Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2007
12/19/2007EP1487605B1 Device and method for laser structuring functional polymers and the uses thereof
12/19/2007CN200993726Y Liquid spraying equipment
12/19/2007CN101091233A Exposure apparatus, exposure method, and device production method
12/19/2007CN101091138A Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space
12/19/2007CN101090067A Manufacturing method of semiconductor device
12/19/2007CN101090064A Liquid processing apparatus and method
12/19/2007CN101090063A Liquid processing apparatus
12/19/2007CN101089734A Cleaning method for photoetching glue residue
12/19/2007CN101089733A A method of characterising the transmission losses of an optical system
12/19/2007CN101089732A Lighting device for exposal
12/19/2007CN101089731A Fabrication apparatus and method of fabricating a soft mold using same
12/19/2007CN101089730A Method for raising fine quality of semiconductor chip
12/19/2007CN101089711A Liquid crystal display device and a manufacturing method thereof
12/19/2007CN101089692A Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof
12/19/2007CN101088781A Process of making glass etching and silver plating ornament picture
12/19/2007CN100356513C Semi conductor element having reduced spacing and its forming method
12/19/2007CN100356511C Film forming method and substrate board treatment method
12/19/2007CN100356258C Method for making metallic reflective layer of silicon based LCD device
12/19/2007CN100356230C Projector and projection method
12/19/2007CN100356216C Method of preparing long period bar wave guide optical grating on optical glass surface
12/19/2007CN100356204C Photosensitive composition, photosensitive color composition, color filter, and liquid crystal display equipemnt
12/19/2007CN100355743C 3- or 4- carbonyl substituted coumarin connected with naphthenones and its synthesis method and use
12/18/2007US7310789 Use of overlay diagnostics for enhanced automatic process control
12/18/2007US7310187 Projection objective, especially for microlithography, and method for adjusting a projection objective
12/18/2007US7310152 Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
12/18/2007US7310146 Mark position measuring method and apparatus
12/18/2007US7310141 Inspection device and inspection method for pattern profile, exposure system
12/18/2007US7310129 Method for carrying out a double or multiple exposure
12/18/2007US7309871 Collector for EUV light source
12/18/2007US7309869 Lithographic apparatus, device manufacturing method and radiation system
12/18/2007US7309750 Cyanoadamantyl compounds and polymers
12/18/2007US7309563 Patterning using wax printing and lift off
12/18/2007US7309560 Composition for forming anti-reflective coating
12/18/2007US7309559 Resist pattern, process for producing same, and utilization thereof
12/18/2007US7309550 Photosensitive composition with low yellowing under UV-light and sunlight exposure
12/18/2007US7309515 Method for fabricating an imprint mold structure
12/13/2007WO2007142603A1 An integrated shadow mask and method of fabrication thereof
12/13/2007WO2007142351A1 Apparatus with mobile body, exposure apparatus, exposure method and device manufacturing method
12/13/2007WO2007142350A1 Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method
12/13/2007WO2007142293A1 Red coloring composition for color filter
12/13/2007WO2007142250A1 Gap measuring method, imprint method, and imprint apparatus
12/13/2007WO2007142209A1 Method for pattern formation and high-carbon-containing resin composition
12/13/2007WO2007142124A1 Crosslinkable prepolymer, process for production thereof, and use thereof
12/13/2007WO2007142088A1 Method of forming resist pattern by nanoimprint lithography
12/13/2007WO2007142029A1 Method for treating photosensitive lithographic printing plate material
12/13/2007WO2007141852A1 Exposure method and exposure apparatus
12/13/2007WO2007141829A1 Photosensitive resin and photosensitive resin composition
12/13/2007WO2007140663A1 Large-field unit-magnification projection optical system
12/13/2007WO2007140643A1 Manufacturing a replication tool
12/13/2007WO2006099380A3 Photoimageable, thermosettable fluorinated resists
12/13/2007US20070288113 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device
12/13/2007US20070287104 Photo-definable self-assembled materials
12/13/2007US20070287102 Pattern formation method
12/13/2007US20070287101 Double exposure technology using high etching selectivity
12/13/2007US20070287100 Near-field exposure method
12/13/2007US20070287098 Mehtod for preparation of lithographic printing plate and lithographic printing plate
12/13/2007US20070287092 Method for Producing a Base Material for Screen Printing, and Base Material of this Type
12/13/2007US20070287078 Reticle, semiconductor die and method of manufacturing semiconductor device
12/13/2007US20070287076 Extreme Ultraviolet; stress compensation layer between substrate and reflection layer; for fine semiconductor device photolithography; precision; molybdenum and silicon films; silicon wafers
12/13/2007US20070287072 Mask substrate depth adjustment to adjust for topography on surface
12/13/2007US20070285798 Off-axis projection optics and extreme ultraviolet lithograhy apparatus employing the same
12/13/2007US20070285644 Microlithographic Projection Exposure Apparatus
12/13/2007US20070285640 Exposure apparatus and method
12/13/2007US20070285637 Imaging System for a Microlithographical Projection Light System
12/13/2007US20070285635 Exposure apparatus, removal method, and device manufacturing method
12/13/2007US20070284547 Method for Enabling Transmission of Substantially Equal Amounts of Energy
12/13/2007US20070283591 EUV-lithography apparatus having a chamber for cleaning an optical element
12/13/2007DE4413821B4 Phasenschiebemaske und Verfahren zu deren Herstellung Phase-shifting mask and a process for their preparation
12/13/2007DE10209602B4 Vorrichtung zur Übergabe von Kassetten für Druckplatten Apparatus for transferring cassettes for printing plates
12/13/2007DE102004024924B4 Verfahren zum Herstellen polykristallinen Siliciums, Verfahren zum Herstellen einer Ausrichtungsmarkierung, sowie Verfahren zum Herstellen eines Schaltelements A method for producing polycrystalline silicon, methods of making an alignment mark, as well as methods for producing a switching element
12/12/2007EP1865542A1 Exposure apparatus, exposure method, and device production method
12/12/2007EP1865541A1 Exposure method, exposure apparatus and device manufacturing method
12/12/2007EP1865540A1 Exposure apparatus, exposure method, and device producing method
12/12/2007EP1865539A1 Method for determining exposure conditions, exposure method, exposure device, and apparatus for producing device
12/12/2007EP1865538A1 Multi-column electron beam exposure device
12/12/2007EP1865382A1 Method for preparation of lithographic printing plate and lithographic printing plate
12/12/2007EP1865381A1 Exposure apparatus, method for manufacturing exposure apparatus, and method for manufacturing microdevice
12/12/2007EP1865380A1 Planographic printing plate precursor and pile of planographic printing plate precursors
12/12/2007EP1865379A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution
12/12/2007EP1865378A1 Photosensitive lithographic printing plate
12/12/2007EP1865377A2 Method of manufacturing high sag micro-lens and high sag micro-lens manufactured thereby
12/12/2007EP1865376A1 Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate
12/12/2007EP1865362A1 Reflective loop system producing incoherent radiation
12/12/2007EP1865359A1 Cooled mirror array for lithography
12/12/2007EP1865291A2 Displacement measurement systems lithographic apparatus and device manufacturing method
12/12/2007EP1865030A1 Dye-containing hardenable composition, and color filter and process for producing the same
12/12/2007EP1865012A1 Photosensitive resin, photosensitive composition and photocrosslinked item
12/12/2007EP1864991A1 Organic ligands for semiconductor nanocrystals
12/12/2007EP1864188A2 Lithographic apparatus and device manufacturing method
12/12/2007EP1864187A1 Flame-retardant composition for solder resist and cured product thereof
12/12/2007EP1864186A2 Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal
12/12/2007EP1864185A1 Micro and nano structures in an elastomeric material
12/12/2007EP1864177A2 Small ultra-high na catadioptric objective
12/12/2007EP1864162A2 Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same
12/12/2007EP1405140A4 Resist compositions with polymers having 2-cyano acrylic monomer
12/12/2007CN200989996Y Photoresist clearing equipment adapted to glass base plate
12/12/2007CN200989995Y Optical fiber junction power automatic detector
12/12/2007CN200989994Y Flexible support mechanism
12/12/2007CN200989993Y Long mask plate for double-exposure
12/12/2007CN101088049A Filter device for the compensation of an asymmetric pupil illumination
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