Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2007
07/19/2007US20070163625 spraying a cleaning solution containing water and an ionic surfactant (polyvinylpyrrolidone or copolyme of acrylic acid or ester and vinylpyrrolidone) over the photoresist film before or after the exposing with radiation for preventing undesired photoresist pattern formation caused by ghost images
07/19/2007DE10339606B4 Vorrichtung zum Belichten der Innenwand einer Zylinderhülse zur Erzeugung von Rillenstrukturen auf zylindrischen Gleitflächen Apparatus for exposing the inner wall of a cylinder sleeve for generating groove structures on cylindrical sliding surfaces
07/19/2007DE10310168B4 Wässrige Entwicklerlösung für Offset-Druckplatten Aqueous solution developer for offset printing plates
07/19/2007DE10308271B4 Verfahren und System zum Verbessern der Belichtungsgleichförmigkeit in einem schrittweisen Belichtungsprozess A method and system for improving the Belichtungsgleichförmigkeit in a stepwise exposure process
07/19/2007DE102006060288A1 Printing block e.g. flat screen printing form, illustrating device, has attenuation unit for decreasing intensity of laser beam in laser optical path, where image point coincides with spatial intensity distribution of laser beam
07/19/2007DE102006002758A1 Verfahren und Vorrichtung zur selektiven Entfernung von siliziumhaltigen Kontaminationen auf optischen Oberflächen Method and apparatus for the selective removal of silicon-containing contaminants on optical surfaces
07/19/2007DE102006001435A1 Vorrichtung zur Beleuchtung und Inspektion einer Oberfläche Apparatus for lighting and inspection of a surface
07/19/2007DE102004062289B4 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich Thermally stable multilayer mirrors for the EUV spectral range
07/19/2007DE102004055149B4 Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat Apparatus and method for imaging a multiple particle beam onto a substrate
07/19/2007DE102004039763B4 Verfahren zum Bestimmen der Dicke einer Schicht A method for determining the thickness of a layer
07/19/2007DE10131534B4 Verfahren zum Herstellen einer Maske zum Belichten A method of manufacturing a mask for exposing
07/18/2007EP1808884A1 Exposure apparatus, exposure method and device manufacturing method
07/18/2007EP1808883A1 Measurement method, exposure method, and device manufacturing method
07/18/2007EP1808731A2 Imprinting apparatus, system and method
07/18/2007EP1808447A1 Photocurable resin composition and a method for forming a pattern
07/18/2007EP1808292A1 Printing plate precursor, image forming method employing the same, and printing method
07/18/2007EP1807735A2 Decal transfer lithography
07/18/2007EP1807734A2 Lithography processes using phase change compositions
07/18/2007EP1807733A2 Patterning and film-forming process, electroluminescence device and manufacturing process therefor, and electroluminescence display apparatus
07/18/2007EP1807477A1 Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent
07/18/2007EP1572758B1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization
07/18/2007EP1479527B1 Printing press, printing plate manufacturing method, and process for regenerating printing plate
07/18/2007EP1349969B1 Semiconductor stripping composition containing 1,3-dicarbonyl compounds
07/18/2007EP1230752A4 Virtual laser operator
07/18/2007EP1135846B1 Displacement device
07/18/2007EP0728034B1 Method of manufacturing a membrane
07/18/2007CN2924591Y Photomask box
07/18/2007CN2924069Y Glue-homogenenization developing apparatus glue pump
07/18/2007CN1327484C Method of fabricating polycrystalline silicon and switching device using polycrystalline silicon
07/18/2007CN1327482C Semiconductor device mfg. method
07/18/2007CN1327468C Pattern
07/18/2007CN1327298C Lithographic method for wiring a side surface of a substrate
07/18/2007CN1327297C Lithographic apparatus and device manufacturing method
07/18/2007CN1327296C Lithographic printing projector containing secondary electronic clear cell
07/18/2007CN1327295C Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/18/2007CN1327294C Lens consisting of a crystalline material
07/18/2007CN1327293C Photosensitive resin composition
07/18/2007CN1327292C Method for making self-alignment component
07/18/2007CN1327285C Circuit array substrate and method of manufacturing the same
07/18/2007CN1327250C Process for mfg. one-dimensional X ray refracted diffraction micro structural component of polymethyl methyl acrylate material
07/18/2007CN1326960C Coating compositions for use with an overcoated photoresist
07/18/2007CN1326959C Coating compositions for use with an overcoated photoresist
07/18/2007CN1326939C Optical solidifying-thermo solidifying resin composition and its solidified products
07/18/2007CN1326919C Method for modifying the surface of a polymeric substrate
07/18/2007CN1326895C Process for refining crude resin for electronic material
07/18/2007CN101002513A Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair
07/18/2007CN101002306A Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
07/18/2007CN101002305A Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device
07/18/2007CN101002303A Exposure apparatus and method for manufacturing device
07/18/2007CN101002302A Substrate processing methodq
07/18/2007CN101002300A Optical characteristic measuring device, optical characteristic measuring method, exposure device, exposure method, and device manufacturing method
07/18/2007CN101002299A Exposing device, exposing method and device manufacturing method
07/18/2007CN101002259A 全息存储介质 Holographic storage medium
07/18/2007CN101002143A Exposure equipment
07/18/2007CN101002142A Photosensitive resin composition and photosensitive film made with the same
07/18/2007CN101002140A Apparatus and method for maintaining immersion fluid in the gap under the projection lens in a lithography machine
07/18/2007CN101002128A Projection optical system, production method for projection optical system, exposure system and exposure method
07/18/2007CN101002127A Projection optical system, exposing method and device
07/18/2007CN101000469A Ph buffered aqueous cleaning composition and method for removing photoresist residue
07/18/2007CN101000468A Colorful resist remover composition for thin film transistor LCD
07/18/2007CN101000467A Resist remover composition and resist removing method
07/18/2007CN101000466A Wet and cleaning device of developer solution cylinder
07/18/2007CN101000465A Rinse processing method and developing processing apparatus
07/18/2007CN101000464A Apparatus for illuminating and inspecting a surface
07/18/2007CN101000463A System, method, and apparatus for membrane, pad, and stamper architecture
07/18/2007CN101000462A Photocurable resin composition and a method for forming a pattern
07/18/2007CN101000409A Variable multi-power projection optical system
07/18/2007CN101000389A High diffraction efficient binary phase scattering grating and its manufacturing method
07/18/2007CN100999582A Photosensitive bottom anti-reflective coatings
07/18/2007CN100999154A Inkjet head, printing head and method of manufacturing thereof
07/17/2007US7246342 Orientation dependent shielding for use with dipole illumination techniques
07/17/2007US7245804 Laser device and exposure device using the same
07/17/2007US7245802 Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device
07/17/2007US7245402 Flexographic printing
07/17/2007US7245361 Method for evaluating refractive index homogeneity of optical member
07/17/2007US7245358 Substrate support system
07/17/2007US7245357 Lithographic apparatus and device manufacturing method
07/17/2007US7245356 Lithographic apparatus and method for optimizing illumination using a photolithographic simulation
07/17/2007US7245354 Source optimization for image fidelity and throughput
07/17/2007US7245349 Exposure apparatus
07/17/2007US7245092 Alignment stage apparatus, exposure apparatus, and semiconductor device manufacturing method
07/17/2007US7245047 Lithographic apparatus and device manufacturing method
07/17/2007US7244954 Collector having unused region for illumination systems using a wavelength ≦193 nm
07/17/2007US7244773 An epoxy compound having at least two oxirane rings and a branched linkage chain; nontoxic, improved stability, photopolymerizability in high humidity, curability, high strength of the cured ink layer, substrate adhesion, and solvent and water resistances
07/17/2007US7244669 Patterning of devices
07/17/2007US7244665 Wafer edge ring structures and methods of formation
07/17/2007US7244623 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern
07/17/2007US7244549 Pattern forming method and bilayer film
07/17/2007US7244548 Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3D optical memory having ultra-high information storage capacity
07/17/2007US7244547 Photosensitive composition and image recording material using the same
07/17/2007US7244546 Imagewise exposing, with an infrared laser, a planographic printing plate precursor including a substrate and an image recording layer provided thereon, removing unexposed areas , feeding an oil based ink and an aqueous component onto the planographic printing plate precursor in the printer
07/17/2007US7244545 Fluorinated compound, fluoropolymer and process for its production
07/17/2007US7244544 Oxime derivatives and the use thereof as latent acids
07/17/2007US7244543 Lithographic printing starting plate
07/17/2007US7244542 For microelectronics; relief imaging
07/17/2007US7244534 Device manufacturing method
07/17/2007US7244533 Accurately aligning a second layer pattern formed in a photoresist layer on a first layer pattern formed in a substrate
07/17/2007US7244370 Fabrication of durable thermal liquid discharge head; forming protective layer and anticavitation film in edge portion of wirings; ink jet printing
07/17/2007US7244369 Method for producing active or passive components on a polymer basis for integrated optical devices
07/17/2007US7244346 Concentration measuring mechanism, exposure apparatus, and device production method
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