Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/26/2014US20140178819 Photosensitive polysiloxane composition and applications thereof
06/26/2014US20140178818 Resist composition and patterning process
06/26/2014US20140178817 Curable coatings for photoimaging
06/26/2014US20140178816 Positive Photosensitive Resin Composition, and Organic Insulator Film for Display Device and Display Device Fabricated Using the Same
06/26/2014US20140178815 Photosensitive Resin Composition for Light Blocking Layer and Light Blocking Layer Using the Same
06/26/2014US20140178814 Dry film photoresist having oxygen permeable barrier layer and manufacturing method thereof
06/26/2014US20140178808 Photosensitive resin composition
06/26/2014US20140178807 Photopatternable imaging layers for controlling block copolymer microdomain orientation
06/26/2014US20140178806 Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask
06/26/2014US20140178803 Multiple-Patterning Photolithographic Mask and Method
06/26/2014US20140178634 Coloring composition, method for manufacturing a color filter using the same, color filter and solid-state imaging device
06/26/2014US20140176955 Inspection Methods, Inspection Apparatuses, and Lithographic Apparatuses
06/26/2014US20140176931 Intermittent temperature control of movable optical elements
06/26/2014US20140176930 Microlithographic illumination system
06/26/2014US20140176929 Lithographic Apparatus and Device Manufacturing Method Using Dose Control
06/26/2014US20140176928 Imaging catoptric euv projection optical unit
06/26/2014US20140176927 Optical imaging arrangement with individually actively supported components
06/26/2014US20140176926 Euv optics
06/26/2014US20140176925 Interference exposure device and method
06/26/2014US20140176924 Projection exposure apparatus with optimized adjustment possibility
06/26/2014US20140176923 Wynn-Dyson imaging system with reduced thermal distortion
06/26/2014US20140176922 Debris Removal in High Aspect Structures
06/26/2014US20140176921 Optical assembly with suppression of degradation
06/26/2014US20140176920 Lithography system, method of clamping and wafer table
06/26/2014US20140175347 Photosensitive Resin Composition, Color Filter And Liquid Crystal Display Device
06/26/2014US20140175346 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
06/26/2014US20140175345 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
06/26/2014US20140175343 Photosensitive Resin Composition and Light Blocking Layer Using the Same
06/26/2014US20140175171 System and a method for nano imprinting
06/26/2014DE102012224005A1 Verfahren zur Herstellung einer homogenen Lichtverteilung A process for the preparation of a homogeneous light distribution
06/26/2014DE102012222451A1 Reflective optical element for arrangement near e.g. box in extreme UV lithography device that, has multi-position system for providing wavelength at range, where waves exhibit surface layer with thickness that lies between two thicknesses
06/25/2014EP2746853A2 Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays
06/25/2014EP2746852A2 Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
06/25/2014EP2746851A2 Simulation of the effects of shot noise in a particle beam lithography method, in particular electron beam lithography
06/25/2014EP2746850A1 Method of manufacturing mirror shells of a nested shells grazing incidence mirror
06/25/2014EP2745174A1 Lithographic apparatus and device manufacturing method
06/25/2014CN203673220U 一种绿油显影机的喷淋装置 A green oil sprinkler developing machine
06/25/2014CN203673219U 一种基板检测修复系统 A substrate to check and repair system
06/25/2014CN103890660A 着色感光性组合物、着色间隔物、滤色片及液晶显示装置 The colored photosensitive composition, a coloring spacers, a color filter and liquid crystal display device
06/25/2014CN103890659A 光可聚合不饱和树脂，含有该光可聚合不饱和树脂的光敏树脂组合物，以及由此制备的光屏蔽间隔和液晶显示器件 A photopolymerizable unsaturated resin containing the photopolymerizable unsaturated resin, a photosensitive resin composition, and a light shielding interval and the thus-prepared liquid crystal display device
06/25/2014CN103890658A 用于彩色滤光片的感光性树脂组合物及使用该组合物制成的彩色滤光片 The photosensitive resin composition for a color filter and a color filter made of the composition
06/25/2014CN103890565A 用于光敏层的图案化曝光的曝光设备和方法 Exposure apparatus and method for patterning photosensitive layer is exposed to
06/25/2014CN103890128A 拒墨剂的制造方法、负型感光性树脂组合物、分隔壁以及光学元件 The method of manufacturing an ink repellent agent, and the negative-type photosensitive resin composition of the partition wall and an optical element
06/25/2014CN103888471A 一种用于光刻机的嵌入式远程通信及控制方法 An embedded remote communications and control method for lithography
06/25/2014CN103886806A 带粘附层的透明面材、显示装置及它们的制造方法 A transparent adhesive layer with a surface material, the display device and manufacturing method thereof
06/25/2014CN103885302A 一种装卡光学元件的力反馈精密支撑装置 A chucking force feedback precision optical components supporting device
06/25/2014CN103885301A 浸没式光刻机中浸液传送系统的控制时序的模型匹配方法 Immersion lithography machine to control the timing of the infusion delivery system model matching method
06/25/2014CN103885300A 一种疏水表面光刻工艺 A hydrophobic surface of the photolithography process
06/25/2014CN103885299A 一种曝光系统 An exposure system
06/25/2014CN103885298A 曝光装置及曝光系统 An exposure apparatus and an exposure system
06/25/2014CN103885297A 光刻机曝光系统照明均匀性的校正方法 Lithography exposure system illumination uniformity correction method
06/25/2014CN103885296A 一种掩模板、曝光方法和曝光设备 One kind of mask, exposure apparatus and exposure method
06/25/2014CN103885295A 一种曝光装置及其调焦调平方法 An apparatus and method for focusing leveling exposure
06/25/2014CN103885294A 感光性聚硅氧烷组成物、保护膜及具有保护膜的元件 Photosensitive polysiloxane composition, protective film protective film has elements
06/25/2014CN103885293A 感光性树脂组合物和由其制成的绝缘层 The insulating layer and the photosensitive resin composition prepared therefrom
06/25/2014CN103885292A 感光性树脂组合物、使用其的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element using the same, a method of forming a resist pattern and the printed circuit board
06/25/2014CN103885291A 光敏树脂组合物及使用其的光阻挡层 The photosensitive resin composition and the use thereof in the light blocking layer
06/25/2014CN103885290A 感光性树脂组合物、使用其的感光性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element using the same, a method of forming a resist pattern and the printed circuit board
06/25/2014CN103885289A 感光性树脂组合物、彩色滤光片及其液晶显示元件 The photosensitive resin composition for color filter and the liquid crystal display device
06/25/2014CN103885288A 用于光成像的可固化涂料 For light imaging curable coating
06/25/2014CN103885287A 使用磺酰腙改性酚醛树脂作为产酸剂的感光组合物及其应用 Sulphonyl hydrazone modified phenolic resin as a photosensitive composition of an acid and Its Application
06/25/2014CN103885286A 一种阳图热敏感光组合物及其应用 One kind of positive thermal photosensitive composition and its application
06/25/2014CN103885281A 一种光屏障基板的制备方法 A light barrier method for preparing a substrate
06/25/2014CN103885159A 一种高na投影物镜 A high-na projection objective
06/25/2014CN103885154A 镜头模块及其制作方法 Lens module and manufacturing method thereof
06/25/2014CN103881473A 一种耐黄变感光阻焊油墨及其制备方法 One kind of anti-yellowing photosensitive solder resist ink and its preparation method
06/25/2014CN103881111A 自-组装结构、其制造方法和包含其的制品 Since - assembled structure, its manufacturing method and articles comprising the same
06/25/2014CN103881034A 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版 A laser nano-micron particles and thermoplastic synthetic method and with its production of flat plate
06/25/2014CN103881025A 多层构造的抗溶剂型乙烯基聚合物及其合成方法和用途 A multilayer structure polymer and solvent resistant vinyl synthetic methods and uses
06/25/2014CN103879169A 一种耐uv油墨的阳图热敏ctp版材 One kind uv resistant inks positive thermal ctp plate
06/25/2014CN103879168A 一种长印程热敏版 A long-printing process thermal plate
06/25/2014CN103879166A 非碱性显影紫激光光聚合型平版印刷版及其显影方法 Non-alkaline developer violet photopolymer lithographic printing and developing methods
06/25/2014CN102998893B 使用反射式掩膜版的曝光装置及曝光方法 Use reflective mask exposure apparatus and exposure method
06/25/2014CN102902002B 一种反射式体全息布拉格光栅紫外曝光的方法 A reflection-type volume hologram grating Bragg UV exposure method
06/25/2014CN102841507B 激光直写式纳米周期性结构图案制造设备 Laser direct write-nanometer manufacturing equipment periodic structure pattern
06/25/2014CN102754027B 感光性组合物及印刷配线板 The photosensitive composition, and a printed wiring board
06/25/2014CN102725695B 形成有机抗反射层的异氰脲酸酯化合物和包含所述化合物的组合物 Isocyanurate compounds forming the organic antireflective layer, and a composition comprising said compound
06/25/2014CN102681359B 同步信号触发扫描方式延迟时间测量方法 Synchronization signal to trigger the scan mode delay measurement method
06/25/2014CN102640021B Euv光刻用光学构件及带反射层的euv光刻用衬底的制造方法 Euv lithography method for producing an optical member and euv lithography with a reflective layer of the substrate
06/25/2014CN102603587B 锍化合物、光致产酸剂及其制备方法 Sulfonium compounds, photoacid its preparation method
06/25/2014CN102460299B 感光性改性聚酰亚胺树脂组合物及其用途 Photosensitive modified polyimide resin composition and its use
06/25/2014CN102460240B 滤色器用着色组合物、使用了该组合物的滤色器以及液晶显示装置 The coloring composition for color filter using the composition, a color filter and a liquid crystal display device
06/25/2014CN102458855B 平版印刷版前体 Lithographic printing plate precursor
06/25/2014CN102411386B 一种用于涂胶显影机的温湿度控制器及涂胶显影机 A method for coating developing machine temperature and humidity control and gluing developing machine
06/25/2014CN102165373B 投影系统和光刻设备 The projection system of the lithographic apparatus and
06/25/2014CN102146217B 颜料微粒分散体、光固化性组合物以及该分散体中使用的新化合物 Dispersion of the pigment particles, the light-curable compositions and new compounds used in the dispersion
06/25/2014CN102063022B 用于实现基于模型的扫描器调整方法 The scanner is used to adjust the model-based method
06/25/2014CN102043345B 曝光装置和曝光方法 Exposure apparatus and exposure method
06/25/2014CN101952269B 锍盐引发剂 Sulfonium salt initiator
06/25/2014CN101821081B 利用激光扫描反射计的自动几何校准 The use of automatic geometric calibration of laser scanning reflectometer
06/25/2014CN101727006B 正光敏树脂组合物 Positive photosensitive resin composition
06/25/2014CN101689540B 制造集成电路的方法 The method of manufacturing an integrated circuit
06/24/2014US8760777 Positioning unit and apparatus for adjustment of an optical element
06/24/2014US8760630 Exposure apparatus and method of manufacturing device
06/24/2014US8760627 Lithographic apparatus and method of manufacturing article
06/24/2014US8760625 Lithographic apparatus, aberration detector and device manufacturing method
06/24/2014US8760624 System and method for estimating field curvature
06/24/2014US8760617 Exposure apparatus and method for producing device
06/24/2014US8760616 Lithographic apparatus and surface cleaning method
06/24/2014US8759799 Charged particle beam writing apparatus and charged particle beam writing method
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