Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/07/2007US7252910 Fabrication method of semiconductor integrated circuit device and mask fabrication method
08/07/2007US7252909 Method to reduce CD non-uniformity in IC manufacturing
08/07/2007US7252715 System for dispensing liquids
08/07/2007US7252710 for producing black matrices having high insulating characteristics and color filters having high transmissivity and high contrast, excellent in developing characteristics; consisting of a pigment derivative, pigment intermediate, colorant derivative and intermediate each reactive with a carbodiimide
08/07/2007US7252492 Devices and methods for aligning a stamp and a substrate
08/07/2007US7252097 System and method for integrating in-situ metrology within a wafer process
08/07/2007CA2427696C Photopatternable sorbent and functionalized films
08/02/2007WO2007087399A1 Epoxy formulations for use in lithography techniques
08/02/2007WO2007086662A1 Method of removing photoresist and apparatus for performing the same
08/02/2007WO2007086580A1 Automatic feeding device for lithographic printing plates
08/02/2007WO2007086557A1 Optical member holding apparatus, method for adjusting position of optical member, and exposure apparatus
08/02/2007WO2007086461A1 Curable composition containing thiol compound
08/02/2007WO2007086385A1 Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board
08/02/2007WO2007086324A1 Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
08/02/2007WO2007086323A1 Photosensitive resin composition
08/02/2007WO2007086249A1 Positive photosensitive resin composition and cured film obtained therefrom
08/02/2007WO2007086220A1 Cata-dioptric imaging system, exposure device, and device manufacturing method
08/02/2007WO2007086217A1 Method for producing pigment fine particle having anthraquinone structure and pigment fine particle having anthraquinone structure which is obtained by such method
08/02/2007WO2007086181A1 Positive resist composition for immersion exposure and method of forming resist pattern
08/02/2007WO2007086169A1 Method for manufacturing substrate for display panel, method for manufacturing display panel and photomask
08/02/2007WO2007085290A2 Method and device for the correction of imaging defects
08/02/2007WO2007063014A3 Method for producing ceramic casting tools
08/02/2007WO2006114369A3 Means for transferring a pattern to an object
08/02/2007US20070178748 Load-lock technique
08/02/2007US20070178413 Reducing the amount of the semiconductor layer protruding from the sides of metal data layer to improve the characteristics of the transistors, which results in reduction of an after image; entire data layer is on the upper semiconductor surface; increased exposed area so decreased photo leakage current
08/02/2007US20070178411 Semiconductor device manufacturing method
08/02/2007US20070178410 Method of forming three-dimensional lithographic pattern
08/02/2007US20070178409 Exposure method of forming three-dimensional lithographic pattern
08/02/2007US20070178408 Process for producing printing substrate capable of laser sculpture
08/02/2007US20070178394 Resist composition
08/02/2007US20070178390 Exposure mask, liquid crystal display device using the same, and method of manufacturing liquid crystal display device using the same
08/02/2007US20070178388 Semiconductor devices and methods of manufacturing thereof
08/02/2007US20070177869 Coater/developer and coating/developing method
08/02/2007US20070177639 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
08/02/2007US20070177315 Combination current sensor and relay
08/02/2007US20070177274 Optical element, and light source unit and exposure apparatus having the same
08/02/2007US20070177132 Method and Apparatus for Self-Referenced Dynamic Step and Scan Intra-Field Scanning Distortion
08/02/2007US20070177125 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
08/02/2007US20070176128 Alignment systems and methods for lithographic systems
08/02/2007US20070175759 Apparatus and method for deposition of an electrophoretic emulsion
08/02/2007US20070175235 Apparatus and method for bagging ice
08/02/2007DE202007006796U1 Hologramm-Erzeugungsvorrichtung Hologram-generating device
08/02/2007DE19853216B4 Verfahren zur Herstellung einer lithographischen Druckplatte und in demselben zu verwendende Behandlungslösung A process for producing a lithographic printing plate and the treatment solution to be used in the same
08/02/2007DE19743540B4 Verfahren zur Herstellung einer Lithographie-Druckplatte A method for preparing a lithographic printing plate
08/02/2007DE102006007446B3 Device for uniform coating of substrate surface with liquid has moistening device for applying liquid in process volume to substrate surface, tumbling device for tilting holder, substrate relative to two axes in plane parallel to surface
08/02/2007DE102004019835B4 Beleuchtungskondensor für ein Partikeloptik-Projektionssystem Illumination condenser for a particle optics projection system
08/02/2007DE10152878B4 Verfahren zum Erzeugen dreidimensionaler Formkörper oder Oberflächen aus organopolysiloxanhaltigen Ausgangsmaterialien durch Laser-Bestrahlung und deren Verwendung A method for generating three-dimensional shaped bodies or surfaces of the organopolysiloxane starting materials by laser irradiation and their use
08/01/2007EP1814147A1 Lighting apparatus, exposure apparatus and micro device manufacturing method
08/01/2007EP1814146A1 Maintenance method, exposure method, exposure apparatus, and device producing method
08/01/2007EP1814145A1 Temperature regulation method and system for low flow rate liquid
08/01/2007EP1814144A1 Substrate processing method, exposure apparatus and method for manufacturing device
08/01/2007EP1814143A1 Exposure condition setting method, substrate processing device, and computer program
08/01/2007EP1813990A1 Method for forming resist pattern
08/01/2007EP1813989A1 Lithographic projection apparatus and device manufacturing method
08/01/2007EP1813988A2 Measurement method
08/01/2007EP1813987A1 Sulfonic-ester-containing composition for formation of antireflection film for lithography
08/01/2007EP1813986A2 Coating compositions for use with an overcoated photoresist
08/01/2007EP1813985A1 Antireflection film composition, substrate, and pattering process
08/01/2007EP1812935A2 High-precision optical surface prepared by sagging from a masterpiece
08/01/2007EP1812825A2 Dynamic development process with de-ionized water puddle
08/01/2007EP1572860A4 Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof
08/01/2007EP1237983B1 Polymerizable composition, cured material thereof and method for manufacturing the same
08/01/2007CN1329953C Substrate inspecting device, coating/developing device and substrate inspecting method
08/01/2007CN1329951C Method for aligning wafer
08/01/2007CN1329777C Clamping piece for clamping printed circuit board to explosure
08/01/2007CN1329768C Colour filter of liquid crystal display and liquid crystal display using said colour filter
08/01/2007CN1329749C Sensitive black composition, black substrate using same and color filter
08/01/2007CN1329212C Reusable printing plate, printing device, printing press, method for produce graphics printing surface and image formation method of reusable printing plate
08/01/2007CN1329190C Infrared-sensitive composition, including printing plate front body and manufacture method
08/01/2007CN1329189C Gravure process method
08/01/2007CN101010779A Device processing system, information display method, program, and recording medium
08/01/2007CN101010641A Process for the production of a lithographic printing plate
08/01/2007CN101010640A Developing solution composition for lithography and method for resist pattern formation
08/01/2007CN101010639A Rinsing liquid for lithography and method for resist pattern formation
08/01/2007CN101010638A 激光投影系统 Laser projection system
08/01/2007CN101010637A Display member exposing method and plasma display member manufacturing method
08/01/2007CN101010636A Pattern forming material, and pattern forming device and pattern forming method
08/01/2007CN101010635A Composition for forming antireflective film and wiring forming method using same
08/01/2007CN101010634A Composition including polyamide acid for forming lower layer reflection preventing film
08/01/2007CN101010633A Interlayer for lithographic printing plates
08/01/2007CN101010632A Modified metal mold for use in imprinting processes
08/01/2007CN101010630A Improved slip film compositions containing layered silicates
08/01/2007CN101009238A Gantry positioning system
08/01/2007CN101009218A Pattern forming method and pattern forming system
08/01/2007CN101009213A Heating process apparatus, heating process method, and computer readable storage medium
08/01/2007CN101009212A Substrate processing apparatus
08/01/2007CN101009210A Substrate cooling device, substrate cooling method, control program and computer readable storage medium
08/01/2007CN101009209A Substrate cooling device
08/01/2007CN101009206A Apparatus for treating substrates and method of treating substrates
08/01/2007CN101008792A Measurement method
08/01/2007CN101008791A Device and method for storing and transporting photomasks
08/01/2007CN101008790A Apparatus and method for reducing contamination in immersion lithography
08/01/2007CN101008789A Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device
08/01/2007CN101008788A A method for model based geometry decomposition for use in a multiple exposure process and corresponding product
08/01/2007CN101008787A Method for applying back-exposure to embedded phase-shifting mask focused ion beam etching
08/01/2007CN101008786A Optical disk and patterned method
08/01/2007CN101008785A Apparatus for coating photoresist material
08/01/2007CN101008784A Photosensitive monomer, liquid crystal material, liquid crystal panel and photoelectric equipment and manufacture method thereof
08/01/2007CN101008783A Photosensitive monomer and liquid crystal panel, and manufacture method therefor
08/01/2007CN101008782A Coating compositions for photoresists
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