Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/30/2007WO2007097306A1 Photosensitive resin composition, method for forming resist pattern, method for manufacturing printed wiring board, and method for producing substrate for plasma display panel
08/30/2007WO2007097302A1 Photosensitive material for lithographic plate and process for producing the same
08/30/2007WO2007097233A1 Cleaning liquid for lithography and cleaning method using same
08/30/2007WO2007097169A1 Lithographic printing plate material, method for manufacturing the same, and printing method
08/30/2007WO2007097168A1 Photosensitive lithographic printing plate material and method of image forming on the material
08/30/2007WO2007097112A1 Multilayer material, method of forming resin pattern, substrate, display apparatus and liquid crystal display apparatus
08/30/2007WO2007097105A1 Method for manufacturing aluminum support for lithographic printing plate material, aluminum support for lithographic printing plate material, lithographic printing plate material, and method for image formation
08/30/2007WO2007096949A1 Photo lithography system, photo lithography method and method for fabricating electronic device
08/30/2007WO2007096250A1 Illumination device of a microlithographic projection exposure apparatus
08/30/2007WO2007096195A1 Slm lithography: printing to below k1=.30 without previous opc processing
08/30/2007WO2007096175A1 Slm height error compensation method
08/30/2007WO2007096094A2 Exposure system
08/30/2007WO2007046528B1 Imprint apparatus, imprint method, and mold for imprint
08/30/2007WO2007039374B1 Immersion optical lithography system having protective optical coating
08/30/2007WO2007029845A3 Method and device for manufacturing structure having pattern, and method for manufacturing mold
08/30/2007WO2006056905A3 Lithographic method
08/30/2007WO2006052692A3 Post etch cleaning composition for use with substrates having aluminum
08/30/2007WO2006043253A3 Dynamic development process with de-ionized water puddle
08/30/2007US20070202668 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential laterial solidification
08/30/2007US20070202446 Semiconductor device fabrication method having step of removing photo-resist film or the like, and photo-resist film removal device
08/30/2007US20070202445 Method for manufacturing micro structure
08/30/2007US20070202442 Method and apparatus for merging a mask and a printing plate
08/30/2007US20070202440 Developing a photoresist film by exposing the resist to deep ultraviolet radiation (365 nm) to activate a radiation-sensitive acid generator to release an acid to effect acid and/or carbonol labile groups on the polymer; single or bilayers; positives and negatives; improved sensitivity/resolution
08/30/2007US20070202434 Light Sensitive Coating Compositions Useful For Lithographic Elements
08/30/2007US20070202421 Process For Preparing A Polymeric Relief Structure
08/30/2007US20070201151 Optical Element
08/30/2007US20070201012 Lithographic apparatus and device manufacturing method
08/30/2007US20070201010 Exposure Apparatus, Exposure Method, And Device Manufacturing Method
08/30/2007US20070200477 Nanofabrication
08/30/2007US20070199505 Optical Medium, An Optical Lens And A Prism
08/30/2007US20070199201 Vacuum Device, Operation Method For Vacuum Device, Exposure System, And Operation Method For Exposure System
08/30/2007DE4411176B4 Entwickler für PS-Platten und Ergänzungsflüssigkeiten für Entwickler Developer for PS plates and complement liquids for developer
08/30/2007DE19910363B4 Positives, lichtempfindliches bebilderbares Element Positive photosensitive imageable element
08/30/2007DE19503959B4 Fotomaske zur Herstellung eines Mikromusters einer Halbleitervorrichtung Photo mask for manufacturing a micro-pattern of a semiconductor device
08/30/2007DE10246788B4 Schutzvorrichtung für Reflexionsmasken und Verfahren zur Verwendung einer geschützten Reflexionsmaske Protection device for reflection masks and methods for using a protected reflection mask
08/30/2007DE10240356B4 Elektrostatisches Halteelement Electrostatic holding element
08/30/2007DE102006042452A1 Field illumination system for microlithographic projection exposure system, has illumination angle variation device influencing intensity and/or phase of light so that intensity contribution of raster units to total intensity is varied
08/30/2007DE102006021334B3 Polarization-influencing optical elements manufacturing method, involves assembling two components, and non-plane surface of component is provided with defined elevator profile is assembled to plane surface of other component
08/30/2007DE102006009703B3 Method for direct monitoring of lens control unit of optical lithography system, involves pressuring circuit model on each wafer of production lot by projection of mask sample on wafer with help of lens
08/30/2007DE102006009212A1 Optical device for homogenization of laser radiation, has homogenizing module, which divides laser radiation in incoherent partial radiation lateral to each other
08/30/2007DE102006008357A1 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus
08/30/2007DE102006008080A1 Exposure system for substrate bodies, has exposure device with guiding cross member for one guiding carriage carrying optics unit, where guiding carriage is guided movably in one direction on guiding cross member
08/30/2007CA2642445A1 Stabilized, non-aqueous cleaning compositions for microelectronics substrates
08/29/2007EP1826813A1 Stage device and exposure apparatus
08/29/2007EP1826616A2 Lithographic apparatus and device manufacturing method
08/29/2007EP1826615A2 Lithographic apparatus and device manufacturing method
08/29/2007EP1826614A1 SLM height error compensation method
08/29/2007EP1826613A2 Top coat for lithography processes
08/29/2007EP1826612A1 Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings
08/29/2007EP1826230A1 Unsaturated group-containing polyimide resin, photosensitive resin composition containing same, and cured product thereof
08/29/2007EP1826206A1 Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
08/29/2007EP1826023A1 Method for processing lithographic printing plate precursor, plate inspection method, image quality control method and dyeing aqueous solution used therein
08/29/2007EP1825502A2 Methods of exposure for the purpose of thermal management for imprint lithography processes
08/29/2007EP1825332A1 Process and apparatus for the production of collimated uv rays for photolithographic transfer
08/29/2007EP1825331A2 Process for producing resist pattern and conductor pattern
08/29/2007EP1825330A1 Method for forming anti-reflective coating
08/29/2007EP1825329A1 Method for forming anti-reflective coating
08/29/2007EP1825328A2 Photosensitive resin composition and photosensitive dry film by the use thereof
08/29/2007EP1825325A1 Low refractive index polymers as underlayers for silicon-containing photoresists
08/29/2007EP1824890A1 Less shear-thinning polyvinyl acetals
08/29/2007EP1601931A4 Apparatus and method for detecting overlay errors using scatterometry
08/29/2007EP1570232A4 Apparatus and methods for detecting overlay errors using scatterometry
08/29/2007EP1373981B1 Lithographic apparatus with a mobile lens for producing digital holograms
08/29/2007EP1301569A4 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography
08/29/2007EP1295153A4 Film coated optical lithography elements and method of making
08/29/2007EP1140024B1 Particles for oral delivery of peptides and proteins
08/29/2007EP1106639B1 Photocurable composition containing iodonium salt compound
08/29/2007CN200941147Y Microcrystal Zn plate with laminated film
08/29/2007CN101027612A 图像记录装置和图像记录方法 The image recording apparatus and an image recording method
08/29/2007CN101027611A 平版印版前体 Lithographic printing plate precursor
08/29/2007CN101027610A Antireflective compositions for photoresists
08/29/2007CN101027609A Positive resin composition of near-infrared-ray activation type
08/29/2007CN101027608A Patterning process, film-forming process, electroluminescence device and its manufacturing process, and electroluminescence display apparatus
08/29/2007CN101027375A Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent
08/29/2007CN101027281A Adamantane derivative, process for producing the same, and photosensitive material for photoresist
08/29/2007CN101026097A Processing method
08/29/2007CN101026063A Exposure device for plasma display device by using multi-panel technology and its method
08/29/2007CN101025580A Semiconductor exposure method and method for operating semiconductor exposure device
08/29/2007CN101025579A Composition for removing a resist
08/29/2007CN101025578A A gas mixture for removing photoresist and post etch residue and use thereof
08/29/2007CN101025577A Pattern formation method
08/29/2007CN101025576A 激光加工装置及其加工方法 The laser processing apparatus and processing method
08/29/2007CN101025575A Base plate exposure device and base plate exposure method
08/29/2007CN101025574A Batch silicon wafer exposure method
08/29/2007CN101025573A Lithographic apparatus and device manufacturing method
08/29/2007CN101025572A Supporting body of plate
08/29/2007CN101025571A 器件制造方法和计算机程序产品 Device manufacturing method, and computer program products
08/29/2007CN101025570A Exposure method and exposure platform
08/29/2007CN101025569A Method for forming fine pattern of semiconductor device
08/29/2007CN101025568A 感光性树脂组合物 The photosensitive resin composition
08/29/2007CN101025567A Radiation-sensitive resin composition, method for forming spacer and spacer
08/29/2007CN101025566A Pattern forming method and gray-tone mask manufacturing method
08/29/2007CN101025564A Four-gradation photomask manufacturing method and photomask blank for use therein
08/29/2007CN101025474A Optical system for transforming numerical aperture
08/29/2007CN101025460A Micro optical component positioning structure and micro channel module preparation using micro channel array
08/29/2007CN101025451A Resin layer surface micro structure mould-band rolling wheel shaping method and optical film
08/29/2007CN101025445A Process of fabricating microlens mold
08/29/2007CN101024683A Reactable resin and optical-imaging composition
08/29/2007CN101024624A Oxime derivative, photopolymerisable composition, colour filter and process for producing the same
08/29/2007CN101024482A Method for constituting 3-D structure
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