Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2007
11/14/2007EP1855159A1 Composition for underlayer film of resist and process for producing the same
11/14/2007EP1855148A1 Imprint / soft lithography process for flat panel displays
11/14/2007EP1854822A1 Optical devices made from radiation curable fluorinated compositions
11/14/2007EP1854639A1 Thermal transfer image-receiving sheet
11/14/2007EP1854627A1 Method for making a lithographic printing plate
11/14/2007EP1853973A1 Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material
11/14/2007EP1853972A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
11/14/2007EP1853971A1 Mask blanks
11/14/2007EP1853882A2 Systems for protecting internal components of an euv light source from plasma-generated debris
11/14/2007EP1853667A2 Infrared dye compositions
11/14/2007EP1551886A4 Fluorinated polymers useful as photoresists, and processes for microlithography
11/14/2007EP0496891B2 Method and device for optical exposure
11/14/2007CN101073295A Printed circuit board production method and equipment
11/14/2007CN101073039A Method for forming anti-reflective coating
11/14/2007CN101073038A Method for forming anti-reflective coating
11/14/2007CN101073037A Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
11/14/2007CN101073036A Positive type dry film photoresist and composition for preparing the same
11/14/2007CN101073035A 正型干膜光致抗蚀剂 Positive-type dry film photoresist
11/14/2007CN101073034A Method for imprint lithography at constant temperature
11/14/2007CN101073021A Transmitting optical element and objective for a microlithographic projection exposure apparatus
11/14/2007CN101072813A Siloxane resin coating
11/14/2007CN101071754A Method for forming fine pattern of semiconductor device
11/14/2007CN101071279A Lithographic apparatus, calibration method, device manufacturing method and computer program product
11/14/2007CN101071278A Photo resist film removing agent
11/14/2007CN101071277A Developing method and method for fabricating semiconductor device using the developing method
11/14/2007CN101071276A Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
11/14/2007CN101071275A Double platform system for rotary exchange
11/14/2007CN101071274A Method for manufacturing semiconductor device using immersion lithography process with filtered air
11/14/2007CN101071273A Method for manufacturing thin film pattern layer
11/14/2007CN101071272A Method for seeking target area for integrated circuit layout design
11/14/2007CN101071271A Coating machine nozzle cleaning module and its device
11/14/2007CN101071270A Colloid pump for spin-coated developing device
11/14/2007CN101071269A Photographic material of black matric wall for ink-jet mode colour filter and its manufacturing method
11/14/2007CN101071267A Photoresist compositions
11/14/2007CN101071266A Photoresist compositions
11/14/2007CN101071265A Processing liquid, manufacturing method for color filter, color filter and display device
11/14/2007CN101071264A Photosensitive combination and photosensitive transprinting material using same, display device shading film and manufacturing method, black matrix, substrate having shading film and display device
11/14/2007CN101071263A Apparatus for manufacturing display panel and method for manufacturing the same
11/14/2007CN101071241A Liquid crystal display device and method of fabricating the same
11/14/2007CN101071239A Display substrate, method of manufacturing the same and display apparatus having the same
11/14/2007CN101071238A Liquid crystal display device and method of fabricating the same
11/14/2007CN101071219A Display unit including an antidazzling film
11/14/2007CN101071217A Liquid crystal display fabrication method
11/14/2007CN101071185A Colour filter and its manufacturing method
11/14/2007CN101071184A Color filter and manufacturing method therefore and crystal display device
11/14/2007CN101071183A Corrugated pattern forming sheet and method for manufacturing the same, and method for manufacturing antireflector, retardation plate, original process sheet plate, and optical element
11/14/2007CN101069879A Method for coating composition, semiconductor element and flat display
11/14/2007CN100349335C 电磁辐射脉冲定时控制 Timing control pulse of electromagnetic radiation
11/14/2007CN100349268C Processing method
11/14/2007CN100349260C Laser mask and method of crystallization using the same
11/14/2007CN100349258C Pattern formation method
11/14/2007CN100349254C Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
11/14/2007CN100349068C Management method for reaction load in micro imaging system, its system and equipment
11/13/2007US7296245 Combined e-beam and optical exposure semiconductor lithography
11/13/2007US7295885 Multi-exposure drawing method and apparatus thereof for dividing an exposing area into exposed zones and un-exposed zones based on odd-numbered and even-numbered vector-graphic data
11/13/2007US7295591 Long-pulse pulse power system for gas discharge laser
11/13/2007US7295362 Continuous direct-write optical lithography
11/13/2007US7295331 Optical element with an optical axis
11/13/2007US7295327 Measuring apparatus and exposure apparatus having the same
11/13/2007US7295326 Apparatus and method for measuring the optical performance of an optical element
11/13/2007US7295291 Apparatus and process for the determination of static lens field curvature
11/13/2007US7295287 Substrate holder and exposure apparatus having the same
11/13/2007US7295284 Optical system, exposure apparatus using the same and device manufacturing method
11/13/2007US7295283 Lithographic apparatus and device manufacturing method
11/13/2007US7295282 Exposure apparatus, cooling method, and device manufacturing method
11/13/2007US7295256 Method for forming pattern of liquid crystal display device and method for fabricating thin film transistor array substrate of liquid crystal display device using the same
11/13/2007US7294906 Wiring technique
11/13/2007US7294844 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/13/2007US7294814 Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same
11/13/2007US7294682 Polysiloxanes and hydrosilation catalyst; radiation transparent; improved hardness and flexural strength
11/13/2007US7294586 Method of processing a substrate, heating apparatus, and method of forming a pattern
11/13/2007US7294580 Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
11/13/2007US7294571 Concave pattern formation method and method for forming semiconductor device
11/13/2007US7294453 Electronic device manufacture
11/13/2007US7294451 Raised solder-mask-defined (SMD) solder ball pads for a laminate electronic circuit board
11/13/2007US7294450 Mixing a solution of a compound capable of generating an acid upon irradiation with actinic radiation with a filtered solution of a resin whose solubility in an alkali developer is changed under an action of an acid; and mixing the product with a basic compound, a surfactant, and a solvent
11/13/2007US7294449 Radiation patternable functional materials, methods of their use, and structures formed therefrom
11/13/2007US7294448 Polymer comprising a 1-alkoxy- or 1-aryloxy-alkyl alkacrylate repeating unit, e.g., 1-n-propoxy-2-methylpropyl methacrylate, a compound that generates an acid by visible light irradiation, and a sensitizing dye; useful as an electronic circuit forming material, a lithographic printing material, etc.
11/13/2007US7294447 Positive-working lithographic printing plate precursor
11/13/2007US7294445 Printing a spot varnish layer to enhance the glossiness of the overprinted color layers of the image to form an accurate proof that can emulate the appearance of a spot varnish applied on-press
11/13/2007US7294444 Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate
11/13/2007CA2280115C Low temperature method and compositions for producing electrical conductors
11/08/2007WO2007126689A1 Article for parallel lithography with two-dimensional pen arrays
11/08/2007WO2007126050A1 Protective agent
11/08/2007WO2007125992A1 Photosensitive resin laminate
11/08/2007WO2007125971A1 Method of forming resist pattern
11/08/2007WO2007125921A1 Photosensitive resin composition and photosensitive film
11/08/2007WO2007125855A1 Method for preparing lithographic printing plate, and method for printing lithographic printing plate
11/08/2007WO2007125818A1 Polymer and photosensitive resin composition comprising the same
11/08/2007WO2007125817A1 Photosensitive resin composition
11/08/2007WO2007125796A1 Photosensitive surface printing plate material
11/08/2007WO2007125774A1 Photosensitive surface printing plate material and method for production thereof
11/08/2007WO2007125758A1 Method for manufacturing liquid crystal display device, and exposure device
11/08/2007WO2007125740A1 Dry film for optical waveguide formation, optical waveguide, and process for producing the same
11/08/2007WO2007124911A1 Radiation curable resin composition and rapid three dimensional imaging process using the same
11/08/2007WO2007023133A3 Photopolymer printing plate precursor.
11/08/2007WO2007009580A3 Photopolymer composition suitable for lithographic printing plates
11/08/2007US20070260419 Image Plane Measurement Method, Exposure Method, Device Manufacturing Method, and Exposure Apparatus
11/08/2007US20070259295 Positive Photosensitive Composition
11/08/2007US20070259293 Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist
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