| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/11/2007 | CN1325997C Exposing method and manufacturing method of semiconductor device using the same |
| 07/11/2007 | CN1325996C Exposure method, exposure device and manufacture method of device |
| 07/11/2007 | CN1325995C Negative deep ultraviolet photoresist |
| 07/11/2007 | CN1325994C Phase shifting mask without Cr film layer, its mfg. method, and fabricating method for semiconductor |
| 07/11/2007 | CN1325972C Inner-switch-over type liquid crystal display and its making method |
| 07/11/2007 | CN1325969C Ultravioletray irradiating device and method for producing liquid crystal display with the same device |
| 07/11/2007 | CN1325956C Method and system for correction of intrinsic birefringence in UV microlithography |
| 07/11/2007 | CN1325532C Actinic radiation hardenable resin composition and hardening product thereof |
| 07/11/2007 | CN1325477C Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same |
| 07/11/2007 | CN1325270C Method of expanding fluid channel |
| 07/10/2007 | US7242537 Holding and positioning apparatus for an optical element |
| 07/10/2007 | US7242477 Apparatus and methods for detecting overlay errors using scatterometry |
| 07/10/2007 | US7242475 Method of determining aberration of a projection system of a lithographic apparatus |
| 07/10/2007 | US7242464 Method for characterizing optical systems using holographic reticles |
| 07/10/2007 | US7242459 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model |
| 07/10/2007 | US7242457 Exposure apparatus and exposure method, and device manufacturing method using the same |
| 07/10/2007 | US7242456 System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions |
| 07/10/2007 | US7242455 Exposure apparatus and method for producing device |
| 07/10/2007 | US7242012 Lithography device for semiconductor circuit pattern generator |
| 07/10/2007 | US7241688 Aperture masks for circuit fabrication |
| 07/10/2007 | US7241560 Irradiating a photoresist, exposing the photoresist to a basic developer/quencher solution of carbon dioxide and a base of a quaternary ammonium salt with a side chain that increases the solubility of the quaternary ammonium salt in carbon dioxide |
| 07/10/2007 | US7241558 Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof |
| 07/10/2007 | US7241557 Photopolymerizable composition |
| 07/10/2007 | US7241556 Positive-working imageable element that is developable with an alkaline developer after thermal imaging |
| 07/10/2007 | US7241554 Photoresist, can suppress contamination of a mirror tower, has high etching resistance, can solve the problems in edge roughness, and can be adapted to developer solutions having various alkali concentrations |
| 07/10/2007 | US7241553 Polymer, resist composition, and patterning process |
| 07/10/2007 | US7241552 Chemical resistance; bonding strength; accuracte patterns; photolithography |
| 07/10/2007 | US7241551 Positive-working resist composition |
| 07/10/2007 | US7241550 Method and apparatus for multiphoton-absorption exposure wherein exposure condition is changed with depth of convergence position |
| 07/10/2007 | US7241541 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched |
| 07/10/2007 | US7241540 Photocurable compositions and flexographic printing plates comprising the same |
| 07/10/2007 | US7241539 Photomasks including shadowing elements therein and related methods and systems |
| 07/10/2007 | US7241538 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same |
| 07/10/2007 | US7241537 Coating a substrate with a first photoresist, exposing the first photoresist with radiation, developing the first photoresist;applying a second photoresist layer onto the substrate, exposing the second photoresist with radiation in the second image area;developing the second photoresist |
| 07/10/2007 | US7241404 Resin composition, optical filter and plasma display |
| 07/10/2007 | US7241124 Apparatus for the rapid development of photosensitive printing elements |
| 07/10/2007 | CA2285938C Methods for fabricating enclosed microchannel structures |
| 07/05/2007 | WO2007074990A1 Composition for removing polymer residue of photosensitive etching-resistant layer |
| 07/05/2007 | WO2007074961A1 Hardmask compositions for resist underlayer films |
| 07/05/2007 | WO2007074862A1 Cleaning liquid for photolithography and method of circulation and use of the same |
| 07/05/2007 | WO2007074810A1 Mask blank and photomask |
| 07/05/2007 | WO2007074798A1 Method of conveying substrate to substrate processing device |
| 07/05/2007 | WO2007074778A1 Surface-protective film |
| 07/05/2007 | WO2007074660A1 Photosensitive resin composition and utilization thereof |
| 07/05/2007 | WO2007074634A1 Support for printing plate material, and printing plate material |
| 07/05/2007 | WO2007074134A1 Optical imaging device with determination of imaging errors |
| 07/05/2007 | WO2007057346A3 Method of making a lithographic printing plate |
| 07/05/2007 | WO2007056369A3 Batch photoresist dry strip and ash system and process |
| 07/05/2007 | WO2007039374A3 Immersion optical lithography system having protective optical coating |
| 07/05/2007 | WO2006137011A3 Methods and devices for characterizing polarization of illumination system |
| 07/05/2007 | WO2006059757A3 Process for producing resist pattern and conductor pattern |
| 07/05/2007 | WO2005098920A3 Aqueous solution for removing post-etch residue |
| 07/05/2007 | US20070155188 Method of forming photoresist pattern and method of manufacturing perpendicular magnetic recording head |
| 07/05/2007 | US20070155182 Manufacturing method of semiconductor device |
| 07/05/2007 | US20070155159 Method for forming under a thin layer of a first material portions of another material and/ or empty areas |
| 07/05/2007 | US20070155052 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 07/05/2007 | US20070154852 Method for patterning a thin film using a plasma by-product |
| 07/05/2007 | US20070154851 Reducing risk of detachment of photoresist from underlying substrate during development of photoresist pattern using fluid developer by controlling surface composition of the underlying substrate so that contact angle formed between substrate with developer is 20 degrees or greater |
| 07/05/2007 | US20070154850 Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures |
| 07/05/2007 | US20070154849 Method of fabricating a semiconductor transistor |
| 07/05/2007 | US20070154848 Low pH Development Solutions for Chemically Amplified Photoresists |
| 07/05/2007 | US20070154847 Chalcogenide layer etching method |
| 07/05/2007 | US20070154843 Resin and resin composition |
| 07/05/2007 | US20070154842 ethcing multilayer photoresists |
| 07/05/2007 | US20070154841 Exposing, baking and developing mixture of photoacid generator and reaction product of polymer containing an aliphatic monocyclic fluoroalcohol unit (poly(1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene) with an alkyloxycarbonylalkyl-group compound (methyl-norbornyloxycarbonylmethyl) |
| 07/05/2007 | US20070154840 cationically curable component having epoxy group containing component; oxetane group containing component, multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator; use in stereolithography; flexibility, elongation, tensile strength, curl resistance, water resistance |
| 07/05/2007 | US20070154835 Positive photosensitive composition |
| 07/05/2007 | US20070154821 Pringting plates comprising modified pigment products |
| 07/05/2007 | US20070154820 Photosensitive resin composition and black matrix using the same |
| 07/05/2007 | US20070153398 Microlithographic reduction projection catadioptric objective |
| 07/05/2007 | US20070153295 Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
| 07/05/2007 | US20070153252 Projection system for EUV lithograhphy |
| 07/05/2007 | US20070153248 Exposure apparatus |
| 07/05/2007 | US20070153245 Semiconductor manufacturing apparatus and pattern formation method |
| 07/05/2007 | US20070152303 Wafer with optical control modules in exposure fields |
| 07/05/2007 | US20070151956 Plasma processing device and ashing method |
| 07/05/2007 | DE4342123B4 Farbfilter, insbesondere für eine Flüssigkristallanzeigeeinrichtung, und Verfahren zu seiner Herstellung Color filters, especially for a liquid crystal display device, and process for its preparation |
| 07/05/2007 | DE19830476B4 Halbleitervorrichtung insbesondere Sensor Semiconductor device, in particular sensor |
| 07/05/2007 | DE10329867B4 Lithographieverfahren zum Verhindern einer lithographischen Belichtung des Randgebiets eines Halbleiterwafers Lithography method for preventing a lithographic exposure of the peripheral area of a semiconductor wafer |
| 07/05/2007 | DE10241208B4 Presbyopiekorrigierende Kontaktlinse und Herstellungsverfahren für eine solche Kontaktlinse Presbyopiekorrigierende contact lens and methods of manufacture for such a contact lens |
| 07/05/2007 | DE102006038454A1 Projection objective for microlithographic projection exposure apparatus, has optical subsystem that projects intermediate image into image-plane with image-plane side projection ratio of specific value |
| 07/05/2007 | DE102006024959A1 Polymer für eine Hartmaske einer Halbleitervorrichtung und Zusammensetzung enthaltend dieselbe Polymer for a hard mask of a semiconductor device and composition containing the same |
| 07/05/2007 | DE102005062618A1 Optical imaging device with imaging error detection, especially for micro-lithography, has measurement device that determines imaging error using measurement image |
| 07/05/2007 | DE102005062430A1 Optical arrangement used in microlithography comprises photomask and adsorbing substance arranged in intermediate chamber to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption |
| 07/05/2007 | DE102005062237A1 Process to evaluate the optical characteristics of a lens system as employed e.g. in stereolithography by comparison of two lens systems |
| 07/05/2007 | DE102005062217A1 Screen printing process for producing images involves illuminating edge region of screen outside illuminated useful area by means of diode on light batten |
| 07/05/2007 | DE102005062081A1 Projektionsobjektiv mit dezentraler Steuerung Projection lens with decentralized control |
| 07/05/2007 | DE102005054562A1 The solder stop varnish for circuit boards, which can be photo structured, is formulated to include a cold blend powder varnish resin |
| 07/05/2007 | DE10133256B4 Verfahren zur Herstellung von leitfähigen oder halbleitenden strukturierten Polymeren A process for the production of conductive or semiconductive polymers structured |
| 07/04/2007 | EP1804555A1 EUV radiation source with cooled aperture |
| 07/04/2007 | EP1804291A1 Semiconductor wafer and semiconductor device |
| 07/04/2007 | EP1804279A1 Substrate for exposure, exposure method and device manufacturing method |
| 07/04/2007 | EP1804125A1 Method for fine pattern formation |
| 07/04/2007 | EP1804124A1 Developing solution composition for lithography and method for resist pattern formation |
| 07/04/2007 | EP1804123A2 A method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 07/04/2007 | EP1804122A2 Lithographic apparatus and device manufacturing method |
| 07/04/2007 | EP1804121A1 Methods and systems for optimising immersion lithographic processing |
| 07/04/2007 | EP1804120A1 Positive resist composition and pattern forming method using the same |
| 07/04/2007 | EP1803969A2 Vibration isolation system |
| 07/04/2007 | EP1803967A2 Vibration isolating system with stabilisation of variables with respect to predictable force disturbances |