Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2007
10/31/2007CN101063809A Arrangement used for manufacturing large area micro-nano structure
10/31/2007CN101063807A Sun sensor optical mask and manufacturing method therefor
10/31/2007CN101063806A Method and apparatus for solving mask precipitated defect issue
10/31/2007CN101063781A TFTLCD array substrates device structure and manufacturing method therefor
10/31/2007CN101063755A Method of manufacturing metal line and display substrate
10/31/2007CN101063741A High precision constant curved face focusing device and method thereof
10/31/2007CN100346231C Composition and method for removing copper-compatible resist
10/31/2007CN100346230C Material for preservative formation
10/31/2007CN100346229C Radiation-sensitive resin composition, patterned resin film, method for formation of the film, and use thereof
10/31/2007CN100346228C Planographic printing plate precursor
10/31/2007CN100346207C Liquid-crystal display device of reinforcing reflection and making method thereof
10/31/2007CN100346206C Liquid crystal display using oblique electric field to control lqiuid crystal molecule tipping direction and its producing method
10/31/2007CN100346150C Imaging characteristics measuring method, imaging characteristics adjusting method, exposure method and equipment, program and recording medium, and device producing method
10/31/2007CN100345696C Supporting body for lithographic printing plate and lithographic printing original plate
10/31/2007CN100345695C Planography strut attachment, mfg. method for original plate of planography printing plate and planography printing plate
10/30/2007US7289858 Lithographic motion control system and method
10/30/2007US7289659 Method and apparatus for manufacturing diamond shaped chips
10/30/2007US7289279 Lithographic objective having a first lens group including only lenses having a positive refractive power
10/30/2007US7289277 Relay lens used in an illumination system of a lithography system
10/30/2007US7289226 Characterization and compensation of errors in multi-axis interferometry systems
10/30/2007US7289225 Surface profiling using an interference pattern matching template
10/30/2007US7289224 Low coherence grazing incidence interferometry for profiling and tilt sensing
10/30/2007US7289223 Method and apparatus for spatially resolved polarimetry
10/30/2007US7289213 Apparatus and methods for detecting overlay errors using scatterometry
10/30/2007US7289212 Lithographic apparatus, device manufacturing method and device manufacturing thereby
10/30/2007US7289198 Process compensation for step and scan lithography
10/30/2007US7289194 Positioning apparatus, exposure apparatus, and device manufacturing method
10/30/2007US7289192 Projection exposure device
10/30/2007US7289190 Monitoring apparatus and method particularly useful in photolithographically
10/30/2007US7289137 Method and test form for equalizing the exposure heads in an exposer for printing originals
10/30/2007US7288884 Field emission backlight unit having emitters disposed on edges of electrodes
10/30/2007US7288864 System and method for cooling motors of a lithographic tool
10/30/2007US7288859 Wafer stage operable in a vacuum environment
10/30/2007US7288848 Overlay mark for measuring and correcting alignment errors
10/30/2007US7288779 Method for position determination, method for overlay optimization, and lithographic projection apparatus
10/30/2007US7288778 Collector for EUV light source
10/30/2007US7288777 Collector for EUV light source
10/30/2007US7288466 Processing method, manufacturing method of semiconductor device, and processing apparatus
10/30/2007US7288366 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings
10/30/2007US7288365 Image formation process and planographic printing plate material
10/30/2007US7288364 Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same
10/30/2007US7288363 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
10/30/2007US7288362 Immersion topcoat materials with improved performance
10/30/2007US7288361 Lithographic printing process
10/30/2007US7288360 A support and a photo/thermosensitive layer formed on the support which contains an alkali-soluble resin, a photothermal converting substance and an ester compound; increases solubility to an alkaline developer as a result of exposure to an infrared laser
10/30/2007US7288359 Radiation-sensitive resin composition
10/30/2007US7288345 Photosensitive colored composition and color filter
10/30/2007US7288156 Methods for cleaning a substrate
10/30/2007US7288008 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/25/2007WO2007120602A2 Double exposure photolithographic process
10/25/2007WO2007120451A1 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
10/25/2007WO2007120420A1 Dynamic compensation system for maskless lithography
10/25/2007WO2007119966A1 Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods
10/25/2007WO2007119949A1 Composition for positive type photoresist and positive type photoresist film manufactured thereby
10/25/2007WO2007119840A1 Diffraction optical element, and aligner equipped with that element
10/25/2007WO2007119839A1 Illumination optical apparatus, projection exposure apparatus, and device manufacturing method
10/25/2007WO2007119821A1 Exposure method, exposure apparatus and device manufacturing method
10/25/2007WO2007119804A1 Resist composition for liquid immersion exposure
10/25/2007WO2007119803A1 Resist material for immersion lithography
10/25/2007WO2007119714A1 Active ray curable hyperbranched polymer
10/25/2007WO2007119699A1 Photosensitive resin composition and photosensitive element using same
10/25/2007WO2007119651A1 Alkaline development-type solder resist, cured product of the same, and print circuit board produced using the same
10/25/2007WO2007119555A1 Plotting position measuring method and device, and plotting method and device
10/25/2007WO2007119514A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method
10/25/2007WO2007119501A1 Exposure apparatus, exposure method and device manufacturing method
10/25/2007WO2007119391A1 Actinic energy radiation negative-working photoresist composition and cured product thereof
10/25/2007WO2007119384A1 Negative-type photosensitive fluorinated aromatic resin composition
10/25/2007WO2007119292A1 Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
10/25/2007WO2007118993A1 Device for collecting flux of electromagnetic radiation in the extreme ultraviolet
10/25/2007WO2007118989A2 Embossing device, such as a cylinder or a sleeve
10/25/2007WO2007118376A1 Dual stage switching positioning system for step and scan lithography machine
10/25/2007WO2007072357A3 Blended sensor system and method
10/25/2007WO2007066225A3 Microlithographic projection illumination system, and method for producing microstructured components
10/25/2007WO2007044048A3 Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
10/25/2007WO2006127313A3 On-press developable imageable element comprising tetraarylborate salt
10/25/2007WO2006090870A3 Image forming device and method
10/25/2007WO2002084720A3 Exposure device and substrate processing system and device producing method
10/25/2007US20070250290 Scanning exposure technique
10/25/2007US20070249749 Arysulfinate salts in photoinitiator systems for polymerization reactions
10/25/2007US20070249748 Copolymer of (meth)acrylic acid with ethylenically unsaturated compounds, 1-[4-morpholinophenyl]-2-dialkylamino-2-(4-alkylbenzyl)-alkane-1-one photoinitiator, and a polyol that is partially or fully esterified with an ethylenically unsaturated carboxylic acid
10/25/2007US20070249169 Mask and method of manufacturing liquid crystal display device using the same
10/25/2007US20070248993 Un-supported Polymeric Film with Embedded Microbeads
10/25/2007US20070248917 Exposing a photoresist to near-field light through photomask using polarized exposure light having an electrical field component parallel to the first direction to form a latent image in the photoresist only in discrete regions at which the second slit opening crosses the light the light shield portion
10/25/2007US20070248916 Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method
10/25/2007US20070248914 during semiconductor fabrication, the curing step stabilizes the developed photoresist layer and prevent the cleaning to damage the developed resist layer
10/25/2007US20070248912 Method and apparatus for thermal development with vapor treatment
10/25/2007US20070248911 Pattern forming method and bilayer film
10/25/2007US20070248909 Photosensitive Composition for Use in Producing Printing Plate, and Photosensitive Printing Original Plate Laminate and Printing Plate Using the Photosensitive Composition
10/25/2007US20070248907 Apparatus and method for laser engraveable printing plates
10/25/2007US20070248905 Two-layer film and method of forming pattern with the same
10/25/2007US20070248896 SU-8; octafunctional epoxidized novolac, solvent, photopolymerization initiator; dialkyl phthalate, malonate, sebacate, and/or adipate plasticizer; and adhesion promoter of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and/or aminopropyltrimethoxysilanel; noncracking; larger wafer
10/25/2007US20070248894 Resist material and pattern formation method using the same
10/25/2007US20070247780 Substrate holding system and exposure apparatus using the same
10/25/2007US20070247722 Refractive projection objective
10/25/2007US20070247640 Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit
10/25/2007US20070247610 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
10/25/2007US20070247609 Assembly of a reticle holder and a reticle
10/25/2007US20070247607 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/25/2007US20070247604 Optimized mirror design for optical direct write
10/25/2007US20070247603 Environmental system including vacuum scavenge for an immersion lithography apparatus
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