| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/02/2008 | CN101097375A Array substrate for liquid crystal display device and method of fabricating the same |
| 01/02/2008 | CN101097373A Mother glass for liquid crystal display and method of fabricating liquid crystal display using the same |
| 01/02/2008 | CN101097371A Method for fabricating a thin film transistor for use with a flat panel display device |
| 01/02/2008 | CN101097370A Liquid crystal display and method for fabricating the same |
| 01/02/2008 | CN101097367A Liquid crystal display and method for fabricating the same |
| 01/02/2008 | CN101097337A Display device and method for manufacturing the same |
| 01/02/2008 | CN101097320A Liquid crystal display device and method of fabricating the same |
| 01/02/2008 | CN101097302A Flexible display and method for forming alignment key of the same |
| 01/02/2008 | CN100359399C Manufacture of thin-membrane transistor of liquid crystal displaying device |
| 01/02/2008 | CN100359378C Method for fabricating super fine set of die for guiding light plate |
| 01/02/2008 | CN100359348C Substrate surface protection method for ion exchange process |
| 01/02/2008 | CN100359343C Method for designing phase raster graphics and method for making photomask system containing it |
| 01/02/2008 | CN100358953C Liquid photosensitive welding resistant printing ink and its circuit board |
| 01/02/2008 | CN100358728C Method and device for transferring a pattern from a stamp to a substrate |
| 01/01/2008 | US7315380 Laser interferometer for repeatable mounting on the wall of a vacuum chamber |
| 01/01/2008 | US7315367 Defining a pattern on a substrate |
| 01/01/2008 | US7315354 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 01/01/2008 | US7315350 Exposure apparatus, reticle shape measurement apparatus and method |
| 01/01/2008 | US7315348 Exposure apparatus, focal point detecting method, exposure method and device manufacturing method |
| 01/01/2008 | US7315347 Exposure apparatus and device manufacturing method |
| 01/01/2008 | US7315346 Lithographic apparatus and device manufacturing method |
| 01/01/2008 | US7315032 Lithographic apparatus and a device manufacturing method |
| 01/01/2008 | US7314853 Cleaning solution for photoresist and method for forming pattern using the same |
| 01/01/2008 | US7314834 Semiconductor device fabrication method |
| 01/01/2008 | US7314702 Composition for a bottom-layer resist |
| 01/01/2008 | US7314701 Radiation-sensitive resin composition |
| 01/01/2008 | US7314699 Radiation-sensitive mixture and recording material produced therewith |
| 01/01/2008 | US7314698 Polymerizable composition and planographic printing plate precursor using the same |
| 01/01/2008 | US7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device |
| 01/01/2008 | US7314689 After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed is determined; substrate is rotated in a predetermined direction by the offset angle; and the feature is processed using the predetermined reference system |
| 01/01/2008 | US7314688 Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device |
| 12/27/2007 | WO2007148968A2 Lithographic apparatus, device manufacturing method and radiation collector |
| 12/27/2007 | WO2007148781A1 Protective agent |
| 12/27/2007 | WO2007148776A1 Method of forming microfined resist pattern |
| 12/27/2007 | WO2007148763A1 Composition for forming lower-layer film and method of forming dual-damascene structure |
| 12/27/2007 | WO2007148627A1 Composition containing hydroxylated condensation resin for forming film under resist |
| 12/27/2007 | WO2007148623A1 Positive resist composition, and method for formation of resist pattern |
| 12/27/2007 | WO2007148606A1 Method of forming precision microspace, process for manufacturing member with precision microspace, and photosensitive laminated film |
| 12/27/2007 | WO2007148574A1 Resist stripping agent |
| 12/27/2007 | WO2007148525A1 Positive resist composition and method for formation of resist pattern |
| 12/27/2007 | WO2007148492A1 Positive resist composition and method of forming resist pattern |
| 12/27/2007 | WO2007148491A1 Positive resist composition and method of forming resist pattern |
| 12/27/2007 | WO2007148470A1 Treating apparatus, method of treating and plasma source |
| 12/27/2007 | WO2007148456A1 Compound, positive resist composition and method for forming resist pattern |
| 12/27/2007 | WO2007148384A1 Negative photosensitive resin composition, method of pattern forming and electronic part |
| 12/27/2007 | WO2007148221A1 High silicon-content thin film thermosets |
| 12/27/2007 | WO2007147803A1 Photopolymerisable layered composite for producing flexo printing elements |
| 12/27/2007 | WO2007147782A2 Oxime sulfonates and the use therof as latent acids |
| 12/27/2007 | WO2007147498A1 Optical apparatus |
| 12/27/2007 | WO2007147304A1 Immersion flow field maintenance system for immersion lithography machine |
| 12/27/2007 | WO2007122843A8 Method of applying elongate web |
| 12/27/2007 | WO2006107010A3 Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal |
| 12/27/2007 | WO2006003592A3 Soft lithographic stamp with a chemically patterned surface |
| 12/27/2007 | US20070298619 Method for stripping photoresist |
| 12/27/2007 | US20070298617 Processing method |
| 12/27/2007 | US20070298352 Onium salts, oxime sulfonates and sulfonyloxyimides derived from these sulfonium salts are effective photoacid generators in chemically amplified resist compositions; sensitive to high-energy radiation |
| 12/27/2007 | US20070298351 Image recording material, planographic printing plate precursor, and planographic printing method using the same |
| 12/27/2007 | US20070298350 comprises image-forming layer comprising an unsaturated double-bond containing substance, graft polymer having poly(alkyleneoxide) unit in side branch, and photothermal conversion substance, developing with neutral developer and ultrasonic waves; prevents staining of nonimage areas |
| 12/27/2007 | US20070298335 Exposure Condition Setting Method, Substrate Processing Device, and Computer Program |
| 12/27/2007 | US20070298328 Novel Resist Material and Method for Forming a Patterned Resist Layer on a Substrate |
| 12/27/2007 | US20070297483 Two-stage laser system for aligners |
| 12/27/2007 | US20070297175 Method for Establishing a Light Beam With Substantially Constant Luminous Intensity |
| 12/27/2007 | US20070297074 Replacement apparatus for an optical element |
| 12/27/2007 | US20070296948 Dose transfer standard detector for a lithography tool |
| 12/27/2007 | US20070296941 Optical System, Exposure System, and Exposure Method |
| 12/27/2007 | US20070296940 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
| 12/27/2007 | US20070296885 Contact for semiconductor and display devices |
| 12/27/2007 | US20070295918 Method for fabricating semiconductor device and equipment for fabricating the same |
| 12/27/2007 | US20070295243 Use of hydroxyl-functional polyalkylorganosiloxanes as solvents for cationic photoinitiators for use in radiation-curable silicones |
| 12/27/2007 | DE112005003399T5 Positivresist-Zusammensetzung und Verfahren zur Erzeugung eines Resistmusters Positive resist composition and method for producing a resist pattern |
| 12/27/2007 | DE102006031561A1 Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements Photomask assembly, optical imaging system method for determining the lattice parameters and absorption properties for a diffractive optical element and method for manufacturing a diffractive optical element |
| 12/27/2007 | DE102006028489A1 Illumination device for microlithographic projection exposure apparatus, has compensator plate, where portion of double refraction is partially compensated by plate, and portion is rotationally symmetrical about optical axis |
| 12/27/2007 | DE102006028222A1 Projection exposure system operating method involves applying illumination system during utilization phase, where illumination system is designed for producing rectangular field |
| 12/27/2007 | DE10133719B4 Organisches Antireflex-Beschichtungspolymer, Antireflex-Beschichtungszusammensetzung und Verfahren zur Herstellung derselben Organic antireflection coating polymer, anti-reflective coating composition and method of manufacturing the same |
| 12/27/2007 | DE10133718B4 Organische Antireflex-Beschichtungspolymere, solche Polymere umfassende Antireflex-Beschichtungszusammensetzungen und Verfahren zur Herstellung derselben Organic anti-reflective coating polymers, such polymers comprising anti-reflective coating compositions and methods for producing the same |
| 12/27/2007 | DE10133716B4 Organische Antireflex-Beschichtungspolymere, solche Polymere umfassende Antireflex-Beschichtungszusammensetzungen und Verfahren zur Herstellung derselben Organic anti-reflective coating polymers, such polymers comprising anti-reflective coating compositions and methods for producing the same |
| 12/27/2007 | DE10133715B4 Organisches Antireflex-Beschichtungspolymer, eine ein solches Polymer umfassende Antireflex-Beschichtungszusammensetzung und Verfahren zur Herstellung derselben Organic antireflection coating polymer, such a polymer comprising a bottom anti-reflective coating composition and method for producing the same |
| 12/26/2007 | EP1870773A2 Resonant scanning mirror |
| 12/26/2007 | EP1870772A2 Lithographic apparatus and device manufacturing method |
| 12/26/2007 | EP1870771A2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib |
| 12/26/2007 | EP1870696A1 Method and apparatus for angular-resolved spectroscopic lithography characterisation |
| 12/26/2007 | EP1870668A1 Correction of off-axis translation of optical elements in an optical zoom assembly |
| 12/26/2007 | EP1869696A2 Process for the formation of miniaturized getter deposits and getterdeposits so obtained |
| 12/26/2007 | EP1869420A1 Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods |
| 12/26/2007 | EP1570315B1 Method for adjusting an optical imaging property of a projection objective of a microlithographic projection exposure apparatus |
| 12/26/2007 | EP1451413A4 Real-time component monitoring and replenishment system for multicomponent fluids |
| 12/26/2007 | EP1384118A4 Method and apparatus for the hardening of photopolymer plates |
| 12/26/2007 | EP1070335B1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 12/26/2007 | EP1027172B1 Protective overcoat for replicated diffraction gratings |
| 12/26/2007 | EP0993692B1 Excimer laser with magnetic bearings supporting fan |
| 12/26/2007 | CN200997394Y Economizing improved structure of glue-homogenizing developer |
| 12/26/2007 | CN101095213A Exposure apparatus and device manufacturing method |
| 12/26/2007 | CN101095084A Process and apparatus for the production of collimated uv rays for photolithographic transfer |
| 12/26/2007 | CN101095083A Photopolymerizable composition |
| 12/26/2007 | CN101095082A Dissolution rate modifiers for photoresist compositions |
| 12/26/2007 | CN101094898A Multi-photon polymerizable pre-ceramic polymeric compositions |
| 12/26/2007 | CN101093796A 等离子体处理方法 The plasma processing method |
| 12/26/2007 | CN101093790A Substrate-processing method |
| 12/26/2007 | CN101093787A Substrate treatment apparatus |
| 12/26/2007 | CN101093671A Method of manufacturing a metal pattern |