Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2007
12/26/2007CN101093366A Conveyer
12/26/2007CN101093365A Against corrosion film stripper composition
12/26/2007CN101093364A Stripping liquid for photo-induced resist and base plate processing method using the same
12/26/2007CN101093363A Cleaning liquid in use for removing photoresist on integrate circuit
12/26/2007CN101093362A Method and apparatus for angular-resolved spectroscopic lithography characterization
12/26/2007CN101093361A Image forming method and computer readable medium
12/26/2007CN101093360A Phase control and compensation process of digital optical lithography
12/26/2007CN101093359A Colored photosensitive polymer combination
12/26/2007CN101093358A Colored photosensitive polymer combination
12/26/2007CN101093357A Photosensitive polymer combination and liquid crystal tropism control cam using same
12/26/2007CN101093356A Photosensitive polymer combination and liquid crystal tropism control cam and forming method thereof
12/26/2007CN101093355A Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof
12/26/2007CN101093354A Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib
12/26/2007CN101093353A Printing apparatus, patterning method, and method of fabricating liquid crystal display device using the same
12/26/2007CN101093352A Color filter and manufacturing method and display device
12/26/2007CN101093351A Color filter and manufacturing method and display device
12/26/2007CN101093350A Photosensitive transprint material, image forming method, component for display device, color filter and display device
12/26/2007CN101093349A Apparatus and method of fabricating thin film pattern
12/26/2007CN101093328A Liquid crystal display device and method for fabricating the same
12/26/2007CN100358032C Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
12/26/2007CN100357831C Manufacturing method of a panel for liquid crystal display
12/26/2007CN100357830C Method for making lithographic apparatus and device
12/26/2007CN100357829C Component manufacturing method, component therefrom and computer programm
12/26/2007CN100357817C Liquid crystal display and its producing method
12/26/2007CN100357799C Display device and fabrication method of display device
12/26/2007CN100357336C Capsule type hardener and composition
12/25/2007US7312860 Test pattern, inspection method, and device manufacturing method
12/25/2007US7312850 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution
12/25/2007US7312849 Substrate alignment apparatus and method, and exposure apparatus
12/25/2007US7312848 Positioning apparatus, exposure apparatus, and device manufacturing method
12/25/2007US7312847 Refractive projection objective for immersion lithography
12/25/2007US7312846 Lithographic apparatus and device manufacturing method
12/25/2007US7312462 Illumination system having a nested collector for annular illumination of an exit pupil
12/25/2007US7312447 Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element
12/25/2007US7312354 Useful as monomer for photosensitive resin; photolithograpy
12/25/2007US7312287 copolymer of ethylenically unsaturated monomer having one or more fluorine group and a polycyclic unsaturated monomer having one or more ester groups
12/25/2007US7312159 Compositions for dissolution of low-k dielectric films, and methods of use
12/25/2007US7312020 Lithography method
12/25/2007US7312018 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
12/25/2007US7312016 Chemically amplified positive resist composition and patterning process
12/25/2007US7312015 Containing structural units derived from a (meth)acrylic ester with a hydrophilic site; washed using an organic solvent that dissolves the resin; separation into two layers by combining with water; chemically amplified photoresist
12/25/2007US7312014 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray
12/25/2007US7312013 Photoreactive composition
12/25/2007US7312012 Urea stabilizers for thermal dye transfer materials
12/25/2007US7312004 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming
12/25/2007US7312003 Computer data signal embodied in electromagnetic waveform; manufacturing small dimension features of integrated circuit complex layouts; reduced phase conflicts
12/25/2007US7311943 Templated monolayer polymerization and replication
12/25/2007US7311778 Single scan irradiation for crystallization of thin films
12/25/2007US7311769 Pigment compositions consisting of a yellow disazo pigment and an organic pigment
12/25/2007US7311407 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
12/21/2007WO2007145711A1 Electronic package and method of preparing same
12/21/2007WO2007145264A1 Thermosetting resin composition, method for forming antihalation film of solid-state imaging device, antihalation film of solid-state imaging device, and solid-state imaging device
12/21/2007WO2007145249A1 Positive photosensitive resin composition containing polymer having ring structure
12/21/2007WO2007145165A1 Stage apparatus, exposure apparatus and device manufacturing method
12/21/2007WO2007145139A1 Variable slit device, illuminating device, exposure device, exposure method, and method of manufacturing device
12/21/2007WO2007145072A1 Supporting apparatus
12/21/2007WO2007145060A1 Surface printing plate material
12/21/2007WO2007145059A1 Lithographic plate material
12/21/2007WO2007145048A1 Lithographic printing plate, material for lithographic printing plate, support for lithographic printing plate material, and method of lithographic printing
12/21/2007WO2007144967A1 Process for producing patterned film and photosensitive resin composition
12/21/2007WO2007144666A1 Method of controlling contamination of a surface
12/21/2007WO2007144193A1 Projection objective of a microlithographic projection exposure apparatus
12/21/2007WO2007144125A2 Imaging device
12/21/2007WO2007144096A1 Method for processing of photopolymer printing plates with overcoat
12/21/2007WO2007021540A3 Etch features with reduced line edge roughness
12/21/2007WO2007019487A3 Method and system for fabricating thin devices
12/21/2007WO2006031411A3 A conductive lithographic polymer mixture and method of making devices using same
12/20/2007US20070293637 epoxides in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom, a binder, an acid generator capable of producing an acid upon exposure to actinic radiation; decreased shrinkage, cracking and brittleness
12/20/2007US20070292808 Developing Solution Composition for Lithography and Method for Resist Pattern Formation
12/20/2007US20070292806 Dynamic Puddle Developing Process
12/20/2007US20070292805 photopolymerizable unsaturated binder obtained by adding unsaturated monobasic acid polyfunctional epoxy resin to form epoxy adduct and allowing epoxy adduct and polybasic acid anhydride to react; color filters, liquid crystal displays, image sensors
12/20/2007US20070292802 Positive Photosenstive Composition
12/20/2007US20070292769 Method of Manufacturing Photomask Blank
12/20/2007US20070292767 Underlayer Coating Forming Composition For Lithography Containing Cyclodextrin Compound
12/20/2007US20070292549 Differentially cured materials and process for forming same
12/20/2007US20070292312 Method of manufacture of a plate of releasable elements and its assembly into a cassette
12/20/2007US20070292017 System And Method Of Providing Mask Defect Printablity Analysis
12/20/2007US20070291242 Exposure apparatus
12/20/2007US20070291239 Exposure Apparatus and Device Manufacturing Method
12/20/2007US20070290697 Microstructured pattern inspection method
12/20/2007US20070290387 Lithography Processes Using Phase Change Compositions
12/20/2007US20070289334 Method For Producing A Photonic Crystal Comprised Of A Material With A High Refractive Index
12/20/2007DE10355573B4 Verfahren zum Erhöhen der Produktionsausbeute durch Steuern der Lithographie auf der Grundlage elektrischer Geschwindigkeitsdaten A method for increasing the production yield by controlling the lithography on the basis of electrical speed data
12/20/2007DE102006027356A1 Light sensitive compound, particularly photoresist, has photo initiation system and matrix, and photo initiation system has initiator and is transversed reversably into inhibition condition by application with optical in inhibition signal
12/20/2007DE102006017359B3 Semiconductor wafers packing method involves producing structured surface charge on surface of auxiliary substrate, where structured exposing and coating compounds are applied on surface of auxiliary substrate
12/19/2007EP1868229A1 Liquid processing apparatus
12/19/2007EP1868037A1 Production method and handling method of original plate of planographic printing plate
12/19/2007EP1868036A1 Method for processing of photopolymer printing plates with overcoat
12/19/2007EP1868035A1 A method of characterising the transmission losses of an optical system
12/19/2007EP1868034A1 Wave front sensor with grey filter and lithographic apparatus comprising same
12/19/2007EP1867681A1 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
12/19/2007EP1866701A1 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure
12/19/2007EP1866700A1 Projection exposure method and projection exposure system therefor
12/19/2007EP1866688A1 Method to fabricate a redirecting mirror in optical waveguide devices
12/19/2007EP1866371A1 Ultraviolet curing resin composition
12/19/2007EP1866357A1 (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof
12/19/2007EP1778636B1 Oxime ester photoinitiators
12/19/2007EP1664885A4 Catadioptric imaging system for broad band microscopy
12/19/2007EP1660945B1 Modulator circuitry
12/19/2007EP1552345B1 Multiphoton photosensitization method