Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2007
09/05/2007EP1829942A1 Coating compositions for use with an overcoated photoresist
09/05/2007EP1829850A2 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
09/05/2007EP1829836A1 Large glass substrate for photomask and method for producing same, computer readable recording medium, and method for exposing mother glass
09/05/2007EP1829702A1 Lithographic printing plate material and lithographic printing method
09/05/2007EP1829681A2 Method for preparation of lithographic printing plate and lithographic printing plate precursor
09/05/2007EP1829088A1 Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
09/05/2007EP1829035A2 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film
09/05/2007EP1828848A1 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
09/05/2007EP1828847A1 Tridimensional structures for an ink jet printhead and relevant manufacturing process
09/05/2007EP1828846A2 Lensed fiber array for sub-micron optical lithography patterning
09/05/2007EP1828845A2 Projection exposure system, beam delivery system and method of generating a beam of light
09/05/2007EP1828844A1 A filter device for the compensation of an asymmetric pupil illumination
09/05/2007EP1828843A1 Photoresist composition for deep uv and process thereof
09/05/2007EP1828842A2 Porous holographic film
09/05/2007EP1828319A1 Compositions for articles comprising replicated microstructures
09/05/2007EP1827717A2 Methods and compositions for forming aperiodic patterned copolymer films
09/05/2007EP1695138A4 Liquid crystal cell that resists degradation from exposure to radiation
09/05/2007CN101032068A Linear motor, stage apparatus and exposure apparatus
09/05/2007CN101032003A Method for stripping photoresist from etched wafer
09/05/2007CN101031997A Measurement method, exposure method, and device manufacturing method
09/05/2007CN101031996A Exposing device, exposing method, and assembly manufacturing method
09/05/2007CN101031847A Method and system for contamination detection and monitoring a lithographic exposure tool and operating method for the same under controlled atmospheric conditions
09/05/2007CN101031846A Anti-reflective coating composition and production method for pattern using the same
09/05/2007CN101031845A Aqueous developable photo-imageable composition precursors for use in photo-patterning methods
09/05/2007CN101031605A Photosensitive resin, photosensitive composition and photo-crosslinked structure
09/05/2007CN101031597A Copolymer and upper film-forming composition
09/05/2007CN101030551A Stage device
09/05/2007CN101030539A Method of making semiconductor device
09/05/2007CN101030532A Method for fabricating semiconductor device
09/05/2007CN101030048A Method for improving semiconductor alignment precision and its opening forming method
09/05/2007CN101030047A Anticorrdant stripping waste liquor regeneration method and device
09/05/2007CN101030046A Anticorrdant stripping waste liquor regeneration method and device
09/05/2007CN101030045A Method for cleaning wafer edge
09/05/2007CN101030044A Method of processing a substrate
09/05/2007CN101030043A Ultraviolet radiation device
09/05/2007CN101030042A Lithographic apparatus and device manufacturing method
09/05/2007CN101030041A Lithographic apparatus and device manufacturing method
09/05/2007CN101030040A Method for forming shallow slot on surface of magnetic head
09/05/2007CN101030039A Lampshade seat
09/05/2007CN101030038A Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
09/05/2007CN101030037A Coating compositions for use with an overcoated photoresist
09/05/2007CN101030036A Radiation sensitive resin composition and spacer for liquid crystal display element
09/05/2007CN101030035A Photosensitive mixed liquid for light-sensing board
09/05/2007CN101030034A Method and apparatus for separating a stamper from a patterned substrate
09/05/2007CN101030033A Production of MEMS suspending structure by laminated photoetching glue victim layer
09/05/2007CN101030032A Method for crystallizing amorphous silicon into polycrystalline silicon and its photoetching mask
09/05/2007CN101030028A Diffraction projecting screen and its production
09/05/2007CN101030027A Projection screen with holographic cylindrical lens structure
09/05/2007CN101029949A Optical element and method of manufacturing optical element
09/05/2007CN101029095A Mono-stripped hydrogen light initiating agent, its production and use
09/05/2007CN100336197C Pattern copy mask, manufacturing method of semiconductor device and program for making mask pattern
09/05/2007CN100336194C Detection of silicon chip state in box and its center relocation method
09/05/2007CN100336173C Substrate treatment apparatus
09/05/2007CN100336140C Magnetic actuator under piezoelectric control
09/05/2007CN100336137C Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
09/05/2007CN100335974C Photoetching projection mask and method for producing device using same and the device obtained therefrom
09/05/2007CN100335973C Negative-working photoimabeable bottom antireflective coating
09/05/2007CN100335972C Photoresist composition for deep ultraviolet lithography
09/05/2007CN100335971C Chemical amplification corrosion-resistant composition
09/05/2007CN100335970C Material and method for making an electroconductive pattern
09/05/2007CN100335969C Method of treatment of porous dielectric films to reduce damage during cleaning
09/05/2007CN100335968C Nanostructures
09/05/2007CN100335864C Backlighting system for displays
09/05/2007CN100335564C Process for making green pigment compositions useful for colour filters and LCD's
09/05/2007CN100335182C Base plate treater and slit jet nozzle
09/04/2007US7266802 Drawing apparatus and drawing method
09/04/2007US7266800 Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
09/04/2007US7266480 Rapid scattering simulation of objects in imaging using edge domain decomposition
09/04/2007US7266137 Laser gas replenishment method
09/04/2007US7265919 Flange assembly of an optical system
09/04/2007US7265917 Replacement apparatus for an optical element
09/04/2007US7265850 Fortified, compensated and uncompensated process-sensitive scatterometry targets
09/04/2007US7265818 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same
09/04/2007US7265817 Lithographic apparatus, device manufacturing method, and slide assembly
09/04/2007US7265816 Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator
09/04/2007US7265812 Cooling apparatus
09/04/2007US7265431 Imageable bottom anti-reflective coating for high resolution lithography
09/04/2007US7265366 Lithographic apparatus and device manufacturing method
09/04/2007US7265364 Level sensor for lithographic apparatus
09/04/2007US7265161 manufacture of three dimensional inorganic structures without molding or embossing steps; nanostructure; photoinitiator, reactive curable organic polymer, transparent oxide particles (silica); formed structure can be pyrolyzed to remove organic components and leave an inorganic structure; resolution
09/04/2007US7265044 Method for forming bump on electrode pad with use of double-layered film
09/04/2007US7264918 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
09/04/2007US7264916 Laser marking method
09/04/2007US7264915 Heat treatment of a donor film composed of a base film, a light-to-heat conversion layer and an organic film; non-uniform distribution of a laser on a region subjected to the LITI process isminimized to prevent the over- or under-transfer of an transferred organic film, etc
09/04/2007US7264914 Especially interpolymers from substituted cyclobutanorbornenes and fluoroolefins or fluorinated vinyl ethers; photoresists have high UV transparency (particularly at short wavelengths, e.g., 157 nm)
09/04/2007US7264913 Coatings comprising mixtures of polyesters, curing agents and acids or acid generators, used to form semiconductors by photolithographic
09/04/2007US7264912 Filtration raw materials; dissolving in solvent
09/04/2007US7264909 Exposure parameters for all of the selected exposure patterns to be corrected include position, focal point, astigmatism, rotation, and magnification
09/04/2007US7264907 Photomask having central and peripheral line patterns
09/04/2007US7264905 Shading area at center of a clear defect in a wiring pattern of a half tone mask; accuracy, lithography
09/04/2007US7264853 Attaching a pellicle frame to a reticle
09/04/2007US7264235 Active damping apparatus, exposure apparatus and device manufacturing method
09/04/2007CA2203505C On-press developable printing plate with amphoteric hydrogen bond forming developability stabilizer
08/2007
08/30/2007WO2007098453A2 Method and apparatus for determining focus and source telecentricity
08/30/2007WO2007097907A2 Radiation-sensitive compositions and imageable materials
08/30/2007WO2007097897A1 Stabilized, non-aqueous cleaning compositions for microelectronics substrates
08/30/2007WO2007097466A1 Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
08/30/2007WO2007097457A1 Composition for forming antireflection film and antireflection film
08/30/2007WO2007097380A1 Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method
08/30/2007WO2007097350A1 Position measuring device and position measuring method, mobile body driving system and mobile body driving method, pattern forming device and pattern forming method, exposure device and exposure method, and device manufacturing method
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