Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2007
12/04/2007CA2283850C Method for manufacturing a stent
11/2007
11/29/2007WO2007136123A1 Chucks for reticles and other planar bodies
11/29/2007WO2007136089A1 Maintenance method, exposure method and apparatus, and device manufacturing method
11/29/2007WO2007136052A1 Exposure method and apparatus, maintenance method, and device manufacturing method
11/29/2007WO2007135990A1 Exposure method and apparatus, maintenance method and device manufacturing method
11/29/2007WO2007135962A1 Curable composition, cured product, color filter, and liquid crystal display device
11/29/2007WO2007135894A1 Photosensitive composition, sheet for photosensitive resist, method for forming resist pattern, and method for manufacturing printed wiring board
11/29/2007WO2007135836A1 Positive resist composition for immersion exposure and method of forming resist pattern
11/29/2007WO2007077207A3 Photopolymer composition suitable for lithographic printing plates
11/29/2007WO2007076361A3 Improving resist resolution using anisotropic acid diffusion
11/29/2007WO2007070486A3 Biosensors and methods for making and using them
11/29/2007WO2006132672A3 A method of nanopatterning, a cured resist film use therein, and an article including the resist film
11/29/2007WO2006023489A3 Cyclic error compensation in interferometry systems
11/29/2007US20070275556 Fabrication Method
11/29/2007US20070275332 Method for producing high resolution nano-imprinting masters
11/29/2007US20070275331 Pattern forming method and method for manufacturing semiconductor device
11/29/2007US20070275330 Bottom anti-reflective coating
11/29/2007US20070275329 System and Method for Characterizing Lithography Effects on a Wafer
11/29/2007US20070275328 Decomposable composition and method for using the same
11/29/2007US20070275327 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method
11/29/2007US20070275307 Resist Composition and Method for Forming Resist Pattern
11/29/2007US20070275246 Biolithographical Deposition and Materials and Devices Formed Therefrom
11/29/2007US20070273965 CATADIOPTRIC PROJECTION SYSTEM FOR 157nm LITHOGRAPHY
11/29/2007US20070273869 Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus
11/29/2007US20070273857 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/29/2007US20070273855 Patterning Systems Using Protomasks Including Shadowing Elements Therein
11/29/2007US20070273850 Extreme Ultra Violet Lithography Apparatus
11/29/2007US20070273029 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same
11/29/2007US20070272669 Laser Multiplexing
11/29/2007US20070272282 Composition for Removing Photoresist and Method for Removing Photoresist
11/29/2007US20070272275 Composition and Method for Photoresist Removal
11/29/2007DE10347682B4 Verfahren zur Herstellung zweischichtiger wärmeempfindlicher bebilderbarer Elemente A process for producing two-layer heat-sensitive imageable elements
11/29/2007DE10221648B4 Verfahren zur Erzeugung eines Maskensatzes für die Lithografie umfassend zumindest eine Maske sowie Verfahren zur Abbildung von Strukturen eines vorgegebenen Layouts in eine gemeinsame Belichtungsebene A method for generating a mask set for lithography comprising at least one mask and method for imaging structures of a given layout in a common exposure level
11/29/2007DE102007023581A1 Zusammensetzung zur Ausbildung eines Musters und in-plane-Druckverfahren unter Verwendung derselben A composition for forming a pattern, and in-plane pressure method using the same
11/29/2007DE102006025025A1 Illumination system for microlithography projection exposure system, has lens group with zoom systems connected one after other such that entrance light distribution in entrance surface is transferred into withdrawal light distribution
11/29/2007DE102006024810A1 Projection lens for use in microlithographic projection illumination system, has actuation device, with which flat deflecting reflector is bent for correction of non-rotational symmetric aberrations exactly around bending axis
11/29/2007DE102004059034B4 Verfahren zum Herstellen einer Hartmaske in einem Kondensatorbauelement und eine Hartmaske zur Verwendung in einem Kondensatorbauelement A method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device
11/28/2007EP1860508A2 Composition and method for photoresist removal
11/28/2007EP1860507A1 Lithographic apparatus and lithographic apparatus cleaning method
11/28/2007EP1860506A1 Lithographic apparatus and device manufacturing method
11/28/2007EP1860505A1 Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types
11/28/2007EP1860504A1 Photosensitive composition containing organic fine particles
11/28/2007EP1860503A2 Colored photosensitive resin composition, color filter, image sensor, and camera system
11/28/2007EP1860502A1 Colored photosensitive resin composition, color filter, image sensor, and camera system
11/28/2007EP1860501A2 Method for producing high-resolution nano-imprint masters
11/28/2007EP1860499A2 Process for making a printing form
11/28/2007EP1860477A1 Projection optical system, exposure equipment and device manufacturing method
11/28/2007EP1860342A1 Vibration isolation system
11/28/2007EP1859955A1 Lithographic printing plate making method and image exposing system
11/28/2007EP1540417A4 Photosensitive bottom anti-reflective coatings
11/28/2007CN101080807A Exposure apparatus, exposure method, device manufacturing method, and system
11/28/2007CN101080675A Image exposing method and apparatus
11/28/2007CN101080674A Composition for forming antireflection film, layered product, and method of forming resist pattern
11/28/2007CN101080673A Resist composition for liquid immersion exposure and method for resist pattern formation
11/28/2007CN101080672A Porous holographic film
11/28/2007CN101080670A Method for patterning surface modification
11/28/2007CN101080467A Actinic energy ray curable resion composition and use thereof
11/28/2007CN101079378A Cleaning method of crystal column surface
11/28/2007CN101079150A Outline definition apparatus and outline definition method, and image processing apparatus
11/28/2007CN101078892A Composition and method for photoresist removal
11/28/2007CN101078891A Thin film removing method and apparatus
11/28/2007CN101078890A Method for eliminating air bubble from photoresist and stud bump making method
11/28/2007CN101078889A 6 freedom degree micromotion operating platform
11/28/2007CN101078888A Polarizing transforming element, optical lighting device, exposure device and exposure method
11/28/2007CN101078887A Lithographic apparatus and lithographic apparatus cleaning method
11/28/2007CN101078886A Image recording method and image recording apparatus
11/28/2007CN101078885A Device and method for providing uniform and stable surface light source in photoetching technique
11/28/2007CN101078884A Photolithographic system exposal lens structure constituted by lens set and the assembling and regulation method
11/28/2007CN101078883A Method for manufacturing thin film transistor substrate using maskless exposing device
11/28/2007CN101078882A Apparatus and method for measuring widthwise ejection uniformity of slit nozzle
11/28/2007CN101078881A Apparatus and method for measuring widthwise ejection uniformity of slit nozzle
11/28/2007CN101078880A Composition for forming pattern and in-plane printing method using the same
11/28/2007CN101078879A Radiation sensitive resin composition, alternation compound and forming method thereof
11/28/2007CN101078878A Colored photosensitive resin composition, color filter, image sensor, and camera system
11/28/2007CN101078877A Colored photosensitive resin composition, color filter, image sensor, and camera system
11/28/2007CN101078876A Green photonasty resin composition, transfer printing material, color filter and display device
11/28/2007CN101078875A Image forming method
11/28/2007CN101078874A Method for producing high-resolution nano-imprint masters
11/28/2007CN101078873A Method for etching complex pattern on 3-D abnormal curved surface
11/28/2007CN101078843A TFT LCD array substrate structure and its production method
11/28/2007CN101078842A TFT LCD array substrate structure and its production method
11/28/2007CN101078820A Processing method for rendering transparent electrode on transparent substrate invisible
11/28/2007CN101078814A Polarizing transforming element, optical lighting device, exposure device and exposure method
11/28/2007CN101078813A Polarizing transforming element, optical lighting device, exposure device and exposure method
11/28/2007CN101078812A Polarizing transforming element, optical lighting device, exposure device and exposure method
11/28/2007CN101078811A Polarizing transforming element, optical lighting device, exposure device and exposure method
11/28/2007CN101078787A Color separation filtering array forming method
11/28/2007CN101078782A Multilayer-optical film and its production method
11/28/2007CN101077768A Tiny structure body, pattern medium and preparation method thereof
11/28/2007CN100352147C Reacting force treating system of operation table device
11/28/2007CN100352001C Structure for lithography process and method for manufacturing semiconductor component
11/28/2007CN100351704C Attaching a pellicle frame to a reticle
11/28/2007CN100351703C Method for mfg. photoetching device and component
11/28/2007CN100351702C UV curable powder suitable for use as a photoresist
11/28/2007CN100351701C Holotype photoresist composite for discharge nozzle type coating method and resist pattern forming method
11/28/2007CN100351700C Radiation-sensitive resin composition
11/28/2007CN100351699C Lithographic apparatus and device manufacturing method
11/28/2007CN100351687C Liquid crystal display and method of producing the same
11/28/2007CN100351656C Coloration-photosensitive resin composition
11/28/2007CN100351653C Primary microlens mask forming method
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