Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2008
01/15/2008US7319056 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
01/15/2008US7318997 Forming fine patterns of a semiconductor using an electric field to infiltrate an acid produced when a photoresist film is exposed into non-exposure regions
01/15/2008US7318996 Method for forming patterned insulating elements and methods for making electron source and image display device
01/15/2008US7318995 Heating precusor to induce coalescence of polymer particles at exposed areas of coating; developing by applying a gum solution, removing non-exposed areas of coating from support
01/15/2008US7318994 Compressible flexographic printing plate construction
01/15/2008US7318993 Doping selected regions of a semiconductor mask layer formed on a carrier with a hard mask layer with a selective ion implantation (direct lithographic writing); wet chemical removal of a doped region to form a semiconductor mask; patterning the carrier using the mask (anisotropic etch); high precision
01/15/2008US7318992 Polysilsesquioxanes containing hydroxyphenylalkyltrioxy units and phenylsilanetrioxy units some of which are substituted with an acid dissociable dissolution inhibiting group connected by an ether oxygen to the phenyl ring (1-ethoxyethyl); acid generator
01/15/2008US7318991 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether
01/15/2008US7318985 Block copolymer composition for photosensitive flexographic plate
01/15/2008US7318907 Apparatus for use in the detection of preferential particles in sample
01/15/2008US7318866 Systems and methods for inducing crystallization of thin films using multiple optical paths
01/15/2008US7318865 Crystallization apparatus and method; manufacturing method of electronic device, electronic device, and optical modulation element
01/15/2008US7318718 Stereolithographic apparatus and method for manufacturing three-dimensional object
01/10/2008WO2008005208A2 Printing form precursor and process for preparing a stamp from the precursor
01/10/2008WO2008004664A1 Micro actuator, optical unit, exposure device, and device manufacturing method
01/10/2008WO2008004654A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method
01/10/2008WO2008004646A1 Exposure apparatus that includes a phase change circulation system for movers
01/10/2008WO2008004384A1 Alkali-developable black photosensitive resin composition for forming light-shielding partition
01/10/2008WO2008004048A2 Methods and apparatus for applying patterns of non-contiguous features
01/10/2008WO2008004047A2 Methods and apparatus for selecting and applying non-contiguous features in a pattern
01/10/2008WO2008003601A1 Water based concentrated product forms of photoinitiators made by a heterophase polymerization technique
01/10/2008WO2008003442A1 Method for revising/repairing a lithographic projection objective
01/10/2008WO2007110773A3 Negative photoresist compositions
01/10/2008WO2007106241A3 Merging a mask and a printing plate
01/10/2008WO2007019287A3 Photoreactive removal of ion implanted resist
01/10/2008WO2006104803A3 Novel photosensitive resin compositions
01/10/2008US20080008970 Lithographic Process
01/10/2008US20080008969 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
01/10/2008US20080008966 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate
01/10/2008US20080008940 Glass mask used for patterning and manufacturing method and apparatus therefor
01/10/2008US20080007706 Method of optimizing imaging performance
01/10/2008US20080007705 In-Situ Interferometer Arrangement
01/10/2008US20080006781 Electron Beam Drawing Apparatus
01/10/2008US20080006305 Resist, Barc and Gap Fill Material Stripping Chemical and Method
01/10/2008DE19637923B4 Unter Verwendung von lichtempfindlichem Material zum Orientieren des Flüssigkristalls hergestellte Flüssigkristallanzeige Vorrichtung Using of photosensitive material for orienting the liquid crystal produced liquid crystal display device
01/10/2008DE10304631B4 Lichtempfindliche Harzzusammensetzung vom Negativ-Typ A photosensitive resin composition of the negative type
01/10/2008DE10236404B4 Verfahren zur Herstellung eines Substrates Process for the preparation of a substrate
01/10/2008DE102004004865B4 Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie Anti-reflective coating that is coated with a photoresist, comprising polymers based on cinnamic acid for 157 nm photolithography
01/09/2008EP1876636A1 Exposure method, exposure apparatus, and device producing method
01/09/2008EP1876635A1 Exposure method, exposure apparatus and device manufacturing method
01/09/2008EP1876495A1 Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography
01/09/2008EP1876190A1 Acrylic copolymer
01/09/2008EP1876166A1 Radiation curable amino(meth)acrylates
01/09/2008EP1875493A2 Composition for cleaning ion implanted photoresist in front end of line applications
01/09/2008EP1875469A2 Device for directing radiation to a layer, apparatus with such device and method using such apparatus
01/09/2008EP1875311A1 A method for measuring the position of a mark in a micro lithographic deflector system
01/09/2008EP1875310A2 Means for transferring a pattern to an object
01/09/2008EP1875309A2 Method for monitoring a reticle
01/09/2008EP1875307A1 Method for mask inspection for mask design and mask production
01/09/2008EP1874524A1 Apparatus and method for making microreplicated article
01/09/2008EP1741006B1 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
01/09/2008EP1646912A4 High resolution, dynamic positioning mechanism for specimen inspection and processing
01/09/2008EP1597627A4 Dissolution rate modifiers for photoresist compositions
01/09/2008EP1419527B1 Adhesive tape
01/09/2008EP1340106B1 Protective overcoat for replicated diffraction gratings
01/09/2008EP1277071B1 Apparatus, system and method for precision positioning and alignment of a lens in an optical system
01/09/2008EP1252689B1 Deep ultraviolet catadioptric anamorphic telescope
01/09/2008CN201004156Y Glue remover
01/09/2008CN101103442A Exposure method, electronic element production method, exposure device and illuminant optical device
01/09/2008CN101103440A Exposure apparatus control method, exposure method and apparatus using the control method, and device manufacturing method
01/09/2008CN101103313A Method for producing a component comprising nanometric multilayers for optical uses and component produced according to said method
01/09/2008CN101103312A Image exposing apparatus and microlens array unit
01/09/2008CN101103311A Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member
01/09/2008CN101103310A Material for pattern formation, apparatus for pattern formation, and method for pattern formation
01/09/2008CN101102904A Printing plate material, plate making method, printing method, planographic printing plate material assembly-use package, planographic printing plate material assembly and plate printing method
01/09/2008CN101101870A Apparatus and method for crystallization
01/09/2008CN101101856A Substrate processing device
01/09/2008CN101101458A Optical etching device aligning method and system
01/09/2008CN101101457A Method of removing photoresist
01/09/2008CN101101456A Chemical raw material instantaneous recovery system
01/09/2008CN101101455A Method for producing device
01/09/2008CN101101454A Photo-etching machine silicon chip platform double-platform switching system
01/09/2008CN101101453A Method of reducing a wave front aberration, and computer program product
01/09/2008CN101101452A Exposure device
01/09/2008CN101101451A Thin film structure for reducing laser direct writing photo-etching point or line width and its preparation method
01/09/2008CN101101450A All-refraction immersion type projection and optical system, device and its uses
01/09/2008CN101101449A All-refraction immersion type projection and optical system, device and its uses
01/09/2008CN101101448A Light spot energy barycenter rectification module and its measurement method and device
01/09/2008CN101101447A Photo-etching machine work-piece platform balancing and positioning device
01/09/2008CN101101446A Photoresist coater carrying disc for preventing static assembly
01/09/2008CN101101445A Two-dimensional nanostructure deep etching method
01/09/2008CN101101444A Light-sensitive resin composition, light-sensitive transfer printing material, separating wall and manufacturing method thereof, color filter and manufacturing method thereof, and displaying device
01/09/2008CN101101443A Photoresist composition and method for preparing color-filtering sheet substrate using same
01/09/2008CN101101442A Jet ink for color filter, color filter, manufacturing method and displaying device for the color filter
01/09/2008CN101101441A Large area periodic array three-dimensional microstructure preparation method
01/09/2008CN101101440A Glass mask used for patterning and manufacturing method and apparatus therefor
01/09/2008CN101101396A Glass substrate carrier for preventing static congregation
01/09/2008CN101100107A Laser plastic micro-welding method
01/09/2008CN100361113C High speed synchronous broadcast bus and bus platform of step scanning projection photo etching machine
01/09/2008CN100361112C Synchronous bus controller of step scanning projection photo etching machine and synchronous control system
01/09/2008CN100361026C Method and apparatus for fabricating flat panel display
01/09/2008CN100361025C Method for flat-plate printing image using adic vertical transfer
01/09/2008CN100360983C Compact imaging head and high speed multi-head laser imaging assembly and method
01/09/2008CN100360982C Microelectromechanical optical display subass embly
01/09/2008CN100360894C Laser interferometer for repeatable mounting on the wall of a vacuum chamber
01/09/2008CN100360575C Photosensitive resin composition and process for the formation of hydrogel
01/08/2008US7317824 Overlay marks, methods of overlay mark design and methods of overlay measurements
01/08/2008US7317583 High numerical aperture projection system and method for microlithography
01/08/2008US7317571 Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
01/08/2008US7317531 Apparatus and methods for detecting overlay errors using scatterometry