Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/10/2007CN101051191A Display device production system
10/10/2007CN101051190A Photoresist stripping apparatus, method of recycling photoresist stripper
10/10/2007CN101051189A Lithographic processing cell and device manufacturing method
10/10/2007CN101051188A Lithographic apparatus and device manufacturing method
10/10/2007CN101051187A Wafer mint-mark method
10/10/2007CN101051186A 负型感光性树脂组合物 The negative photosensitive resin composition
10/10/2007CN101051185A Light etching positioning self assembling filling method
10/10/2007CN101051184A Large area micro nano structure soft impression method
10/10/2007CN101051183A Pattern forming method and mold
10/10/2007CN101051182A Imprint lithography alignment
10/10/2007CN100342491C Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
10/10/2007CN100342490C Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device
10/10/2007CN100342489C Evaluation metod of process residual, setting method and program of determination condition
10/10/2007CN100342284C Mask supporting apparatus using vacuum and light exposing system, and method using the same
10/10/2007CN100342283C Process for producing an image using a first minimum bottom antireflective coating composition
10/10/2007CN100342282C Chemical enlarging positive corrosion resist composition
10/10/2007CN100342279C Substrate for a liquid crystal display device and fabricating method thereof
10/10/2007CN100342261C 曝光装置 Exposure device
10/10/2007CN100341992C Semiconductor process residue removal composition and process
10/10/2007CN100341712C Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
10/09/2007US7280230 Parametric profiling using optical spectroscopic systems
10/09/2007US7280228 System and method of measurement, system and method of alignment, lithographic apparatus and method
10/09/2007US7280225 Stage apparatus and control method including first and second measurement systems for measuring a stage position and a switching unit for switching between the measurement systems
10/09/2007US7280224 Interferometry systems and methods of using interferometry systems
10/09/2007US7280223 Interferometry systems and methods of using interferometry systems
10/09/2007US7280212 Apparatus and methods for detecting overlay errors using scatterometry
10/09/2007US7280185 Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device
10/09/2007US7280184 Assembly and adjusting method of optical system, exposure apparatus having the optical system
10/09/2007US7280183 Image forming device
10/09/2007US7280182 Lithographic apparatus, device manufacturing method and computer program
10/09/2007US7280132 Method and device for imaging a printing form
10/09/2007US7280129 Pixel position specifying method, method of correcting image offset, and image forming device
10/09/2007US7279693 Source multiplexing in lithography
10/09/2007US7279539 Alkali-soluble polymer and polymerizable composition thereof
10/09/2007US7279270 formed by applying a film material by an ink-jet method; protrusion section functions as a barrier against the film material flowing, in the gap region; prevents color mixing and uneven color density while maintaining high productivity
10/09/2007US7279269 Dividing a giant magnetic resistor semiconductor (GMR) stack into upper and lower parts; Alignment between the two pedestals is exact because a self-aligning is used; size of the lower pedestal is controlled with the upper pedestal precisely aligned to be centrally located
10/09/2007US7279268 Conductive lithographic polymer and method of making devices using same
10/09/2007US7279267 Exposing through photomasks then developing (via ablation, vaporization) to affect thickness; photoresists
10/09/2007US7279266 Photosensitive composition and lithographic printing plate precursor using the same
10/09/2007US7279265 an acrylic ester copolymer, terpolymer or tetrapolymer with pendant adamantyl or methanobenzofuranone groups, an acid generator, a solvent chosen from a propylene glycol monoalkyl ether carboxylate, an alkyl lactate and a linear or cyclic ketone; noncracking, dry etch resistance
10/09/2007US7279264 fluorescein dyes that exhibit a first color when in the crystal structured form and a second color when in the liquid, amorphous form, for use in thermal printing
10/09/2007US7279263 Dual-wavelength positive-working radiation-sensitive elements
10/09/2007US7279258 Method and arrangement for controlling focus parameters of an exposure tool
10/09/2007US7279257 Pattern forming method, method of manufacturing thin film transistor substrate, method of manufacturing liquid crystal display and exposure mask
10/09/2007US7279256 Less sensitive to change in the amount of energy due to its higher active energy than that of a conventional photoresist polymer
10/09/2007US7279255 Shelf life, do not require the presence of a coated oxygen impermeable overcoat, avoids the use of a preheat step before development without any loss in imaging properties
10/09/2007US7279254 Imageable film that contains at least a mask substrate and an imageable material is imagewise exposed to imaging radiation to form an imaged film; imaged film is transferred to an imageable article, such as a flexographic printing plate precursor; exposure to curing radiation, removing, developing
10/09/2007US7279200 Process for producing coatings using surface-active photoinitiators
10/09/2007US7279195 Addition polymerization of a polymer having a crosslinkable side chain on a support, graft polymerization with another monomer that can contain a metal ion or salt, and reducing the metal ion or salt to form a fine metal particle; for electric wiring, electromagnetic wave-blocking films, magnetic films
10/09/2007US7278817 Method for transferring and loading a reticle
10/09/2007US7278709 Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same
10/09/2007US7278299 Method of processing vertical cross-section using atomic force microscope
10/04/2007WO2007111504A1 Contamination barrier and lithographic apparatus comprising same
10/04/2007WO2007111469A1 Method of forming nanopattern and substrate having pattern formed using the method
10/04/2007WO2007111356A1 Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display
10/04/2007WO2007111336A1 Photocurable/thermosetting resin composition, cured product thereof and printed wiring board obtained by using same
10/04/2007WO2007111308A1 Inner drum exposure system
10/04/2007WO2007111307A1 Inner drum exposure system
10/04/2007WO2007111261A1 Electron-beam recording device, and beam adjusting method
10/04/2007WO2007111216A1 Curable composition and cured product thereof
10/04/2007WO2007111174A1 Plotting state adjusting method and device
10/04/2007WO2007111173A1 Plotting state adjusting method and device
10/04/2007WO2007111146A1 Lighting optical system, exposure system, and device production method
10/04/2007WO2007111104A1 Projection optical system, exposure apparatus and device manufacturing method
10/04/2007WO2007111003A1 Photosensitive composition, photosensitive film, method of forming permanent pattern, and printed wiring board
10/04/2007WO2007111000A1 Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board
10/04/2007WO2007110719A2 Improved alkaline solutions for post cmp cleaning processes
10/04/2007WO2007110387A1 Photo-curable resins and resin compositions with very high refractive indices for application in plasic optics
10/04/2007WO2007087399B1 Epoxy formulations for use in lithography techniques
10/04/2007WO2007085290A3 Method and device for the correction of imaging defects
10/04/2007WO2007080616A3 Preheating oven for the preparation of printing plates
10/04/2007WO2007079206A3 Fabrication of semiconductor device for flash memory with increased select gate width
10/04/2007US20070232713 Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same
10/04/2007US20070232513 Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning
10/04/2007US20070231752 Method for Shrinking Opening Sizes of a Photoresist Pattern
10/04/2007US20070231751 Photoresist top coat out-of-band illumination filter for photolithography
10/04/2007US20070231750 Method of forming damascene structure
10/04/2007US20070231749 Method for forming a semiconductor device
10/04/2007US20070231748 Patterning trenches in a photoresist layer with tight end-to-end separation
10/04/2007US20070231746 Treating carbon containing layers in patterning stacks
10/04/2007US20070231745 Method for preparation of lithographic printing plate and lithographic printing plate precursor
10/04/2007US20070231708 monomer of acrylate ester copolymer has a function of an acid generator, attached with a sulfonium or iodonium salt acid generator, and generate acid sulfonate ions on exposure; improve line edge roughness, high resolution; production of semiconductor elements and liquid crystal display
10/04/2007US20070230861 Laser Inscribed Structures
10/04/2007US20070230768 Method and apparatus for inspecting a substrate
10/04/2007US20070229927 Method of recording an exposure pattern in a recording layer of a holographic mask, method of forming an exposure pattern in a photosensitive material film, method of manufacturing a semiconductor device and method of manufacturing an electro-optic device
10/04/2007US20070229795 Immersion Lithography Fluids
10/04/2007US20070229791 Step Measuring Device and Apparatus, and Exposure Method and Apparatus
10/04/2007US20070229790 Arrangement for the transfer of structural elements of a photomask onto a substrate and method therefor
10/04/2007US20070229784 Immersion exposure technique
10/04/2007US20070229783 Immersion exposure technique
10/04/2007US20070229337 Charged particle beam apparatus, abnormality detecting method for da converter unit, charged particle beam writing method, and mask
10/04/2007US20070228844 Alignment apparatus and exposure apparatus using the same
10/04/2007US20070228290 Contamination barrier and lithographic apparatus comprising same
10/04/2007US20070227566 Substrate processing apparatus and substrate processing method
10/04/2007US20070227383 Soft Lithographic Stamp with a Chemically Patterned Surface
10/04/2007DE19963587B4 Projektions-Belichtungsanlage Projection exposure apparatus
10/03/2007EP1840945A1 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method
10/03/2007EP1840944A1 Exposure method and apparatus, and electronic device manufacturing method
10/03/2007EP1840943A1 Mobile body system, exposure apparatus, and method of producing device
10/03/2007EP1840940A1 Apparatus and process for coating micro or nanostructured substrates
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