Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/18/2007WO2007116000A2 Device and method for microstructuring a storage medium and storage medium comprising a microstructured region
10/18/2007WO2007115597A1 Microlithography projection optical system, tool and method of production
10/18/2007WO2007115596A1 Microlithography projection optical system and method for manufacturing a device
10/18/2007WO2007096094A3 Exposure system
10/18/2007WO2007054860A3 Vibration isolation system and method
10/18/2007US20070244210 Piperazino Sensitisers
10/18/2007US20070243711 Substrate Treatment Method and Substrate Treatment Apparatus
10/18/2007US20070243494 Mixture of acid, base such as alkanolamine and tetraalkylammonium compound and sulfur compound as corrosion resistant
10/18/2007US20070243492 Double exposure photolithographic process
10/18/2007US20070243491 Method of making a semiconductor with a high transmission CVD silicon nitride phase shift mask
10/18/2007US20070243474 hIGH REFRACTIVE INDEX, FLEXIBILITY; HIGH SENSITIVITY; LOW SCATTERING; WEATHERPROOFING; DURABILITY ; CONTAINING ORGANOMETALLIC COMPOUND WITH PHOTOPOLYMERIZABLE COMPOUND
10/18/2007US20070243473 Hologram Recording Material and Hologram Recording Medium
10/18/2007US20070242922 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
10/18/2007US20070242799 Illumination system
10/18/2007US20070242250 Objective with crystal lenses
10/18/2007US20070242247 Exposure apparatus and device manufacturing method
10/18/2007US20070242242 Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part
10/18/2007US20070242241 Exposure Apparatus and Device Manufacturing Method
10/18/2007US20070241880 Alerting device, transporting device, transporting method, and exposure apparatus
10/18/2007US20070241471 Method and apparatus for manufacturing plastic optical lenses molds and gaskets
10/18/2007US20070241329 Semiconductor integrated circuit and method for manufacturing same, and mask
10/18/2007US20070241274 Method for calibrating exposure apparatuses of different types using single mask and method to auto-feedback optimum focal length
10/18/2007DE10338257B4 Verfahren zum Bebildern Zweischichtiger strahlungsempfindlicher Elemente A method of imaging Twin layer of radiation-sensitive elements
10/18/2007DE10203839B4 Resist für die Fotolithografie mit reaktiven Gruppen für eine nachträgliche Modifikation der Resiststrukturen Resist for lithography with reactive groups for subsequent modification of the resist structures
10/18/2007DE102007015232A1 Ladungspartikelstrahlenvorrichtung, Anomalieerfassungsverfahren für eine DA-Wandlereinheit, Ladungspartikelstrahlenschreibverfahren und Maske Charged particle beam apparatus, anomaly detection method for a DA converter unit, charged particle beam writing method and mask
10/18/2007DE102006024735A1 Hartmaskenschichtstapel und Verfahren zum Strukturieren einer Schicht unter Verwendung des Hartmaskenschichtstapels Hard mask layer stack and method for structuring a layer using the hard mask layer stack
10/18/2007DE102006017894A1 Laser light mixing device for use in optical system, has plate arrangements aligned on top of each other such that partial beam is arranged on sides of midplane opposite to each other before entering into device
10/18/2007DE102006017336A1 Catoptric illumination system for extreme ultraviolet lithography, has optical element e.g. mirror with large number of catoptric raster elements, placed beside another element, where distance between two elements is varied
10/18/2007DE102006015759A1 Vorrichtung und Verfahren zum Behandeln von Wafern Device and method for treating wafers
10/18/2007DE102006014775A1 Verfahren und Behandlungsflüssigkeit zur Reinigung und Reparatur von optischen Elementen The method and the treatment liquid for the cleaning and repair of optical elements
10/17/2007EP1845555A1 Post chemical-mechanical planarization (CMP) cleaning composition
10/17/2007EP1845418A2 Moving beam with respect to diffractive optics in oder to reduce interference patterns
10/17/2007EP1845417A2 Illumination system with zoom lens
10/17/2007EP1845416A2 Coating compositions for photolithography
10/17/2007EP1845415A2 Process for producing an image using a first minimum bottom antireflective coating composition
10/17/2007EP1845132A2 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
10/17/2007EP1845109A2 Optical devices made from radiation curable fluorinated compositions
10/17/2007EP1844946A1 Lithographic printing plate original plate and lithographic printing method
10/17/2007EP1844491A1 Method for patterning coatings
10/17/2007EP1844490A1 Measuring apparatus, exposure apparatus and method, and device manufacturing method
10/17/2007EP1844367A1 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
10/17/2007EP1844366A2 Illumination optical apparatus and optical apparatus
10/17/2007EP1844365A1 Catadioptric projection objective with intermediate image
10/17/2007EP1844364A1 Method for manufacturing array board for display device
10/17/2007EP1844105A1 Method for producing a structured elastomer and elastomer
10/17/2007EP1843884A2 Chucking system for nano-manufacturing
10/17/2007EP1719017A4 Processless digitally imaged photopolymer elements using microspheres
10/17/2007EP1664935B1 Stripping and cleaning compositions for microelectronics
10/17/2007EP1571741B1 Ultraviolet light source, phototherapy apparatus using ultraviolet light source, and exposure system using ultraviolet light source
10/17/2007EP1240552A4 Water-processable photoresist compositions
10/17/2007EP1189964B1 Radiation curable coating containing polyfluorooxetane
10/17/2007CN101057316A Position measurement method, position control method, measurement method, loading method, exposure method, exoposure apparatus, and device production method
10/17/2007CN101057315A Exposure equipment
10/17/2007CN101057185A A composition for coating over a photoresist pattern
10/17/2007CN101057184A Array of spatial light modulators and method of production of a spatial light modulator device
10/17/2007CN101057183A Tracing method and apparatus
10/17/2007CN101057182A Method for thermally processing photosensitive printing sleeves
10/17/2007CN101057181A Photosensitive resin composition for flexographic printing
10/17/2007CN101057161A 流体紫外线透镜 Fluid UV Lens
10/17/2007CN101056896A Less shear-thinning polyvinyl acetals
10/17/2007CN101055849A Cleaning method for removing the optical resistance residue and dual enchasing technology of the copper making process
10/17/2007CN101055835A Coating developing device, base plate processing method and recording medium
10/17/2007CN101055833A Substrate processing apparatus
10/17/2007CN101055742A Method and apparatus for manufacturing optical disk master, and method for manufacturing optical disk
10/17/2007CN101055433A Heating treatment device
10/17/2007CN101055432A Fine dust adsorption device and machine station using same
10/17/2007CN101055431A Image forming method and apparatus
10/17/2007CN101055430A Lithographic apparatus, lens interferometer and device manufacturing method
10/17/2007CN101055429A Moving beam with respect to diffractive optics in order to reduce interference patterns
10/17/2007CN101055428A Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
10/17/2007CN101055427A Lithographic apparatus and device manufacturing method
10/17/2007CN101055426A Method of manufacturing integrated circuits
10/17/2007CN101055425A Lithographic apparatus and device manufacturing method
10/17/2007CN101055424A Integrative type direct-writing photo-etching method
10/17/2007CN101055423A Infiltration type lithography method
10/17/2007CN101055422A Integrated measuring room for transparent base material
10/17/2007CN101055421A Method for forming double inserted structure
10/17/2007CN101055420A Negative type photo-sensitive composition and its lithographic plate printing method
10/17/2007CN101055419A Ultraviolet photo-cured radical type etching glue for micro nano structure imprinting and copying
10/17/2007CN101055418A System, method, and apparatus for non-contact and diffuse curing exposure
10/17/2007CN101055417A Sprinkler device
10/17/2007CN101055368A Color filter substrate for liquid crystal display and method of fabricating the same
10/17/2007CN101055367A Color filter substrate for liquid crystal display, and manufacturing method thereof
10/17/2007CN101055337A Light path folding type wave-guide optical switch array and its method
10/17/2007CN101055334A Self-aligning doping process suitable for step structure
10/17/2007CN101055323A Slit arrangement and its preparing process
10/17/2007CN101054033A Improved method for relief printing prepress production process
10/17/2007CN100344053C 振动控制装置 Vibration control device
10/17/2007CN100343953C Method for removing photoresist in semiconductor manufacturing process
10/17/2007CN100343947C Crystallizing device, crystallizing method and phase exchanging mechanism
10/17/2007CN100343760C Exposure device and method
10/17/2007CN100343759C Mask for projection exposure, projection exposure appts. and used method
10/17/2007CN100343758C Electroplating method
10/17/2007CN100343749C Array substrate of thin film transistor liquid crystal display and manufacturing method thereof
10/17/2007CN100343712C Miniature movable device
10/17/2007CN100343698C Continuous deep relief nonspheric microlens array manufacturing method
10/17/2007CN100343361C Aqueous cleaning compsn. contg. copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
10/17/2007CN100343335C Curable polymer compound
10/17/2007CN100343232C Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
10/17/2007CN100343079C Method for manufacturing coloured copperplate etching
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