| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/08/2008 | US7317508 Optical system and method for the production of micro-structured components by microlithography |
| 01/08/2008 | US7317505 Exposure apparatus and device manufacturing method |
| 01/08/2008 | US7317504 Lithographic apparatus and device manufacturing method |
| 01/08/2008 | US7317470 Imaging device for a printing form and method for arranging optical components in the imaging device |
| 01/08/2008 | US7317197 Method of detecting tightly adhering state, tight adhesion control method and method of and apparatus for near field exposure |
| 01/08/2008 | US7317196 LPP EUV light source |
| 01/08/2008 | US7316934 Personalized hardware |
| 01/08/2008 | US7316894 Developer regenerators |
| 01/08/2008 | US7316893 Modular containment cell arrangements |
| 01/08/2008 | US7316892 Process of preparing planographic printing plate |
| 01/08/2008 | US7316891 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
| 01/08/2008 | US7316889 Photoresist pattern; smooth surface and edges; resolution; wide depth of focus range; acid generator upon exposure |
| 01/08/2008 | US7316888 Smooth surface photresist pattern; using acrylated ester and acid generator |
| 01/08/2008 | US7316887 Maximum sensitivity in 390 to 430 nm light region; laser responsive; computer direct drawing; image-exposing the photosensitive lithographic printing plate by means of a laser light; development of the image by an aqueous developer |
| 01/08/2008 | US7316886 For forming on resist film a protective film soluble in an alkali developing solution, capable of peeling off by an alkali developing solution used in a development while protecting the resist film from an immersion liquid in pattern formation by immersion exposure, and forming a good pattern |
| 01/08/2008 | US7316885 Method of forming resist pattern, positive resist composition, and layered product |
| 01/08/2008 | US7316884 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
| 01/08/2008 | US7316883 Microcapsule, hydrophobic reactive compound; water-soluble compound reactive with hydrophobe; image-forming layer contains water-soluble compound outside microcapsule; on-press developability, long press life, scumming resistance |
| 01/08/2008 | US7316874 Heating thermally imageable donor element, substrate and a transfer layer of semiconductive material in conjunction with a dielectric; donor is exposed with the positive image of the desired pattern to be formed on the receiver, such that the exposed portions of the layer is transferred forming pattern |
| 01/08/2008 | US7316870 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 01/08/2008 | CA2515716C Curable epoxidized polyisoprene composition |
| 01/08/2008 | CA2308757C Composite relief image printing plates |
| 01/08/2008 | CA2220932C Variable focus lens by small changes of the equatorial lens diameter |
| 01/03/2008 | WO2008002402A1 Positive-working imageable members with branched hydroxystyrene polymers |
| 01/03/2008 | WO2008002134A2 Arrangement for cleaning a surface in a lithographic apparatus |
| 01/03/2008 | WO2008001871A1 Maintenance method, exposure method and apparatus and device manufacturing method |
| 01/03/2008 | WO2008001782A1 Photosensitive resin composition and method of forming pattern |
| 01/03/2008 | WO2008001711A1 Fluid container and fluid-containing container using the same |
| 01/03/2008 | WO2008001706A1 Method for producing plastic lens |
| 01/03/2008 | WO2008001679A1 Method of forming pattern and composition for forming of organic thin-film for use therein |
| 01/03/2008 | WO2008001670A1 Monoparticulate-film etching mask and process for producing the same, process for producing fine structure with the monoparticulate-film etching mask, and fine structure obtained by the production process |
| 01/03/2008 | WO2008001637A1 Amine imide compound to be activated by irradiation of active energy ray, composition using the same, and method for curing the same |
| 01/03/2008 | WO2008001593A1 Exposing method, exposing device, and device manufacturing method |
| 01/03/2008 | WO2008001544A1 Positive resist composition, and method for formation of resist pattern |
| 01/03/2008 | WO2008000696A1 Radiation curable amino(meth)acrylates |
| 01/03/2008 | WO2008000437A1 Reflective optical element and method for characterizing same |
| 01/03/2008 | WO2007131951A3 Method for making a lithographic printing plate |
| 01/03/2008 | WO2007047345A3 Compensation for effects of beam misalignments in interferometer metrology systems |
| 01/03/2008 | WO2005036274A3 Optical lithography method for patterning lines of equal width |
| 01/03/2008 | WO2003019272A3 Exposure mask |
| 01/03/2008 | US20080004193 Semiconductor process residue removal composition and process |
| 01/03/2008 | US20080003529 (Meth)Acrylate, Polymer and Resist Composition |
| 01/03/2008 | US20080003525 Method for Projecting High Resolution Patterns |
| 01/03/2008 | US20080003524 Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography |
| 01/03/2008 | US20080003517 Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern |
| 01/03/2008 | US20080003509 Performing a lyophobic treatment on a surface of a translucent substrate; putting a light-shielding material on that surface in a desired shape by a droplet discharge; and firing the light-shielding material to form the light-shielding pattern |
| 01/03/2008 | US20080002265 Catadioptric Projection Objective |
| 01/03/2008 | US20080002172 Microlithographic projection exposure apparatus |
| 01/03/2008 | US20080002170 Holding Device for an Optical Element in an Objective |
| 01/03/2008 | US20080002166 Exposure apparatus, and device manufacturing method |
| 01/03/2008 | US20080002165 Method And Apparatus For Producing Printed-Circuit-Board |
| 01/03/2008 | US20080001103 Electron-beam lithography method and apparatus, and program thereof |
| 01/03/2008 | US20080001101 Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned |
| 01/03/2008 | US20080001097 Electron beam drawing apparatus, electron beam drawing method, and a semiconductor device manufacturing method |
| 01/03/2008 | DE4407044B4 Verfahren zur Herstellung einer Maske A process for the production of a mask |
| 01/03/2008 | DE102006030359A1 Photo resist developing method, involves removing photo resist residual area that is not cross-linked by applying of developer on photo resist, which is arranged as homogeneous layer on material structure |
| 01/03/2008 | DE102006029799A1 Reflektives optisches Element und Verfahren zu seiner Charakterisierung The reflective optical element and method for its characterization |
| 01/03/2008 | DE102006028640A1 Fotopolymerisierbarer Schichtenverbund zur Herstellung von Flexodruckelementen Photopolymerizable layer composite for the production of flexographic printing |
| 01/03/2008 | DE102005062217B4 Verfahren zur Laserbelichtung eines Siebes Process for the laser exposure of a screen |
| 01/03/2008 | DE102004017769B4 Sintern unter Verwendung von Thermobild-Rückkopplung Sintering using thermal image-feedback |
| 01/03/2008 | DE10133717B4 Organische Antireflex-Beschichtungspolymere, solche Polymere umfassende Antireflex-Beschichtungszusammensetzungen und Verfahren zur Herstellung derselben Organic anti-reflective coating polymers, such polymers comprising anti-reflective coating compositions and methods for producing the same |
| 01/02/2008 | EP1873816A1 Exposure device, exposure method, and device manufacturing method |
| 01/02/2008 | EP1873815A1 Exposure apparatus, exposure method, and device production method |
| 01/02/2008 | EP1873588A2 Imaging element having a photoluminescent tag, apparatus containing said imaging element and method to form a recording element using it |
| 01/02/2008 | EP1873587A2 Inprintable medium dispenser |
| 01/02/2008 | EP1872942A2 Lithographic printing plate precursor and lithographic printing method |
| 01/02/2008 | EP1872176A2 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system |
| 01/02/2008 | EP1872175A1 Liquid immersion lithography system comprising a tilted showerhead |
| 01/02/2008 | EP1872174A2 Exposure device for press plates |
| 01/02/2008 | EP1871584A1 Apparatus and method for producing two-sided patterned web in registration |
| 01/02/2008 | EP1709488A4 Photosensitive printing sleeves and method of forming the same |
| 01/02/2008 | EP1656242A4 Capillary imprinting technique |
| 01/02/2008 | EP1516230A4 Photosensitive compositions |
| 01/02/2008 | EP1508157A4 High efficiency solid-state light source and methods of use and manufacture |
| 01/02/2008 | EP1446829B1 Method for forming a structure in a semiconductor substrate |
| 01/02/2008 | EP1390664A4 Materials, methods, and uses for photochemical generation of acids and/or radical species |
| 01/02/2008 | EP1297383B1 A method for individualised marking of circuit boards |
| 01/02/2008 | CN201000533Y Liner structure of light blockage collection base |
| 01/02/2008 | CN101099114A Resist pattern forming method |
| 01/02/2008 | CN101099113A Silicon-containing photosensitive composition, method for forming thin film pattern using same, protective film for electronic device, gate insulating film and thin film transistor |
| 01/02/2008 | CN101098954A Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
| 01/02/2008 | CN101098927A Chemicals compositions |
| 01/02/2008 | CN101097837A Substrate processing method and substrate processing apparatus |
| 01/02/2008 | CN101097410A Method of detecting displacement of exposure position marks |
| 01/02/2008 | CN101097409A Substrate processing apparatus and method |
| 01/02/2008 | CN101097408A Kinetic energy destabilization developing process |
| 01/02/2008 | CN101097407A Tracing system |
| 01/02/2008 | CN101097406A Tracing system |
| 01/02/2008 | CN101097405A Illumination light in immersion lithography stepper for particle or bubble detection |
| 01/02/2008 | CN101097404A Homocercal chromatic radiation sensitive resin combination |
| 01/02/2008 | CN101097403A Resist for soft mold and method for fabricating liquid crystal display using the same |
| 01/02/2008 | CN101097402A Photosensitive transprinting material, lamilated body and preparation method thereof, base plate for liquid crystal display device, liquid crystal display element and liquid crystal display device |
| 01/02/2008 | CN101097401A Method for fabricating soft mold and pattern forming method using the same |
| 01/02/2008 | CN101097400A Soft mold and method of fabricating the same |
| 01/02/2008 | CN101097399A Moulds fabricating method |
| 01/02/2008 | CN101097388A Array substrate for liquid crystal display device and method of fabricating the same |
| 01/02/2008 | CN101097386A Liquid crystal display and method of manufacturing the same |
| 01/02/2008 | CN101097385A Array substrate for liquid crystal display device and method of fabricating the same |
| 01/02/2008 | CN101097382A Method of fabricating liquid crystal display device |
| 01/02/2008 | CN101097381A Method for fabricating liquid crystal display device |