Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2007
12/06/2007US20070281098 Composition for forming antireflection coating
12/06/2007US20070279768 Optical Element Holding Device, Lens Barrel, Exposing Device, and Device Producing Method
12/06/2007US20070279613 Transmission Filter Apparatus
12/06/2007US20070279607 Method And Apparatus For Self-Referenced Wafer Stage Positional Error Mapping
12/06/2007US20070279604 Lithography systems and processes
12/06/2007US20070279535 Illumination System For A Microlithography Projection Exposure Installation
12/06/2007US20070278429 High flux, high energy photon source
12/06/2007US20070278425 Method of operating emitter for electron-beam projection lithography system
12/06/2007US20070278424 Method and apparatus to improve lithography throughput
12/06/2007DE60221790T2 Verfahren und vorrichtung zur effizienten und genauen filterung und interpolation Method and apparatus for efficient and accurate filtering and interpolation
12/06/2007DE19936626B4 Resistentfernungsmittel und Resistentfernungsverfahren Resist remover and resist removal method
12/06/2007DE102007024961A1 Vorrichtung zum Ändern des Abstandes zwischen Lichtstrahlachsen und Substratbelichtungsvorrichtung A device for changing the distance between the light beam axis and substrate exposure apparatus
12/06/2007DE102006046392A1 Fotolithografievorrichtung und -verfahren Photolithography apparatus and method
12/06/2007DE102006026032A1 Illumination system for use during manufacturing of e.g. integrated circuit, has optical units arranged between collector and illumination field, and optical axis deflected onto illumination-main level around preset degrees
12/06/2007DE102006024741A1 Semiconductor device manufacturing method, involves providing semiconductor substrate available with surface, and layer pile comprising conductive layer on substrate surface
12/06/2007DE10144874B4 Verfahren und Vorrichtung zum homogenen Auftragen einer Lackschicht auf vorvereinzelte Substrate Method and apparatus for applying a homogeneous coating layer on substrates vorvereinzelte
12/06/2007CA2649088A1 Negative-working radiation-sensitive compositions and imageable materials
12/05/2007EP1863071A1 Shot shape measuring method, mask
12/05/2007EP1863070A1 Exposure apparatus and method for manufacturing device
12/05/2007EP1862857A2 Method and apparatus for determining a process model for integrated circuit fabrication
12/05/2007EP1862856A1 Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
12/05/2007EP1862855A1 Photosensitive resin composition
12/05/2007EP1862854A1 Decomposable composition and method for using the same
12/05/2007EP1862853A2 Pattern forming method and pattern forming apparatus
12/05/2007EP1862505A2 Resin composition for printed wiring board film and use thereof
12/05/2007EP1861751A1 Positive-working photoresist composition for thick film formation
12/05/2007EP1861750A2 Pretreatment compositions
12/05/2007EP1861749A2 Novel photosensitive resin compositions
12/05/2007EP1861694A2 Method for producing three-dimensional fine structures
12/05/2007EP1751601B1 Catadioptric projection objective with intermediate images
12/05/2007EP1554033A4 Improved semiconductor stress buffer coating edge bead removal compositions and method for their use
12/05/2007EP1523697B1 Method for the production of photoresist structures
12/05/2007EP1373980A4 High performance, photoimageable resin compositions and printing plates prepared therefrom
12/05/2007CN101084473A Cleaning liquid for lithography and method of cleaning therewith
12/05/2007CN101084472A Monolithic polarization controlled angle diffusers, associated methods and lithographic systems incorporating controlled angle diffusers
12/05/2007CN101084471A Support structure and lithographic apparatus
12/05/2007CN101084470A Material for pattern formation, apparatus for pattern formation, and method for pattern formation
12/05/2007CN101084469A Surface patterning and via manufacturing employing controlled precipitative growth
12/05/2007CN101084468A Material composition for nano-and micro-lithography
12/05/2007CN101083208A Apparatus for processing substrate and method of doing the same
12/05/2007CN101082783A Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
12/05/2007CN101082782A Exposure device and method
12/05/2007CN101082781A Tracing system
12/05/2007CN101082780A Device for changing pitch between light beam axes, and substrate exposure apparatus
12/05/2007CN101082779A Lithographic apparatus and device manufacturing method
12/05/2007CN101082778A On-line testing apparatus of projection objective
12/05/2007CN101082777A Projection objective detecting method
12/05/2007CN101082776A 干涉仪 Interferometer
12/05/2007CN101082775A Vertically delicate adjusting and gravity force compensating mechanism and photo-etching machine
12/05/2007CN101082774A Pattern forming material and device and method
12/05/2007CN101082773A Photo- and thermo-setting solder resist composition and printed wire board using same
12/05/2007CN101082772A Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
12/05/2007CN101082771A Photosensitive resin composition for colorful color filter
12/05/2007CN101082770A Pattern forming method and pattern forming apparatus
12/05/2007CN101082769A Method for copying surface basso-relievo microstructure based on Darman raster
12/05/2007CN101082729A Liquid crystal display board, colorful color filter and manufacturing method thereof
12/05/2007CN101082721A Method for manufacturing semi-reflective semi-transmitting liquid crystal display device
12/05/2007CN101082685A Dry film and method for producing colorful color filter with dry film
12/05/2007CN101082684A Paint dispersion combination, optical solidification combination, filter produced thereof and producing method
12/05/2007CN101081943A Pigment dispersion combination, photo-sensitive resin combination, trans-printing material, filter, liquid display device and ccd device
12/05/2007CN101081941A Organic nano particle and dispersive combination, photo-sensitive resin combination, trans-printing material, filter, liquid display device and CCD device
12/05/2007CN100353495C Method of forming light resist pattern by using reflect nearby effect
12/05/2007CN100353488C Method for producing semiconductor device and cleaning device for resist stripping
12/05/2007CN100353244C Liquid crystal display device, and its manufacturing method anbd transistor array substrate and manufacturing method
12/05/2007CN100353224C Method for manufacturing liquid crystal display device
12/05/2007CN100353209C Optical system for compensating spacial dispersion
12/05/2007CN100353207C Imaging methods
12/05/2007CN100353204C Method and apparatus for determining the focal position during imaging of a sample
12/05/2007CN100352870C Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same
12/05/2007CN100352849C Water radical developing copolymerized type photosensitive polyimide material and preparation process thereof
12/04/2007US7304775 Actively stabilized, single input beam, interference lithography system and method
12/04/2007US7304749 Point diffraction interferometer and exposure apparatus and method using the same
12/04/2007US7304721 Method for dynamically monitoring a reticle
12/04/2007US7304720 System for using a two part cover for protecting a reticle
12/04/2007US7304719 Patterned grid element polarizer
12/04/2007US7304717 Imaging device in a projection exposure facility
12/04/2007US7304716 Method for purging an optical lens
12/04/2007US7304715 Lithographic apparatus and device manufacturing method
12/04/2007US7304318 System and method for maskless lithography using an array of sources and an array of focusing elements
12/04/2007US7304190 Photoresist compositions comprising diamondoid derivatives
12/04/2007US7304001 Fabrication methods of semiconductor integrated circuit device and photomask
12/04/2007US7303995 Method for reducing dimensions between patterns on a photoresist
12/04/2007US7303862 Microfabrication methods and devices
12/04/2007US7303861 Apparatus and method for making a forming structure
12/04/2007US7303860 Forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer
12/04/2007US7303859 Photoresist, photolithography method using the same, and method for producing photoresist
12/04/2007US7303858 Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device
12/04/2007US7303857 Photosensitive composition and planographic printing plate precursor
12/04/2007US7303856 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer
12/04/2007US7303855 Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect
12/04/2007US7303854 Electrode-forming composition for field emission type of display device, and method using such a composition
12/04/2007US7303853 For use in fabrication of microelectronic, micro-optical and micromechanical devices
12/04/2007US7303852 Resolution; sensitivity; heat stability and shelf stability
12/04/2007US7303849 Polymer having a hydrophilic graft chain crosslinked by hydrolyzing or polycondensing an alkoxide of Si, Ti, Zr or Al; improved printing stain resistance and printing resistance
12/04/2007US7303845 Generating mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction tofirst mask pattern data, generating second mask pattern data from design data under second condition, generating second corrected pattern, comparing
12/04/2007US7303843 Faster wafer fabrication without wasting exposure area; simultaneous evaluation
12/04/2007US7303785 Antireflective film material, and antireflective film and pattern formation method using the same
12/04/2007US7303627 Method for making low-stress large-volume not-(111)-oriented crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby
12/04/2007US7303383 Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
12/04/2007US7303243 Pattern drawing apparatus and pattern drawing method for forming patterns, that have mirror image relationship to each other with respect to a substrate, on both sides of the substrate, and test apparatus for use in the pattern drawing apparatus
1 ... 466 467 468 469 470 471 472 473 474 475 476 477 478 479 480 481 482 483 484 485 486 ... 1272