Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/24/2014US8759797 Drawing apparatus, drawing method, and method of manufacturing article
06/24/2014US8759741 Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element
06/24/2014US8758987 Methods of forming a reversed pattern in a substrate
06/24/2014US8758986 Printed wiring board and method for producing the same
06/24/2014US8758985 Method of fabricating nanostructure array and device including nanostructure array
06/24/2014US8758983 Method of patterning an electronic of photonic material
06/24/2014US8758982 Laser processing enabling radio frequency identification (RFID) customization
06/24/2014US8758981 Photoresist underlayer composition and method of manufacturing semiconductor device by using the same
06/24/2014US8758979 Photoresist composition
06/24/2014US8758978 Radiation-sensitive resin composition, resist pattern formation method, and polymer
06/24/2014US8758977 Negative-type photosensitive resin composition, pattern forming method and electronic parts
06/24/2014US8758976 Positive photosensitive polyimide composition
06/24/2014US8758975 Lithographic printing plate precursor and method of preparing lithographic printing plate
06/24/2014US8758974 Photoresist-free micropatterning on polymer surfaces
06/24/2014US8758966 Photosensitive resin composition for color filter and color filter prepared using the same
06/24/2014US8758963 Holographic reticle and patterning method
06/24/2014US8758864 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
06/24/2014US8758654 Photosensitive resin composition for color filter and color filter using the same
06/24/2014US8757089 Coating and developing apparatus, coating and developing method, and storage medium
06/19/2014WO2014092270A1 Photocurable composition and device including barrier layer formed from composition
06/19/2014WO2014092267A1 Photocurable composition, barrier layer comprising same, and encapsulated apparatus comprising same
06/19/2014WO2014092258A1 Photosensitive resin composition for color filter and color filter using same
06/19/2014WO2014092155A1 Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin
06/19/2014WO2014092149A1 Composition for forming overlay film, and resist pattern formation method using same
06/19/2014WO2014091997A1 Photosensitive resin composition and photosensitive film using same
06/19/2014WO2014091818A1 Copolymer and photosensitive resin composition and resin film containing said copolymer
06/19/2014WO2014090661A1 Method for microcontact printing
06/19/2014WO2014090635A1 Optical system of a microlithographic projection exposure apparatus
06/19/2014WO2014090480A1 Power source for a lithographic apparatus, and lithographic apparatus comprising such a power source
06/19/2014WO2014090115A1 Negative stiffness system for gravity compensation of micropositioner
06/19/2014WO2014090113A1 Silicon wafer platform with anti-collision function
06/19/2014WO2014090039A1 Hash fast marching method for simulation of surface evolution in photoresist etching process
06/19/2014WO2014089908A1 Cleaning solution for removing photoresist
06/19/2014WO2014089895A1 Method and clamp for gluing detection board assembly
06/19/2014US20140171584 Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions
06/19/2014US20140170566 Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
06/19/2014US20140170565 Pattern forming method and method for manufacturing template for imprint
06/19/2014US20140170564 Actinic ray-sensitive or radiation-sensitive resing composition, actinic ray-sensitive or radiation-sensitive film using the composition, and pattern forming method
06/19/2014US20140170563 Positive resist composition and patterning process using same
06/19/2014US20140170561 Vinyl ether group-containing copolymer, preparation process and use thereof
06/19/2014US20140170560 Negative resist composition and patterning process using the same
06/19/2014US20140170539 Determination of lithography tool process condition
06/19/2014US20140170332 Film forming method, non-transitory computer storage medium and film forming apparatus
06/19/2014US20140170310 Colloidal lithography methods for fabricating microscopic and nanoscopic particle patterns on substrate surfaces
06/19/2014US20140170307 Method for cleaning imprinting mask
06/19/2014US20140168805 Method for manufacturing a color filter, color filter and solid-state imaging device
06/19/2014US20140168627 Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product
06/19/2014US20140168626 Lithography system and lithography method
06/19/2014US20140168624 Exposure apparatus, method of controlling the same, and alignment method for exposure
06/19/2014US20140168623 Exposure apparatus, exposure method, and method of manufacturing device
06/19/2014US20140168620 Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
06/18/2014EP2743770A1 Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
06/18/2014EP2743769A1 Resist composition, resist pattern formation method, polyphenol compound used therein, and alcohol compound capable of being derived therefrom
06/18/2014EP2743286A1 Resin composition for resists
06/18/2014EP2743249A1 Cyclic compound, method for producing same, composition, and method for forming resist pattern
06/18/2014EP2742387A1 Radiation source and lithographic apparatus
06/18/2014EP2742386A1 Laminated flexographic printing sleeves and methods of making the same
06/18/2014EP2742385A2 Developable bottom antireflective coating compositions for negative resists
06/18/2014EP2742016A1 Method for connecting components and composite structure
06/18/2014DE102013225790A1 Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage Illumination system of a microlithography projection exposure apparatus
06/18/2014DE102013208446A1 Optical component for guiding radiation beam for facet mirror for illumination system of projection exposure apparatus, has application specific integrated circuits arranged offset to one another in direction of surface normal
06/18/2014DE102012223233A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus
06/18/2014DE102009059165B4 Verfahren zum Herstellen einer Ausrichtungsschicht für eine Flüssigkristallanzeige A method for producing an alignment layer for a liquid crystal display
06/18/2014CN203658729U 一种应用于柔性版生产线上的曝光装置 Applied to the exposure device flexo production line
06/18/2014CN203658728U 一种砂刻菲林 One kind of sand carved Film
06/18/2014CN203658727U 一种具有快速对准功能的新型纳米压印设备 New nano-imprinting device having a quick alignment function
06/18/2014CN103874962A Optical recording head and image formation device
06/18/2014CN103874961A Positive photosensitive resin composition, method for producing cured product, method for producing resin pattern, cured product, and optical member
06/18/2014CN103874322A Metal wire layout structure on insulation layer and preparation method thereof
06/18/2014CN103872876A Linear motor and platform device
06/18/2014CN103872019A Photoetching mark applied to epitaxial process and manufacturing method for photoetching mark
06/18/2014CN103871869A Non-photosensitive polyimide passivation layer manufacturing method
06/18/2014CN103871846A Self-alignment multiple patterning method and application of silicon-based hard mask composition
06/18/2014CN103869638A Photoetching alignment method implemented by penetrating through wafer
06/18/2014CN103869637A Technique method of preparing slope-edged metal film by using photoresist stripping
06/18/2014CN103869636A Photoresist remover
06/18/2014CN103869635A Cleaning liquid for removing photoresist
06/18/2014CN103869634A Focusing limit adjusting method
06/18/2014CN103869633A Extreme ultraviolet lithography light source collection and illumination system
06/18/2014CN103869632A Lighting model generating device for high-numerical-aperture projection lithography system
06/18/2014CN103869631A Exposure apparatus, controlling method for the same, and alignment method for exposure
06/18/2014CN103869630A Pre-alignment debug method
06/18/2014CN103869629A Photoetching system and photoetching method
06/18/2014CN103869628A Self-reference interference alignment signal processing system for photoetching equipment
06/18/2014CN103869627A Focusing and leveling method used for projection photoetching machine
06/18/2014CN103869626A Ultrahigh numerical aperture lithography imaging polarization compensation apparatus and method thereof
06/18/2014CN103869625A Polarization lighting device and polarization illumination method
06/18/2014CN103869624A Photoresist nozzle, and method for determining photoresist spraying center by utilizing it
06/18/2014CN103869623A Coating composition
06/18/2014CN103869622A Photosensitive composition for display device, black matrix having the composition, and method of forming black matrix using composition
06/18/2014CN103869621A Photosensitive Resin Composition for Color Filter, and Color Filter Using Same
06/18/2014CN103869620A Alkali-developable photocurable resin composition, dried film and cured product of composition, and printed wiring board comprising dried film or cured product
06/18/2014CN103869619A Photosensitive Resin Composition and Black Spacer Using the Same
06/18/2014CN103869618A Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
06/18/2014CN103869617A Active radiation hardenable resin composition, and spacer and/or color filter protective layer for display element using the same
06/18/2014CN103869616A Active energy ray curable resin composition and spacer for display device using the same and/or color filter protective layer
06/18/2014CN103869615A Photocurable composition, solder resist layer and printed circuit board
06/18/2014CN103869614A Photosensitive resin composition,photosensitive element, photosenitive element coil and photoresistance pattern forming method
06/18/2014CN103869613A Colored hardening composite, pattern hardeninig colored layer using same, colored filter and liquid crystal display device
06/18/2014CN103869612A Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
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