making same |
| 06/13/2007 | CN1979276A Liquid crystal display and panel therefor |
| 06/13/2007 | CN1979259A Method for increasing yield of liquid crystal screen |
| 06/13/2007 | CN1979229A Color filter substrate and method of fabricating the same |
| 06/13/2007 | CN1979086A Low walk-off interferometer |
| 06/13/2007 | CN1978529A Photo-sensistive polyimide resin and composition and preparing method |
| 06/13/2007 | CN1321440C Forming method of contact hole and manufacturing method of semiconductor device |
| 06/13/2007 | CN1321352C Lithographic antireflective hardmask compositions and uses thereof |
| 06/13/2007 | CN1321351C Chemical reinforcing type positive photoresist composition |
| 06/12/2007 | US7230964 Lithography laser with beam delivery and beam pointing control |
| 06/12/2007 | US7230764 Differentially-cured materials and process for forming same |
| 06/12/2007 | US7230706 Position detection method and apparatus, and exposure method and apparatus |
| 06/12/2007 | US7230704 Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay |
| 06/12/2007 | US7230703 Apparatus and method for measuring overlay by diffraction gratings |
| 06/12/2007 | US7230692 Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method |
| 06/12/2007 | US7230682 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
| 06/12/2007 | US7230679 Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates |
| 06/12/2007 | US7230678 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/12/2007 | US7230674 Lithographic apparatus and device manufacturing method |
| 06/12/2007 | US7230662 Color filter substrate and method for fabricating the same |
| 06/12/2007 | US7230636 Image recording apparatus with jet and suction |
| 06/12/2007 | US7230258 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
| 06/12/2007 | US7230257 Electron beam exposure apparatus |
| 06/12/2007 | US7230254 Movable carriage for a lithographic apparatus and device manufacturing method |
| 06/12/2007 | US7230220 Method of determining optical properties and projection exposure system comprising a wavefront detection system |
| 06/12/2007 | US7230122 Arylsulfonium salts of 1-halothioxanthones and 2-decyl-1-tetradecyl bromide as an intermediate for their preparation; photocurable adhesive, coating or sealant compositions |
| 06/12/2007 | US7230121 For addition polymers; photopolymerization |
| 06/12/2007 | US7229936 Method to reduce photoresist pattern collapse by controlled surface microroughening |
| 06/12/2007 | US7229847 Forming electrical contacts to a molecular layer |
| 06/12/2007 | US7229748 Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription |
| 06/12/2007 | US7229747 Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns |
| 06/12/2007 | US7229746 Printed high strength permanent magnet targets for magnetic sensors |
| 06/12/2007 | US7229745 Lithographic semiconductor manufacturing using a multi-layered process |
| 06/12/2007 | US7229744 thermally imaging an imageable element and producing an imaged imageable element comprising imaged regions and unimaged regions; developing the imaged imageable element with a developer and removing the imaged regions |
| 06/12/2007 | US7229742 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system |
| 06/12/2007 | US7229741 Asymmetric acrylate or vinyl ether compound containing sulfide groups, aromatic moieties, and optionally bromine is mixed with a matrix polymer precursor (expecially polyurethane) and reacted; holography recording medium |
| 06/12/2007 | US7229740 Reimageable paper |
| 06/12/2007 | US7229739 Positive working thermal plates |
| 06/12/2007 | US7229737 Using a specific boron anion type photopolymerization initiator; high contrast images |
| 06/12/2007 | US7229726 Thermal imaging process and products made therefrom |
| 06/12/2007 | US7229725 Heating the photomask blank to dehydrate the resist, cooling the blank in a nitrogen-purged environment to room temperature, such that the resist has a level of exposure sensitivity approximate to the resist as when initially applied onto the blank; and patterning an image into the photoresist |
| 06/12/2007 | US7229724 Optical transmission pattern; etching edges; on radiation transparent substrate |
| 06/12/2007 | US7229723 Method for forming an opening in a light-absorbing layer on a mask |
| 06/12/2007 | US7229721 comprises preparing a photo mask including a unit drawing pattern, finding a dimensional variation relating to the photo mask; judging quality of the photo mask by comparing the actual and allowable deteriorated amount of the exposure latitude |
| 06/12/2007 | US7229522 Substrate processing apparatus and substrate processing method |
| 06/12/2007 | US7229273 Imprint lithography template having a feature size under 250 nm |
| 06/12/2007 | US7228865 FRAM capacitor stack clean |
| 06/12/2007 | CA2264843C Phase mask for machining optical fibers, and its fabrication method |
| 06/07/2007 | WO2007064527A1 Imageable members with improved chemical resistance |
| 06/07/2007 | WO2007064409A1 Photopolymer printing form with reduced processing time |
| 06/07/2007 | WO2007064377A1 Developer solution and process for use |
| 06/07/2007 | WO2007064210A1 Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| 06/07/2007 | WO2007064102A1 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester |
| 06/07/2007 | WO2007063985A1 Cleaning liquid for photolithography and method of cleaning substrate therewith |
| 06/07/2007 | WO2007063816A1 Glass paste, method for producing display by using same, and display |
| 06/07/2007 | WO2007063767A1 Cleaning solution for semiconductor device or display device, and cleaning method |
| 06/07/2007 | WO2007063744A1 Method for post-exposure of planographic printing plate, post-exposure apparatus, exposure apparatus, unit for exposure, image-developing method, and image-developing apparatus |
| 06/07/2007 | WO2007063739A1 Product with concave-convex pattern on its surface and method of forming the concave-convex pattern |
| 06/07/2007 | WO2007063721A1 Positive photosensitive resin composition, and semiconductor device and display using same |
| 06/07/2007 | WO2007063682A1 Lithographic printing plate material and printing method |
| 06/07/2007 | WO2007063576A1 Method of detaching resist and resist detaching apparatus |
| 06/07/2007 | WO2007063441A1 Local control of heat flow to more accurately regulate machine temperatures |
| 06/07/2007 | WO2007063136A2 Optical element comprising a double-refractive coating |
| 06/07/2007 | WO2007063014A2 Method for producing ceramic casting tools |
| 06/07/2007 | WO2007062963A1 Oxime ester photoinitiators |
| 06/07/2007 | WO2007062962A1 Combined stepper and deposition tool |
| 06/07/2007 | WO2007062808A1 Projection illumination system |
| 06/07/2007 | WO2007062796A1 Method of direct microcontact printing of a pattern on a substrate, the substrate obtainable and the use of such substrate |
| 06/07/2007 | WO2007062794A1 Objective, in particular projection objective for semiconductor lithography |
| 06/07/2007 | WO2007047523A3 System and method for positioning and synthesizing of nanostructures |
| 06/07/2007 | WO2007016911A3 Method for producing cylindrical, jointless continuous surfaces |
| 06/07/2007 | WO2007008507A3 Phase separation in patterned structures |
| 06/07/2007 | US20070129576 Copolymer of 2-fluoro-2-fluorocarbonyl-5-norbornene and tetrafluoroethyene; chemical amplification of type photoresist by a F2 laser; excellent radiation transparency, particularly ultraviolet; improved dry etching resistance |
| 06/07/2007 | US20070128559 Material for forming fine pattern, method of forming fine pattern, method of manufacturing electronic device using the same, and electronic device manufactured from the same |
| 06/07/2007 | US20070128558 Pattern formation method and exposure system |
| 06/07/2007 | US20070128557 Phototool coating |
| 06/07/2007 | US20070128556 Method of manufacturing semiconductor integrated circuit devices |
| 06/07/2007 | US20070128554 Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus |
| 06/07/2007 | US20070128552 Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus |
| 06/07/2007 | US20070128551 Manufacturing method of thin film transistor array panel |
| 06/07/2007 | US20070128550 rubbing to remove the surface protective layer and exposing a photosensitive layer containing a sensitizing dye, a polymerization initiator, a polymerizable dipentaerythritol pentaacrylate compound and a hydrophobic methacrylic copolymer binder, and hardening; hydrophilic or highly water-permeable |
| 06/07/2007 | US20070128547 Polymer of styrene modified with alkoxy or alcohol substituents capable of increasing its solubility in an alkali developer under action of an acid, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent; nanolithography processes for manufacturing VLSI |
| 06/07/2007 | US20070128539 Composition for removing photoresist and method of forming a pattern using the same |
| 06/07/2007 | US20070128529 Exposure method and apparatus, coating apparatus for applying resist to plural substrates, and device manufacturing method |
| 06/07/2007 | US20070128383 Laser addressable thermal transfer imaging element with an interlayer |
| 06/07/2007 | US20070127026 Substrate alignment apparatus and method, and exposure apparatus |
| 06/07/2007 | US20070127025 Periodic Patterns and Technique to Control Misalignment Between Two Layers |
| 06/07/2007 | US20070127007 Method and device for lithography by extreme ultraviolet radiation |
| 06/07/2007 | US20070127006 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 06/07/2007 | US20070127004 Exposure apparatus and device manufacturing method |
| 06/07/2007 | US20070127000 Method and System for a Pellicle Frame with Heightened Bonding Surfaces |
| 06/07/2007 | US20070126990 Projection optical system and exposure apparatus with the same |
| 06/07/2007 | US20070125970 EUV light source |
| 06/07/2007 | US20070125964 Lithographic apparatus including a cleaning device and method for cleaning an optical element |