| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/02/2007 | US7276317 Polycrystalline silicon thin film having uniform crystallization characteristics |
| 10/02/2007 | US7276097 Load-lock system, exposure processing system, and device manufacturing method |
| 10/02/2007 | US7275925 Apparatus for stereolithographic processing of components and assemblies |
| 10/02/2007 | US7275627 Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus |
| 09/27/2007 | WO2007108482A1 Photosensitive original printing plate for letterpress printing, composition for forming ink-receiving layer used therefor, and method for producing letterpress printing plate |
| 09/27/2007 | WO2007108420A1 Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 09/27/2007 | WO2007108415A1 Exposure apparatus and device manufacturing method |
| 09/27/2007 | WO2007108414A1 Exposure apparatus and device production method |
| 09/27/2007 | WO2007108367A1 Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof |
| 09/27/2007 | WO2007108291A1 Photosensitive composition, and material for formation of light-shield film for display device or photosensitive transfer material using the composition |
| 09/27/2007 | WO2007108253A1 Positive resist composition for formation of thick resist film, thick resist laminate, and method for formation of resist pattern |
| 09/27/2007 | WO2007108223A1 Method for forming thick resist film and method for forming resist pattern |
| 09/27/2007 | WO2007108186A1 Cleaning treatment liquid |
| 09/27/2007 | WO2007108172A1 Photosensitive composition, photosensitive film, photosensitive layered product, method of forming permanent pattern, and printed wiring board |
| 09/27/2007 | WO2007108171A1 Photosensitive composition, photosensitive film, photosensitive layered product, method of forming permanent pattern, and printed wiring board |
| 09/27/2007 | WO2007107783A1 Spectral filter repair |
| 09/27/2007 | WO2007107030A1 Internal-drum imagesetter |
| 09/27/2007 | WO2007063136A3 Optical element comprising a double-refractive coating |
| 09/27/2007 | WO2006057423A3 Photosensitive resin composition and photosensitive dry film by the use thereof |
| 09/27/2007 | US20070226677 Performance in model-based opc engine utilizing efficient polygon pinning method |
| 09/27/2007 | US20070226676 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method |
| 09/27/2007 | US20070225395 Thermally stable cationic photocurable compositions |
| 09/27/2007 | US20070224629 Laser exposure of photosensitive masks for dna microarray fabrication |
| 09/27/2007 | US20070224550 Photosensitive composition and method for forming pattern using same |
| 09/27/2007 | US20070224549 Forming a photosensitive layer on a substrate, selectively irradiating the photosensitive layer with at least one of an ultraviolet ray and an ionizing radiation; heat treatment; developing the photosensitive layer to remove irradiated area |
| 09/27/2007 | US20070224547 Method of processing substrate |
| 09/27/2007 | US20070224546 Method of forming resist pattern and method of maufacturing semiconductor device |
| 09/27/2007 | US20070224545 Method for immersion lithography |
| 09/27/2007 | US20070224544 exposing subareas of a surface of the lithographic printing form covered by amphiphilc molecules to electromagnetic radiation, treating the subareas with at least one complex-forming substance e.g. oligosacchrides polysacchrides, citric acid, ammonia |
| 09/27/2007 | US20070224543 Photopolymer Printing Plate Precursor |
| 09/27/2007 | US20070224538 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same |
| 09/27/2007 | US20070224535 subjecting a planographic printing plate precursor to exposure using laser light in a wavelength range of 250 nm to 420 nm with a one-pixel drawing time of one millisecond or less; high sensitivity, white light safety, high image quality |
| 09/27/2007 | US20070224534 Method for Forming Thick Film Pattern, Method for Manufacturing Electronic Component, and Photolithography Photosensitive Paste |
| 09/27/2007 | US20070224520 for patterning semiconductor integrated circuit by lithography; resolution |
| 09/27/2007 | US20070223116 Holding and positioning apparatus for an optical element |
| 09/27/2007 | US20070222979 Method to Determine the Value of Process Parameters BAsed on Scatterometry Data |
| 09/27/2007 | US20070222967 Apparatus and Method for Providing Fluid for Immersion Lithography |
| 09/27/2007 | US20070222966 Supporting plate, stage device, exposure apparatus, and exposure method |
| 09/27/2007 | US20070222958 Exposure apparatus, exposure method, and method for producing device |
| 09/27/2007 | US20070222956 Contamination barrier with expandable lamellas |
| 09/27/2007 | DE112005002469T5 Festphasenimmersionslinsenlithographie Solid phase immersion lens lithography |
| 09/27/2007 | DE102006013459A1 Photo-mask`s structural unit transmitting arrangement for integrated circuit, has optical unit causing local variation of transmission rate of radiations depending on angle of incidence of radiations with respect to surface of optical unit |
| 09/27/2007 | DE102006011098A1 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage Projection objective of a microlithography projection exposure apparatus |
| 09/27/2007 | DE102004008500B4 Verfahren zum Ermitteln einer Strahlungsleistung und eine Belichtungsvorrichtung A method of determining a radiation power and an exposure device |
| 09/27/2007 | CA2644916A1 Internal drum image setter |
| 09/26/2007 | EP1837902A2 Use of organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 09/26/2007 | EP1837897A1 Laser plasma euv light source, target member, production method for target member, target supplying method, and euv exposure system |
| 09/26/2007 | EP1837895A1 Optical integrator, illumination optical device, photolithograph, photolithography, and method for fabricating device |
| 09/26/2007 | EP1837706A1 Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
| 09/26/2007 | EP1837705A2 Lithographic apparatus and device manufacturing method |
| 09/26/2007 | EP1837704A2 Resist composition and pattern forming method using the same |
| 09/26/2007 | EP1837695A1 Catadioptric imaging system with beam splitter |
| 09/26/2007 | EP1836535A1 Non-aqueous, non-corrosive microelectronic cleaning compositions |
| 09/26/2007 | EP1658313B1 Photopatterning conductive electrode layers with electrically-conductive polymer |
| 09/26/2007 | EP1444549A4 Method of patterning electrically conductive polymers |
| 09/26/2007 | CN101044602A Using ozone to process wafer like objects |
| 09/26/2007 | CN101044594A Substrate processing method, exposure apparatus, and method for producing device |
| 09/26/2007 | CN101044593A Exposure apparatus, exposure method, and device producing method |
| 09/26/2007 | CN101044435A Photosensitive composition removing liquid |
| 09/26/2007 | CN101044434A Photosensitive resin composition and photosensitive dry film by the use thereof |
| 09/26/2007 | CN101044433A Photosensitive composition, image-forming base material, image-forming material, and image-forming method |
| 09/26/2007 | CN101044432A Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device |
| 09/26/2007 | CN101044185A Photosensitive compositions based on polycyclic polymers |
| 09/26/2007 | CN101043953A Roller micro-contact printer with pressure control |
| 09/26/2007 | CN101042987A Method of processing substrate |
| 09/26/2007 | CN101042543A Chemical rinse composition for removing resist stripper |
| 09/26/2007 | CN101042542A Displacement measurement systems lithographic apparatus and device manufacturing method |
| 09/26/2007 | CN101042541A Lithographic apparatus and device manufacturing method |
| 09/26/2007 | CN101042540A 衬底处理系统和衬底处理方法 A substrate processing system and a substrate processing method |
| 09/26/2007 | CN101042539A Hanger bearing image-forming system and light scribing device |
| 09/26/2007 | CN101042538A Method for changing dimension of photo mask pattern |
| 09/26/2007 | CN101042537A Detecting method for position of photomask graphics |
| 09/26/2007 | CN101042536A Method for reducing critical dimension of photoresist contact hole pattern |
| 09/26/2007 | CN101042535A Liquid coating apparatus and method thereof |
| 09/26/2007 | CN101042534A Compositions and processes for photolithography |
| 09/26/2007 | CN101042533A Organosilane hardmask compositions and methods of producing semiconductor devices using the same |
| 09/26/2007 | CN101042532A Radiation sensitive composition for forming a colored layer and color filter |
| 09/26/2007 | CN101042531A Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
| 09/26/2007 | CN101042530A Method for imaging a lithographic printing form |
| 09/26/2007 | CN101042529A 光刻胶再生方法及其系统 Photoresist regeneration method and system |
| 09/26/2007 | CN101042528A Pattern dividing method for correcting optical near-field effect |
| 09/26/2007 | CN101042527A Compensation process for critical dimension homogeneity |
| 09/26/2007 | CN101042526A Mask data correction method, photomask and optical image prediction method |
| 09/26/2007 | CN101042502A Liquid crystal display and mfg. method therefor |
| 09/26/2007 | CN101041794A Cleaning fluid composition and usage thereof |
| 09/26/2007 | CN101041282A Film peeling device |
| 09/26/2007 | CN100339967C Ion irradiating device |
| 09/26/2007 | CN100339950C Planar stage device |
| 09/26/2007 | CN100339940C Film electric crystal array substrate and its micro-shadow mfg. method, and light shade designing method |
| 09/26/2007 | CN100339768C Method and apparatus for pyroelectric lithography using patterned emitter |
| 09/26/2007 | CN100339767C Resist compositions |
| 09/26/2007 | CN100339766C Preparations of carbon nano tube layout film or composite material from polymerisable semgental surface modified carbon nano tubes |
| 09/26/2007 | CN100339754C Fabrication method for reflecting electrode applied in reflective panel display and photo mask |
| 09/26/2007 | CN100339752C Transferring plate for forming orientation film |
| 09/26/2007 | CN100339738C Micro electromechanical actuator having a plurality of face comb electrodes and method for manufacturing the same |
| 09/26/2007 | CN100339407C Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 09/26/2007 | CN100339406C Top arc polymers, method of preparation thereof and top arc compositions |
| 09/26/2007 | CN100339213C Antireflective silicon-containing compositions as hardmask layer |
| 09/25/2007 | US7274814 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 09/25/2007 | US7274471 Systems and methods for measuring distance of semiconductor patterns |