| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/12/2007 | CN101034672A Double exposure double resist layer process for forming gate patterns |
| 09/12/2007 | CN101034263A Method and system for enhanced lithographic alignment |
| 09/12/2007 | CN101034262A Manufacturing method for array substrate of thin film transistor LCD |
| 09/12/2007 | CN101034261A Method and device for preventing barrier processing from polluting optical element |
| 09/12/2007 | CN101034260A 感光性树脂组合物 The photosensitive resin composition |
| 09/12/2007 | CN101034259A Process for producing an image using a first minimum bottom antireflective coating composition |
| 09/12/2007 | CN101034258A Liquid light curing resin composition |
| 09/12/2007 | CN101034257A Photosensitive film used for holographic recording and manufacturing method |
| 09/12/2007 | CN101034256A Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof |
| 09/12/2007 | CN101034255A 光掩模和曝光方法 Photomask and exposure method |
| 09/12/2007 | CN101034254A Method and system for enhanced lithographic patterning |
| 09/12/2007 | CN101034215A Pixel structure of LCD array substrate and method for making same |
| 09/12/2007 | CN101034212A LCD and defect mending method used for display thereof |
| 09/12/2007 | CN101034175A Color filter substrate and display components thereof |
| 09/12/2007 | CN101033587A Method of printing on towel by four primary colors |
| 09/12/2007 | CN101032879A Imaging apparatus, imaging method, and printing apparatus |
| 09/12/2007 | CN100337307C Photolithography evaluating method and photolithography process |
| 09/12/2007 | CN100337239C Analyzing system of exposuring device, analyzing method, and program, and semiconductor element mfg. method |
| 09/12/2007 | CN100337161C Pattern-forming material and method of forming pattern |
| 09/12/2007 | CN100337160C Photosensitive composition and color filter |
| 09/12/2007 | CN100337145C A method and apparatus for producing three-dimensional photon crystal structure |
| 09/12/2007 | CN100337089C Device detection |
| 09/12/2007 | CN100336836C Acrylic copolymer and radiation-sensitive resin composition |
| 09/12/2007 | CN100336671C Photosensitive resin composition for original printing plate capable of being carved by laser |
| 09/11/2007 | USRE39835 Producing direct-imaged flexographic printing elements having light-attenuating support layers such that both the front and back exposure times are economically efficient |
| 09/11/2007 | US7269819 Method and apparatus for generating exposure data |
| 09/11/2007 | US7269817 Lithographic process window optimization under complex constraints on edge placement |
| 09/11/2007 | US7269816 Driven inspection or measurement |
| 09/11/2007 | US7269804 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
| 09/11/2007 | US7269470 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |
| 09/11/2007 | US7268891 Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
| 09/11/2007 | US7268890 Device and method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine |
| 09/11/2007 | US7268888 Compensation of refractivity perturbations in an interferometer path |
| 09/11/2007 | US7268855 Projection optical system |
| 09/11/2007 | US7268854 Exposure apparatus, exposure method, and method for producing device |
| 09/11/2007 | US7268853 Exposing systems providing post exposure baking and related methods |
| 09/11/2007 | US7268360 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 09/11/2007 | US7268343 Method and system for detecting defects |
| 09/11/2007 | US7268200 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 09/11/2007 | US7268171 Water-based coating composition curable with actinic energy ray, coated metallic material with cured film of the composition, production process, and method of bonding coated metallic material |
| 09/11/2007 | US7268070 Profile improvement method for patterning |
| 09/11/2007 | US7267932 Method for high resolution patterning using soft X-ray, process for preparing nano device using the same method |
| 09/11/2007 | US7267929 Producing barrier ribs for a pixel pattern from a mixture of an alkali-soluble photosensitive resin having acidic groups and at least three ethylenic double bonds per molecule; an ink repellent copolymer having fluoroalkyl groups; and a photopolymerization initiator |
| 09/11/2007 | US7267928 Printing plate material and printing process |
| 09/11/2007 | US7267927 Method for fabricating semiconductor device and equipment for fabricating the same |
| 09/11/2007 | US7267926 Active energy beam curing type conductive paste, production method and device for conductor circuit substrate and non-contact ID and production method thereof |
| 09/11/2007 | US7267925 Photosensitive composition and novel compound used therefor |
| 09/11/2007 | US7267924 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 09/11/2007 | US7267923 Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; enhanced contrast of alkali dissolution rate before and after exposure; high sensitivity and resolution in fine feature size regions |
| 09/11/2007 | US7267913 Recording material and image forming method |
| 09/11/2007 | US7267912 Exposure mask and pattern exposure method |
| 09/11/2007 | CA2362387C Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 09/11/2007 | CA2273797C Method of contact printing on gold coated films |
| 09/11/2007 | CA2207864C Improved photoresists and method of making printing plates |
| 09/11/2007 | CA2174851C Process for making an array of tapered photopolymerized waveguides |
| 09/07/2007 | WO2007100144A1 Measurement apparatus, exposure apparatus having the same, and device manufacturing method |
| 09/07/2007 | WO2007100087A1 Exposure apparatus and device manufacturing method |
| 09/07/2007 | WO2007100081A1 Exposure method and apparatus, and device manufacturing method |
| 09/07/2007 | WO2007099925A1 Photographic developer composition for photosensitive organic film |
| 09/07/2007 | WO2007099887A1 Method for producing lithographic printing plate |
| 09/07/2007 | WO2007099108A1 Method for making a lithographic printing plate |
| 09/07/2007 | WO2007099053A1 Method for making a lithographic printing plate |
| 09/07/2007 | WO2007083999A3 Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same |
| 09/07/2007 | WO2007082327A3 Printing plate |
| 09/07/2007 | WO2007076739A3 Coating installation for wafers |
| 09/07/2007 | WO2007041508A3 Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control |
| 09/07/2007 | WO2007030650A3 Devices and methods for targeting printing plates and measuring dot coverage thereon |
| 09/07/2007 | WO2006096476A3 Infrared dye compositions |
| 09/06/2007 | US20070209030 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
| 09/06/2007 | US20070208098 Composition Curable By Radical Photo Curing And Cationic Photo Curing In Combination |
| 09/06/2007 | US20070207938 Cleaning compositions and methods of use thereof |
| 09/06/2007 | US20070207925 applying an UV curable resin blends comprising a thermosetting resin or an alkyd resin and a colorless color former, exposure to UV or high energy radiation whereby the color is formed; without the need of a developer |
| 09/06/2007 | US20070207601 Exposure Apparatus |
| 09/06/2007 | US20070207413 Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers |
| 09/06/2007 | US20070207412 Method of producing planographic printing plate, and planographic printing plate |
| 09/06/2007 | US20070207411 Method for preparation of lithographic printing plate and lithographic printing plate precursor |
| 09/06/2007 | US20070207410 Planar inorganic device |
| 09/06/2007 | US20070207409 claimed monomer is fluorinated alpha,omega-diene having pendant ether or ester groups; cyclopolymerization produces fluoropolymer having alicyclic structure in the main chain with pendant functional groups; high transparency in a wide wavelength region; chemical stability, heat resistance; photoresist |
| 09/06/2007 | US20070207406 Anti-reflective coatings using vinyl ether crosslinkers |
| 09/06/2007 | US20070206381 System for reducing the coherence of laser radiation |
| 09/06/2007 | US20070206301 Faceted mirror apparatus |
| 09/06/2007 | US20070206297 Positioning unit and alignment device for an optical element |
| 09/06/2007 | US20070206264 Image Forming Method and Apparatus |
| 09/06/2007 | US20070206172 Lithographic apparatus and device manufacturing method |
| 09/06/2007 | US20070206171 Illumination system for a microlithographic projection exposure apparatus |
| 09/06/2007 | US20070206167 Exposure Method and Apparatus, and Device Manufacturing Method |
| 09/06/2007 | US20070205528 Photocurable Compositions |
| 09/06/2007 | US20070204885 Substrate processing apparatus for resist film removal |
| 09/06/2007 | DE4426119B4 Photobildfähige Massen, enthaltend 1,2-dihalogenierte Ethane auf Schichtträgermaterial, zur Verbesserung des Druckbildes Photo image-capable compounds containing 1,2-dihalogenated ethanes on substrate material, to improve the print image |
| 09/06/2007 | DE10337509B4 Gerät zur Herstellung von Halbleitern Apparatus for production of semiconductors |
| 09/06/2007 | DE10260755B4 Verfahren zur Bildung eines Strukturelementes auf einem Wafer mittels einer Maske und einer ihr zugeordneten Trim-Maske A method for forming a structural element on a wafer with a mask and a trim mask assigned |
| 09/06/2007 | DE102006010236A1 Immersion lithography projection objective material, comprising high refractive index, alkaline earth metal-containing phosphate glass, is obtained using deposition burner in presence of oxygen-containing gas |
| 09/05/2007 | EP1830456A1 Magnetic guiding apparatus, stage apparatus, exposure apparatus and device manufacturing method |
| 09/05/2007 | EP1830422A2 Light emitting device and electronic device |
| 09/05/2007 | EP1830395A1 Method for measuring position of mask surface in height direction, exposure apparatus and exposure method |
| 09/05/2007 | EP1830394A1 Exposure apparatus, exposure method and device manufacturing method |
| 09/05/2007 | EP1830393A1 Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus |
| 09/05/2007 | EP1830229A2 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same |
| 09/05/2007 | EP1830228A1 Compound for resist and radiation-sensitive composition |
| 09/05/2007 | EP1830227A1 Resist composition for liquid immersion exposure and method for resist pattern formation |