Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2007
11/28/2007CN100351425C In-line deposition processes for circuit fabrication
11/28/2007CN100351335C Uv-cure adhesive composition for optical disk, cured material and goods
11/27/2007US7302111 Graphics engine for high precision lithography
11/27/2007US7301646 Device and method for the determination of imaging errors and microlithography projection exposure system
11/27/2007US7301634 Apparatus and methods for detecting overlay errors using scatterometry
11/27/2007US7301622 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
11/27/2007US7301615 Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method
11/27/2007US7301607 Wafer table for immersion lithography
11/27/2007US7301606 Supporting plate, stage device, exposure apparatus, and exposure method
11/27/2007US7301605 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
11/27/2007US7301604 Method to predict and identify defocus wafers
11/27/2007US7301602 Stage apparatus and exposure apparatus
11/27/2007US7301161 Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
11/27/2007US7300747 For producing optical materials such as adhesives for optical devices, coating compositions for optical devices, resist materials, prisms, fiber optics, information recording media, filters and plastic lenses
11/27/2007US7300744 Imagewise exposing the light sensitive planographic printing plate material; developing the exposed light sensitive planographic printing plate material with a developer to obtain a planographic printing plate, plate processing the resulting planographic printing plate with a plate protecting solution
11/27/2007US7300743 Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing
11/27/2007US7300740 Lithographic printing plate precursor and lithographic printing method
11/27/2007US7300739 Negative resists based on a acid-catalyzed elimination of polar molecules
11/27/2007US7300738 Thermal recording material, storability before images are recorded thereon (unprocessed stock storability), color formation efficiency, reduced in coloration of a background portion due to exposure to light, image stability
11/27/2007US7300728 Imaging lithographic printing plates, then transferring data to controllers for adjustment; data processing
11/27/2007US7300727 Method for forming temporary image
11/27/2007US7300726 to improve the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; lithographic printing plates
11/27/2007US7300608 Transparent resin pigment carrier with blue and purple pigments
11/27/2007US7300606 Pb free Ag paste composition for PDP address electrode
11/22/2007WO2007133478A2 System for delivery and monitoring of administration of controlled substances
11/22/2007WO2007133072A1 Contamination barrier and lithographic apparatus
11/22/2007WO2007132892A1 Positive photosensitive resin composition containing siloxane compound
11/22/2007WO2007132890A1 Positive photosensitive resin composition and porous film obtained therefrom
11/22/2007WO2007132862A1 Projection optical system, exposure method, exposure apparatus, and method for manufacturing device
11/22/2007WO2007132758A1 Substrate treating method, program, computer-readable storage medium, and substrate treating system
11/22/2007WO2007132724A1 Reactive carboxylate compound, curable resin composition using the same, and use thereof
11/22/2007WO2007132619A1 Imaging optical system, exposure system, and device production method
11/22/2007WO2007132610A1 Exposure apparatus
11/22/2007WO2007132532A1 Photosensitive resin composition and produced therefrom, photosensitive film and stencil for screen printing
11/22/2007WO2007131951A2 Method for making a lithographic printing plate
11/22/2007WO2007131792A1 Process for immersion exposure of a substrate
11/22/2007WO2007131769A1 Backside immersion lithography
11/22/2007WO2007131336A1 New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
11/22/2007WO2007106290A3 Heat treatment of multilayer imageable elements
11/22/2007WO2007044107A3 Multi-level layer
11/22/2007WO2007022124A3 Novel positive photosensitive polybenzoxazole precursor compositions
11/22/2007WO2004077529A3 Edge bead removal for spin-on materials containing low volatility solvents using carbon dioxide cleaning
11/22/2007WO2000007220A3 Wet processing methods for the manufacture of electronic components using ozonated process fluids
11/22/2007US20070269754 Acrylic Polymer and Radiation-Sensitive Resin Composition
11/22/2007US20070269752 unnecessary patterns generated in undesired regions by ghost images are avoided as excess acid generated by the photoacid generator is neutralized and removed; spraying before or after an exposing step; water and polyoxyethylene glycol nonionic surfactant;
11/22/2007US20070269751 Immersion Liquid for Liquid Immersion Lithography Process and Method for Forming Resist Pattern Using Such Immersion Liquid
11/22/2007US20070269750 Colored masking for forming transparent structures
11/22/2007US20070269749 Methods to reduce the minimum pitch in a pattern
11/22/2007US20070269747 Lithography Technique Using Silicone Molds
11/22/2007US20070269746 Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device
11/22/2007US20070269738 Photosensitive Film, Photosensitive Film Laminate and Photosensitive Film Roll
11/22/2007US20070269735 Radiation-Sensitive Resin Composition
11/22/2007US20070269734 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern
11/22/2007US20070269206 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof
11/22/2007US20070268474 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
11/22/2007US20070268471 Lithographic apparatus and device manufacturing method
11/22/2007US20070268468 Immersion lithography fluid control system
11/22/2007US20070267121 Method for Digitally Creating Lithephane-Type Images
11/22/2007US20070266875 Imprint Lithographic Apparatus, Device Manufacturing Method and Device Manufactured Thereby
11/22/2007DE102007022571A1 Belichtungssystem und Fotolithografiegerät Exposure system and photolithography equipment
11/22/2007DE102007021649A1 Optical environment effect correcting method for use during reproduction of sample, involves arranging optical units between object surface and image surface, and arranging Fourier-transformed pupil surface on image surface
11/22/2007DE102007007080A1 Mustererzeugungsverfahren und Einrichtung zum Schreiben mit geladenen Teilchen Pattern generation method and means for writing with charged particles
11/22/2007DE102006023876A1 Optische Abbildungseinrichtung Optical imaging device
11/22/2007DE102006023159A1 Herstellungsverfahren für Dokumente mit Hologramm sowie Hologramm Manufacturing processes for documents with hologram and hologram
11/22/2007DE102006022958A1 Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs Projection exposure apparatus, projection exposure method and using a projection lens
11/21/2007EP1857882A2 Optical imaging device
11/21/2007EP1857881A1 Lithographic apparatus and device manufacturing method
11/21/2007EP1857880A1 Exposure method and apparatus and device manufacturing method
11/21/2007EP1857879A1 An illumination system and a photolithography apparatus
11/21/2007EP1857878A1 Active vibration isolating system with combined position actuator
11/21/2007EP1857877A1 Photosensitive planographic printing plate material
11/21/2007EP1857294A1 Material of lithographic printing plate, process for producing material of lithographic printing plate, and method of printing
11/21/2007EP1857293A1 Material of lithographic printing plate and method of printing
11/21/2007EP1857292A1 Lithographic printing plate material, method of printing therewith and method of recovering plastic support
11/21/2007EP1857276A2 Polymerizable composition and planographic printing plate precursor
11/21/2007EP1856717A2 Stabilized photoresist structure for etching process
11/21/2007EP1856578A2 Microlithography projection system with an accessible diaphragm or aperture stop
11/21/2007EP1856577A1 Positive dry film photoresist and composition for preparing the same
11/21/2007EP1856177A1 Carboxyl group-containing polyurethane and thermosetting resin composition using the same
11/21/2007EP1855861A2 Surface and site-specific polymerization by direct-write lithography
11/21/2007EP1491560B1 Process for the production of high-molecular compounds for photoresist
11/21/2007EP1365290B1 Resist composition
11/21/2007EP1303729B1 Item storage and retrieval system
11/21/2007CN200979606Y A raster single-forming device
11/21/2007CN101076877A Substrate holding apparatus, exposure apparatus and device manufacturing method
11/21/2007CN101076876A Temperature regulation method and system for low flow rate liquid
11/21/2007CN101076860A Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film
11/21/2007CN101076760A Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
11/21/2007CN101076759A Cleaning liquid for lithography and method for resist pattern formation
11/21/2007CN101076758A Matte agent for infrared-sensitive planographic printing plate and use thereof
11/21/2007CN101076436A Compliant device for nano-scale manufacturing
11/21/2007CN101075553A Substrate processing method and substrate processing apparatus
11/21/2007CN101075552A Method of removing ion implanted photoresist
11/21/2007CN101075099A Modulator
11/21/2007CN101075098A Ultrathin triple-freedom inching work table
11/21/2007CN101075097A Photo-etching equipment and method for manufacturing device
11/21/2007CN101075096A System for balancing and positioning work table of photoetching device
11/21/2007CN101075095A Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrate circuit
11/21/2007CN101075094A Method for producing COB-DRAM bit line with nitrogen-oxygen-nitrogen SAC structure
11/21/2007CN101075093A Method for producing COB DRAM bit line for preventing it from collapse
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