| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/03/2007 | US7239148 Method and device for measuring surface potential distribution |
| 07/03/2007 | US7239051 Driving apparatus and exposure apparatus |
| 07/03/2007 | US7238653 surface tension is lowered to prevent collapse of photoresist patterns in the last development process of removing the residual photoresist film |
| 07/03/2007 | US7238542 Manufacturing method for compound semiconductor device |
| 07/03/2007 | US7238464 Photoresist formulation for high aspect ratio plating |
| 07/03/2007 | US7238462 On semiconductor substrate before formation of photoresist layer for forming pattern comprising resin with substituent group capable of forming a sulfonic acid residue after exposure to heat or light; lithography; amines and quaternary ammonium hydroxide used as stripping solution for easy removal |
| 07/03/2007 | US7238455 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| 07/03/2007 | US7238454 Thin films which forms optical variations on exposure to light; applying photoresists; baking; lithography |
| 07/03/2007 | US7237967 Developing apparatus and method |
| 07/03/2007 | US7237915 Catadioptric projection system for 157 nm lithography |
| 07/03/2007 | US7237914 Light condenser |
| 07/03/2007 | US7237581 Apparatus and method of dispensing photosensitive solution in semiconductor device fabrication equipment |
| 07/03/2007 | US7237482 Flexo processor |
| 07/03/2007 | CA2387389C Photocationic initiator combinations |
| 06/28/2007 | WO2007072888A1 Photosensitive sheets and method and apparatus for manufacturing the same |
| 06/28/2007 | WO2007072818A1 Liquid producing apparatus, liquid immersion exposure apparatus, and method for manufacturing device |
| 06/28/2007 | WO2007072786A1 Glass substrate having circuit pattern and process for producing the same |
| 06/28/2007 | WO2007072778A1 Mask blank and mask |
| 06/28/2007 | WO2007072702A1 Resist composition and process for producing the same |
| 06/28/2007 | WO2007072689A1 Ethylenically unsaturated bond-containing compound, photosensitive composition, photosensitive lithographic printing plate material, and printing method using the same |
| 06/28/2007 | WO2007072682A1 Photosensitive transfer material, member for display device, process for producing the member, black matrix, color filter, process for producing the color filter, substrate for display device, and display device |
| 06/28/2007 | WO2007072641A1 Pattern-forming material, pattern-forming apparatus and pattern-forming method |
| 06/28/2007 | WO2007072613A1 Elastomer constituent and photosensitive composition making use of the same |
| 06/28/2007 | WO2007072335A2 Speckle reduction by angular scanning for laser projection displays |
| 06/28/2007 | WO2007071569A1 Projection objective of a microlithographic projection exposure apparatus |
| 06/28/2007 | WO2007071565A1 Projection objective of a microlithographic projection exposure apparatus |
| 06/28/2007 | WO2007071497A1 Oxime ester photoinitiators |
| 06/28/2007 | WO2007071408A1 Slm direct writer |
| 06/28/2007 | WO2007071353A1 Imaging device in a projection exposure machine |
| 06/28/2007 | WO2007071307A1 Projection objective with decentralized control |
| 06/28/2007 | WO2007071280A1 Immersion lithography apparatus and method of performing immersion lithography |
| 06/28/2007 | WO2007047932A3 Nir/ir curable coatings for light directed imaging |
| 06/28/2007 | WO2007001848A3 High refractive index fluids with low absorption for immersion lithography |
| 06/28/2007 | WO2004111726A3 Novel photosensitive resin compositions |
| 06/28/2007 | WO2004018622A3 Selective and alignment-free molecular patterning of surfaces |
| 06/28/2007 | US20070150850 Photomask evaluation method, photomask evaluation apparatus, and semiconductor device manufacturing method |
| 06/28/2007 | US20070149429 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning |
| 06/28/2007 | US20070148603 Method for forming pattern and method for fabricating LCD device using the same |
| 06/28/2007 | US20070148602 sequentially forming underlying layer, hard mask layer, silicon-containing first anti-reflection film, and photoresist film over semiconductor substrate, forming photoresist pattern by exposing and developing film using exposure mask, and etching, performing O2 plasma treatment |
| 06/28/2007 | US20070148598 Method for fabricating dual damascene structures |
| 06/28/2007 | US20070148597 Method and apparatus for laser exposure of a screen for use in screen printing |
| 06/28/2007 | US20070148585 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer |
| 06/28/2007 | US20070148584 Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; enhanced contrast of alkali dissolution rate before and after exposure; high sensitivity and resolution in fine feature size regions |
| 06/28/2007 | US20070148583 Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers |
| 06/28/2007 | US20070148582 Negative photosensitive composition and negative photosensitve lithographic printing plate |
| 06/28/2007 | US20070148581 Photoresist composition and method of forming resist pattern |
| 06/28/2007 | US20070148559 Phase shift mask and method for fabricating the same |
| 06/28/2007 | US20070148557 Composition for forming nitride coating film for hard mask |
| 06/28/2007 | US20070148556 Photosensitive composition for volume hologram recording |
| 06/28/2007 | US20070148344 Spin-coating method, determination method for spin-coating condition and mask blank |
| 06/28/2007 | US20070147750 Laser device and exposure device using the same |
| 06/28/2007 | US20070146680 Exposure apparatus, exposure method, and exposure mask |
| 06/28/2007 | US20070146677 Illumination optical system and exposure apparatus using the same |
| 06/28/2007 | US20070146674 Advanced Illumination System for Use in Microlithography |
| 06/28/2007 | US20070146672 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 06/28/2007 | US20070146668 Lithographic processing optimization based on hypersampled correlations |
| 06/28/2007 | US20070146663 Exposure apparatus, exposure method, and device producing method |
| 06/28/2007 | US20070146662 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device |
| 06/28/2007 | US20070145632 Elastomeric stamp, patterning method using such a stamp and method for producing such a stamp |
| 06/28/2007 | US20070145306 Lithographic apparatus, method for calibrating and device manufacturing method |
| 06/28/2007 | US20070145297 Method for cleaning a lithographic apparatus module, cleaning arrangement for a lithographic apparatus module and lithographic apparatus comprising the cleaning arrangement |
| 06/28/2007 | US20070145296 Method for cleaning a lithographic apparatus module, cleaning arrangement for a lithographic apparatus module and lithographic apparatus comprising the cleaning arrangement |
| 06/28/2007 | US20070144384 Image recording method |
| 06/28/2007 | US20070144382 Lightened offset plates, preparation and use thereof |
| 06/28/2007 | DE112005002156T5 Leitfähiges lithographisches Polymer und Verfahren zur Herstellung von Vorrichtungen unter Verwendung desselben Of the same conductive lithographic polymer and method for the production of devices using |
| 06/28/2007 | DE102005062401A1 Mirror`s imaging characteristics variation device for projection exposure system, has actuators formed such that changeable forces are introduced in mirror by variation in temperature, where forces lead to deformation of mirror surface |
| 06/28/2007 | DE102005062038A1 Body`s e.g. mirror, determining method for micro lithography device, involves determining relative position of body by detector signal that has information about impact position of part of measuring light beam on detector surface |
| 06/28/2007 | DE102005060456A1 Plastic film fabricating method for fabricating semiconductor components, involves filling fluid in area separated by film, so that pressure difference caused by filling presses film on wafer, where plastic coating is formed on film |
| 06/27/2007 | EP1802186A2 Solder resist composition and printed circuit boards |
| 06/27/2007 | EP1802184A1 Method for manufacturing conductive pattern material |
| 06/27/2007 | EP1801853A1 Exposure apparatus and device manufacturing method |
| 06/27/2007 | EP1801852A1 Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method |
| 06/27/2007 | EP1801658A2 EUV-lithographic projection apparatus comprising an optical element with a capping layer |
| 06/27/2007 | EP1801657A1 Device manufacturing method and computer program product |
| 06/27/2007 | EP1801656A1 Lithographic apparatus and device manufacturing method using multiple exposure types |
| 06/27/2007 | EP1801655A2 Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units |
| 06/27/2007 | EP1801654A1 Lithographic apparatus and device manufacturing method |
| 06/27/2007 | EP1801653A1 Lithographic apparatus and method for manufacturing a device |
| 06/27/2007 | EP1801652A2 Methods of releasing photoresist film from substrate and bonding photoresist film with second substrate |
| 06/27/2007 | EP1801651A1 Polymerizable composition and planographic printing plate precursor using the same |
| 06/27/2007 | EP1801650A2 Alignment for imprint lithography |
| 06/27/2007 | EP1801649A2 Imprint lithography |
| 06/27/2007 | EP1801648A1 Photosensitive transfer material and pattern forming method and pattern |
| 06/27/2007 | EP1801630A1 Projection optical system, production method for projection optical system, exposure system and exposure method |
| 06/27/2007 | EP1801619A2 Substrate, method for producing the same, and patterning process using the same |
| 06/27/2007 | EP1801145A1 Process for producing cured product of photosensitive resin |
| 06/27/2007 | EP1800862A2 Method and apparatus for irradiating a screen used in silk-screen printing |
| 06/27/2007 | EP1800188A1 Device for generating extreme ultraviolet light and application to an extreme ultraviolet radiation lithography source |
| 06/27/2007 | EP1800187A1 Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements |
| 06/27/2007 | EP1800186A1 An imprinted polymer support |
| 06/27/2007 | EP1716450A4 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 06/27/2007 | EP1711861A4 Structured materials and methods |
| 06/27/2007 | EP1579435B1 Method and device for irradiating spots on a layer |
| 06/27/2007 | CN1989593A Development apparatus and development method |
| 06/27/2007 | CN1989459A Method of making a photopolymer printing plate |
| 06/27/2007 | CN1989458A Optical system having a cleaning arrangement |
| 06/27/2007 | CN1989457A Photosensitive element, method of forming resist pattern with the same, and process for producing printed wiring board |
| 06/27/2007 | CN1989456A Photosensitive film, photosensitive film laminate and photosensitive film roll |
| 06/27/2007 | CN1989455A Oxime derivatives and the use therof as latent acids |
| 06/27/2007 | CN1989454A Photosensitive paste and method for producing member for display panel |