Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2007
09/25/2007US7274435 Exposure apparatus and device fabrication method using the same
09/25/2007US7274431 Lithographic projection apparatus and device manufacturing method
09/25/2007US7274430 Optical arrangement and projection exposure system for microlithography with passive thermal compensation
09/25/2007US7274429 Integrated lithographic fabrication cluster
09/25/2007US7274030 Apparatus for the temporally stable generation of EUV radiation by means of a laser-induced plasma
09/25/2007US7273761 Box-in-box field-to-field alignment structure
09/25/2007US7273692 Planographic printing plate material and planographic printing plate preparing process
09/25/2007US7273691 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
09/25/2007US7273690 Improvement in the resist pattern falling and profile deterioration caused by a time delay between exposure and post-exposure bake; use of sulfonium acid generator that has either a cation with a fluoro(cyclo)alkyl residue or an anion with a nonfluoro-substituted (cyclo)alkyl residue
09/25/2007US7273689 Method to remove unwanted, unexposed, positive-working, IR radiation sensitive layer
09/25/2007US7273636 Patterning of solid state features by direct write nanolithographic printing
09/25/2007US7273633 Sensors
09/25/2007US7273564 Method and apparatus for fabricating flat panel display
09/25/2007CA2336467C Method of making optical replicas by stamping in photoresist and replicas formed thereby
09/25/2007CA2150120C Lithographic printing plates with photoreactive polymeric binders
09/20/2007WO2007106489A1 Flexographic printing plate assembly
09/20/2007WO2007106241A2 Merging a mask and a printing plate
09/20/2007WO2007106168A2 Printing sleeve and method of manufacturing the same
09/20/2007WO2007105939A1 Lithography system and projection method
09/20/2007WO2007105799A1 Recording device, recording control signal generation device, transfer type manufacturing method, and transfer type and magnetic disks
09/20/2007WO2007105776A1 Composition for forming lower layer film and pattern forming method
09/20/2007WO2007105649A1 Curable composition, color filters, and liquid crystal displays
09/20/2007WO2007105644A1 Photosensitive-resin layered product
09/20/2007WO2007105549A1 Apparatus for and method of compactly storing and changing fixed dimension apertures used in a desired plane of optical system
09/20/2007WO2007105538A1 Composition for resist underlayer film, and resist underlayer film using the same
09/20/2007WO2007105406A1 Projection optical system, aligner and method for fabricating semiconductor device
09/20/2007WO2007105404A1 Photosensitive composition, optical recording medium and method for manufacturing same, optical recording method, and optical recording apparatus
09/20/2007WO2007105381A1 Photosensitive resin composition for photospacer, method for producing photospacer, substrate for liquid crystal display, liquid crystal display element, and liquid crystal display
09/20/2007WO2007105082A1 Base soluble polymers for photoresist compositions
09/20/2007WO2007104555A1 Method for producing defect-free light guiding elements of great widths, production device and diffractive light guiding element
09/20/2007WO2007079453A3 Bragg diffracting security markers
09/20/2007WO2007073498A3 Flame retardant photoimagable coverlay compositions
09/20/2007WO2007070486A8 Biosensors and methods for making and using them
09/20/2007WO2006078069A3 Ink jet recording head, producing method therefor and composition for ink jet recording head
09/20/2007US20070219664 Device Processing System, Information Display Method, Program, and Recording Medium
09/20/2007US20070218673 Manufacturing method of semiconductor device, reticle correcting method, and reticle pattern data correcting method
09/20/2007US20070218412 Rinse Solution For Lithography
09/20/2007US20070218410 Method for forming a material layer
09/20/2007US20070218409 Flexographic printing plate assembly
09/20/2007US20070218403 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
09/20/2007US20070218399 Resist Pattern Forming Method and Composite Rinse Agent
09/20/2007US20070218373 Low-defect microparticle pattern, dot array pattern, or hole array pattern with less processing steps (no rinsing of by-products) using a silane having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group; quantum dot laser; photonic crystal optical devices; single-electron devices
09/20/2007US20070218372 Method For Production Of Micro-Optics Structures
09/20/2007US20070218305 Photosensitive Resin Composition, Cured Product Thereof and Production Method of Printed Circuit Board Using the Same
09/20/2007US20070217800 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device
09/20/2007US20070216889 Exposure Apparatus, Exposure Method, and Method for Producing Device
09/20/2007US20070216888 Support Device for Positioning an Optical Element
09/20/2007US20070216887 Illumination System for a Microlithographic Projection Exposure Apparatus
09/20/2007US20070216886 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
09/20/2007US20070216885 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
09/20/2007US20070216767 Electron Beam Displacement Measuring Method, Electron Beam Displacement Measuring Device, and Electron Beam Recording Apparatus
09/20/2007US20070216751 Method and apparatus for imaging with multiple exposure heads
09/20/2007US20070216663 Method of producing a touch panel
09/20/2007DE112005000736T5 System und Verfahren zur Herstellung von Kontaktlöchern System and method for producing contact holes
09/20/2007DE10318105B4 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures
09/20/2007DE102006043357A1 Photoempfindliche, hitzehärtbare Harzzusammensetzung, mit einem mit Resistfilm überzogene, geglättete, gedruckte Schaltungsplatine und Verfahren zu ihrer Herstellung A photosensitive thermosetting resin composition, with a resist film coated, smoothed, and printed circuit board processes for their preparation
09/20/2007DE102006012034A1 Optical system e.g. lighting device, for use in microlithographic projection lighting system, has light-conductance-increasing unit with set of diffractive or refractive beam deflecting structures extending in common direction
09/20/2007DE102006011949A1 Verfahren zur Herstellung von defektfreien mikrooptischen Lichtlenkelementen grosser Breite A process for producing defect-free micro-optical light guiding elements large width
09/20/2007DE102006010337A1 Off-axis-Objektive mit drehbarem optischen Element Off-axis lenses with rotatable optical element
09/19/2007EP1835527A1 Projection optical system, exposure apparatus, exposure system, and exposure method
09/19/2007EP1835513A1 Electronic device and method for manufacturing same
09/19/2007EP1835349A1 Lithographic apparatus, control system and device manufacturing method
09/19/2007EP1835348A2 Lithographic apparatus and device manufacturing method
09/19/2007EP1835347A1 Image producing methods and image producing devices
09/19/2007EP1835346A1 Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
09/19/2007EP1835345A2 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device
09/19/2007EP1835344A1 Silicon-containing photosensitive composition, method for forming thin film pattern using same, protective film for electronic device, gate insulating film and thin film transistor
09/19/2007EP1835343A1 Positive resist composition and pattern formation method using the positive resist composition
09/19/2007EP1835342A2 Positive resist composition and pattern forming method using the same
09/19/2007EP1835341A1 Positive resist composition and pattern forming method using the same
09/19/2007EP1835340A1 Positive resist composition and pattern formation method using the positive resist composition
09/19/2007EP1835339A1 Fabrication process by LIGA type technology, of a monolayer or multilayer metallic structure, and structure obtained therewith
09/19/2007EP1834765A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate
09/19/2007EP1834214A2 Process for relief printing
09/19/2007EP1523695B1 Nozzle assembly for applying a liquid to a substrate
09/19/2007EP1360712B1 Post chemical-mechanical planarization (cmp) cleaning composition
09/19/2007EP0728034B8 Method of manufacturing a membrane
09/19/2007CN101040367A Shot shape measuring method, mask
09/19/2007CN101040222A Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements
09/19/2007CN101040221A Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent
09/19/2007CN101040220A Sulfur-atom-containing composition for forming of lithographic antireflection film
09/19/2007CN101038448A Substrate processing method
09/19/2007CN101038447A A conveyance apparatus and vacuum processing apparatus
09/19/2007CN101038446A Lithographic apparatus and device manufacturing method
09/19/2007CN101038445A Pattern forming method and gray-tone mask manufacturing method
09/19/2007CN101038444A System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method
09/19/2007CN101038443A Lithographic apparatus, control system and device manufacturing method
09/19/2007CN101038442A Lithographic apparatus and device manufacturing method
09/19/2007CN101038441A Projection process
09/19/2007CN101038440A Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
09/19/2007CN101038439A Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device
09/19/2007CN101038438A Black photosensitive composition
09/19/2007CN101038437A Black photosensitive composition, shielding film and el device manufactured by the black photosensitive composition
09/19/2007CN101038436A Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
09/19/2007CN101038435A Wafer lithography mask, its manufacturing method and wafer photolithography method
09/19/2007CN101038390A Device for transfer of flat display panel
09/19/2007CN101037422A Phenothiazine double-photon photoacid initiator and preparation method thereof
09/19/2007CN100338740C Resist removing apparatus and method of removing resist
09/19/2007CN100338731C Processing method and method for making semiconductor device
09/19/2007CN100338719C Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector