Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/09/2007US20070185606 Exposure apparatus and device manufacturing method
08/09/2007US20070185298 Organosilicate resin formulation for use in microelectronic devices
08/09/2007US20070185287 Modified epoxy resin, process for its production, photosensitive resin composition and photsensitive element
08/09/2007US20070185276 Synthesis of Photresist Polymers
08/09/2007US20070185226 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same
08/09/2007US20070185225 Photoinitiated reactions
08/09/2007US20070184670 Manufacturing method of semiconductor device, and ic card, ic tag, rfid, transponder, bill, securities, passport, electronic apparatus, bag, and garment
08/09/2007US20070184391 Method of applying patterned metallization to block filter resonators
08/09/2007US20070184390 Exposure method
08/09/2007US20070184388 Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate
08/09/2007US20070184387 Method for preparation of lithographic printing plate and lithographic printing plate precursor
08/09/2007US20070184384 Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition
08/09/2007US20070184379 Peeling-off method and reworking method of resist film
08/09/2007US20070184366 Dye containing curable composition, color filter, and process of preparing color filter
08/09/2007US20070184359 Photomask, pattern formation method using photomask and mask data creation method
08/09/2007US20070184353 Volume hologram recording material and volume hologram recording medium
08/09/2007US20070184178 Developing device and developing method
08/09/2007US20070183064 Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
08/09/2007US20070183063 Device for preventing the displacement of an optical element
08/09/2007US20070183046 Method of Forming a Diffractive Optical Element
08/09/2007US20070183044 Diffractive Optical Element, Illumination System Comprising the Same, and Method of Manufacturing Semiconductor Device Using Illumination System
08/09/2007US20070183017 Correcting device to compensate for polarization distribution perturbations and projection objective for microlithography
08/09/2007US20070182946 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus
08/09/2007US20070182942 Exposure device
08/09/2007US20070182941 Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program product
08/09/2007US20070182821 Apparatus for imaging using an array of lenses
08/09/2007US20070182060 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate
08/09/2007US20070181825 Measurement method, transfer characteristic measurement method, adjustment method of exposure apparatus, and device manufacturing method
08/09/2007DE102007006144A1 Strukturierungsverfahren und -Masken Structuring process and masks
08/09/2007DE102006004230A1 Verfahren zur Herstellung einer Maske für die lithografische Projektion eines Musters auf ein Substrat A method of making a mask for the lithographic projection of a pattern on a substrate
08/08/2007EP1816673A2 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
08/08/2007EP1816671A1 Exposure method, device manufacturing method, and substrate
08/08/2007EP1816521A2 Developing solution and method for producing lithography printing plate
08/08/2007EP1816520A2 Optical system for transforming numerical aperture
08/08/2007EP1816519A1 Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition
08/08/2007EP1816518A2 Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
08/08/2007EP1816515A1 Package for planographic printing plates and method for packaging planographic printing plates
08/08/2007EP1816502A1 Projection optical system, exposure equipment and exposure method
08/08/2007EP1815297A2 Method for producing flexographic printing forms and appropriate flexographic printing element
08/08/2007EP1815296A1 A composition for coating over a phtoresist pattern
08/08/2007EP1815295A2 Array of spatial light modulators and method of production of a spatial light modulator device
08/08/2007EP1815294A2 Protection of surfaces exposed to charged particles
08/08/2007EP1815277A1 Fluid ultraviolet lens
08/08/2007EP1815244A1 Cell culture device
08/08/2007EP1687829A4 Lithographic systems and methods with extended depth of focus
08/08/2007EP1509379A4 Methods and apparatus of field-induced pressure imprint lithography
08/08/2007EP1352009B1 Optical devices made from radiation curable fluorinated compositions
08/08/2007EP1200341A4 Patterned carbon nanotube films
08/08/2007EP1044074B8 Photoresist coating process control with solvent vapor sensor
08/08/2007CN1330986C Fabrication method for ridge circular waveguide device
08/08/2007CN1330710C Organic pigment for use in color filter of liquid crystal display
08/08/2007CN1330432C Chemical applying method and its applying device
08/08/2007CN101015040A Substrate cleaning method and developing apparatus
08/08/2007CN101015039A Substrate for exposure, exposure method and device manufacturing method
08/08/2007CN101015038A Exposure equipment and exposure method
08/08/2007CN101014905A 浸入式光刻系统 Immersion lithography system
08/08/2007CN101014904A Apparatus and method for manufacturing photosensitive layer product
08/08/2007CN101014903A Metallic mold for nano-imprint, forming method of nano-pattern, and resin molding
08/08/2007CN101014569A Oxime ester initiators
08/08/2007CN101013657A Decompression drying processing device
08/08/2007CN101013274A Mask film formation method and mask film formation apparatus
08/08/2007CN101013273A Cleaning formulations
08/08/2007CN101013272A Baking equipment
08/08/2007CN101013271A Method for correcting layering optical proximity effect
08/08/2007CN101013270A Photomask substrate container unit, photomask substrate transportation and exposal method
08/08/2007CN101013269A Lithographic apparatus, device manufacturing method and exchangeable optical element
08/08/2007CN101013268A Coating and developing method, coating and developing device and storage medium
08/08/2007CN101013267A Illumination system
08/08/2007CN101013266A Supply system
08/08/2007CN101013265A Method of forming corrosion-resistant pattern and method of manufacturing semiconductor device
08/08/2007CN101013264A Radiation sensitivity composition, color filter and liquid crystal display element
08/08/2007CN101013263A Photosensitive resin composition suitable for irrational and slit mold coating method
08/08/2007CN101013262A Photo-sensitive monomer, liquid crystal material, liquid crystal panel and method of fabrication, photoelectric device and fabricating method thereof
08/08/2007CN101013261A Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
08/08/2007CN101013260A Forming thin film pattern on display substrate by suppressing flat plate printing
08/08/2007CN101013259A Photomask, pattern formation method using the same and mask data creation method
08/08/2007CN101013240A Method for making array base plate
08/08/2007CN101013224A Liquid crystal display panel and array base plate and method for manufacturing same
08/08/2007CN101013221A Manufacturing method for chromatic filter layer
08/08/2007CN101013219A Method of manufacturing a black matrix of color filter
08/08/2007CN101013181A CMOS technique compatible silicon optical waveguide preparation method
08/08/2007CN101012180A Single-component hydrogen-capture-type light initiator and its preparing method and use
08/08/2007CN101011763A Photo-etched edm electrode
08/07/2007US7254251 System and method of providing mask defect printability analysis
08/07/2007US7253975 Retainer, exposure apparatus, and device fabrication method
08/07/2007US7253907 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
08/07/2007US7253905 Determination and correction for laser induced CCD camera degradation
08/07/2007US7253883 Machine for exposing printed circuit panels with gas balloons and mechanical spacers
08/07/2007US7253882 Exposure method and exposure system
08/07/2007US7253878 Exposure apparatus and device fabrication method
08/07/2007US7253243 Organosilicon compounds and method of manufacturing the same
08/07/2007US7253113 Methods for using a silylation technique to reduce cell pitch in semiconductor devices
08/07/2007US7252927 High performance curable polymers and processes for the preparation thereof
08/07/2007US7252926 Photosensitive layer containing: an iron-arene complex photopolymerization initiator; a polymer binder; an unsaturated polymerizable compound; and an anionic xanthene dye that has a solubility in methyl ethyl ketone of not less than 1 weight %
08/07/2007US7252925 1-Alkoxy- or cycloalkoxy(poly)oxyethylenebenzimidazoles, e.g., 1-(2-methoxyethyl)-1H-benzimidazole, used to form amplified resists with excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and useful in microfabrication using electron beams or deep-UV light.
08/07/2007US7252924 Positive resist composition and method of pattern formation using the same
08/07/2007US7252923 Lithography; offset printing; using metal oxide photocatalyst
08/07/2007US7252922 Image recording material
08/07/2007US7252913 Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer
08/07/2007US7252912 Hydrophilic polymer membrane formed by photocrosslinking a water-soluble photosensitive resin having azido groups atleast some of which are covalently bound to amino groups on a base material; can be used as a base material for cell culture or as a material for a biosensor
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