| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/01/2007 | CN101008781A Method for improving color resist characteristics and color resist agent |
| 08/01/2007 | CN101008780A Exposure mask, liquid crystal display device, and manufacturing method therefor |
| 08/01/2007 | CN101008733A Color filter and manufacture method therefor |
| 08/01/2007 | CN101008694A Design and manufacture technology of optical switch |
| 08/01/2007 | CN101008686A Color filter substrate and manufacture method therefor |
| 08/01/2007 | CN101008682A Manufacture method of microcomponent |
| 08/01/2007 | CN101007487A Production method of Mianzhu Spring Festival picture |
| 07/31/2007 | US7251086 Apparatus for positioning an optical element in a structure |
| 07/31/2007 | US7251042 Lithographic apparatus, interferometer and device manufacturing method |
| 07/31/2007 | US7251029 Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus |
| 07/31/2007 | US7251017 Environmental system including a transport region for an immersion lithography apparatus |
| 07/31/2007 | US7251012 Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris |
| 07/31/2007 | US7250621 Method and arrangement for the plasma-based generation of intensive short-wavelength radiation |
| 07/31/2007 | US7250616 Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| 07/31/2007 | US7250475 Synthesis of photoresist polymers |
| 07/31/2007 | US7250391 Cleaning composition for removing resists and method of manufacturing semiconductor device |
| 07/31/2007 | US7250316 Mask and method of manufacturing liquid crystal display device using the same |
| 07/31/2007 | US7250315 Method for fabricating a structure for a microelectromechanical system (MEMS) device |
| 07/31/2007 | US7250247 Fabricating an integrated circuit includes placing at least two antireflective coating layers chosen so radiation reflected mutally cancels when combined, between a reflective surface and another material |
| 07/31/2007 | US7250246 Positive resist composition and pattern formation method using the same |
| 07/31/2007 | US7250245 Switchable polymer printing plates with carbon bearing ionic and steric stabilizing groups |
| 07/31/2007 | US7250238 Toners and processes thereof |
| 07/31/2007 | US7250237 Exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing; determining corrective information based on the measured attributes |
| 07/31/2007 | US7250235 Focus monitor method and mask |
| 07/31/2007 | US7250122 Differentially cured materials and process for forming same |
| 07/31/2007 | US7249925 System and method for reticle protection and transport |
| 07/26/2007 | WO2007084279A1 System and method for absorbance modulation lithography |
| 07/26/2007 | WO2007083999A2 Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same |
| 07/26/2007 | WO2007083690A1 Active energy ray-curable resin composition and use thereof |
| 07/26/2007 | WO2007083606A1 Printing mask and solar cell manufacturing method using same |
| 07/26/2007 | WO2007083595A1 Photosensitive material for lithographic plate and method of forming lithographic plate from the same |
| 07/26/2007 | WO2007083592A1 Substrate holding apparatus, exposure apparatus, and device production method |
| 07/26/2007 | WO2007083542A1 Lithographic printing plate material and process for producing the same |
| 07/26/2007 | WO2007083506A1 Printing plate material, process for producing printing plate material, and method for lithography |
| 07/26/2007 | WO2007083489A1 In-plane exposure device and in-plane exposure method |
| 07/26/2007 | WO2007083458A1 Positive resist composition for immersion exposure and method of forming resist pattern |
| 07/26/2007 | WO2007083140A1 Optically variable security device |
| 07/26/2007 | WO2007082327A2 Printing plate |
| 07/26/2007 | WO2007050022A3 Writing apparatuses and methods |
| 07/26/2007 | WO2007045498A3 Photosensitive coating for enhancing a contrast of a photolithographic exposure |
| 07/26/2007 | WO2007022922A3 Replacement device for an optical element |
| 07/26/2007 | WO2006133956A3 Removal of thin structured polymer layers by means of atmospheric plasma |
| 07/26/2007 | WO2006063268B1 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 07/26/2007 | US20070172992 Methods for fabricating stiffeners for flexible substrates |
| 07/26/2007 | US20070172978 Manufacture of a polymer device |
| 07/26/2007 | US20070172776 Adding mixture of aqueous solution of solvent, dispensing agent and base to developer; developing imaged printing plate using developer; adding aqueous regenerator to maintain the activity of the aqueous developer |
| 07/26/2007 | US20070172774 Print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer; print patterned mask is then used as a development or etching mask, and underlying layer overdeveloped or overetched to undercut print patterned mask; removing mask; electronics |
| 07/26/2007 | US20070172770 Methods for manufacturing dense integrated circuits |
| 07/26/2007 | US20070172767 liquid immersion; photosensitivity |
| 07/26/2007 | US20070172766 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 07/26/2007 | US20070172765 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 07/26/2007 | US20070172763 Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same |
| 07/26/2007 | US20070172762 Reacting a polymer containing an aliphatic monocyclic fluoroalcohol unit (poly(1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene) with an alkyloxycarbonylalkyl-group compound (methyl-norbornyloxycarbonylmethyl) in the presence of an organic base. |
| 07/26/2007 | US20070172759 Antireflection film composition, substrate, and patterning process |
| 07/26/2007 | US20070172757 base resin comprises homo-/copolyenes having alkali soluble group, exhibits changed alkali solubility under action of acid, acid generator, and tertiary alkanolamines; for patterning semiconductor integrated circuit via lithography; improved resolution |
| 07/26/2007 | US20070172756 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board |
| 07/26/2007 | US20070172755 Positive photoresist and method for producing structure |
| 07/26/2007 | US20070172742 Volume hologram recording material and volume hologram recording medium |
| 07/26/2007 | US20070172600 Molecular bonding method and molecular bonding device |
| 07/26/2007 | US20070172181 Curable resin composition for optical waveguide, curable dry film for optical waveguide, optical waveguide and method for forming core part for optical waveguide |
| 07/26/2007 | US20070171558 Reflective projection lens for EUV-photolithography |
| 07/26/2007 | US20070171552 Method for connection of an optical element to a mount structure |
| 07/26/2007 | US20070171547 Broad band DUV, VUV long-working distance catadioptric imaging system |
| 07/26/2007 | US20070171539 Projection Exposure System |
| 07/26/2007 | US20070171391 Exposure apparatus and method for producing device |
| 07/26/2007 | US20070171390 Cleanup method for optics in immersion lithography |
| 07/26/2007 | US20070170435 Liquid crystal display panel and fabricating method thereof |
| 07/26/2007 | US20070170378 EUV light source optical elements |
| 07/26/2007 | DE10330456B4 Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer Apparatus for creating a surface structure on a wafer |
| 07/26/2007 | DE102006052140A1 Ladungsteilchenstrahl-Schreibverfahren und -Schreibvorrichtung, Positionsabweichungsmessverfahren und Positionsmessvorrichtung A charged-writing process and writing device, position deviation measurement method and position measuring device |
| 07/26/2007 | DE102004007105B4 Verfahren zum Unterdrücken eines Lithographievorgangs am Rand einer Halbleiterscheibe A method of suppressing a lithography process at the edge of a semiconductor wafer |
| 07/26/2007 | DE10138103B4 Verfahren zum Strukturieren einer Fotolackschicht auf einem Halbleitersubstrat A method for patterning a photoresist layer on a semiconductor substrate |
| 07/25/2007 | EP1811547A1 Optical integrator, illumination optical device, exposure device, and exposure method |
| 07/25/2007 | EP1811546A1 Exposure apparatus and device producing method |
| 07/25/2007 | EP1811545A1 Exposure equipment and exposure method |
| 07/25/2007 | EP1811342A1 Sulfur-atom-containing composition for forming of lithographic antireflection film |
| 07/25/2007 | EP1811341A1 Positive photosensitive composition and method of forming pattern using the same |
| 07/25/2007 | EP1811340A2 Photosensitive resin composition and manufacturing method of semiconductor device using the same |
| 07/25/2007 | EP1811339A1 Pattern forming method |
| 07/25/2007 | EP1811338A2 Pattern forming method |
| 07/25/2007 | EP1811337A2 Pattern forming method and pattern forming system |
| 07/25/2007 | EP1811336A1 Photosensitive resin composition for flexographic printing |
| 07/25/2007 | EP1811331A2 Additive printed mask process and structures produced thereby |
| 07/25/2007 | EP1810836A1 Lithographic printing plate |
| 07/25/2007 | EP1810085A2 A system and a method for generating periodic and/or quasi-periodic pattern on a sample |
| 07/25/2007 | EP1810084A1 Resist composition |
| 07/25/2007 | EP1810083A1 Photosensitive resin composition and photosensitive dry film by the use thereof |
| 07/25/2007 | EP1810082A1 Photopolymerizable composition |
| 07/25/2007 | EP1810081A2 Photopolymerizable composition. |
| 07/25/2007 | EP1810080A2 Article with patterned layer on surface |
| 07/25/2007 | EP1810079A2 High resistivity compositions |
| 07/25/2007 | EP1810078A1 Method for thermally processing photosensitive printing sleeves |
| 07/25/2007 | EP1809477A1 Mandrels for electroforming printing screens, and electroforming apparatus |
| 07/25/2007 | EP1740393B1 Security mark for a data carrier, corresponding data carrier and method for the production of a security mark |
| 07/25/2007 | EP1634125B1 Lithographic method for producing microcomponents |
| 07/25/2007 | EP1554322B1 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 07/25/2007 | EP1546808A4 Photopolymerizable resin composition for sandblast resist |
| 07/25/2007 | EP1504307B1 Imaging process and products providing durable assemblages |
| 07/25/2007 | EP1341672B1 Receiver element for adjusting the focus of an imaging laser |
| 07/25/2007 | EP1305824A4 Method of making electronic materials |