Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/25/2007US20070247602 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
10/25/2007US20070247601 Cleanup method for optics in immersion lithography
10/25/2007US20070247600 Exposure apparatus and method for producing device
10/25/2007US20070246249 Metal Pattern Forming Methd, Metal Pattern Obtained by the Same, Printed Wiring Board, Conductive Film Forming Method, and Conductive Film Obtained by the Same
10/25/2007US20070245909 Composite stamper for imprint lithography
10/25/2007DE202007008769U1 Vorrichtung zur Kontaktbelichtung einer Druckschablone Apparatus for contact exposure of a stencil
10/25/2007DE202007008768U1 Vorrichtung zur Kontaktbelichtung einer Druckschablone Apparatus for contact exposure of a stencil
10/25/2007DE20122785U1 Vorrichtung zur Beleuchtung eines Objekts A device for illuminating an object
10/25/2007DE102007011346A1 Electron beam-pattern writing method, involves writing re-dimensioned design pattern on target-workpiece with iso-focal dose in accordance to pattern thickness in each of multiple small regions
10/25/2007DE102006031654A1 Facet mirror e.g. field facet mirror, for projection illumination system, has mirror segments provided with reflective surfaces, arranged on mirror carrier, and formed with individually formed angle of inclination in two different planes
10/24/2007EP1848004A2 Extreme UV radiation focusing mirror and extreme UV radiation source device
10/24/2007EP1847880A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof
10/24/2007EP1847879A2 Method for cleaning an automatic process device
10/24/2007EP1847878A1 Photosensitive composition removing liquid
10/24/2007EP1847877A2 Lithographic apparatus and device manufacturing method
10/24/2007EP1847876A1 Photosensitive composition removing liquid
10/24/2007EP1847875A2 Pattern transfer apparatus, imprint apparatus, and pattern transfer method
10/24/2007EP1847328A1 Photoresist coating process control with solvent vapor sensor
10/24/2007EP1846803A2 Process for preparing a polymeric relief structure
10/24/2007EP1846791A1 Vibration damping for photolithographic lens mount
10/24/2007EP1846527A1 Multi-photon polymerizable pre-ceramic polymeric compositions
10/24/2007EP1846241A2 Improved flexo processor
10/24/2007EP1754108A4 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing
10/24/2007EP1578855A4 Organic bottom anti-reflective composition and patterning method using the same
10/24/2007EP1549984B1 Optical apparatus, exposure apparatus, and semiconductor device fabrication method
10/24/2007EP1203031B1 Optical devices made from radiation curable fluorinated compositions
10/24/2007CN200965622Y Exposure machine exposure frame positioning structure
10/24/2007CN101061574A Substrate treatment apparatus
10/24/2007CN101061569A Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus
10/24/2007CN101061568A Exposure condition setting method, substrate processing unit and computer program
10/24/2007CN101061436A Etching method including photoresist plasma conditioning step with hydrogen flow rate ramping
10/24/2007CN101061435A Protection of surfaces exposed to charged particles
10/24/2007CN101061434A Photoresist composition for deep UV and process thereof
10/24/2007CN101061433A Lithographic printing plate precursors with oligomeric or polymeric sensitizers
10/24/2007CN101061432A Decal transfer lithography
10/24/2007CN101061429A Environmental system including vacuum scavenge for an immersion lithography apparatus
10/24/2007CN101061409A Optical projection system
10/24/2007CN101061058A Imprinting of supported and free-standing 3-D micro-or nano-structures
10/24/2007CN101060769A A method for producing the 3D products suitable for foldable forming
10/24/2007CN101060165A Organic el device including microstructures between a transparent substrate and an electrode
10/24/2007CN101060110A Semiconductor integrated circuit and method for manufacturing same, and mask
10/24/2007CN101060072A Coating and developing device, method of controlling coating and developing device and storage medium
10/24/2007CN101059661A Lithographic apparatus and device manufacturing method
10/24/2007CN101059660A Method for producing aligning mark
10/24/2007CN101059659A Immersion photolithography system and method using inverted wafer-projection optics interface
10/24/2007CN101059658A A method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method
10/24/2007CN101059657A MIM capacitance material etching method
10/24/2007CN101059656A Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern
10/24/2007CN101059655A Photosensitive composition and color filter formed from photosensitive composition
10/24/2007CN101059654A Photolithagraphic diffractive image false-proof film and its preparation method
10/24/2007CN101059653A 感光性树脂组合物 The photosensitive resin composition
10/24/2007CN101059652A Photocuarable resin composition
10/24/2007CN101059651A Radiation sensitive resin composition, protrusion and spacer made therefrom and forming method for the protrusion and spacer, and liquid crystal display device
10/24/2007CN101059650A Pattern transfer printing device, stamping device and pattern transfer printing method
10/24/2007CN101059633A An array substrate for in-plane switching mode LCD and method of fabricating of the same
10/24/2007CN101059631A Array substrate for liquid crystal display device using organic semiconductor material and method of fabricating the same
10/24/2007CN101059610A Liquid crystal display manufacture method
10/24/2007CN101058481A Organic EL coating device and method
10/24/2007CN100345253C Optic micro distance correcting method
10/24/2007CN100345252C Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium
10/24/2007CN100345200C Method for manufacturing a master and forming a pattern, a master, a stamper, an optical information recording medium and a resist
10/24/2007CN100345059C Patterning of solid state features by direct write nanolithographic printing
10/24/2007CN100345003C Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material
10/24/2007CN100344430C Method for producing resin formed product, method for producing metal structure budy and resin forming product
10/23/2007US7287239 Performance in model-based OPC engine utilizing efficient polygon pinning method
10/23/2007US7286247 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty
10/23/2007US7286245 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
10/23/2007US7286240 Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
10/23/2007US7286216 Exposure apparatus inspection method and exposure apparatus
10/23/2007US7286208 In-situ interferometer arrangement
10/23/2007US7286206 Exposure apparatus
10/23/2007US7285781 Characterizing resist line shrinkage due to CD-SEM inspection
10/23/2007US7285378 Juxtaposed island manufacturing method by means of self-organised deposition on a substrate and structure obtained using said method
10/23/2007US7285377 Fabrication method for a damascene bit line contact plug
10/23/2007US7285376 Correction process of planographic printing plate
10/23/2007US7285375 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
10/23/2007US7285374 Light-sensitive lithographic printing plate precursor
10/23/2007US7285373 Terpolymer or copolymer comprising comonomers of (meth)acrylic acid, (meth)acrylate monomer, olefin, and/or 2-(trifluoromethyl)acrylic acid derivative; triphenyl sulfonium nonaplate as a photoacid generator; adhesiveness with low dependency to substrate, etch resistance, transparency, resolution
10/23/2007US7285372 Radiation-sensitive elements and their storage stability
10/23/2007US7285371 Pigment, photo-reactive amphipathic molecule which crosslinks (meth)acrylic acid-(meth)acrylate copolymer, and solvent; color filters; liquid crystal displays
10/23/2007US7285370 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
10/23/2007US7285369 Positive resist composition and pattern formation method using the same
10/23/2007US7285368 Radiation transparent; etching resistance; high resolution; micropatterning using electron beams or ultraviolet radiation
10/23/2007US7285365 Patterning a workpiece covered with a layer sensitive to electromagnetic radiation by concurrently using a plurality of exposure beams having a predetermined separation; reducing compact disk errors
10/23/2007US7285364 Permanent, removable tissue markings
10/23/2007US7285363 Photoactivators, methods of use, and the articles derived therefrom
10/23/2007US7285010 TDI detecting device, a feed-through equipment and electron beam apparatus using these devices
10/23/2007US7284485 Alignment elements for an apparatus for handling printing plates
10/23/2007CA2260470C Structured surfaces having hydrophobic properties
10/18/2007WO2007117808A2 Method of forming nanoscale features using soft lithography
10/18/2007WO2007116941A1 Photosensitive resin composition for flexographic printing
10/18/2007WO2007116799A1 Reflow method, pattern forming method and production method of liquid crystal display unit-use tft element
10/18/2007WO2007116786A1 Lithographic printing plate material and method of printing
10/18/2007WO2007116752A1 Stage apparatus, exposure apparatus, stage control method, exposure method and device manufacturing method
10/18/2007WO2007116741A1 Recording system, recording device, and recording control signal generation device
10/18/2007WO2007116671A1 Method for forming surface unevenness
10/18/2007WO2007116664A1 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
10/18/2007WO2007116614A1 Process for producing resin for semiconductor lithography
10/18/2007WO2007116469A1 Method of transferring pattern and apparatus for transferring pattern
10/18/2007WO2007116362A1 Method of manufacturing a semiconductor device
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