Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/16/2007US7283660 Multi-layer printed circuit board fabrication system and method
10/16/2007US7283575 Narrow band electric discharge gas laser having improved beam direction stability
10/16/2007US7283252 Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method
10/16/2007US7283237 Overlay targets with isolated, critical-dimension features and apparatus to measure overlay
10/16/2007US7283208 Lithographic apparatus, method of manufacturing a device, and device manufactured thereby
10/16/2007US7283207 Exposure apparatus
10/16/2007US7283204 Method of producing an optical imaging system
10/16/2007US7283203 Roll printer with decomposed raster scan and X-Y distortion correction
10/16/2007US7283202 In-situ interferometer arrangement
10/16/2007US7283200 System and method for measuring displacement of a stage
10/16/2007US7283195 Method of fabricating color filter substrate for liquid crystal display device having patterned spacers
10/16/2007US7282821 Linear motor, stage apparatus, exposure apparatus, and device manufacturing apparatus
10/16/2007US7282820 Stage device and exposure apparatus
10/16/2007US7282725 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask
10/16/2007US7282549 Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions
10/16/2007US7282422 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same
10/16/2007US7282324 Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
10/16/2007US7282323 Highly heat-resistant, negative-type photosensitive resin composition
10/16/2007US7282322 Sensitivity, no inhibition time, and low shrinkage; long-term storage and archival life stabilities under high temperature and humidity conditions; holographic optical data storage, optical lenses, beam steerers, and waveguides
10/16/2007US7282321 Lithographic printing method and presensitized plate
10/16/2007US7282319 Photoresist composition and method of forming a pattern using same
10/16/2007US7282318 Photoresist composition for EUV and method for forming photoresist pattern using the same
10/16/2007US7282317 Dye complexes and use thereof in imaging members and methods
10/16/2007US7282316 Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
10/16/2007US7282256 Photosensitive resin laminate for sign boards
10/16/2007US7282240 Elastomeric mask and use in fabrication of devices
10/16/2007US7281921 Scatterometry alignment for imprint lithography
10/16/2007US7281871 Image forming apparatus and image forming method
10/16/2007US7281779 Apparatus and method for measuring the length change of the feed spindle in an exposer for printing originals
10/11/2007WO2007114695A1 Rotatable contamination barrier and lithographic apparatus comprising same
10/11/2007WO2007114448A1 Device substrate washing method
10/11/2007WO2007114253A1 Composition for under-resist film and under-resist film using same
10/11/2007WO2007114071A1 Positive photosensitive composition
10/11/2007WO2007114024A1 Projection optical system, aligner, and method for fabricating device
10/11/2007WO2007114014A1 Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board
10/11/2007WO2007113941A1 Substrate for display panel, display panel provided with such substrate, method for manufacturing substrate for display panel and method for manufacturing display panel
10/11/2007WO2007113933A1 Exposure method and exposure device
10/11/2007WO2007113901A1 Photosensitive resin composition, and photosensitive element, method for formation of resist pattern and process for production of print circuit board using the composition
10/11/2007WO2007113107A1 Photosensitive resist composition for color filters for use in electronic paper display devices
10/11/2007WO2007113083A1 Method of making a photopolymer printing plate
10/11/2007WO2007112997A1 Reflecting optical element with eccentric optical passageway
10/11/2007WO2007112921A1 Cationic composition and methods of making and using the same
10/11/2007WO2007112878A1 A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate
10/11/2007WO2007112625A1 Method for in-situ aberration measurement of optical imaging system in lithographic tools
10/11/2007WO2007013007A3 Composition and use thereof
10/11/2007WO2006117745A3 Method and device for transferring a pattern from a stamp to a substrate
10/11/2007WO2005060321A3 Method and device for generating in particular euv radiation and/or soft x-ray radiation
10/11/2007WO2004095080A3 Apparatus and methods for thermal reduction of optical distortion
10/11/2007US20070238207 Semiconductor constructions
10/11/2007US20070238055 Method for manufacturing optical disk master, method for manufacturing optical disk, and apparatus for manufacturing optical disk master
10/11/2007US20070238053 Manufacturing method of semiconductor device
10/11/2007US20070238051 Blanket for a printing roll, method of manufacturing the same, patterning method using the same, and method of manufacturing liquid crystal display device
10/11/2007US20070238050 Photoresist, can suppress contamination of a mirror tower, has high etching resistance, can solve problems in edge roughness, can be adapted to developer solutions having various alkali concentrations; irradiating photosensitive layer, heat treatment; developing
10/11/2007US20070238048 coatings comprising a mixture of a perfluoroalkyl*alkylenesulfonic acid, an organic amine, a water-soluble polymer, a perfluoroalkylethyl group containing compound and water; applying to photoresist and heating to form resist pattern on the substrates
10/11/2007US20070238036 Dielectric, display equipped with dielectric, and method for manufacturing said dielectric
10/11/2007US20070238028 Substrate Treatment Method and Substrate Treatment Apparatus
10/11/2007US20070237890 Bilayer Laminated Film for Bump Formation and Method of Bump Formation
10/11/2007US20070236691 Exposure apparatus inspection method and exposure apparatus
10/11/2007US20070236674 Catadioptric projection objective
10/11/2007US20070235666 Plasma-Based Debris Mitigation for Extreme Ultraviolet (EUV) Light Source
10/11/2007DE4419237B4 Verfahren zur Entfernung eines eine Siliciumverbindung oder eine Germaiumverbindung enthaltenden Photoresists A process for the removal of a silicon compound containing one or Germaiumverbindung photoresists
10/11/2007DE19838148B4 Verfahren zum Herstellen von Halbleiterbauelementen A method for manufacturing of semiconductor devices
10/11/2007DE10324466B4 Mikrolithografische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus
10/11/2007DE10305618B4 Verfahren zum Belichten eines fotoempfindlichen Lackes auf einem Halbleiterwafer A method of exposing a photosensitive resist on a semiconductor wafer
10/11/2007DE10301475B4 Verfahren zum Belichten eines Substrates mit einem Strukturmuster A method of exposing a substrate with a pattern structure
10/11/2007DE102006015213A1 Polarization influencing optical arrangement for e.g. projection lens system, has optical unit changing distribution in central area of beam cross section, where beam has approximate tangential polarization distribution in central area
10/11/2007DE102006014380A1 Microlithography projection objective for imaging radiation from object plane to image plane, has mirrored entry pupil in mirrored entry pupil plane obtained by mirroring entry pupil at object plane
10/11/2007DE102006014298A1 Integrated circuit`s structural component manufacturing method, involves performing thermal baking-out process in coating for diffusion of acids into polymer in lacquer such that acids are split up into process-soluble groups
10/10/2007EP1843387A1 Immersion exposure system, and recycle method and supply method of liquid for immersion exposure
10/10/2007EP1843386A1 Liquid removing apparatus, exposure apparatus and device manufacturing method
10/10/2007EP1843385A1 Projection optical system, exposure system, and exposure method
10/10/2007EP1843384A1 Exposure device and device manufacturing method
10/10/2007EP1843382A2 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
10/10/2007EP1843328A2 Settling judgment method for positioning control device and positioning control device
10/10/2007EP1843210A2 Method of aligning and exposing a substrate
10/10/2007EP1843209A2 Exposure apparatus and device manufacturing method
10/10/2007EP1843208A2 Photoresist stripping apparatus, method of recycling photoresist stripper, and method of manufacturing thin film transistor array panel using the photoresist stripping apparatus
10/10/2007EP1843207A2 Method and device for treating wafers
10/10/2007EP1843206A2 Lithographic apparatus and device manufacturing method
10/10/2007EP1843205A1 Local treatment device, lithographic apparatus and device manufacturing method
10/10/2007EP1843204A1 Exposure device, exposure method, and micro device manufacturing method
10/10/2007EP1843203A1 Method of making a photopolymer printing plate
10/10/2007EP1843202A2 Method and apparatus for performing dark field double dipole lithography
10/10/2007EP1842103A2 Synchronous raster scanning lithographic system
10/10/2007EP1842102A2 Illumination system, in particular for a projection exposure machine in semiconductor lithography
10/10/2007EP1842101A2 Displacement device
10/10/2007EP1842100A1 Exposure method, method for forming projecting and recessed pattern, and method for manufacturing optical element
10/10/2007EP1842099A2 A system and a method for synthesizing nanoparticle arrays in-situ
10/10/2007EP1652003A4 Wafer table for immersion lithography
10/10/2007EP1470447A4 Photolithographic critical dimension control using reticle measurements
10/10/2007EP1315005B1 Method of forming optical thin film
10/10/2007CN101053063A Apparatus and plasma ashing process for increasing photoresist removal rate
10/10/2007CN101052924A Method and apparatus for development of lithographic printing plate precursor
10/10/2007CN101052923A Exposure apparatus, method for manufacturing exposure apparatus, and method for manufacturing microdevice
10/10/2007CN101052922A Exposure device, exposure method, and micro device manufacturing method
10/10/2007CN101052921A A system and a method for generating periodic and/or quasi-periodic pattern on a sample
10/10/2007CN101052920A Tracing method and apparatus
10/10/2007CN101052919A Sulfonic-ester-containing composition for formation of antireflection film for lithography
10/10/2007CN101052918A Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus and method of pattern formation
10/10/2007CN101052257A Light source, method for controlling light source, and method for replacing light source
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