Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2007
11/01/2007WO2007123270A1 Photocurable conductive paste and photocurable black paste used for forming bus electrode having two-layer structure, and plasma display panel
11/01/2007WO2007123226A1 Developer for photosensitive surface printing plate and method for treatment of photosensitive surface printing plate
11/01/2007WO2007123198A1 Substrate treatment apparatus and substrate manufacturing method
11/01/2007WO2007123189A1 Exposure apparatus, exposure method, and device production method
11/01/2007WO2007123062A1 Photosensitive element, method for formation of resist pattern, and method for production of print circuit board
11/01/2007WO2007123031A1 Printing plate material
11/01/2007WO2007122982A1 Method for preparing lithographic printing plate and printing method for lithographic printing plate
11/01/2007WO2007122977A1 Material of the resist-protecting membrane for immersion lithography
11/01/2007WO2007122929A1 Radiation-sensitive insulating resin composition
11/01/2007WO2007122856A1 Apparatus for cooling optical element, and exposure apparatus
11/01/2007WO2007122843A1 Method of applying elongate web
11/01/2007WO2007121990A1 Projection exposure system and use thereof
11/01/2007WO2007121871A1 Bakeable lithographic printing plates with a high resistance to chemicals
11/01/2007WO2007094863A3 Oblique parallelogram pattern diffractive optical element
11/01/2007WO2006125509A3 Method and apparatus for a post exposure bake of a resist
11/01/2007US20070254247 Radiation-sensitive resin composition
11/01/2007US20070254245 Poly (Imide-Azomethine ) Copolymer, Poly (Amic Acid-Azomethine) Copolymer , and Positive Photosensitive Resin Composition
11/01/2007US20070254244 Method of forming a resist structure
11/01/2007US20070254243 Method for manufacturing photosensitive resin composition and relief pattern using the same
11/01/2007US20070254241 Method of treating on-press developable lithographic printing plate
11/01/2007US20070254219 Photomask, method for producing the same, and method for forming pattern using the photomask
11/01/2007US20070254208 Method for Photo-Embossing a Monomer-Containing Layer
11/01/2007US20070253072 Differentially-cured materials and process for forming same
11/01/2007US20070252993 Wafer alignment apparatus
11/01/2007US20070252971 Substrate holder and exposure apparatus having the same
11/01/2007US20070252970 Substrate Holder, Stage Apparatus, and Exposure Apparatus
11/01/2007US20070252969 Stage apparatus and exposure apparatus
11/01/2007US20070252965 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/01/2007US20070252962 Environmental system including a transport region for an immersion lithography apparatus
11/01/2007US20070252961 Environmental system including a transport region for an immersion lithography apparatus
11/01/2007US20070252930 Liquid crystal display having reflection electrodes
11/01/2007US20070252111 Antistatic Treatment Agent, and Antistatic Film, Coated Article and Pattern Forming Method Using the Agents
11/01/2007US20070252094 Reduction projection objective and projection exposure apparatus including the same
11/01/2007US20070251443 Method for making low-stress large-volume not-(111)-oriented crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby
11/01/2007US20070251304 Demonstration Kit And Method For Enhancing And/Or Demonstrating Photoactive Properties
10/2007
10/31/2007EP1850464A1 Linear motor, stage apparatus, and exposure apparatus
10/31/2007EP1850372A1 Temperature setting method for heat treating plate, temperature setting device for heat treating plate, program and computer-readable recording medium recording program
10/31/2007EP1850371A1 Exposure method, exposure apparatus and method for manufacturing device
10/31/2007EP1850370A1 Stage apparatus and exposure apparatus
10/31/2007EP1850183A2 Method and apparatus for thermal development with vapor treatment
10/31/2007EP1850182A2 Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
10/31/2007EP1850181A1 Lithographic projection apparatus and device manufacturing method
10/31/2007EP1850180A1 Composition for forming of underlayer film for lithography that contains compound having protected carboxyl
10/31/2007EP1850179A1 Semiconductor substrate for improving pattern formation in photolithographic process
10/31/2007EP1850178A2 Dye-containing negative curable composition, color filter and method for producing the same
10/31/2007EP1850177A2 Litographic pellicle
10/31/2007EP1849600A1 Bakeable radiation-sensitive elements with a high resistance to chemicals
10/31/2007EP1849587A1 Device and method for creating a three dimensional object using mask illumination
10/31/2007EP1849586A1 Device and method for creating a three dimensional object using mask illumination
10/31/2007EP1849181A2 Replication tools and related fabrication methods and apparatus
10/31/2007EP1849042A2 Process for the production of lithographic printing plates
10/31/2007EP1849041A2 Lithographic method
10/31/2007EP1849040A2 Immersion liquid, exposure apparatus, and exposure process
10/31/2007EP1849039A2 A process of imaging a photoresist with multiple antireflective coatings
10/31/2007EP1789847A4 Integral plated resistor and method for the manufacture of printed circuit boards comprising boards comprising the same
10/31/2007EP1671353A4 Apparatus for multiple beam deflection and intensity stabilization
10/31/2007EP1573771A4 System and method for removal of materials from an article
10/31/2007EP1490227B1 Compositions for positive heat sensitive lithographic printing plates
10/31/2007EP1414722A4 Reticle protection and transport
10/31/2007EP1305813A4 Plasma focus light source with active and buffer gas control
10/31/2007DE10322238B4 Diffraktives optisches Element sowie Projektionsobjektiv mit einem solchen Element A diffractive optical element and projection lens with such an element
10/31/2007DE102007018306A1 Overlay measuring device for use during manufacturing semiconductor chip, has light source for producing visible light with set of wavelengths, and optical module for selecting visible light
10/31/2007DE102007012334A1 Hard masking layer stack for use in semiconductor memory device, has carbon layer arranged on layer to be structured, and covering layer arranged on intermediate layer, where intermediate layer is thicker than covering layer
10/31/2007DE102006019964A1 Rapid prototyping process and assembly for the production of prototype patterns for industrial purposes employs Voxel matrix bitmap mask
10/31/2007DE102006019963A1 Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts mittels Maskenbelichtung Apparatus and method for producing a three-dimensional object by means of mask exposure
10/31/2007DE102005032320B4 Anordnung mit optischem Element und Reinigungsvorrichtung, Projektionsbelichtungsanlage für die Mikrolithographie, Reinigungsvorrichtung und Reinigungsverfahren Arrangement with the optical element and cleaning apparatus, projection exposure system for microlithography, cleaning apparatus and cleaning method
10/31/2007DE102004010002B4 Maskenhalter zum Halten einer lithografischen Reflexionsmaske und Verfahren Mask holder for holding a lithographic reflection mask and method
10/31/2007DE10162796B4 Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren Method for optimizing imaging properties of at least two of the optical elements as well as photolithographic manufacturing process
10/31/2007CN200969029Y Compound support offset PS plate
10/31/2007CN101065837A Aqueous solution for removing post-etch residue
10/31/2007CN101065710A Lithographic printing plate-use correcting fluid and image correcting method for lithographic printing plate
10/31/2007CN101065709A Process for producing resist pattern and conductor pattern
10/31/2007CN101065708A Method for forming photoresist pattern using double layer antireflection film
10/31/2007CN101065707A Process for producing resist pattern and conductor pattern
10/31/2007CN101064245A Method for producing semiconductor elements and hard mask layer
10/31/2007CN101064240A Substrate processing method, substrate processing system and substrate processing apparatus
10/31/2007CN101064237A Substrate processing apparatus
10/31/2007CN101063832A Preparation method for light sensitive planographic printing plate material
10/31/2007CN101063831A Conveying device
10/31/2007CN101063830A Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
10/31/2007CN101063829A Overlay measuring method and overlay measuring apparatus using the same
10/31/2007CN101063828A Exposure apparatus
10/31/2007CN101063827A Exposure apparatus inspection method
10/31/2007CN101063826A Projection exposing device
10/31/2007CN101063825A Exposing device and method
10/31/2007CN101063824A 曝光装置及曝光方法 Exposure apparatus and exposure method
10/31/2007CN101063823A Method for enhancing photoetching technique resolving capability
10/31/2007CN101063822A Methods and systems for improving boundary contrast
10/31/2007CN101063821A Method for removing etching residue
10/31/2007CN101063820A Electronic beam exposure method
10/31/2007CN101063819A Coating compositions for photolithography
10/31/2007CN101063818A Top coat for lithography processes
10/31/2007CN101063817A Resist for printing and patterning method using the same
10/31/2007CN101063816A Resist composition, method for forming resist pattern, array substrate fabricated and method of fabricating the array substrate
10/31/2007CN101063815A Method for manufacturing decorative glass
10/31/2007CN101063814A Dielectric, display equipped with dielectric, and method for manufacturing said dielectric
10/31/2007CN101063813A Printing plate and method of manufacturing liquid crystal display device using the same
10/31/2007CN101063812A Device and method for creating a three dimensional object using mask illumination
10/31/2007CN101063811A Device and method for creating a three dimensional object using mask illumination
10/31/2007CN101063810A Dual-purpose copy arrangement for ultraviolet lighting micro-nano graph air pressure stamping and photolithography
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