| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 06/21/2007 | CA2632992A1 Biosensors and methods for making and using them |
| 06/20/2007 | EP1798758A1 Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method |
| 06/20/2007 | EP1798599A1 Antireflection film composition, patterning process and substrate using the same |
| 06/20/2007 | EP1798598A1 Positive photosensitive composition |
| 06/20/2007 | EP1798597A2 Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof |
| 06/20/2007 | EP1798596A2 Positive photoresist composition |
| 06/20/2007 | EP1798595A1 Fabrication mehod for photomask, fabrication method for device and monitoring method for photomask |
| 06/20/2007 | EP1797584A2 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 06/20/2007 | EP1797479A1 Device obtained by nanoprinting comprising metallic patterns and method for nanoprinting of metallic patterns |
| 06/20/2007 | EP1797146A1 Cyanopyridine-based azo dyes |
| 06/20/2007 | EP1664925A4 Imprint lithography templates having alignment marks |
| 06/20/2007 | EP1311908B1 Photoresist composition for deep uv and process thereof |
| 06/20/2007 | EP1257924A4 Process monitoring system for lithography lasers |
| 06/20/2007 | EP1237824B1 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 06/20/2007 | EP1200879B1 Control of the illumination distribution in the exit pupil of an EUV illumination system |
| 06/20/2007 | EP1044074B1 Photoresist coating process control with solvent vapor sensor |
| 06/20/2007 | CN2914146Y Lithium niobate wafer photolith whirl coating vacuum cups |
| 06/20/2007 | CN1985357A Substrate heating equipment and substrate heating method |
| 06/20/2007 | CN1985355A Determination method of exposure conditions, exposure method, exposure device and device manufacturing method |
| 06/20/2007 | CN1985354A Exposure device, exposing method, and device manufacturing method |
| 06/20/2007 | CN1985344A Apparatus for shielding a charged particle beam |
| 06/20/2007 | CN1985217A Non-aqueous microelectronic cleaning compositions containing fructose |
| 06/20/2007 | CN1985216A Improved method for bump exposing relief image printing plates |
| 06/20/2007 | CN1985206A Catadioptric projection objective with intermediate images |
| 06/20/2007 | CN1984975A Pigment dispersion composition, use thereof and compound for treating pigment |
| 06/20/2007 | CN1984938A Photocurable/thermosetting resin composition and cured product thereof |
| 06/20/2007 | CN1983520A Production of semiconductor anti-reflective layer |
| 06/20/2007 | CN1983510A Method of manufacturing semiconductor device |
| 06/20/2007 | CN1983038A 曝光装置 Exposure device |
| 06/20/2007 | CN1983037A Exposure method, exposure device, and method of manufacturing device |
| 06/20/2007 | CN1983036A Binary sinusoidal sub-wavelength gratings as alignment marks |
| 06/20/2007 | CN1983035A Method for reducing mask precipitation defects |
| 06/20/2007 | CN1983034A A method for preventing or reducing contamination of an immersion type projection appartus and an immersion type lithographic apparatus |
| 06/20/2007 | CN1983033A Mask pattern arrangement |
| 06/20/2007 | CN1983032A Scale and method for measuring photoetching alignment precision |
| 06/20/2007 | CN1983031A Photosensitive resin composition for organic light emitting diodes |
| 06/20/2007 | CN1983030A Cationically polymerizable photo imageable thick film compositions, electrodes, and methods of forming thereof |
| 06/20/2007 | CN1983029A Method and device using arf photoresist |
| 06/20/2007 | CN1983028A Mask blank and method for manufacturing transfer mask |
| 06/20/2007 | CN1983027A Color filter mask layout |
| 06/20/2007 | CN1983026A Polymer for hardmask of semiconductor device and composition containing the same |
| 06/20/2007 | CN1983025A Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 06/20/2007 | CN1983024A Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 06/20/2007 | CN1983023A Method and system for detecting corrugation defect and manufacturing method of photomask |
| 06/20/2007 | CN1983003A Manufacturing method of dsplay device and mold therefor |
| 06/20/2007 | CN1983002A Liquid crystal display device and method for fabricating the same |
| 06/20/2007 | CN1982997A Thin-film transistor base plate and its production |
| 06/20/2007 | CN1982967A Liquid crystal display device and method of manufacturing the same |
| 06/20/2007 | CN1982953A Method for adjusting display device white balance and liquid-crystal display device |
| 06/20/2007 | CN1982924A Color optical filter and its production |
| 06/20/2007 | CN1982425A Detergent |
| 06/20/2007 | CN1982388A Organic anti-reflective coating polymer, anti-reflective coating polymer and preparing method thereof |
| 06/20/2007 | CN1982202A Method for producing nano-stamped template by laminated sided-wall technology |
| 06/20/2007 | CN1982083A Production of planar relief flat based on corrosion |
| 06/20/2007 | CN1322608C Process for preparing carbon electrode array with high surface area and high gap filling capacity |
| 06/20/2007 | CN1322591C Method for processing and manufacturing components and parts applied in micro-electronics and mechanical system |
| 06/20/2007 | CN1322580C 胶粘带 Adhesive tape |
| 06/20/2007 | CN1322550C Liquid supplying device and substrate processing device |
| 06/20/2007 | CN1322546C Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 06/20/2007 | CN1322545C Light carving projection device and method for producing device with it and produced device |
| 06/20/2007 | CN1322374C Exposure device and aberration correcting method |
| 06/20/2007 | CN1322373C Projection optical system, exposure device and its assembly mfg. method |
| 06/20/2007 | CN1322372C Optical cover process and method for making film transistor |
| 06/20/2007 | CN1322371C Solid imaging compsns. for preparing polypropylene-like articles |
| 06/20/2007 | CN1322351C Crystallizer and crystallizing method |
| 06/20/2007 | CN1322105C Cleaning solution and manufacturing method for semiconductor device |
| 06/20/2007 | CN1321737C Process for producing film forming resins for photoresist compositions |
| 06/19/2007 | US7234128 Method for improving the critical dimension uniformity of patterned features on wafers |
| 06/19/2007 | US7233836 Exposure apparatus and device manufacturing method |
| 06/19/2007 | US7233445 Method of manufacturing microlens array |
| 06/19/2007 | US7233387 Image forming apparatus |
| 06/19/2007 | US7233386 Method of optimizing imaging performance |
| 06/19/2007 | US7233383 Exposure apparatus, device manufacturing method, pattern generator and maintenance method to check for pixel deterioration |
| 06/19/2007 | US7233010 Radiation system and lithographic apparatus |
| 06/19/2007 | US7233009 Lithographic projection apparatus and reflector assembly for use therein |
| 06/19/2007 | US7232917 Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation |
| 06/19/2007 | US7232850 Composition of a cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; epoxy-containing compounds are the cationically curable groups |
| 06/19/2007 | US7232768 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials |
| 06/19/2007 | US7232758 Method of correcting lithographic process and method of forming overlay mark |
| 06/19/2007 | US7232651 Optical recording materials |
| 06/19/2007 | US7232650 Forming a porous optical structure, by heating at high temperature for a time to pyrolyze a photopatterning structure, which is formed with a mixture of epoxy resins, a photoinitiator, silica sol particles; optical waveguides |
| 06/19/2007 | US7232649 Method for thermally processing photosensitive printing sleeves |
| 06/19/2007 | US7232648 Photosensitive resin composition and coating film cured product thereof |
| 06/19/2007 | US7232647 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp |
| 06/19/2007 | US7232646 Low-viscous, radiation curable formulation, particularly for the stereo-lithographical production of earpiece |
| 06/19/2007 | US7232645 obtained by electrochemical graining treatment on an aluminum plate, which contains 0.02-0.29 wt % Fe, 0.03-0.15% Si, 0.020-0.040% Cu, and 0.050% or less Ti; surface area ratio and steepness each satisfies specified conditions |
| 06/19/2007 | US7232644 Polymerization using free radical catalyst |
| 06/19/2007 | US7232643 Composition of a resin which contains an acid dissociable dissolution inhibiting group, an acid generator and a cycloalkylester or ether substituted triphenyl methane compound; semiconductor elements and liquid crystal display elements |
| 06/19/2007 | US7232642 Resin of an acrylic ester with pendant cyclic or heterocyclic groups and an acid generator; suitable for ArF excimer laser lithography, showing excellent resolution, sensitivity, pattern shape, excellent line edge roughness |
| 06/19/2007 | US7232641 Base resin polymer for a positive-resist composition of acrylic ester monomers with pendant adamantine and norbornene groups ; high sensitivity, high resolution in exposure with a high energy beam, reduced line edge roughness due to suppressed swelling at the time of development |
| 06/19/2007 | US7232640 Polymer of styrene modified with alkoxy or alcohol substituents capable of increasing its solubility in an alkali developer under action of an acid, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent; nanolithography processes for manufacturing VLSI |
| 06/19/2007 | US7232639 Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same |
| 06/19/2007 | US7232638 Resist composition and patterning process |
| 06/19/2007 | US7232637 Light sensitive media for optical devices using organic mesophasic materials |
| 06/19/2007 | US7232629 Method of forming and testing a phase shift mask |
| 06/19/2007 | US7232498 Applying layers of curable elastomer composition to prepared sidewall surface until a predetermined raised thickness is obtained; curing the curable elastomer by application of heat or electromagnetic radiation |
| 06/19/2007 | US7232233 Catoptric reduction projection optical system and exposure apparatus using the same |
| 06/19/2007 | CA2221014C New family of monomeric or polymeric photoinitiators in which sulfonic groups are fso2 groups |
| 06/14/2007 | WO2007067706A2 Pressurized aerosol formulation for use in radiation sensitive coatings |
| 06/14/2007 | WO2007067039A1 Radiation system and lithographic apparatus |