| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/19/2007 | CN100338530C Method for releasing resist |
| 09/19/2007 | CN100338529C Exposure apparatus |
| 09/19/2007 | CN100338528C Method and apparatus for porforming rule-based gate shrink utilizing dipole illumination |
| 09/19/2007 | CN100338490C Laser device, exposure head, exposure device and optical fibre connecting method |
| 09/19/2007 | CN100338106C Vinyl polymer and light sensitivity lithographic plate containing said polymer |
| 09/19/2007 | CN100338102C Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 09/19/2007 | CN100338056C Substituted oxime derivatives and the use thereof as latent acids |
| 09/18/2007 | US7272102 Ridge waveguide with recess |
| 09/18/2007 | US7272099 Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 09/18/2007 | US7271905 Method and apparatus for self-referenced wafer stage positional error mapping |
| 09/18/2007 | US7271902 Generic interface for an optical metrology system |
| 09/18/2007 | US7271879 Decoupled planar positioning system |
| 09/18/2007 | US7271878 Wafer cell for immersion lithography |
| 09/18/2007 | US7271876 Projection objective for microlithography |
| 09/18/2007 | US7271873 Lithographic apparatus and device manufacturing method |
| 09/18/2007 | US7271867 Contact for semiconductor and display devices |
| 09/18/2007 | US7271492 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same |
| 09/18/2007 | US7271098 Method of fabricating a desired pattern of electronically functional material |
| 09/18/2007 | US7270942 Optimized mirror design for optical direct write |
| 09/18/2007 | US7270941 Method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising |
| 09/18/2007 | US7270940 Method of structuring of a substrate |
| 09/18/2007 | US7270939 Photoresist composition for LCD light diffuse reflecting film |
| 09/18/2007 | US7270938 Photopolymerizable composition, light sensitive planographic printing plate material and manufacturing method of planographic printing plate |
| 09/18/2007 | US7270937 Over-coating composition for photoresist and process for forming photoresist pattern using the same |
| 09/18/2007 | US7270936 Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same |
| 09/18/2007 | US7270935 Cyanoadamantyl compounds and polymers and photoresists comprising same |
| 09/18/2007 | US7270934 Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern |
| 09/18/2007 | US7270933 applying mixtures of curing agents, light absorbers, acid generators, solvents and polydimethylsiloxane on the surfaces of a layer to be etched, then baking to form films, applying photosensitive materials, exposing to a light source and developing to form patterns |
| 09/18/2007 | US7270932 Imaging composition and method |
| 09/18/2007 | US7270931 Silicon-containing compositions for spin-on ARC/hardmask materials |
| 09/18/2007 | US7270930 Heat-sensitive positive working lithographic printing plate precursor |
| 09/18/2007 | US7270929 Media for laser imaging |
| 09/18/2007 | US7270928 Isocyanate composition, microcapsule and production method thereof, and recording material |
| 09/18/2007 | US7270916 Recording medium |
| 09/18/2007 | US7270760 Method and apparatus for simulating standard test wafers |
| 09/18/2007 | US7270533 System for creating a turbulent flow of fluid between a mold and a substrate |
| 09/18/2007 | US7270528 Flash curing in selective deposition modeling |
| 09/18/2007 | US7270478 X-ray alignment system for fabricating electronic chips |
| 09/18/2007 | US7270058 Photosensitive planographic printing plate and method of producing the same |
| 09/18/2007 | US7270005 Transducer-based sensor system |
| 09/18/2007 | CA2422772C Fibrous structure having increased surface area and process for making same |
| 09/13/2007 | WO2007103082A2 Interferometry systems and methods of using interferometry systems |
| 09/13/2007 | WO2007102987A1 Method und apparatus for rapid printing of near-field and imprint lithographic features |
| 09/13/2007 | WO2007102487A1 Treated substratum with hydrophilic region and water-repellent region and process for producing the same |
| 09/13/2007 | WO2007102474A1 Active energy ray-curable composition and method for producing same |
| 09/13/2007 | WO2007102470A1 Photosensitive resin composition for volume phase hologram recording and optical information recording medium using same |
| 09/13/2007 | WO2007102425A1 Positive resist composition and method for forming resist pattern |
| 09/13/2007 | WO2007102376A1 Plotting image data creation method and device and plotting method and device |
| 09/13/2007 | WO2007102322A1 Photosensitive lithographic printing plate material |
| 09/13/2007 | WO2007102298A1 Rotary drive apparatus and electron beam irradiation apparatus |
| 09/13/2007 | WO2007102289A1 Photosensitive composition, photosensitive film, method for permanent pattern formation using said photosensitive composition, and printed board |
| 09/13/2007 | WO2007102261A1 Photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board |
| 09/13/2007 | WO2007102192A1 Method for fabricating semiconductor device |
| 09/13/2007 | WO2007101860A1 Off-axis lens with rotatable optical element |
| 09/13/2007 | WO2007101774A1 Projection objective of a microlithographic projection exposure apparatus |
| 09/13/2007 | WO2007072335A3 Speckle reduction by angular scanning for laser projection displays |
| 09/13/2007 | WO2006098291A9 Photosensitive resin composition |
| 09/13/2007 | WO2006087102A3 Process for the production of lithographic printing plates |
| 09/13/2007 | WO2006071914A3 Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| 09/13/2007 | US20070214448 Orientation dependent shielding for use with dipole illumination techniques |
| 09/13/2007 | US20070213962 Simulation of objects in imaging using edge domain decomposition |
| 09/13/2007 | US20070213447 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 09/13/2007 | US20070212655 Method for applying T-shaped photo-resist pattern to fabricate a wiring pattern with small structural dimensions |
| 09/13/2007 | US20070212654 Method for lithography for optimizing process conditions |
| 09/13/2007 | US20070212650 Overlay accuracy measurement vernier and method of forming the same |
| 09/13/2007 | US20070212649 Method and system for enhanced lithographic patterning |
| 09/13/2007 | US20070212648 Method and system for enhanced lithographic patterning |
| 09/13/2007 | US20070212647 Photosensitive Original Printing Plate for Relief Printing, Method for Producing Relief Printing Plate, and Light-Shielding Ink for Performing the Method |
| 09/13/2007 | US20070212623 Dye-containing negative working curable composition, color filter and production method thereof |
| 09/13/2007 | US20070212617 For exposure of semiconductor wafer with dipole illumination light; photoresists |
| 09/13/2007 | US20070212013 Photocurable Resin Composition for Forming Optical Waveguide, Photocurable Dry Film for Forming Optical Waveguide, and Optical Waveguide |
| 09/13/2007 | US20070211850 Cleaning of Multi-Layer Mirrors |
| 09/13/2007 | US20070211613 Conveyance apparatus having a compact conveying mechanism |
| 09/13/2007 | US20070211235 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 09/13/2007 | US20070211234 Exposure apparatus, and device manufacturing method |
| 09/13/2007 | US20070211232 Thermophoretic Techniques for Protecting Reticles from Contaminants |
| 09/13/2007 | US20070210731 Motor Control Apparatus |
| 09/13/2007 | US20070210393 Lithographic Method Products Obtained And Use Of Said Method |
| 09/13/2007 | US20070209200 Circuit Board, Method Of Manufacturing Circuit Board, And Display Device Having Circuit Board |
| 09/13/2007 | DE112005002819T5 Positivresist - Zusammensetzung und Verfahren zur Erzeugung eines Resist - Musters Positive resist - Composition and method for forming a resist - pattern |
| 09/13/2007 | DE102006011140A1 Prozesskontrollstreifen und Verfahren zur Aufzeichnung Process control strip and method for recording |
| 09/13/2007 | DE102005028489B4 Verfahren und Vorrichtung zum Herstellen eines Flachtafeldisplays Method and apparatus for manufacturing a flat panel display |
| 09/13/2007 | DE102005013532B4 EUV-Lithographiesystem und Retikelhalter zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and reticle for solving reticles in a vacuum-insulated environment |
| 09/13/2007 | DE10125372B4 Mischung zur Verwendung als Antireflexionsschicht, Substrat mit einer Antireflexionsschicht und Verfahren zur Herstellung einer Antireflexionsschicht Mixture for use as an anti-reflection layer, the substrate having an antireflection layer and methods of making an anti-reflection layer |
| 09/12/2007 | EP1833082A1 Substrate processing method, exposure method, exposure apparatus, and method for manufacturing device |
| 09/12/2007 | EP1833081A1 Exposure apparatus and method for manufacturing device |
| 09/12/2007 | EP1833080A1 Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 09/12/2007 | EP1832933A1 Substrate processing and alignment |
| 09/12/2007 | EP1832932A1 Cleaning liquid for lithography and method of cleaning therewith |
| 09/12/2007 | EP1832931A1 Cleaning liquid for lithography and method for resist pattern formation |
| 09/12/2007 | EP1832930A2 Aperture diffraction interferometer (adi) for the inspection and measurement of ophthalmic optical components |
| 09/12/2007 | EP1832929A1 Compositions and process for photolithography |
| 09/12/2007 | EP1832928A2 Photosensitive recording material, planographic printing plate precursor, and stacks of the same |
| 09/12/2007 | EP1832927A1 A test pattern and a method of evaluating the transfer properties of a test pattern |
| 09/12/2007 | EP1831764A2 Nanofabrication based on sam growth |
| 09/12/2007 | EP1831763A1 Surface patterning and via manufacturing employing controlled precipitative growth |
| 09/12/2007 | EP1831271A2 Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| 09/12/2007 | EP1390692A4 Periodic patterns and technique to control misalignment |
| 09/12/2007 | CN101036423A Method for producing conductive pattern material |
| 09/12/2007 | CN101036086A A flexible nano-imprint stamp |