| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/27/2007 | CN1989453A Integral plated resistor and method for the manufacture of printed circuit boards comprising boards comprising the same |
| 06/27/2007 | CN1989156A Fluorine-containing copolymer, alkali-developable resin composition, and alkali-developable photosensitive resin composition |
| 06/27/2007 | CN1989009A Apparatus and method for thermally developing flexographic printing elements |
| 06/27/2007 | CN1988956A Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| 06/27/2007 | CN1988130A Method for fabricating dual damascene structures |
| 06/27/2007 | CN1988127A Silicon sheet pre-positioning system based on multiple sensor data fusing |
| 06/27/2007 | CN1987663A Light resistance washing agent |
| 06/27/2007 | CN1987662A Lithographic apparatus and device manufacturing method |
| 06/27/2007 | CN1987661A Flat surface stage apparatus |
| 06/27/2007 | CN1987660A Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units |
| 06/27/2007 | CN1987659A Lithographic apparatus and device manufacturing method using multiple exposure types |
| 06/27/2007 | CN1987658A 器件制造方法和计算机程序产品 The device manufacturing method, and computer program products |
| 06/27/2007 | CN1987657A Lithographic apparatus and method for manufacturing a device |
| 06/27/2007 | CN1987656A Multiple mask exposure system and method |
| 06/27/2007 | CN1987655A Exposure device of closing type |
| 06/27/2007 | CN1987654A Method for semi-penetration semi-reflection liquid crystal display |
| 06/27/2007 | CN1987653A Method for producing printing plate of flexible plate printing and ink jet printing device made according to said method |
| 06/27/2007 | CN1987652A Photoresist coating device and its method |
| 06/27/2007 | CN1987651A Method for producing printing plate material |
| 06/27/2007 | CN1987650A Negative light resistance agent composition |
| 06/27/2007 | CN1987649A Photo setting composition and color filter |
| 06/27/2007 | CN1987648A Positive PS printing plate light sensitive composition |
| 06/27/2007 | CN1987647A Thermosensitive polymerized lithographic printing plate |
| 06/27/2007 | CN1987646A Concave/convex pattern forming method and information recording medium manufacturing method |
| 06/27/2007 | CN1987645A 压印光刻 Imprint lithography |
| 06/27/2007 | CN1987644A Negative light resistance agent |
| 06/27/2007 | CN1987643A The photo mask and method of fabricating the array substrate for liquid crystal display device using the same |
| 06/27/2007 | CN1987627A TFT LCD structure and producing method |
| 06/27/2007 | CN1987622A Array base board structure of thin film transistor liquid crystal display and its producing method |
| 06/27/2007 | CN1987570A Metal line, method of manufacturing the same, display substrate having the same and method of manufacturing the display substrate |
| 06/27/2007 | CN1987533A Color filter sheet structure and its producing method |
| 06/27/2007 | CN1987532A Method for producing color filter sheet |
| 06/27/2007 | CN1323327C Composition of refrared sensitive and forebody of lithographic printing plate |
| 06/27/2007 | CN1323326C Water soluble negative photoresist and method for forming photoresist pattern |
| 06/27/2007 | CN1323325C System and method for protecting templates by two-piece cover |
| 06/27/2007 | CN1323321C Method of making optical interference type display units |
| 06/27/2007 | CN1322937C Coated drying device |
| 06/26/2007 | US7237221 Matrix optical process correction |
| 06/26/2007 | US7236434 Exposure apparatus of an optical disk master, method of exposing an optical disk master, and wavefront fluctuation correction mechanism |
| 06/26/2007 | US7236254 Exposure apparatus with interferometer |
| 06/26/2007 | US7236245 Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same |
| 06/26/2007 | US7236239 Illumination system and exposure apparatus |
| 06/26/2007 | US7236233 Assembly of a reticle holder and a reticle |
| 06/26/2007 | US7236232 Using isotopically specified fluids as optical elements |
| 06/26/2007 | US7236231 Exposure apparatus and device manufacturing method |
| 06/26/2007 | US7236230 Exposure apparatus and device fabrication method |
| 06/26/2007 | US7236228 Exposure apparatus |
| 06/26/2007 | US7235801 Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby |
| 06/26/2007 | US7235490 Method of manufacturing semiconductor device |
| 06/26/2007 | US7235464 Patterning method |
| 06/26/2007 | US7235411 Method for aligning a wafer and apparatus for performing the same |
| 06/26/2007 | US7235350 Alumina insulation for coating implantable components and other microminiature devices |
| 06/26/2007 | US7235349 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator |
| 06/26/2007 | US7235348 Water soluble negative tone photoresist |
| 06/26/2007 | US7235347 Low pH development solutions for chemically amplified photoresists |
| 06/26/2007 | US7235346 flexible, metallic support, adhesive layer, photopolymerizable layer which can be developed in organic media which comprises at least one elastomeric binder, ethylenically unsaturated monomers, a photoinitiator or photoinitiator system and plasticizer, transparent substrate layer, and protective film |
| 06/26/2007 | US7235345 Covering substrate containing photoresist pattern; heating; shrinkage; reducing spacing between photoresist; using water soluble polymer and surfactant mixtures |
| 06/26/2007 | US7235344 includes first moiety such as photoacid generator capable of modifying the composition in response to an energy transfer, second moiety capable of harvesting energy from an external energy source (photons) positioned in composition such that energy harvested at second moiety is transferred to the first |
| 06/26/2007 | US7235343 Photoacid generators, chemically amplified resist compositions, and patterning process |
| 06/26/2007 | US7235342 Negative photoresist composition including non-crosslinking chemistry |
| 06/26/2007 | US7235341 Positive resist composition |
| 06/26/2007 | US7235340 Method of producing a touch panel |
| 06/26/2007 | US7235336 to determine a photoresist thickness that will provide the desired photoresist feature size |
| 06/26/2007 | US7235195 Method for making opthalmic devices |
| 06/21/2007 | WO2007070775A2 Integrated circuit with antireflective coating |
| 06/21/2007 | WO2007070486A2 Biosensors and methods for making and using them |
| 06/21/2007 | WO2007069798A1 Positive photoresist composition |
| 06/21/2007 | WO2007069703A1 Fluorine-containing polymer, negative photosensitive composition and partition wall |
| 06/21/2007 | WO2007069640A1 Novel compound, polymer, and resin composition |
| 06/21/2007 | WO2007069585A1 Positive resist composition for circuit board, and positive dry film for circuit board, and process for producing circuit board with use thereof |
| 06/21/2007 | WO2007069548A1 Resist composition for liquid immersion exposure and method for forming resist pattern |
| 06/21/2007 | WO2007069480A1 Aligner and aligning method |
| 06/21/2007 | WO2007069457A1 Surface inspection apparatus and surface inspection method |
| 06/21/2007 | WO2007069313A1 Resist application method |
| 06/21/2007 | WO2007031413A3 Optical element unit for exposure processes |
| 06/21/2007 | WO2006120634A3 Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device |
| 06/21/2007 | WO2005122235A3 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 06/21/2007 | US20070143732 Pixelated masks for high resolution photolithography |
| 06/21/2007 | US20070142619 Forming electrical contacts to a molecular layer |
| 06/21/2007 | US20070142617 Polymer for hard mask of semiconductor device and composition containing the same |
| 06/21/2007 | US20070142490 Radiation-sensitive compositions and imageable elements based thereon |
| 06/21/2007 | US20070141516 Ultra dark polymer |
| 06/21/2007 | US20070141515 coating with a photoimageable ink on a carrier film, forming a photoresist layer, then exposed to developing |
| 06/21/2007 | US20070141514 Method for forming photoresist pattern and photoresist laminate |
| 06/21/2007 | US20070141513 For use in production of semiconductor devices; acid generator that generates an acid upon irradiation of an actinic ray or radiation, resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by action of an acid to increase solubility in an alkali developing solution |
| 06/21/2007 | US20070141508 Negative resist composition and method for forming resist pattern |
| 06/21/2007 | US20070141507 Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof |
| 06/21/2007 | US20070141485 Multilayered imaging element |
| 06/21/2007 | US20070141483 Near-field exposure photoresist and fine pattern forming method using the same |
| 06/21/2007 | US20070141480 including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask |
| 06/21/2007 | US20070141479 mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure; can improve contrast in forming a pattern in an arbitrary shape |
| 06/21/2007 | US20070141262 Coating apparatus and method having a slide bead coater and liquid drop applicator |
| 06/21/2007 | US20070140906 Digital optical chemistry micromirror imager |
| 06/21/2007 | US20070139851 Substrate holding technique |
| 06/21/2007 | US20070139636 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system |
| 06/21/2007 | US20070139631 Environmental system including a transport region for an immersion lithography apparatus |
| 06/21/2007 | US20070138131 Method of forming a patterned layer on a substrate |
| 06/21/2007 | US20070137556 Thermal processing appparatus |
| 06/21/2007 | DE102005061250A1 Gewebe und Verfahren zu dessen Herstellung Fabric and method of producing the |
| 06/21/2007 | DE102005060517A1 Prism polarizer e.g. Glan-Thompson polarizer, for e.g. micro lithography-projection illumination system, has prisms, where birefringent characteristics of prisms are independent of stress-induced birefringence in wavelength area of light |