Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/22/2007CN1333453C Method for positioning substratge relatively to supporting table and its equipment
08/22/2007CN1333437C Mask with two-way alignment pattern
08/22/2007CN1333436C Process for making sub-lithographic photoresist features
08/22/2007CN1333308C Method for controlling accuracy and repeatability of an etch process
08/22/2007CN1333307C Over-coating composition for photoresist and process for forming photoresist pattern using the same
08/22/2007CN1333306C Light shield for contacting window making process and making process thereof
08/22/2007CN1333271C Method for making high dencity grating utilizing laser scanning cofocal microscope
08/22/2007CN1333011C Curable composition
08/22/2007CN1332879C Method for forming pattern film of surface modified carbon nano tube
08/22/2007CN1332819C Shaft seal structure
08/22/2007CN1332809C Lithographic printing plate forebody
08/22/2007CN101023395A Ink composition for etching resist, method of forming etching resist pattern using the same, and method of formng microchannel using the ink composition
08/22/2007CN101023394A Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin compositoin
08/22/2007CN101022943A Apparatus for the rapid development of photosensitive printing elements
08/22/2007CN101021694A Aligning system and aligning method based on image technique
08/22/2007CN101021693A Liquid supply and recovery seal controller in immersion type photoetching system
08/22/2007CN101021692A High resolution ratio micro optical device parallel direct-writing producing method and producing system
08/22/2007CN101021691A Lithographic apparatus and device manufacturing method
08/22/2007CN101021690A Lithographic apparatus and stage apparatus
08/22/2007CN101021689A Semiconductor manufacturing method and related apparatus
08/22/2007CN101021688A Thin film pattern layer producing method
08/22/2007CN101021687A Thin film pattern layer producing method
08/22/2007CN101021686A Method for producing thin film pattern layer
08/22/2007CN101021685A Base plate structure and method for producing thin film pattern layer
08/22/2007CN101021684A Resist underlayer coating forming composition for mask blank, mask blank and mask
08/22/2007CN101021683A Chemical-amplification positive photoresist composition
08/22/2007CN101021682A Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
08/22/2007CN101021680A Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device
08/22/2007CN101021658A Liquid crystal display panel semiconductor structure and producing method thereof
08/22/2007CN101021656A Array substrate for liquid crystal display device and fabrication method thereof
08/22/2007CN101021631A Substrate structure and method for producing thin film pattern layer
08/22/2007CN101021592A Site-selectively modified micro-and nanostructures and the methods of their fabrication
08/22/2007CN101021584A Method for producing colour optical filter
08/22/2007CN101021583A Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof
08/22/2007CN101021582A Colourful optical filter and producing method thereof
08/22/2007CN101021581A Reflector, liquid crystal display device having reflector, method of manufacturing reflector, and method of manufacturnig liquid crystal display device
08/22/2007CN101020869A Cleaning agent for slit type coater, slit type coater for manufacturing display device, and method for manufacturing display device
08/22/2007CN101020381A Apparatus and method for forming pattern
08/21/2007US7259836 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider
08/21/2007US7259835 Reticle-processing system
08/21/2007US7259833 Substrate support method
08/21/2007US7259832 Lithographic apparatus and device manufacturing method
08/21/2007US7259831 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
08/21/2007US7259830 Image exposure device
08/21/2007US7259828 Alignment system and method and device manufactured thereby
08/21/2007US7259777 Scanner system
08/21/2007US7259774 Method and device for imaging of a printing form
08/21/2007US7259461 Semiconductor device having improved contact hole structure and method for fabricating the same
08/21/2007US7258966 Multilayer; radiation transparent substrate, overcoating with photoresists; masking; exposure; development
08/21/2007US7258965 Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow
08/21/2007US7258964 Printing plates using binder resins having polyethylene oxide segments
08/21/2007US7258963 Vinyl ether-maleic anhydride resin or a cyclo-olefin-maleic anhydride resin having a weight-average molecular weight of 6,300-7,700, including a blocking group substituted for an acid; photoacid generator; and an organic solvent
08/21/2007US7258962 Positive-tone radiation-sensitive resin composition
08/21/2007US7258961 lithographic plates comprising supports having thermosensitive multilayersontaining water-insoluble but alkali-soluble polymer compounds, contain an infrared absorbing dyes, show a broad latitude in development for image formation and can form good images through exposure
08/21/2007US7258957 Using hologram masks on which alignment marks are formed; reduces needed area on a object to be exposed for alignment marks while keeping minimum permissible intervals among alignment marks on a same exposure mask
08/21/2007US7258956 Radiation-absorptive layer contains a pigment that is attached to a alkyleneimine polymer or copolymer via an an arylene, heteroarylene, or alkylene group and a spacer group and optionally an additional polymer such as an hydroxystyrene or a phenol-formaldehyde polymer
08/21/2007US7258954 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
08/21/2007US7257902 Stage device
08/21/2007US7257890 Exposure mask device and method for orienting a plurality of substrates on an exposure mask
08/16/2007WO2007092011A1 Photosensitive polyimide composition and polyimide precursor composition
08/16/2007WO2007091621A1 Radiation-sensitive composition
08/16/2007WO2007091569A1 Method for producing film-forming material
08/16/2007WO2007091560A1 Photosensitive resin composition and photoresist film using the same
08/16/2007WO2007091537A1 Process for producing layered product, layered product, substrate for liquid-crystal display, liquid-crystal display element, and liquid-crystal display
08/16/2007WO2007091463A1 Catadioptric imaging system, exposure device, and device manufacturing method
08/16/2007WO2007091442A1 Material of lithographic printing plate
08/16/2007WO2007091441A1 Photosensitive composition, photosensitive material for lithographic plate, and method of recording in lithographic plate material
08/16/2007WO2007091402A1 Photosensitive composition, photosensitive film, permanent pattern forming method, and printed board
08/16/2007WO2007090828A1 Production of cavities that can be filled with a fluid material in an optical microtechnological component
08/16/2007WO2007090612A1 Debris apparatus, system and method
08/16/2007WO2007090550A1 Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
08/16/2007WO2006118340A3 Image recording processing circuit, image recording apparatus and image recording method using image recording processing circuit
08/16/2007WO2006083284A3 A material composition for nano- and micro-lithography
08/16/2007US20070192757 Pattern generation method and charged particle beam writing apparatus
08/16/2007US20070191520 Photo-radically curable resin composition containing epoxy resin
08/16/2007US20070190735 Method to restore hydrophobicity in dielectric films and materials
08/16/2007US20070190466 Manufacturing method for pixel structure
08/16/2007US20070190465 Positively radiation-sensitive resin composition
08/16/2007US20070190462 Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
08/16/2007US20070190461 Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films
08/16/2007US20070190455 Smooth surface photresist pattern; using acrylated ester and acid generator; for use with a wavelength of no more than 200 nm, and particularly an ArF excimer laser
08/16/2007US20070190451 Calixresorcinarene compounds, photoresist base materials, and compositions thereof
08/16/2007US20070190450 photoresists contains an amide or ester monomers increasing affinity of a resist for a plating solution; forming a barrier metal layer on a wafer; producing a plated shaped article, highly precisely forming a high bump having a height of 20 to 200 mu m on a chip base; wettability; photolithography
08/16/2007US20070190449 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
08/16/2007US20070190448 Positive-type resist composition for liquid immersion lithography and method for forming resist pattern
08/16/2007US20070190447 Photoresist composition and method of forming resist pattern
08/16/2007US20070190446 Lithographic printing original plate and lithographic printing plate
08/16/2007US20070190436 Resist composition
08/16/2007US20070190435 Dye-containing photosensitive composition, color filter using the same, and production method thereof
08/16/2007US20070188881 Projection objective, especially for microlithography, and method for adjusting a projection objective
08/16/2007US20070188880 Very high-aperture projection objective
08/16/2007US20070188840 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
08/16/2007US20070188729 Projection Lens for a Microlithographic Projection Exposure Apparatus
08/16/2007US20070188728 Exposure apparatus
08/16/2007US20070188727 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
08/16/2007US20070188726 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
08/16/2007US20070187947 Binder-free photopolymerizable compositions
08/16/2007US20070187627 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
08/16/2007US20070187625 Lithography system
08/16/2007US20070186804 Violet colorant for colour filters, inks for ink-jet electrophotographic toners and developers and e-inks
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