Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/18/2014CN103869611A Method for manufacturing three-layer composite structured transparent soft mold for full-chip nano-imprint lithography in situ
06/18/2014CN103869610A Treatment method for residual points in chromium plate manufacturing technology
06/18/2014CN103869609A Roll-to-plane photolithography impressing medium-ultraviolet light source structure
06/18/2014CN103869608A Stamping equipment and pressing method thereof
06/18/2014CN103869606A Exposure photomask and method for manufacturing color filter
06/18/2014CN103869605A Mask plate for manufacturing light filter plate, light filter plate forming method, and display apparatus
06/18/2014CN103869604A Light shield and its designing method
06/18/2014CN103869602A Mask plate, and method of mask plate used for realizing exposure joint
06/18/2014CN103869596A Method for determining safe range of lateral erosion width of phase shift mask layer in double exposure
06/18/2014CN103869531A Color film substrate and manufacturing method thereof
06/18/2014CN103868456A Object stage translation measuring device and object stage translation measuring method
06/18/2014CN103867622A Flexible device for vibration isolation and photo-etching equipment using device
06/18/2014CN103865478A Novel absorber and composition for preparing organic antireflective protecting layer comprising same
06/18/2014CN103864964A Water-soluble two-photon polymerization initiator as well as assembling method and use thereof
06/18/2014CN103864003A Manufacturing method of micromotor structure
06/18/2014CN103862908A Laser master mask and photoetching machine for manufacturing laser master mask
06/18/2014CN103091982B Microtube fabrication process
06/18/2014CN103048877B Ink-jet printing silk screen plate making method and photo-sensitive resist ink thereof
06/18/2014CN102866579B Method for manufacturing rotary drum pressing die based on dynamic nano engraving technology
06/18/2014CN102755970B On-line SPM generating system and control method thereof
06/18/2014CN102722089B Non-contact coarse-motion and fine-motion cascading SDOF (six-degree of freedom) positioning device
06/18/2014CN102722088B Non-contact coarse-fine motion layer positioning system and motion control method thereof
06/18/2014CN102707588B Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam
06/18/2014CN102707579B Driver switching device used in position exchange of double workpiece benches
06/18/2014CN102707578B Laser ruler measurement signal switching device and method used in exchange process of double benches
06/18/2014CN102692822B Multi-wavelength based aligning system and aligning method
06/18/2014CN102681364B Six-degree-of-freedom magnetic suspension micro-positioner
06/18/2014CN102566292B Switching structure and switching method for double workpiece tables
06/18/2014CN102566290B Projection ramp exposure photoetching machine device and method
06/18/2014CN102540777B Aligning scan method capable of improving aligning accuracy
06/18/2014CN102540415B Projection lithographic objective
06/18/2014CN102486569B Projection lens system
06/18/2014CN102459416B Process for production of polyhydroxyimide
06/18/2014CN102401980B Projection objective lens with large exposure viewing field
06/18/2014CN102378939B Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate
06/18/2014CN102362227B Exposure apparatus, exposure method, and method of manufacturing device
06/18/2014CN102279459B Projection object lens
06/18/2014CN102103327B Black matrix composition with high light-shielding and improved adhesion properties
06/18/2014CN102093751B Pigment particle dispersion body, photo-curing composition and color filter using dispersion
06/18/2014CN102037543B Methods of forming structures supported by semiconductor substrates
06/18/2014CN101738858B Flame retardant photocurable resin composition, dry film and cured product thereof, and printed wiring board using the same
06/18/2014CN101724318B Method for manufacturing coloring composition
06/17/2014US8755054 Method of measuring surface structure of display device
06/17/2014US8755034 Maskless exposure apparatus and method to determine exposure start position and orientation in maskless lithography
06/17/2014US8755033 Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
06/17/2014US8755031 Illumination system of a microlithographic projection exposure apparatus
06/17/2014US8755030 Lithographic apparatus and device manufacturing method
06/17/2014US8755029 Immersion lithography apparatus and tank thereof
06/17/2014US8755028 Lithographic apparatus and device manufacturing method
06/17/2014US8755025 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
06/17/2014US8753805 Patterning process and resist composition
06/17/2014US8753804 Line width roughness improvement with noble gas plasma
06/17/2014US8753803 Pattern forming method
06/17/2014US8753802 Pattern forming method, chemical amplification resist composition and resist film
06/17/2014US8753801 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
06/17/2014US8753799 Method for fabricating LCD
06/17/2014US8753798 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head
06/17/2014US8753797 Surface-modified middle layers
06/17/2014US8753796 Photoresist composition
06/17/2014US8753795 Photoresist composition
06/17/2014US8753794 N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition
06/17/2014US8753793 Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method
06/17/2014US8753792 Positive photosensitive composition and pattern forming method using the same
06/17/2014US8753791 Laser-markable compositions
06/17/2014US8753790 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
06/12/2014WO2014088169A1 Photocurable composition and encapsulated device comprising barrier layer formed of said composition
06/12/2014WO2014088161A1 Black photosensitive resin composition, and light-shielding layer using same
06/12/2014WO2014088159A1 Triarylmethane dye high molecular compound, blue resin composition including same for color filter, and color filter using same
06/12/2014WO2014088018A1 Method for manufacturing cured film, cured film, liquid crystal display device and organic el display device
06/12/2014WO2014088017A1 Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device and organic el display device
06/12/2014WO2014086905A1 Reflective optical element for euv lithography and method of manufacturing a reflective optical element
06/12/2014WO2014086846A2 Positive working photosensitive material
06/12/2014US20140163254 Novel sulfonium salt, method for producing the same, and photoacid generator
06/12/2014US20140163212 Coloring matter compound, ink, heat-sensitive transfer recording sheet, and resist composition for color filter
06/12/2014US20140162194 Conformal sacrificial film by low temperature chemical vapor deposition technique
06/12/2014US20140162193 Resist composition for euv, method of producing resist composition for euv, and method of forming resist pattern
06/12/2014US20140162192 Photopolymer Imaging from Solvent Ink Film Images
06/12/2014US20140162191 Drawing apparatus, and method of manufacturing article
06/12/2014US20140162190 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
06/12/2014US20140162189 Sulfonium salt, polymer, polymer making method, resist composition, and patterning process
06/12/2014US20140162188 Positive resist composition, monomer, polymer, and patterning process
06/12/2014US20140162187 Positive-working lithographic printing plate
06/12/2014US20140162179 Method for manufacturing electrode for display apparatus, electrode for display apparatus manufactured using the same, and display apparatus including the same
06/12/2014US20140162178 Photosensitive composition for display device, black matrix having the composition, and method of forming black matrix using the composition
06/12/2014US20140160467 System and method for characterizing material shrinkage using coherent anti-stokes raman scattering (cars) microscopy
06/12/2014US20140160457 Display manufacturing method and photo alignment process
06/12/2014US20140160456 Optical aperture device
06/12/2014US20140160455 Pellicle for reticle and multilayer mirror
06/12/2014US20140160453 Radiation source
06/12/2014US20140160451 Substrate reference image creation method, substrate defect inspection method, substrate reference image creation apparatus, substrate defect inspection unit and non-transitory computer storage medium
06/12/2014US20140159278 Stable metal compounds, their compositions and methods
06/12/2014US20140158953 Photosensitive Resin Composition for Color Filter, and Color Filter Using the Same
06/12/2014US20140158952 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
06/12/2014DE102013215197A1 Projektionsbelichtungsanlage mit temperierbaren optischen Elementen und Verfahren zum Betrieb einer derartigen Anlage Projection exposure apparatus with temperature-optical elements and methods of operation of such a system
06/12/2014DE102013211830A1 Extreme UV lithography system used for performing miniaturization of e.g. semiconductor wafers, has electron switch that is arranged between accelerator unit and undulator unit, for directing electron beam alternately to undulators
06/12/2014DE102012222466A1 Reflektives optisches Element für die EUV-Lithographie The reflective optical element for EUV lithography
06/12/2014DE102012206150B9 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage An optical system, in particular of a microlithographic projection exposure apparatus
06/11/2014CN203645903U 一种碎屑收集装置和包含该收集装置的euv光源系统 Euv light source system and a debris collecting device that contains the collection device
06/11/2014CN203643743U 一种光罩正反侦测简易装置 One kind of mask a simple device to detect positive and negative
06/11/2014CN203643742U 极紫外光刻反射式光学元件温控装置 EUVL reflective optical element temperature control device
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