Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2007
12/12/2007CN101088048A Lensed fiber array for sub-micron optical lithography patterning
12/12/2007CN101088047A Material for forming resist protection films and method for resist pattern formation with the same
12/12/2007CN101088046A Compound for resist and radiation-sensitive composition
12/12/2007CN101088045A Imprint reference template for multilayer or multipattern registration and method therefor
12/12/2007CN101088044A Nanofabrication based on sam growth
12/12/2007CN101086966A A making method for nano coulomb structure
12/12/2007CN101086961A Method of forming a semiconductor device
12/12/2007CN101086631A Substrate processing method and substrate processing apparatus
12/12/2007CN101086630A Baking unit having device for sensing the attitude of parts of the unit and method of use of the baking unit
12/12/2007CN101086629A Reflecting mirror array for lithography
12/12/2007CN101086628A Lithographic apparatus and device manufacturing method
12/12/2007CN101086627A Bump photolithographic machine exposal method
12/12/2007CN101086626A Lithography
12/12/2007CN101086625A Lithography device and its method
12/12/2007CN101086624A Lithography systems and processes
12/12/2007CN101086623A Method for rendering optical approximate revision more accurate based on model
12/12/2007CN101086622A Method for using inverse scattering belt
12/12/2007CN101086621A Planographic printing plate precursor and pile of planographic printing plate precursors
12/12/2007CN101086620A Salt adapted for acid generating agent and chemical enlarging type positive corrosion-resisting agent composition containing the same
12/12/2007CN101086619A Color photosensitive resin compositions
12/12/2007CN101086618A Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production
12/12/2007CN101086617A Light solidifying composition and burned object pattern obtained using the same
12/12/2007CN101086616A Components pattern, wiring structural body and manufacturing method for image display device
12/12/2007CN101086615A Printing resist, method for preparing the same and patterning method using the same
12/12/2007CN101086614A Micrometer-class three-dimensional rolling die and its production method
12/12/2007CN101086613A Reticle, semiconductor chip and method of manufacturing semiconductor device
12/12/2007CN101085578A Screen printing technique for polyolefin plastic products
12/12/2007CN100355061C In-print method and in-print device
12/12/2007CN100355056C Method for detecting silicon chip state in chip case and repositioning its circle center
12/12/2007CN100355055C Method for controlling pre-aligning of silicon wafer
12/12/2007CN100355053C Probability constrained optimization for electrical fabrication control
12/12/2007CN100355024C Method for forming resist pattern and method for manufacturing semiconductor device
12/12/2007CN100355023C Semiconductor fabrication apparatus and pattern formation method using the same
12/12/2007CN100355022C Illuminating method, exposing method, and device for therefor
12/12/2007CN100354757C Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus
12/12/2007CN100354756C 正型感光性树脂组合物 The positive photosensitive resin composition
12/12/2007CN100354755C External coating composition for photoresist agent and method for forming photoresist agent pattern using said composition
12/12/2007CN100354754C Methods for patterning polymer films, and use of the methods
12/12/2007CN100354712C Flat-board display device and method and device for making same
12/12/2007CN100354708C Method of manufacturing substrate for liquid crystal display device and method of manufacturing liquid crystal display device using same
12/12/2007CN100354663C Method for producing color filter
12/12/2007CN100354661C Photosensitive resin compsn. controlling solubility and pattern formation method of double-layer structure using same
12/12/2007CN100354315C Polymeric photoinitiators
12/12/2007CN100354257C Sulfonate and a resist composition
12/12/2007CN100354133C Injection head cap and liquid drop injection device having same, method for mfg of photoelectric device
12/11/2007US7308568 Network interface with double date rate and delay locked loop
12/11/2007US7307783 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
12/11/2007US7307715 Method for the formation of a structure size measured value
12/11/2007US7307712 Method of detecting mask defects, a computer program and reference substrate
12/11/2007US7307698 Exposure apparatus and device manufacturing method
12/11/2007US7307697 Adaptive shape substrate support system
12/11/2007US7307696 Lithographic apparatus and device manufacturing method
12/11/2007US7307695 Method and device for alignment of a substrate
12/11/2007US7307693 Illumination optical device, photolithography machine, and exposure method
12/11/2007US7307692 Exposure apparatus and device manufacturing method
12/11/2007US7307691 Maskless direct exposure system and user interface
12/11/2007US7307382 Flat display device including an overflow barrier
12/11/2007US7307263 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
12/11/2007US7307259 System and method for controlling composition for lithography process in real time using near infrared spectrometer
12/11/2007US7307123 For stereolithography, allow for variation in color, opacity, and surface properties, form opaque white or colored objects
12/11/2007US7307020 Membrane 3D IC fabrication
12/11/2007US7306898 Imagewise exposing, with an infrared laser, a planographic printing plate precursor including a substrate and an image recording layer provided thereon, removing unexposed areas , feeding an oil based ink and an aqueous component onto the planographic printing plate precursor in the printer
12/11/2007US7306897 Coating solution containing colloid of spherical metal oxide particles applied on substrate is heated to dry
12/11/2007US7306895 graft polymerization on supports having polymerization initiation layers obtained by fixing or crosslinking polymers
12/11/2007US7306894 Unsaturaed monomer, photoinitiator (titanocene), benzotriazole sensitizer; exposure to laser light having a wavelength of 450 nm or shorter; scanning exposure adapted for computer-to-plate systems; storage stability; can reproduce halftone dot area with a high fidelity after accelerated aging
12/11/2007US7306893 Image recording material and planographic printing plate
12/11/2007US7306892 Undercoating containing chromogen; covering with photoresist which forms images when exposured to radiation wavelengths
12/11/2007US7306890 Aluminum alloy plate for lithographic printing form and method for production thereof and lithographic printing form
12/11/2007US7306883 Color filter; liquid crystal display
12/11/2007US7306882 Quartz substrate with a partially dug main surface covered with a Cr film; dug portion has an undercut so that Cr film partially serves as an eaves; a subopening exposes an end of the dug portion; allows an eaves to be directly, accurately measured
12/11/2007US7306881 Method and system of lithography using masks having gray-tone features
12/11/2007US7306853 Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material
12/11/2007US7306850 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
12/11/2007US7306742 Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
12/11/2007US7306680 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
12/06/2007WO2007139687A1 Negative-working radiation-sensitive compositions and imageable materials
12/06/2007WO2007139312A1 Colored negative photoresist composition, colored pattern comprising the same, and method for producing the colored pattern
12/06/2007WO2007139268A1 Antireflective hardmask composition
12/06/2007WO2007139007A1 Heat curable composition for protective film, cured product, and liquid crystal display device
12/06/2007WO2007139006A1 Thermosetting composition for protective film, cured object, and liquid-crystal display
12/06/2007WO2007139005A1 Heat curable composition for protective film, cured product, and liquid crystal display device
12/06/2007WO2007138893A1 Positive resist composition and method for formation of resist pattern
12/06/2007WO2007138873A1 Resist composition for immersion exposure, and method for formation of resist pattern
12/06/2007WO2007138834A1 Exposure apparatus and exposure method
12/06/2007WO2007138797A1 Positive resist composition and method of forming resist pattern
12/06/2007WO2007138356A1 Maskless photopolymer exposure process and apparatus
12/06/2007WO2007137763A2 Illumination system for a microlithography projection exposure apparatus and projection exposure
12/06/2007WO2007110719A3 Improved alkaline solutions for post cmp cleaning processes
12/06/2007WO2007094848A3 Antireflective coating material
12/06/2007WO2007081913A3 Surface plasmon enhanced radiation methods and apparatus
12/06/2007WO2007019031A3 Radiation-sensitive compositions and imageable materials
12/06/2007US20070282030 Multibeam interference; pyrolysis; chemical vapor deposition
12/06/2007US20070281249 Novel nanoparticle patterning process
12/06/2007US20070281248 Photoresist stabilization technique used in a double exposure process such that a patterned photoresist layer remains intact during a subsequent lithographic sub-process; cross-linking and modification of outer surfaces solvent, etch, and intense ion implantation resistances
12/06/2007US20070281246 Processing method of light sensitive planographic printing plate material
12/06/2007US20070281243 Base Material for Pattern Forming Material, Positive Resist Composition and Method of Resist Formation
12/06/2007US20070281242 as photoresist with improved lithographic properties such as etch-resistance, transparency, resolution, sensitivity, focus latitude, low line edge roughness, and adhesion; reacting a polysilsesquioxane with e.g. t-butyl 2-trifluoromethylacrylate or t-butyl ester of norbornene to modify it
12/06/2007US20070281221 Stencil mask
12/06/2007US20070281220 self-organizing; photolithography; integrated circuits; photomasks; etching; random access memory
12/06/2007US20070281219 Masking techniques and contact imprint reticles for dense semiconductor fabrication
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