| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/14/2007 | WO2007066700A1 Laser light source device, exposure method, and device |
| 06/14/2007 | WO2007066687A1 Temperature measuring method, exposure method, exposure apparatus and method for manufacturing device |
| 06/14/2007 | WO2007066679A1 Exposure apparatus, exposure method, projection optical system and device manufacturing method |
| 06/14/2007 | WO2007066661A1 Positive photoresist composition and method of forming photoresist pattern using the same |
| 06/14/2007 | WO2007066653A1 Polysiloxane and radiation-sensitive resin composition |
| 06/14/2007 | WO2007066597A1 Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film |
| 06/14/2007 | WO2007066596A1 Exposure method and exposure device |
| 06/14/2007 | WO2007066591A1 Positive resist composition for immersion exposure and method for forming resist pattern |
| 06/14/2007 | WO2007066582A1 Temperature control apparatus, exposure apparatus, temperature control method and device manufacturing method |
| 06/14/2007 | WO2007066481A1 FLUORINE-CONTAINING NORBORNENE DERIVATIVE CONTAINING α,β-UNSATURATED ESTER GROUP OR CURABLE FLUORINE-CONTAINING POLYMER COMPOSITION CONTAINING FLUORINE-CONTAINING NORBORNANE DERIVATIVE |
| 06/14/2007 | WO2007065769A1 Method for machining an optical element and optical element |
| 06/14/2007 | WO2007035166A3 Methods and systems for pattern generation based on multiple forms of design data |
| 06/14/2007 | WO2006067814A8 Tridimensional structures for an ink jet printhead and relevant manufacturing process |
| 06/14/2007 | US20070135581 Underlayer coating forming composition containing dextrin ester compound |
| 06/14/2007 | US20070135556 Coating materials containing alpha-(1'-hydroxyalkyl)acrylates |
| 06/14/2007 | US20070135531 2-Hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-phenoxy]-phenyl}-2-methyl-propan-1-one; prepared by reacting diphenylether with an acylating agent by means of a Friedel-Crafts reaction catalyzed by a Lewis acid to produce a reaction product; and reacting the reaction product with a hydrated base |
| 06/14/2007 | US20070134600 Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored |
| 06/14/2007 | US20070134598 Manufacturing method of semiconductor device, and wafer and manufacturing method thereof |
| 06/14/2007 | US20070134597 By surrounding it with somewhat narrower, dummy hole features; The isolated hole may then be used for etching or electroplating the underlying substrate; manufacture of magnetic write heads |
| 06/14/2007 | US20070134596 Photosensitive printing element having nanoparticles and method for preparing the printing element |
| 06/14/2007 | US20070134595 Pressurized aerosol formulation for use in radiation sensitive coatings |
| 06/14/2007 | US20070134593 transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film |
| 06/14/2007 | US20070134592 Photosensitive lithographic printing plate and method for making a printing plate |
| 06/14/2007 | US20070134586 Excellent resolution and can be developed with an aqueous alkaline solution such as tetramethylammonium hydroxide (TMAH); forms a stable benzoxazole ring by heating; heat resistant film; p-(o-hydroxyphenylaminocarbonyl)styrene for example |
| 06/14/2007 | US20070134585 Dissolution inhibitors in photoresist compositions for microlithography |
| 06/14/2007 | US20070134562 Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 06/14/2007 | US20070134560 Lithography system using a programmable electro-wetting mask |
| 06/14/2007 | US20070134424 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film |
| 06/14/2007 | US20070134420 Methods for modifying surfaces |
| 06/14/2007 | US20070134359 Apparatus for use in stereolithographic processing of components and assemblies |
| 06/14/2007 | US20070132979 Lithographic apparatus and device manufacturing method |
| 06/14/2007 | US20070132975 Cleanup method for optics in immersion lithography |
| 06/14/2007 | US20070132974 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 06/14/2007 | US20070132973 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/14/2007 | US20070132972 Lithographic apparatus and device manufacturing method |
| 06/14/2007 | US20070132971 Lithographic apparatus and device manufacturing method |
| 06/14/2007 | US20070132970 Lithographic apparatus and device manufacturing method |
| 06/14/2007 | US20070132969 Microlithographic projection exposure apparatus and method for introducing an immersion liquid into an immersion space |
| 06/14/2007 | US20070132968 Exposure apparatus and method for producing device |
| 06/14/2007 | US20070132320 Positioning apparatus and charged-particle-beam exposure apparatus |
| 06/14/2007 | US20070131879 Force provider with adjustable force characteristics for a stage assembly |
| 06/14/2007 | US20070131878 Controlling the flow through the collector during cleaning |
| 06/14/2007 | DE19957326B4 Verfahren zur Herstellung von Kontaktstrukturen A method for producing contact structures |
| 06/14/2007 | DE10314185B4 Doppelbrechungsmessgerät- und Verfahren Doppelbrechungsmessgerät- and procedures |
| 06/14/2007 | DE102006049920A1 Härtung eines Lacks nach dessen Bestrahlung Curing of a lacquer according to the irradiation thereof |
| 06/14/2007 | DE102006042007A1 Interferometer system, has measurement channel for providing signal indicating measurement along path, and another measurement channel for providing signal indicating measurement having component one direction |
| 06/13/2007 | EP1796446A2 Solder resist composition and printed circuit boards |
| 06/13/2007 | EP1796153A1 Ashing method and ashing apparatus |
| 06/13/2007 | EP1796146A1 Exposure apparatus, exposure method, and method for manufacturing device |
| 06/13/2007 | EP1796144A1 Stage apparatus and exposure apparatus |
| 06/13/2007 | EP1796143A1 Substrate holder, stage apparatus, and exposure apparatus |
| 06/13/2007 | EP1796142A1 Optical characteristic measuring device, optical characteristic measuring method, exposure device, exposure method, and device manufacturing method |
| 06/13/2007 | EP1796141A1 Method for controlling exposure system, exposure method and system using same, and method for manufacturing device |
| 06/13/2007 | EP1796139A1 Illumination optical equipment, exposure system and method |
| 06/13/2007 | EP1795967A1 Methods and devices for lithography using electromagnetic radiation with short wavelengths |
| 06/13/2007 | EP1795966A1 Lithographic apparatus and device manufacturing method |
| 06/13/2007 | EP1795965A2 Programmable mask for fabricating biomolecule array or polymer array |
| 06/13/2007 | EP1795964A2 Photosensitive printing element having silica nanoparticles and method for preparing the printing element |
| 06/13/2007 | EP1795963A1 Positive resist composition and pattern forming method using the same |
| 06/13/2007 | EP1795962A2 Positive resist composition and pattern for forming method using the same |
| 06/13/2007 | EP1795961A1 Positive resist composition and pattern making method using the same |
| 06/13/2007 | EP1795960A2 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition |
| 06/13/2007 | EP1795959A1 Imprint method, imprint apparatus, and process for producing chip |
| 06/13/2007 | EP1795958A1 Method of fabricating nanoimprint mold |
| 06/13/2007 | EP1795506A1 Titania-doped quartz glass and making method, euv lithographic member and photomask substrate |
| 06/13/2007 | EP1794783A1 Using ozone to process wafer like objects |
| 06/13/2007 | EP1794657A1 Process for the production of a lithographic printing plate |
| 06/13/2007 | EP1794656A2 Healing algorithm |
| 06/13/2007 | EP1794655A2 A material composition for nano- and micro-lithography |
| 06/13/2007 | EP1794654A1 Archiving means for permanently storing optically recognisable information |
| 06/13/2007 | EP1794651A2 Improved slip film compositions containing layered silicates |
| 06/13/2007 | EP1794650A2 Projection optical device and exposure apparatus |
| 06/13/2007 | EP1794326A2 Use of photopolymerization for amplification and detection of a molecular recognition event |
| 06/13/2007 | EP1793979A2 Device for producing molded bodies |
| 06/13/2007 | EP1381656A4 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 06/13/2007 | EP1171502B1 Resin composition for photofabrication of three dimensional objects |
| 06/13/2007 | EP0978015B1 Light absorbing polymers |
| 06/13/2007 | CN2911736Y Exposing device of flexible circuit board |
| 06/13/2007 | CN1981365A Exposure equipment, exposure method and device manufacturing method |
| 06/13/2007 | CN1981361A Apparatus for generating and emitting xuv radiation |
| 06/13/2007 | CN1981243A 电子束绘制装置 Electron beam drawing device |
| 06/13/2007 | CN1981242A Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications |
| 06/13/2007 | CN1981241A Method of making a photopolymer sleeve blank for flexographic printing |
| 06/13/2007 | CN1981240A Anti-reflective coatings using vinyl ether crosslinkers |
| 06/13/2007 | CN1981239A Photopolymer printing plate precursor. |
| 06/13/2007 | CN1981238A Display panel includidng patterned spacer |
| 06/13/2007 | CN1981237A Photocurable/thermosetting resin composition, dry film using same, and cured product thereof |
| 06/13/2007 | CN1981236A Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing |
| 06/13/2007 | CN1980984A 聚酰胺 Polyamide |
| 06/13/2007 | CN1980962A Acid-sensitive copolymer and use thereof |
| 06/13/2007 | CN1979768A Method for adopting positive electronic corrosion-resistant to prepare metal nano electrode |
| 06/13/2007 | CN1979765A Heat treatment unit |
| 06/13/2007 | CN1979764A Heat treatment unit, heat treatiment method, control program and computer-readable recording medium |
| 06/13/2007 | CN1979753A Plane light-source and mfg. method |
| 06/13/2007 | CN1979346A Manufacturing and cleansing of thin film transistor panels |
| 06/13/2007 | CN1979345A Resin molded product production process, metal structure production process, and resin molded product |
| 06/13/2007 | CN1979344A Exposure method using exposure mask |
| 06/13/2007 | CN1979343A Immersion lithography systems |
| 06/13/2007 | CN1979342A Manufacturing method of semiconductor device, and wafer and manufacturing method thereof |
| 06/13/2007 | CN1979341A Method for making ultraviolet solidified nano impression formboard |