Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2007
08/29/2007CN101024451A Dual-face imaging system and method used for plane base sheet
08/29/2007CN100334687C Method of manufacturing integrated circuit
08/29/2007CN100334654C Photosensitive conductive paste and conductive body pattern formed thereby
08/29/2007CN100334508C Photoresist demoulding coposition and model forming method by using said composition
08/29/2007CN100334507C Substrate processing system for performing exposure process in gas atmosphere
08/29/2007CN100334506C Photoresist compound using photoresist
08/29/2007CN100334487C Method for producing colour filter base plate for liquid crystal display device
08/29/2007CN100334155C Radiation curable composition, optical waveguide and method for formation thereof
08/28/2007US7262920 Optical element and manufacturing method therefor
08/28/2007US7262917 Out-of-plane pre-aligned refractive micro lens
08/28/2007US7262915 Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus
08/28/2007US7262878 System and method for calibrating an imaging system during imaging
08/28/2007US7262860 Compensation for errors in off-axis interferometric measurements
08/28/2007US7262828 Near-field photomask and near-field exposure apparatus including the photomask
08/28/2007US7262398 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
08/28/2007US7262243 Coating composition, antireflection film, photoresist and pattern formation method using it
08/28/2007US7262063 Directed assembly of functional heterostructures
08/28/2007US7261998 Imageable element with solvent-resistant polymeric binder
08/28/2007US7261997 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
08/28/2007US7261995 Provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light
08/28/2007US7261994 Positive resist composition
08/28/2007US7261993 Photoresists and processes for microlithography
08/28/2007US7261992 Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
08/28/2007US7261985 Large feature-shift coma sensitivity is simulated for a range of illumination conditions, resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified
08/28/2007US7261984 Exposure pattern or mask and inspection method and manufacture method for the same
08/28/2007US7261982 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions
08/28/2007US7261957 protective layer comprises iridium; protective barrier layers based on ion beam assisted deposition; longer life span
08/28/2007US7261831 Positive tone bi-layer imprint lithography method
08/28/2007US7261830 Applying imprinting material to substrates employing electromagnetic fields
08/23/2007WO2007094863A2 Oblique parallelogram pattern diffractive optical element
08/23/2007WO2007094784A1 Adamantane based molecular glass photoresists for sub-200 nm lithography
08/23/2007WO2007094474A1 Tertiary alcohol derivative, polymer compound and photoresist composition
08/23/2007WO2007094473A1 Tertiary alcohol derivative, polymer compound and photoresist composition
08/23/2007WO2007094443A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium
08/23/2007WO2007094436A1 Acid-dissociative group-containing compound and radiation-sensitive composition
08/23/2007WO2007094431A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094414A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094407A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094396A1 Photosensitive resin composition and pattern forming method using same
08/23/2007WO2007094299A1 Processing liquid for resist substrate and method of processing resist substrate using the same
08/23/2007WO2007094235A1 Exposure method, exposure apparatus, photomask and photomask manufacturing method
08/23/2007WO2007094229A1 Substrate treating method, and computer-readable storage medium
08/23/2007WO2007094217A1 Laminated resin body and method for manufacturing same, display device material, display device and liquid crystal display device
08/23/2007WO2007094192A1 Resist composition for immersion lithography and method for formation of resist pattern
08/23/2007WO2007094187A1 Printing plate material and method for image formation
08/23/2007WO2007093436A1 Optical integrator for an illumination system of a microlithographic projection exposure apparatus
08/23/2007WO2007093433A1 Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type
08/23/2007WO2007093396A1 Illumination system for a microlithographic projection exposure apparatus
08/23/2007WO2007093193A1 Method of detecting defects in an integrated circuit
08/23/2007WO2007057442A3 Method of making a photopolymer printing plate
08/23/2007WO2007057337A3 Method of making a lithographic printing plate
08/23/2007WO2006121563A3 Method and system for line-dimension control of an etch process
08/23/2007WO2005098538A3 Chemical compositions
08/23/2007WO2005022600A3 Method and systems for processing overlay data
08/23/2007US20070197718 Photofunctional optical material comprising fluorine-containing acrylate polymer
08/23/2007US20070196854 Method for producing polymers
08/23/2007US20070196819 Patterning Method For Biosensor Applications And Devices Comprising Such Patterns
08/23/2007US20070196776 Stable High Ph Developer
08/23/2007US20070196774 Exposure Method And Device Manufacturing Method
08/23/2007US20070196772 light exposing photoresist polymer selected from a ROMA-type polymer including a Ring-Opened Maleic Anhydride repeating unit; COMA-type copolymer including Cyclo-Olefin repeating unit, Maleic Anhydride repeating unit and methacrylate or acrylate repeating unit, baking
08/23/2007US20070196771 Method of developing laser sensitive lithographic printing plate
08/23/2007US20070196770 Printing sleeve and method of manufacturing the same
08/23/2007US20070196768 Charged particle beam projection method and program used therefor
08/23/2007US20070196763 Method of forming laminated resist
08/23/2007US20070196746 Methods and apparatuses for applying wafer-alignment marks
08/23/2007US20070196745 comprising a slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions; improving resolution, high light intensity contrast, narrow the exposed width of the resist film with a small uniform width
08/23/2007US20070196594 Photo-alignment material and liquid crystal display device and its manufacturing method using the same
08/23/2007US20070195325 Method and apparatus for measuring optical overlay deviation
08/23/2007US20070195304 Large field of view projection optical system with aberration correctability
08/23/2007US20070195303 Apparatus and method for providing fluid for immersion lithography
08/23/2007US20070195302 Using isotopically specified fluids as optical elements
08/23/2007US20070195300 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
08/23/2007US20070195299 Method for improving an Optical Imaging Property of a Projection Objective of a Microlithographic Projection Exposure Apparatus
08/23/2007US20070194741 Driving apparatus, exposure apparatus, and device manufacturing method
08/23/2007US20070194499 Method for making opthalmic devices
08/23/2007US20070193907 Composite substrate carrier
08/23/2007DE10340611B4 Lithografiemaske zur Abbildung von konvexen Strukturen Lithography mask for imaging of convex structures
08/23/2007CA2642842A1 Methods and means relating to photopolymer printing plates
08/22/2007EP1821377A2 Gas discharge laser system
08/22/2007EP1821338A1 Exposure apparatus, exposure method and device manufacturing method
08/22/2007EP1821337A1 Maintenance method, maintenance apparatus, exposure apparatus and device manufacturing method
08/22/2007EP1821336A1 Position measurement method, position control method, measurement method, loading method, exposure method, exoposure apparatus, and device production method
08/22/2007EP1821150A1 Lithographic apparatus and device manufacturing method
08/22/2007EP1821149A2 Exposure apparatus and device manufacturing method
08/22/2007EP1821148A2 Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
08/22/2007EP1821147A1 Resist composition for supercritical development
08/22/2007EP1820377A2 Method and apparatus for operating an electrical discharge device
08/22/2007EP1820066A2 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
08/22/2007EP1820065A2 Photopolymerizable silicone materials forming semipermeable membranes for sensor applications
08/22/2007EP1820064A2 Radiation-curable coating substances
08/22/2007EP1820063A1 Positive type dry film photoresist
08/22/2007EP1820062A1 Positive type dry film photoresist and composition for preparing the same
08/22/2007EP1820061A1 Silicon containing tarc/barrier layer
08/22/2007EP1820050A1 Transmitting optical element and objective for a microlithographic projection exposure apparatus
08/22/2007EP1641848B1 Photoresist polymer compositions
08/22/2007EP1532484A4 Lithographic printing with polarized light
08/22/2007EP1319650B1 Process for producing (meth)acrylic anhydride and process for producing (meth)acrylic ester
08/22/2007CN2938174Y Exposure lamp
08/22/2007CN2938173Y Exposure frame
08/22/2007CN2938172Y Exposure precision positioning system of changed by two-device
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