Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/11/2014CN203643741U 一种障壁曝光机间隔计测单元 One kind of barrier Exposure interval measurement unit
06/11/2014CN203643740U 一种涂胶显影机 One kind of glue Developers
06/11/2014CN203639142U 制备无序合金微弹簧的曝光台 Preparation of disordered alloy micro springs exposure stage
06/11/2014CN1955843B Photonasty resin compositon
06/11/2014CN103858209A Mask blank for reflection-type exposure, and mask for reflection-type exposure
06/11/2014CN103858058A Composition for forming fine resist pattern and pattern forming method using same
06/11/2014CN103858057A Vibration isolation module and substrate processing system
06/11/2014CN103858056A Positive photosensitive resin composition, method for producing cured product, method for producing resin pattern, cured product and optical member
06/11/2014CN103858055A Reflective optical element for the EUV wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
06/11/2014CN103857752A Azo pigment, method for producing azo pigment, dispersion containing azo pigment, tinting composition and inkjet recording ink
06/11/2014CN103852979A Method for developing printed circuit board
06/11/2014CN103852978A Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
06/11/2014CN103852977A Automatic washing device and method of infiltration component of infiltration type photoetching machine
06/11/2014CN103852976A Method for periodically monitoring photolithography pattern size
06/11/2014CN103852975A Method for preparing dual-period nanostructure through laser interference nanolithography
06/11/2014CN103852974A Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
06/11/2014CN103852973A Ionic thermal acid generators for low temperature applications
06/11/2014CN103852972A Micrometer impressing and laser induction forming method of double-focus microlens array
06/11/2014CN103852971A Transparent member having an image and method for forming the image on the transparent member
06/11/2014CN103852241A V-shaped block position conversion mechanism
06/11/2014CN103852044A Online measuring method used during optical fiber alignment base array manufacturing with silicon substrate technology
06/11/2014CN103848930A Synthesis of N-phenyl maleimide-containing photosensitive acrylic resin and application thereof in negative photoresist
06/11/2014CN103241709B Method for adjusting photoelectric property of nanocarbon film by ozone and for graphing nanocarbon film
06/11/2014CN102944975B Mask plate and manufacturing method thereof, and array substrate manufacturing method
06/11/2014CN102736436B Illumination design for lens heating mitigation
06/11/2014CN102725691B Positive-type resist composition and method for producing microlens
06/11/2014CN102654591B Cylindrical lenticulation and manufacturing method thereof
06/11/2014CN102591161B Photoresist compositions and method for multiple exposures with multiple layer resist systems
06/11/2014CN102566282B Hardmask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern
06/11/2014CN102549468B Holding arrangement for an optical element
06/11/2014CN102471616B Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same
06/11/2014CN102445841B Photosensitive resin composition and light blocking layer using the same
06/11/2014CN102435058B Drying apparatus, light resistance removing apparatus and drying method
06/11/2014CN102393605B Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
06/11/2014CN102376543B Development method in semiconductor component manufacture process
06/11/2014CN102356353B Illumination system of microlithographic projection exposure apparatus
06/11/2014CN102289158B Radiation system and lithographic apparatus
06/11/2014CN102209937B Coating compositions
06/11/2014CN102112925B Illumination optical unit for microlithography
06/11/2014CN101840160B Exposure apparatus
06/11/2014CN101770175B Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
06/10/2014US8749771 Apparatus for measuring thickness of lens and method using the apparatus
06/10/2014US8749762 Lithographic apparatus and device manufacturing method
06/10/2014US8749760 Asymmetric complementary dipole illuminator
06/10/2014US8749759 Exposure apparatus, exposure method, and method for producing device
06/10/2014US8749758 Exposure apparatus and method of manufacturing device
06/10/2014US8749757 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
06/10/2014US8749756 Lithographic apparatus and device manufacturing method
06/10/2014US8749755 Stage apparatus and exposure apparatus
06/10/2014US8749754 Lithographic apparatus and device manufacturing method
06/10/2014US8749753 Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method
06/10/2014US8748831 Flat panel imagers with pixel separation and method of manufacturing the same
06/10/2014US8748780 Substrate processing apparatus, substrate processing method, and computer-readable storage medium
06/10/2014US8748085 Use of photosensitized Epon epoxy resin 1002F for MEMS and bioMEMS applications
06/10/2014US8748084 Method for producing optical orientation film, method for producing retardation film, system for producing optical orientation film, optical orientation film and retardation film
06/10/2014US8748083 Method for forming wires with narrow spacing
06/10/2014US8748082 Laser engravable flexographic printing articles based on millable polyurethanes, and method
06/10/2014US8748081 Organic anti reflective layer composition
06/10/2014US8748080 Compositions and processes for photolithography
06/10/2014US8748079 Multiple step printing methods for microbarcodes
06/10/2014US8748078 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
06/10/2014US8748077 Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device
06/10/2014US8748076 Resist composition and patterning process using the same
06/10/2014US8748074 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
06/10/2014US8748064 Charged particle beam drawing method and charged particle beam drawing apparatus
06/10/2014US8748060 Fluorinated coating and phototools made therewith
06/10/2014CA2549341C Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
06/05/2014WO2014084447A1 Method for fabricating ultra-low density three-dimensional thin film structure based on photo-lithography
06/05/2014WO2014084279A1 Negative photosensitive resin composition, cured resin film, partition wall and optical element
06/05/2014WO2014084269A1 Novel sulfonic acid derivative compound, photoacid generator, cationic polymerization initiator, resist composition, and cationically polymerizable composition
06/05/2014WO2014084229A1 Transfer system, exposure apparatus, transfer method, exposure method, device manufacturing method, and suction apparatus
06/05/2014WO2014084228A1 Suction apparatus, carry-in method, conveyance system, light exposure device, and device production method
06/05/2014WO2014084190A1 Photocurable composition, transfer material, cured product, method for producing cured product, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device
06/05/2014WO2014084147A1 Composition, infrared pass filter and method for fabricating same, and infrared sensor
06/05/2014WO2014084097A1 Compound containing phenolic hydroxy group, composition containing phenolic hydroxy group, resin containing (meth)acryloyl group, curable composition and cured product thereof, and resist material
06/05/2014WO2014084060A1 Placement member and method for manufacturing same
06/05/2014WO2014083871A1 Exposure apparatus and exposure method
06/05/2014WO2014083143A1 Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
06/05/2014WO2014082961A1 Lithographic apparatus, substrate support system, device manufacturing method and control program
06/05/2014WO2014082938A1 Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method
06/05/2014WO2014082830A1 Arrangement for actuating at least one optical element in an optical system
06/05/2014WO2014082813A2 Method and apparatus for determining lithographic quality of a structure
06/05/2014US20140155310 Dynamic multi-purpose composition for the removal of photoresists and method for its use
06/05/2014US20140154827 Photoresist Employing Photodimerization Chemistry and Method for Manufacturing Organic Light Emitting Diode Display Using the Same
06/05/2014US20140154632 Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
06/05/2014US20140154631 Method of removing negative acting photoresists
06/05/2014US20140154630 Asymmetric templates for forming non-periodic patterns using directes self-assembly materials
06/05/2014US20140154628 Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist
06/05/2014US20140154627 Negative type photosensitive resin composition, resin film, and electronic device
06/05/2014US20140154626 Epoxy-functional radiation-curable composition containing an epoxy-functional siloxane oligomer for enhanced film retention and adhesion during solvent development
06/05/2014US20140154625 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
06/05/2014US20140154624 Positive working photosensitive material
06/05/2014US20140154616 Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device
06/05/2014US20140154483 Transparent member having an image and method for forming the image on the transparent member
06/05/2014US20140152969 Lithographic apparatus and device manufacturing method
06/05/2014US20140152968 Microlens array and scanning exposure device using same
06/05/2014US20140152967 Source-collector module wth GIC mirror and LPP EUV light source
06/05/2014US20140152966 Facility and method for treating substrate
06/05/2014US20140151615 Coloring composition, colored cured film, color filter, manufacturing method of the same, and sold state imaging device
06/05/2014US20140151089 Printed circuit board and method for manufacturing the same
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