Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/16/2007DE19639313B4 Photohärtbare Epoxysilicone, die Fluoreszenz- oder photosensibilisierende Markierungsfarbstoffe als funktionelle Gruppen aufweisen Have photocurable epoxy silicones, the fluorescence labeling dyes or photosensitizing as functional groups
08/16/2007DE10345525B4 Verfahren zum Bilden eines Musters von Strukturelementen auf einer Photomaske A method for forming a pattern of structural elements on a photomask
08/16/2007DE102004016704B4 Verfahren zur Reduktion des Rastermaßes auf einer Halbleiterscheibe A process for the reduction of the modular dimension on a semiconductor wafer
08/15/2007EP1818972A1 Device processing system, information display method, program, and recording medium
08/15/2007EP1818724A1 Lithographic printing plate-use correcting fluid and image correcting method for lithographic printing plate
08/15/2007EP1818723A1 Composition for forming antireflection film, layered product, and method of forming resist pattern
08/15/2007EP1818722A1 Chemical amplification photoresist composition, photoresist layer laminate, method for producing photoresist composition, method for producing photoresist pattern and method for producing connecting terminal
08/15/2007EP1818721A2 System, method, and apparatus for noncontact and diffuse curing exposure for making photopolymer nanoimprinting stamper
08/15/2007EP1818699A1 Writing of photo-induced structures
08/15/2007EP1818658A1 Method for approximating the influence of an optical system on the state of polarisation of optical radiation
08/15/2007EP1818376A1 Photosensitive composition
08/15/2007EP1817634A1 Process for producing resist pattern and conductor pattern
08/15/2007EP1350321B1 Method and system for efficient and accurate filtering and interpolation
08/15/2007EP1268216B1 Printing plate in the form of a roller and method for obtaining same
08/15/2007CN2935213Y Raw material supply bottle cover
08/15/2007CN1332423C Method to predict and identify defocus wafers and system thereof
08/15/2007CN1332422C Target system and method of determining alignment error in electronic substrates
08/15/2007CN1332270C Method for fabricating a carbon nanotube chip and a biochip using the self-assembly of super molecules and staining of metal compound
08/15/2007CN1332269C Manufacturing method for lithographic apparatus and device and device made therefrom
08/15/2007CN1332268C Base fixing parts and device producing method
08/15/2007CN1332267C Manufacturing method of photo etching apparatus and device
08/15/2007CN1332266C Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board
08/15/2007CN1332245C Wiring substrate for display device and its mfg. method
08/15/2007CN1331960C Photo-assisted solidification method for coating material
08/15/2007CN1331687C Method for recording and erasing image using non-contact rewritable heat-sensitive label
08/15/2007CN101019209A Exposure device, exposure method, and device manufacture method
08/15/2007CN101019207A Substrate processing apparatus, use state ascertaining method, and false use preventing method
08/15/2007CN101019078A A device for generating light in the extreme ultraviolet and its application to a source for lithography using radiation in the extreme ultraviolet
08/15/2007CN101019077A Holder for a ceiling sign
08/15/2007CN101019076A Material for formation of resist protection film and method of forming resist pattern therewith
08/15/2007CN101019075A Material for formation of resist protection film and method of forming resist pattern therewith
08/15/2007CN101019074A Lithography technique using silicone molds
08/15/2007CN101019073A Method for pre-exposing relief image printing plate
08/15/2007CN101019066A Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
08/15/2007CN101019017A 全息传感器 Holographic Sensors
08/15/2007CN101018835A Coating composition for film with low refractive index and film prepared therefrom
08/15/2007CN101018829A Cyanopyridine-based azo dyes
08/15/2007CN101018819A Process for producing cured product of photosensitive resin
08/15/2007CN101018674A Lithographic printing plate
08/15/2007CN101017778A A method for preparing the nano-electrode with the negative electronic erosion-resisting agent
08/15/2007CN101017334A Method for regenerating a resist treatment composition and its apparatus
08/15/2007CN101017333A Positive photosensitive resist release agent compositions
08/15/2007CN101017332A Developing apparatus and developing method
08/15/2007CN101017331A XYtheta moving stage
08/15/2007CN101017330A Light source device of ultraviolet light
08/15/2007CN101017329A Substrate treatment system, substrate treatment method, and computer readable storage medium
08/15/2007CN101017328A Precursor composition for positive photosensitive resin and display made with the same
08/15/2007CN101017327A Precursor composition for positive photosensitive resin and display made with the same
08/15/2007CN101017326A Coating compositions for use with an overcoated photoresist
08/15/2007CN101017325A Liquid photosensitive etching resisting ink
08/15/2007CN101017324A Photosensitive composition, photosensitive colored composition, color filter, and liquid crystal display
08/15/2007CN101017323A Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element
08/15/2007CN101017322A Manufacture method of sidewall chromium attenuation type phase-shifting mask used in 193nm optical lithography
08/15/2007CN101017297A Liquid crystal display and manufacturing method thereof
08/15/2007CN101017295A Mold for display device and manufacturing method of dsplay device using the same
08/15/2007CN101017275A Converging substrate, electro-optic device, substrate for electro-optic device, projector, and electronic apparatus
08/15/2007CN101017214A Manufacture method of high resolution self-supporting totally hollowed-out transmission grating
08/15/2007CN101016634A Method of preparing metal roller with surface relief microstructure
08/15/2007CN101016447A Antistatic agent, antistatic film and articles coated with antistatic film
08/15/2007CN101016003A Plate for rotary screen apparatus and method of manufacturing the same
08/15/2007CN101016001A Method of realizing directly printing by prefabricating molecule net engraving
08/14/2007US7257785 Method and apparatus of evaluating layer matching deviation based on CAD information
08/14/2007US7257453 Exposure method and apparatus
08/14/2007US7256873 Enhanced lithographic resolution through double exposure
08/14/2007US7256872 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask
08/14/2007US7256869 Exposure apparatus and an exposure method
08/14/2007US7256868 Projection exposure apparatus, device manufacturing method, and sensor unit
08/14/2007US7256865 Methods and apparatuses for applying wafer-alignment marks
08/14/2007US7256863 Sealing assembly, a lithographic projection apparatus, and a device manufacturing method
08/14/2007US7256811 Method and apparatus for imaging with multiple exposure heads
08/14/2007US7256435 Multilevel imprint lithography
08/14/2007US7256419 Composition for forming organic insulating film and organic insulating film formed from the same
08/14/2007US7256408 Gas supply unit, gas supply method and exposure system
08/14/2007US7256407 Lithographic projection apparatus and reflector assembly for use therein
08/14/2007US7256406 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter
08/14/2007US7256316 Cyclohexyl vinyl ether with acrylic esters and methacrylic esters in fluorine-containing copolymers dissolve in organic solvents and have high transparency; reists
08/14/2007US7256221 Mixture of photopolymer, photoinitiator and viscosity adjustment; adhesives, seals
08/14/2007US7256135 Etching method and computer storage medium storing program for controlling same
08/14/2007US7255978 Multi-level optical structure and method of manufacture
08/14/2007US7255976 Laser-engravable flexo printing elements for the production of flexo printing forms containing blends of hydrophilic polymers and hydrophobic elastomers
08/14/2007US7255975 Yield and line width performance for liquid polymers and other materials
08/14/2007US7255973 Containing a polymer having exo-form ester units from a norbornanyl (meth)acrylate derivative and units from an ester having two hexafluoroisopropanol groups; minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion
08/14/2007US7255972 Chemically amplified positive photosensitive resin composition
08/14/2007US7255971 A compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and
08/14/2007US7255970 Polymer that is insoluble in an aqueous alkali developer but becomes soluble prior to development; an imide (especially a sulfonyloxy imide or imidosulfonate) photoacid generator; and a naphthoquinone diazide photobleachable dye that absorbs at the same radiation as the photoacid generator
08/14/2007US7255968 Alignment method of exposure mask and manufacturing method of thin film element substrate
08/14/2007US7255967 Image forming method used in liquid crystal display device for both reflection and transmission modes
08/14/2007US7255912 Antistatic layer comprises areas of patterned coverage that makes up a graphic design; photographic paper for example; simpler to manufacture, lower cost
08/14/2007US7255805 Photonic structures, devices, and methods
08/14/2007US7255804 Process for making photonic crystal circuits using an electron beam and ultraviolet lithography combination
08/14/2007US7255737 Azo dye: azopyrazolone metal complex intercalcated with melamine; colour filters in liquid crystal displays, screens, colour resolution instruments, sensors
08/09/2007WO2007088884A1 Positive resist composition for forming thick resist film, object coated with thick resist, and method of forming resist pattern
08/09/2007WO2007088795A1 Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method
08/09/2007WO2007057664A3 A method of patterning a thin film
08/09/2007WO2007054813A3 Developable undercoating composition for thick photoresist layers
08/09/2007WO2007050704A3 Microstructure synthesis by flow lithography and polymerization
08/09/2007WO2007013889A3 System and method for controlling the size and/or distribution of catalyst nanoparticles for nanostructure growth
08/09/2007WO2006136967A3 Method of cleaning optical surfaces of an irradiation unit in a two-step process
08/09/2007WO2006001518A3 Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member
08/09/2007US20070186207 Method and apparatus for printing patterns with improved cd uniformity
1 ... 487 488 489 490 491 492 493 494 495 496 497 498 499 500 501 502 503 504 505 506 507 ... 1272