Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/03/2007EP1840659A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof
10/03/2007EP1840658A1 Measurement method
10/03/2007EP1840657A1 Support structure for temporarily supporting a substrate
10/03/2007EP1840656A1 Polymerizable negative planographic printing plate precursor, stack of planographic printing plate precursors, and method of producing polymerizable negative planographic printing plate precursor
10/03/2007EP1840655A1 Material for forming resist protection films and method for resist pattern formation with the same
10/03/2007EP1840654A1 Radiation-sensitive negative resin composition
10/03/2007EP1840653A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor
10/03/2007EP1840652A1 Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics
10/03/2007EP1840651A1 Positive resist composition and pattern formation method using the same
10/03/2007EP1840650A1 Positive type radiation-sensitive resin composition
10/03/2007EP1840649A2 Device for holding an imprint lithography template
10/03/2007EP1840648A1 A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate
10/03/2007EP1840146A1 Polyurethane polymer having bisphenol group and photoimageable composition containing the same
10/03/2007EP1839093A1 Method for producing a component comprising nanometric multilayers for optical uses and component produced according to said method
10/03/2007EP1839092A2 Projection optical system
10/03/2007EP1839091A1 Support structure and lithographic apparatus
10/03/2007EP1839090A1 Composite composition for micropatterned layers having high relaxation ability, high chemical resistance and mechanical stability
10/03/2007EP1839089A1 Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space
10/03/2007EP1839088A1 Imprint reference template for multilayer or multipattern registration and method therefor
10/03/2007EP1839037A2 Single wavelength stimulated emission depletion microscopy
10/03/2007EP1838424A2 Method and composition providing desirable characteristics between a mold and a polymerizable composition
10/03/2007EP1614002A4 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof
10/03/2007EP1482361B1 Acid-degradable resin compositions containing ketene-aldehyde copolymer
10/03/2007EP1451619A4 Structures and methods for reducing aberration in optical systems
10/03/2007EP1423758B1 A zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system
10/03/2007EP1279070B1 Apparatus for providing a purged optical path in a projection photolithography system and a corresponding method
10/03/2007CN200956088Y Pressure sensitive developing paper sticker
10/03/2007CN101048854A Exposure apparatus and device producing method
10/03/2007CN101048705A Lower layer film-forming composition for lithography containing cyclodextrin compound
10/03/2007CN101048704A 抗蚀剂组合物 The resist composition
10/03/2007CN101048703A Positive photosensitive insulating resin composition and cured product of the same
10/03/2007CN101048702A Edge cure prevention composition and process for using the same
10/03/2007CN101048692A Imaging or insulation device, particularly for the creation of an electronic micro-circuit
10/03/2007CN101048442A Poly(imide/azomethine) copolymer, poly(amic acid/azomethine) copolymer and positive type photosensitive resin compositions
10/03/2007CN101048377A Oxime ester compound and photopolymerization initiator comprising the compound
10/03/2007CN101048373A Thiol compound and photosensitive composition using the same
10/03/2007CN101048372A Thiol compound, and photosensitive composition and black matrix resist composition using the compound
10/03/2007CN101048281A Solvent resistant imageable element
10/03/2007CN101047141A Level adjustment systems and adjustable pin chuck thereof
10/03/2007CN101047121A Reflow method, pattern generating method, and fabrication method for tft element for LCD
10/03/2007CN101047110A Substrate processing apparatus and substrate processing method
10/03/2007CN101047087A Film photoetching manufacturing method of plasma display plate electrode and its product
10/03/2007CN101046968A Magnetic head with micro-veins and manufacturing method thereof
10/03/2007CN101046641A Cleaning agent or flushing agent for photolithography
10/03/2007CN101046640A Lithographic apparatus and device manufacturing method
10/03/2007CN101046639A Measurement method and apparatus, exposure apparatus and method, adjusting method and device manufactureing method
10/03/2007CN101046638A Substrate processing device and substrate processing method
10/03/2007CN101046637A Assembly, a conditioning system, a lithographic apparatus and methods
10/03/2007CN101046636A Method of determining semiconductor technological condition
10/03/2007CN101046635A Control method and operation system for wet photoetching process
10/03/2007CN101046634A Method for etching quartz on photomask plasma
10/03/2007CN101046633A Planographic printing plate precursor
10/03/2007CN101046632A Planographic printing plate precursor
10/03/2007CN101046631A Use of cyclic piperonyl compound and its derivative as ultraviolet ray initiator
10/03/2007CN101046630A Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element
10/03/2007CN101046629A Solidifying resin composition and condensate thereof
10/03/2007CN101046628A Flexible mold and producing method of flexible mold for flat display pannel
10/03/2007CN101046627A Process of making color filter substrate
10/03/2007CN101046626A Method for etching molybdenum when manufacturing photomask
10/03/2007CN101046625A Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
10/03/2007CN101046624A Pattern defect detection device, pattern defect detection method and manufacturing method for photomask
10/03/2007CN101045839A Liquid photosensitive ink and applied in printing circuit board
10/03/2007CN101045787A Carbamate polymer with bisphenol group and optical image composite containing it
10/03/2007CN101045371A Digital platemaking control strip
10/03/2007CN101045370A Print control strip
10/03/2007CN101045369A Digital print control stirp
10/03/2007CN100341136C Semiconductor device and forming method for interconnecting structure and copper wiring processing method
10/03/2007CN100341113C 涂布方法和涂布装置 The coating method and coating apparatus
10/03/2007CN100341106C Method and device for aligning a charged particle beam column
10/03/2007CN100340925C Erosion resistant pattern forming method, micro-pattern forming method using the same
10/03/2007CN100340924C Optical projection system, exposure device and method
10/03/2007CN100340923C Pattern generation system using spatial light modulator
10/03/2007CN100340922C Impression mask photoetching
10/03/2007CN100340921C Photosensitive composition of infrared sensitive
10/03/2007CN100340920C Offset press and component manufacturing method
10/03/2007CN100340916C Liquid crystal display and its manufacturing method
10/03/2007CN100340875C 800 nano waveband quartz transmission-polarizing beam-splitting grating
10/03/2007CN100340547C New unsaturated oxime derivatives and the use thereof as latent acids
10/03/2007CN100340419C Mounting and preparing gemstone or industrial diamond for formation of mark on surface thereof
10/03/2007CN100340418C Lithographic plate packaging structure and method
10/03/2007CN100340417C Nano marking press
10/02/2007US7278125 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method
10/02/2007US7277466 High power gas discharge laser with helium purged line narrowing unit
10/02/2007US7277231 Projection objective of a microlithographic exposure apparatus
10/02/2007US7277220 Ultraviolet laser apparatus and exposure apparatus using same
10/02/2007US7277185 Method of measuring overlay
10/02/2007US7277182 Apparatus for polarization-specific examination, optical imaging system, and calibration method
10/02/2007US7277165 Method of characterizing flare
10/02/2007US7277155 Exposure apparatus and method
10/02/2007US7276714 Advanced pattern definition for particle-beam processing
10/02/2007US7276575 Synthesizing a crude resin, washing using a washing solvent by filtering off
10/02/2007US7276548 Colorant-containing curable composition, color filter using the composition, and method for manufacturing the same
10/02/2007US7276541 Use of hydroxyl-functional polyalkylorganosiloxanes as solvents for cationic photoinitiators for use in radiation- curable silicones
10/02/2007US7276449 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/02/2007US7276445 Method for forming pattern using printing method
10/02/2007US7276328 Providing radiation having a cross-section shape that is asymmetric;reflecting the asymmetric radiation off a reflective reticle; directing the asymmetric radiation to the resist
10/02/2007US7276327 Silicon-containing compositions for spin-on arc/hardmask materials
10/02/2007US7276325 Using photosensitive copper conductive mixture of copper powder in binder; controlling particle sizes
10/02/2007US7276324 Nitrogen-containing organic compound, resist composition and patterning process
10/02/2007US7276323 Photoresists, polymers and processes for microlithography
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