| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/25/2007 | EP1256149B1 Electric discharge laser with acoustic chirp correction |
| 07/25/2007 | EP1256033B1 Zoom illumination system for use in photolithography |
| 07/25/2007 | EP1194816B1 Method for producing a digitally imaged screen for use in a screen printing process |
| 07/25/2007 | EP1086030B1 Pod including wafer cassette |
| 07/25/2007 | CN1328760C Method for distinguishing imperfect graphic spacing to improve microimage process |
| 07/25/2007 | CN1328723C Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 07/25/2007 | CN1328627C Photosensitive flexible printing element and method for the production of newspaper flexible printing plates |
| 07/25/2007 | CN1328608C Repeatered lens used in lighting system of photoetching system |
| 07/25/2007 | CN1328295C Auxiliary for forming fine pattern and process for producing the same |
| 07/25/2007 | CN1328068C Method ofr thermally transferrying oriented materials for organic electronic displays and devices |
| 07/25/2007 | CN101006573A Substrate transfer apparatus, substrate transfer method and exposure apparatus |
| 07/25/2007 | CN101006565A Method for providing uniform removal of organic material |
| 07/25/2007 | CN101006561A Solvent for cleaning |
| 07/25/2007 | CN101006557A Lighting apparatus, exposure apparatus and micro device manufacturing method |
| 07/25/2007 | CN101006553A Optical integrator, illumination optical device, exposal device ,method and element manufacture method |
| 07/25/2007 | CN101006552A Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method |
| 07/25/2007 | CN101006394A Micro pattern forming material, method of forming micro resist pattern and electronic device |
| 07/25/2007 | CN101006393A Alkali development-type photosensitive resin composition, substrate with protrusions for liquid crystal split orientational control and color filter formed using the same, and liquid crystal display d |
| 07/25/2007 | CN101006329A Embedded attenuated phase shift mask with tunable transmission |
| 07/25/2007 | CN101005024A Method of treatment of porous dielectric films to reduce damage during cleaning |
| 07/25/2007 | CN101005015A Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device |
| 07/25/2007 | CN101005014A Semiconductor device fabrication equipment and method of using the same |
| 07/25/2007 | CN101005010A Thermal processing apparatus |
| 07/25/2007 | CN101005009A Substrate processing apparatus |
| 07/25/2007 | CN101004560A Detergent composition |
| 07/25/2007 | CN101004559A Method for enhancing adhesion force of graphics in photoetching procedure |
| 07/25/2007 | CN101004558A Manufacturing method of semiconductor device |
| 07/25/2007 | CN101004557A Development apparatus of having macroscopic detection |
| 07/25/2007 | CN101004556A Method for optimizing route for exposing wafer |
| 07/25/2007 | CN101004555A System for installing and adjusting adjustable reflection type optical object lens |
| 07/25/2007 | CN101004554A Method for measuring difference between exposure machines |
| 07/25/2007 | CN101004553A Photo curable composition, color filter and method of producing thereof |
| 07/25/2007 | CN101004552A Active energy ray-curable resin composition and method for forming resist pattern |
| 07/25/2007 | CN101004551A Stamper, method of forming a concave/convex pattern, and method of manufacturing an information recording medium |
| 07/25/2007 | CN101004550A Optical vicinity correction method, optical mask of optical vicinity correction, and structure of conducting wire |
| 07/25/2007 | CN101004530A Excimer laser and line narrowing module |
| 07/25/2007 | CN101003591A Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 07/25/2007 | CN101003355A Direct write nano etching method |
| 07/24/2007 | US7249342 Method and system for context-specific mask writing |
| 07/24/2007 | US7248667 Illumination system with a grating element |
| 07/24/2007 | US7248365 Method for adjusting a substrate in an appliance for carrying out exposure |
| 07/24/2007 | US7248349 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device |
| 07/24/2007 | US7248339 Lithographic apparatus and device manufacturing method |
| 07/24/2007 | US7248338 Multi beam exposing device and exposing method using the same |
| 07/24/2007 | US7248337 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 07/24/2007 | US7248336 Method and system for improving focus accuracy in a lithography system |
| 07/24/2007 | US7248335 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 07/24/2007 | US7247868 Position detection method and apparatus |
| 07/24/2007 | US7247866 Contamination barrier with expandable lamellas |
| 07/24/2007 | US7247659 Oligomers or polymers with carboxylic acid groups, photosensitive resins and polymers with double bonds |
| 07/24/2007 | US7247574 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography |
| 07/24/2007 | US7247568 Method for manufacturing a transparent element with invisible electrodes |
| 07/24/2007 | US7247420 Two-layer film and method of forming pattern with the same |
| 07/24/2007 | US7247419 Nanocomposite photosensitive composition and use thereof |
| 07/24/2007 | US7247418 Imageable members with improved chemical resistance |
| 07/24/2007 | US7247209 Dual outlet nozzle for the combined edge bead removal and backside wash of spin coated wafers |
| 07/24/2007 | US7247208 Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 07/24/2007 | US7246909 Method for the production of a facetted mirror |
| 07/24/2007 | US7246615 Atomising nozzle and filter and spray generating device |
| 07/24/2007 | US7246445 Alignment device |
| 07/24/2007 | CA2367050C Optical systems and apparatuses including bragg gratings and methods of making |
| 07/19/2007 | WO2007080947A1 Diketooxime ester compound and use thereof |
| 07/19/2007 | WO2007080904A1 Photosensitive composition, display member, and process for producing the same |
| 07/19/2007 | WO2007080782A1 Resin, resist composition, and method of forming resist pattern |
| 07/19/2007 | WO2007080779A1 Object conveyance apparatus, exposure apparatus, object temperature regulation apparatus, object conveyance method, and method of producing microdevice |
| 07/19/2007 | WO2007080726A1 Detergent for lithography and method of forming resist pattern with the same |
| 07/19/2007 | WO2007080698A1 Photosensitive resin composition, photosensitive transfer film, and method for pattern formation |
| 07/19/2007 | WO2007080523A1 Maglev object positioning apparatus and method for positioning an object and maintaining position with high stability |
| 07/19/2007 | WO2007080206A1 Method for obtaining microfluidic polymer structures |
| 07/19/2007 | WO2007079904A1 Method and device for analysing the imaging behaviour of an optical imaging element |
| 07/19/2007 | WO2007051537A3 High power euv lamp system |
| 07/19/2007 | WO2007046528A3 Imprint apparatus, imprint method, and mold for imprint |
| 07/19/2007 | WO2007045434A3 Collector for lighting systems with a wavelength ≤ 193 nm |
| 07/19/2007 | WO2007027311A3 Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography |
| 07/19/2007 | WO2006105122A3 Small ultra-high na catadioptric objective |
| 07/19/2007 | WO2006056413A3 Method for producing flexographic printing forms and appropriate flexographic printing element |
| 07/19/2007 | US20070168815 Compositions and methods for use in three dimensional model printing |
| 07/19/2007 | US20070167645 Radiation-cured substances |
| 07/19/2007 | US20070166946 Method of reducing film stress on overlay mark |
| 07/19/2007 | US20070166650 Patterning methods and masks |
| 07/19/2007 | US20070166648 Integrated lithography and etch for dual damascene structures |
| 07/19/2007 | US20070166647 Light sensitive planographic printing plate material and planographic printing plate manufacturing process |
| 07/19/2007 | US20070166642 Photosensitive resin composition, and cured product and use thereof |
| 07/19/2007 | US20070166641 improve lithography characteristics, and reduction in defects; increase solubility in developing solution under the action of acid which is generated by acid generator on irradiation; tetra- or tripolymers contains monomers of methacrylic acid, adamantyl methacrylate, butyrolactone acrylate |
| 07/19/2007 | US20070166639 Laminated resist used for immersion lithography |
| 07/19/2007 | US20070166633 Exposure system, exposure method, and method for manufacturing semiconductor device |
| 07/19/2007 | US20070166632 Alkali soluble resin with phenolic hydroxyl group, quinonediazide, crosslinked fine particles, compound containing alkyletherified amino groups, and solvent; resolution, thermal shock, bonding strength |
| 07/19/2007 | US20070166627 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates |
| 07/19/2007 | US20070166557 Modified metal mold for use in imprinting processes |
| 07/19/2007 | US20070165357 Overlay Correction By Reducing Wafer Slipping After Alignment |
| 07/19/2007 | US20070165311 Housing structure for mounting optical elements |
| 07/19/2007 | US20070165203 Lithographic apparatus and device manufacturing method |
| 07/19/2007 | US20070165202 Illumination system for a microlithography projection exposure installation |
| 07/19/2007 | US20070165201 System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System |
| 07/19/2007 | US20070165200 System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System |
| 07/19/2007 | US20070165198 Projection objective for a microlithographic projection exposure apparatus |
| 07/19/2007 | US20070165098 Method for high precision printing of patterns |
| 07/19/2007 | US20070164487 Method for imprint lithography at constant temperature |
| 07/19/2007 | US20070164261 Liquid for immersion exposure and immersion exposure method |
| 07/19/2007 | US20070164234 Exposure apparatus and device manufacturing method |