Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2007
11/08/2007US20070259291 Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer
11/08/2007US20070259287 Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern
11/08/2007US20070259280 Photomask, exposure control method and method of manufacturing a semiconductor device
11/08/2007US20070259278 Photosensitive resin composition
11/08/2007US20070259273 Positive Resist Composition and Method of Forming Resist Pattern
11/08/2007US20070258152 Projection Optical System
11/08/2007US20070258134 Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type
11/08/2007US20070258073 Enhanced lithographic resolution through double exposure
11/08/2007US20070258071 Advanced exposure techniques for programmable lithography
11/08/2007US20070258067 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258066 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258065 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258064 Exposure apparatus and device manufacturing method
11/08/2007US20070258063 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258062 Environmental system including a transport region for an immersion lithography apparatus
11/08/2007US20070258061 System and method for using a two part cover and a box for protecting a reticle
11/08/2007US20070257400 include at least one three-dimensional pattern formed along portion of inner surface of tube; polymer shrink tubes can be used for, for example, embossing a pattern into a polymer tube or forming a catheter with at least one channel located in the catheter wall; guide catheters
11/08/2007US20070257209 Optimized correction of water thermal deformations in a lithographic process
11/08/2007US20070256781 Photocurable compositions for articles having stable tensile properties
11/08/2007US20070256584 Photosensitive planographic printing plate and method of producing the same
11/08/2007DE10330456B9 Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer Apparatus for creating a surface structure on a wafer
11/08/2007DE10243742B4 Verfahren zur Strukturierung von Halbleitersubstraten unter Verwendung eines Fotoresists A process for patterning of semiconductor substrates using a photoresist,
11/08/2007DE102007017010A1 Fotolackzusammensetzung, Verfahren zum Bilden einer Fotolackstruktur unter Verwendung derselben, Arraysubstrat hergestellt unter Verwendung derselben und Herstellungsverfahren des Arraysubstrats Photoresist composition, method of forming a resist pattern using the same, array substrate prepared using the same and method of manufacturing the array substrate
11/08/2007DE102006020321A1 Lighting system for projection illumination arrangement, has image lens imaging intermediate area plane on emission plane and pupil plane between intermediate area plane and emission plane
11/08/2007DE102006018928A1 Projektionsbelichtungssystem und Verwendung desselben The same projection exposure system and use
11/07/2007EP1852948A1 Laser light source control method, laser light source device, and exposure apparatus
11/07/2007EP1852894A1 Exposure method and apparatus, and electronic device manufacturing method
11/07/2007EP1852746A2 Lithographic apparatus and method
11/07/2007EP1852745A1 High-NA projection objective
11/07/2007EP1852744A1 Photosensitive lithographic printing plate material
11/07/2007EP1852743A1 Method for manufacturing photosensitive resin composition and relief pattern using the same
11/07/2007EP1852272A1 Material of lithographic printing plate and method of printing
11/07/2007EP1852271A1 Lithographic printing plate material and printing method
11/07/2007EP1852236A1 Production method for 3-d mold, production method for finely machined product, production method for fine-pattern molded product, 3-d mold, finely machined product, fine-pattern molded product and optical component
11/07/2007EP1851591A1 Photolithographic patterning of polymeric materials
11/07/2007EP1851590A2 Ink jet recording head, producing method therefor and composition for ink jet recording head
11/07/2007EP1851589A2 Immersion topcoat materials with improved performance
11/07/2007EP1851574A1 Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus
11/07/2007EP1850972A2 Thermal control of deposition in dip pen nanolithography
11/07/2007EP1588362B1 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
11/07/2007EP1546222A4 Photoresists, fluoropolymers and processes for 157 nm microlithography
11/07/2007CN200972570Y Exposure machine with double-image pick-up device capable of separatable three-axle regulating
11/07/2007CN200972569Y Automatic liquid soft plate making machine
11/07/2007CN101069267A Optical integrator, illumination optical device, exposure device, and exposure method
11/07/2007CN101069266A Exposure device and device manufacturing method
11/07/2007CN101069265A Exposure apparatus, exposure method and device manufacturing method
11/07/2007CN101069129A Radiation-curable coating substances
11/07/2007CN101068853A Polymer, method for producing the polymer, optical film, and image display device
11/07/2007CN101068852A Unsaturated group-containing polyimide resin, photosensitive resin composition containing same, and cured product thereof
11/07/2007CN101067729A Method for photoetching glue soluting cleaning filter bubble
11/07/2007CN101067728A Photoetching error computing method
11/07/2007CN101067727A Mask loading technology
11/07/2007CN101067726A Workpiece platform structure and method for raising repeat accuracy of precision processing equipment
11/07/2007CN101067725A Preventing device and method for sensitive-liquid curing in slit-nozzle
11/07/2007CN101067724A Four-functional group propenoic acid ester photocureable resin with star-shape structure and synthesis method thereof
11/07/2007CN101067723A Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
11/07/2007CN101067722A Method for producing spraying photo sensitive thermosensitive CTP plate material
11/07/2007CN101067721A Material delivery system for use in solid imaging
11/07/2007CN101067720A Material delivery tension and tracking system for use in solid imaging
11/07/2007CN101067719A Method for constituting sub-10 nano gap and array thereof
11/07/2007CN101067701A LCD device and its production method
11/07/2007CN100347854C Semiconductor device and method of manufacturing the same
11/07/2007CN100347816C Mask data correction method, photomask, optical image prediction method
11/07/2007CN100347612C Method for processing substrate and medicinal liquid used therefor
11/07/2007CN100347611C Photosensitive resin composition, method for producing pattern and electronic parts
11/07/2007CN100347610C Positive anticorrosive additive composition and anticorrosive pattern forming method
11/07/2007CN100347608C Method for forming a micro-pattern on a substrate by using capillary force
11/07/2007CN100347593C Method for fabricating a liquid crystal display device
11/07/2007CN100347592C Dust cleaning apparatus for process reaction chamber and process reaction chamber having dust removing function
11/07/2007CN100347059C Method and device for loading / unloading a drum plotter
11/07/2007CN100346965C 成像材料 Imaging Materials
11/06/2007USRE39913 Providing a reticle that includes a pattern of lines having a line width greater than target width; coating wiht photoresist; exposing photoresist layer to an image projected from reticle; developing photoresist layer, trimming pattern, etching
11/06/2007US7292426 Substrate holding system and exposure apparatus using the same
11/06/2007US7292388 Lens made of a crystalline material
11/06/2007US7292346 Triangulation methods and systems for profiling surfaces through a thin film coating
11/06/2007US7292343 Gas discharge MOPA laser spectral analysis module
11/06/2007US7292335 Optical measurements of patterned structures
11/06/2007US7292316 Illumination optical system and exposure apparatus having the same
11/06/2007US7292315 Optimized polarization illumination
11/06/2007US7292313 Apparatus and method for providing fluid for immersion lithography
11/06/2007US7292311 Scanning exposure technique
11/06/2007US7292309 Exposure apparatus and device manufacturing method
11/06/2007US7292308 System and method for patterning a flexible substrate in a lithography tool
11/06/2007US7292307 Cooling apparatus, optical element having the same, and exposure apparatus
11/06/2007US7291853 Discharge produced plasma EUV light source
11/06/2007US7291654 Storage stability of photoinitiators
11/06/2007US7291554 Method for forming semiconductor device
11/06/2007US7291446 Method and system for treating a hard mask to improve etch characteristics
11/06/2007US7291445 Infrared-imageable layer of a continuous varying distribution in a direction vertical to the substrate of a hydrophilic/oleophilic, ink-receptive polymer and a hydrophobic/oleophobic ink-repelling polymer
11/06/2007US7291444 Photosensitive ceramic composite and method for manufacturing multilayer substrate including the composite
11/06/2007US7291443 Mixture of dye, free radical catalyst and unsaturated compound in binder
11/06/2007US7291442 9,9-Didecyl-2,7-bis[phenyl-(9,9-didecyl-2-[N,N-diphenylamino]-fluorenyl)aminofluorene, a photoacid generator and a polymer binder; write-once read-many (WORM) data storage medium
11/06/2007US7291441 Positive resist composition and pattern forming method utilizing the same
11/06/2007US7291440 Bakeable multi-layer imageable element
11/06/2007US7291439 Using a photoresist film of an alkali-soluble resin, especially a novolak, and a photosensitive compound having a ballast structure, especially 2,2'-methylene bis[6-(2-hydroxy-5-methylphenyl)methyl]-4-methyl-1,2-naphtoquinonediazide-5-sulfonate; may also contain a bisphenol heat resistance additive
11/06/2007US7291438 Negative photosensitive composition and negative photosensitive lithographic printing plate
11/06/2007US7291427 Exposing a substrate bonded to a polymer via a grafted chain that includes a substrate-bonding group and and also a phototcleavable group to cleave the group in exposed areas and removing the graft chain from those areas; a conductor may then be adhered to the areas having the graft polymer chains
11/06/2007US7290948 Substrate processing apparatus and substrate processing method
11/06/2007US7290487 Method for producing flexo printing forms by means of laser direct engraving
11/01/2007WO2007123357A1 Dry film photoresist resin composition for ldi
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