| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/17/2007 | US7244335 Substrate processing system and substrate processing method |
| 07/17/2007 | US7244334 Apparatus used in reshaping a surface of a photoresist |
| 07/12/2007 | WO2007078445A1 Process for preparing stable photoresist compositions |
| 07/12/2007 | WO2007077920A1 Exposure device and fabrication method thereof |
| 07/12/2007 | WO2007077901A1 Exposure system, device manufacturing system, exposure method and device manufacturing method |
| 07/12/2007 | WO2007077875A1 Exposure apparatus, exposure method, and device production method |
| 07/12/2007 | WO2007076739A2 Coating installation for wafers |
| 07/12/2007 | WO2007061189A3 Occupancy based pattern generation method for maskless lithography |
| 07/12/2007 | WO2007053396A3 Silsesquioxane-titania hybrid polymers |
| 07/12/2007 | WO2007015753A3 Systems and methods for retrieving residual liquid during immersion lens photolithography |
| 07/12/2007 | WO2006103979A8 (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof |
| 07/12/2007 | WO2006063098A8 Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers |
| 07/12/2007 | WO2005119801A3 Compliant device for nano-scale manufacturing |
| 07/12/2007 | US20070162889 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography |
| 07/12/2007 | US20070161764 Novel thiol compound, copolymer and method for producing the copolymer |
| 07/12/2007 | US20070161530 Photosensitive composition remover |
| 07/12/2007 | US20070161243 Aqueous solution for removing post-etch residue |
| 07/12/2007 | US20070161100 Photosensitive resin composition and cured product thereof |
| 07/12/2007 | US20070160936 Adhesion method using gray-scale photolithography |
| 07/12/2007 | US20070160935 Lithographic printing plate material for CTP |
| 07/12/2007 | US20070160934 Actinic radiation absorbing compound uniformly distributed throughout support layer, with photopolymerizable material deposited thereon, and masking layer; relief imaging |
| 07/12/2007 | US20070160933 Water-developable photopolymer plate for letterpress printing |
| 07/12/2007 | US20070160932 Electron beam lithography apparatus |
| 07/12/2007 | US20070160928 Photosensitive resin composition for printing substrate capable of laser sculpture |
| 07/12/2007 | US20070160927 Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith |
| 07/12/2007 | US20070160918 irradiating illumination light onto a mask to transfer (offset) mask patterns to a semiconductor substrate; narrow spacing; reduce the dimensional variation of the outmost pattern |
| 07/12/2007 | US20070160912 Thermal transfer sheet, process for producing the same, and image formed object produced by transfer of said thermal transfer sheet |
| 07/12/2007 | US20070160103 Gas discharge laser light source beam delivery unit |
| 07/12/2007 | US20070159616 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/12/2007 | US20070159612 Liquid crystal display substrate fabrication |
| 07/12/2007 | US20070159611 Source Multiplexing in Lithography |
| 07/12/2007 | US20070159610 Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
| 07/12/2007 | US20070159609 Exposure apparatus and device manufacturing method |
| 07/12/2007 | US20070159608 Exposure apparatus and device manufacturing method |
| 07/12/2007 | US20070159584 Image forming method |
| 07/12/2007 | US20070158798 Wafer with optical control modules in ic fields |
| 07/12/2007 | US20070158597 EUV light source |
| 07/12/2007 | US20070158596 EUV light source |
| 07/12/2007 | US20070158401 Stage device |
| 07/12/2007 | US20070158302 Systems and methods for gas assisted resist removal |
| 07/12/2007 | DE10335816B4 Verfahren zur Justage eines Substrates vor der Durchführung eines Projektionsschrittes in einem Belichtungsgerät A process for the adjustment of a substrate prior to performing a step in a projection exposure apparatus |
| 07/12/2007 | DE102006054335A1 Verfahren zur Bestimmung einer Belichtungsdosis und Belichtungsvorrichtung A method of determining an exposure dose and exposure device |
| 07/12/2007 | DE102006002032A1 Fotoempfindliche Beschichtung zum Verstärken eines Kontrasts einer fotolithographischen Belichtung The photosensitive coating for enhancing a contrast of a photolithographic exposure |
| 07/12/2007 | CA2635807A1 Bragg diffracting security markers |
| 07/11/2007 | EP1806828A1 Linear motor, stage apparatus and exposure apparatus |
| 07/11/2007 | EP1806773A1 Exposure device, exposure method, and device manufacturing method |
| 07/11/2007 | EP1806772A1 Exposure apparatus and device manufacturing method |
| 07/11/2007 | EP1806771A1 Exposure device and device manufacturing method |
| 07/11/2007 | EP1806767A1 Substrate transfer apparatus, substrate transfer method and exposure apparatus |
| 07/11/2007 | EP1806622A1 Developer for thermal positive type photosensitive composition |
| 07/11/2007 | EP1806621A1 Coating compositions for photoresists |
| 07/11/2007 | EP1806620A1 Matte agent for infrared-sensitive planographic printing plate and use thereof |
| 07/11/2007 | EP1806619A1 Resist composition, method for forming resist pattern, and compound |
| 07/11/2007 | EP1806618A1 Positive photosensitive insulating resin composition and cured product thereof |
| 07/11/2007 | EP1806370A1 Copolymer and upper film-forming composition |
| 07/11/2007 | EP1805561A2 Antireflective compositions for photoresists |
| 07/11/2007 | EP1805560A2 Edge cure prevention composition and process for using the same |
| 07/11/2007 | EP1805546A1 Imaging or insulation device, particularly for the creation of an electronic micro-circuit |
| 07/11/2007 | EP1805544A1 A six degree of freedom (dof) actuator reaction mass |
| 07/11/2007 | EP1805137A1 Thiol compound and photosensitive composition using the same |
| 07/11/2007 | EP1805014A1 Solvent resistant imageable element |
| 07/11/2007 | EP1804979A1 Roller micro-contact printer with pressure control |
| 07/11/2007 | EP1616224B1 Micromachining process |
| 07/11/2007 | EP1132773B1 Positive-type photosensitive polyimide precursor composition |
| 07/11/2007 | EP1078288B1 Method for forming bragg gratings |
| 07/11/2007 | CN1998036A Adhesive label, adhesive label roll, photosensitive web unit, and apparatus for and method of manufacturing photosensitive laminated body |
| 07/11/2007 | CN1997944A Pattern forming method |
| 07/11/2007 | CN1997943A Vacuum system for immersion photolithography |
| 07/11/2007 | CN1997942A Laser interferometer mirror assembly |
| 07/11/2007 | CN1997941A Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
| 07/11/2007 | CN1997940A Microstructuring method of mesogens using contact printing |
| 07/11/2007 | CN1997939A Method of forming resist pattern, positive resist composition, and layered product |
| 07/11/2007 | CN1997917A Building up diffractive optics by structured glass coating |
| 07/11/2007 | CN1997869A Application of scatterometry alignment in imprint lithography |
| 07/11/2007 | CN1997509A Process for producing a tridimensional object with improved separation of hardened material layers from a base plane |
| 07/11/2007 | CN1997491A Method and system to control movement of a body for nano-scale manufacturing |
| 07/11/2007 | CN1997453A Microfluidic chip |
| 07/11/2007 | CN1996153A Heating device and heating method |
| 07/11/2007 | CN1996152A Method for real-time monitoring concentration of effective developing solution |
| 07/11/2007 | CN1996151A Circuit pattern exposure method and mask |
| 07/11/2007 | CN1996150A Hemi-spherical structure and method for fabricating the same |
| 07/11/2007 | CN1996149A Lithographic apparatus and device manufacturing method |
| 07/11/2007 | CN1996148A Method for forming etched color pattern on stainless steel pipe surface |
| 07/11/2007 | CN1996147A TFT array semi-exposure photoetching technology |
| 07/11/2007 | CN1996146A Positive quadrupole illuminating exposure method and device therefor |
| 07/11/2007 | CN1996145A Method for reducing water pollution of optical elements in immersion type photoengraving technology |
| 07/11/2007 | CN1996144A Method for making hole-plugging ink composition for printed circuit board plating through hole and printed circuit board |
| 07/11/2007 | CN1996143A Dry film using method |
| 07/11/2007 | CN1996142A Device for the storage and use of at least one photomask for lithographic projection and method for using the device in an exposure installation |
| 07/11/2007 | CN1996141A Impression die with zero film thickness and impression-photoetched pattern transferring method |
| 07/11/2007 | CN1996110A Binding method for UV hardened mask plate and application tool therefor |
| 07/11/2007 | CN1996061A Processing method for light guide plate |
| 07/11/2007 | CN1996060A Processing method for light guide plate mesh point |
| 07/11/2007 | CN1994754A Ceramic tile printing cylinder |
| 07/11/2007 | CN1994486A 'I' structured three-dimensional micro solid/hollow silicon needle and silicon knife |
| 07/11/2007 | CN1994178A Method for making laser holographic gold silver coin and product produced thereby |
| 07/11/2007 | CN1326229C Load-lock technique |
| 07/11/2007 | CN1326211C Method for forming sub-photoetched opening in semiconductor technology |
| 07/11/2007 | CN1326204C Grating alignment procedure |
| 07/11/2007 | CN1326203C Method and device for improving key size consistency between different patterns for semiconductor assembly |