Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2007
11/21/2007CN101075092A Method for improving SAC etching process tolerance in COB DRAM manufacture
11/21/2007CN101075091A Photographic soluble organic semiconductor material
11/21/2007CN101075090A Dry film corrosion resisting agent
11/21/2007CN101075089A Method for forming pattern, color filter, structure material and liquid crystal display device
11/21/2007CN101075086A 光掩模和曝光方法 Photomask and exposure method
11/21/2007CN101075085A 图案形成方法 Pattern forming method
11/21/2007CN101075045A Semi-transmissive type liquid-crystal display device and method of fabricating the same
11/21/2007CN101073935A Raster and light valve array processed by electric microcomputer for laser filmsetting and its production
11/21/2007CN100350820C Process for thick film circuit patterning
11/21/2007CN100350565C Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus
11/21/2007CN100350483C Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism
11/21/2007CN100350327C Process for continuous liquid processing of photosensitive compositions having reduced levels of residues
11/21/2007CN100350326C Reticle and optical characteristic measuring method
11/21/2007CN100350319C Liquid crystal display panel and fabricating method thereof
11/21/2007CN100350281C Radioactive-ray sensitive composition for colour optical filter, colouring-layer for mation method and use
11/21/2007CN100349932C Amorphous perfluorinated polymers
11/20/2007US7298770 Laser spectral engineering for lithographic process
11/20/2007US7298546 Ultraviolet light source, laser treatment apparatus comprising ultraviolet light source, and exposure apparatus comprising ultraviolet light source
11/20/2007US7298500 Position sensor
11/20/2007US7298498 Optical property measuring apparatus and optical property measuring method, exposure apparatus and exposure method, and device manufacturing method
11/20/2007US7298494 Methods and systems for interferometric analysis of surfaces and related applications
11/20/2007US7298481 Apparatus and methods for detecting overlay errors using scatterometry
11/20/2007US7298459 Wafer handling method for use in lithography patterning
11/20/2007US7298458 Optical error minimization in a semiconductor manufacturing apparatus
11/20/2007US7298456 System for varying dimensions of a substrate during nanoscale manufacturing
11/20/2007US7298453 Method and apparatus for irradiating a microlithographic substrate
11/20/2007US7298452 Patterning apparatus and method for fabricating continuous pattern using the same
11/20/2007US7298013 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure
11/20/2007US7297971 Alignment systems and methods for lithographic systems
11/20/2007US7297968 Debris collector for EUV light generator
11/20/2007US7297724 Photoiniators having triarylsulfonium and arylsulfinate ions
11/20/2007US7297635 Processing method
11/20/2007US7297616 Methods, photoresists and substrates for ion-implant lithography
11/20/2007US7297472 Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium
11/20/2007US7297471 Method for manufacturing an array of interferometric modulators
11/20/2007US7297470 Forming wafer with thin film, release, and patterned layer of photoresist; layer of metal is added to wafer; heating to above glass transition temperature to cause deformation or cracks; solvent is applied to dissolve release layer and penetrate cracks; etching, milling, baking
11/20/2007US7297469 surface of the resist-material layer is modified, and then the thick-film-paste-material layer is formed thereon, so that there can be reliably avoided the problem that the resist-material layer is dissolved by the thick-film-paste-material layer
11/20/2007US7297468 Applying photosensitive resin; development, etching, transferring patern
11/20/2007US7297467 Hydrophilic layer coated with hydrophobic thermoplastic polymer particles; exposed to infrared light to form precursor; mounted on print cylinder of printing press, develope precursor with aqueous liquid or ink
11/20/2007US7297466 Method of forming a photoresist pattern and method for patterning a layer using a photoresist
11/20/2007US7297465 Postive working lithography printing plate on support, infrared radiadiation absorber, binder and polysiloxane; sensitivity
11/20/2007US7297464 comprising: a siloxane resin, photoacid generator or photobase generator, and a solvent capable of dissolving component and curing acceleration catalyst
11/20/2007US7297463 photosensitive polymer without a footing phenomenon even if there is a post exposure delay between an exposure process and a post-exposure-bake process
11/20/2007US7297462 Heat-sensitive lithographic printing plate precursor
11/20/2007US7297461 An acid- dissociable group-containing polysiloxane and a photoacid generator containing a trifluoromethane sulfonic acid or other fluoroalkyl sulfonic acid compounds
11/20/2007US7297460 Radiation curable ink compositions suitable for ink-jet printing
11/20/2007US7297452 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone
11/20/2007US7297448 Data storage medium comprising colloidal metal and preparation process thereof
11/20/2007US7297374 Single- and multi-photon polymerizable pre-ceramic polymeric compositions
11/20/2007US7297361 In-line deposition processes for circuit fabrication
11/20/2007US7296519 Method and device for transferring a pattern from stamp to a substrate
11/15/2007WO2007129891A1 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
11/15/2007WO2007129753A1 Exposure apparatus and device manufacturing method
11/15/2007WO2007129589A1 Photosensitive resin composition
11/15/2007WO2007129576A1 Photosensitive surface printing plate material
11/15/2007WO2007129442A1 Exposure apparatus
11/15/2007WO2007129389A1 Resist removing line
11/15/2007WO2007129355A1 Device and method for obtaining a substrate structured on micrometric or nanometric scale
11/15/2007WO2007129135A1 Method for transferring a predetermined pattern reducing proximity effects
11/15/2007WO2007128835A1 Optical imaging device with thermal attenuation
11/15/2007WO2007128407A1 Illumination system for euv lithography as well as a first and second optical element for use in an illumination system of this type
11/15/2007WO2007057773A3 Photoactive compounds
11/15/2007WO2007048586A3 Polymer and compositions
11/15/2007WO2001089196A3 Method for controlling calibration and image sharpening of printing plates having integral photomask layer
11/15/2007US20070266364 Method and System for Context-Specific Mask Writing
11/15/2007US20070265406 Light absorbent agent polymer useful for organic anti-reflective coating, and preparation method for the same
11/15/2007US20070264601 Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof
11/15/2007US20070264599 Method for manufacturing semiconductor device using immersion lithography process with filtered air
11/15/2007US20070264598 Method of forming a fine pattern
11/15/2007US20070264595 Method for Multiple Irradiation of a Resist
11/15/2007US20070264594 Method of Inhibiting Photoresist Pattern Collapse
11/15/2007US20070264593 Method for manufacturing semiconductor device using immersion lithography process
11/15/2007US20070264590 Patterning Process, Film Forming Process, Electroluminescence Device Manufacturing Process, Electroluminescence Device, and Electroluminescence Display Apparatus
11/15/2007US20070264588 Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
11/15/2007US20070264587 Resist Composition
11/15/2007US20070264501 Multi-photon reactive compositions with inorganic particles and method for fabricating structures
11/15/2007US20070263199 Illumination System for a Microlithography Projection Exposure Installation
11/15/2007US20070263196 Exposure apparatus and device manufacturing method
11/15/2007US20070263194 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same
11/15/2007US20070263193 Exposure apparatus and method for manufacturing device
11/15/2007US20070263188 Exposure Apparatus And Device Fabrication Method
11/15/2007US20070263186 Exposure apparatus, exposure method, and method for producing device
11/15/2007US20070263185 Exposure apparatus, exposure method, and method for producing device
11/15/2007US20070263184 Immersion lithography fluid control system
11/15/2007US20070263183 Exposure apparatus, exposure method, and method for producing device
11/15/2007US20070261810 Seamless master and method of making same
11/15/2007US20070261600 anti-reflective coatings comprising a polysilsesquioxane polysilicate copolymer; use in photolithography process on a semiconductor wafer
11/15/2007US20070261574 Microcontact printing
11/15/2007DE112004002491T5 Kontaktlose Flash-Speicheranordnung Contactless flash memory array
11/15/2007DE102006058560A1 Verfahren zur Bildung hochaufgelöster Strukturen mit gewünschter Dicke oder hohem Aspektverhältnis mittels eines Trockenfilmresists A method for forming high-resolution structures of the desired thickness or high aspect ratio by a dry film resist
11/15/2007DE102006058559A1 Verfahren zur Bildung hochaufgelöster Strukturen mit gewünschter Dicke oder hohem Aspektverhältnis mittels tiefer Ablation A method for forming high-resolution structures of the desired thickness or high aspect ratio with a deeper ablation
11/15/2007DE102006022361A1 Verfahren zum mehrfachen Bestrahlen eines Resists Method for multiple irradiation of a resist
11/15/2007DE102006022352A1 Anordnung zur Projektion eines Musters von einer EUV-Maske auf ein Substrat Arrangement for projecting a pattern of an EUV mask onto a substrate
11/15/2007DE102006021797A1 Optische Abbildungseinrichtung mit thermischer Dämpfung Optical imaging device with thermal damping
11/15/2007DE102006020991A1 Formkörper aus Glas oder Glaskeramik und Verfahren zu dessen Herstellung Molded article of glass or glass ceramics and process for its preparation
11/15/2007DE102006020734A1 Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem An illumination system for EUV lithography, as well as first and second optical element for use in such an illumination system
11/15/2007DE102006016533A1 Haltevorrichtung für optisches Element Holding device for optical element
11/14/2007EP1855311A1 Two-light flux interference exposure device, two-light flux interference exposure method, semiconductor light emitting element manufacturing method, and semiconductor light emitting element
11/14/2007EP1855161A1 Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types
11/14/2007EP1855160A2 Projection exposure device, projection exposure method and use of a projection lens
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