| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/02/2014 | CN103901731A 可动刀口装置 Movable blade device |
| 07/02/2014 | CN103901730A 曝光装置及曝光方法 Exposure apparatus and exposure method |
| 07/02/2014 | CN103901729A 改善套刻精度面内均匀性的方法 Improve overlay accuracy within surface uniformity of approach |
| 07/02/2014 | CN103901728A 感光性聚硅氧烷组合物及其应用 Photosensitive silicone composition and its application |
| 07/02/2014 | CN103901727A 正感光性树脂组合物、由其制造的有机绝缘膜和显示装置 Positive photosensitive resin composition, produced by the organic insulating film and a display device |
| 07/02/2014 | CN103901726A 负型感光性树脂组合物 The negative photosensitive resin composition |
| 07/02/2014 | CN103901725A 一种光固化树脂组合物 A photocurable resin composition |
| 07/02/2014 | CN103901724A 用于彩色滤光片的感光树脂组合物，和使用其的彩色滤光片 A photosensitive resin composition for color filters, and the use of a color filter thereof |
| 07/02/2014 | CN103901723A 用于挡光层的光敏树脂组合物及使用其的挡光层 The light-blocking layer for the photosensitive resin composition and the use thereof in the light-blocking layer |
| 07/02/2014 | CN103901722A 一种碱性显像型感光树脂组合物及其制备方法 An alkaline developing type photosensitive resin composition and its preparation method |
| 07/02/2014 | CN103901721A 一种光阻组合物、彩膜基板和显示装置 One kind of photoresist composition, color filter substrate and a display device |
| 07/02/2014 | CN103901720A 活性能量射线固化型树脂组合物、显示元件用着色间隔物以及黑色矩阵 The active energy ray-curable resin composition, a colored display element spacers, and black matrix |
| 07/02/2014 | CN103901719A 一种快干型含羧基的感光性树脂及其制备方法 A fast drying photosensitive resin containing a carboxyl group and its preparation method |
| 07/02/2014 | CN103901718A 用于滤光片的感光树脂组合物和使用其的滤光片 Used to filter the photosensitive resin composition and using the same filter |
| 07/02/2014 | CN103901717A 用于彩色滤光片的光敏树脂组合物及使用其的彩色滤光片 The photosensitive resin composition for a color filter and a color filter using the same |
| 07/02/2014 | CN103901687A 一种阵列基板及其制备方法、显示装置 One kind of array substrate and its preparation method, the display device |
| 07/02/2014 | CN103901623A 一种用于折反射式投影物镜的热效应控制装置 A catadioptric projection objective of thermal effects control device |
| 07/02/2014 | CN103901576A 可动镜片微调机构 Movable lens tuning mechanism |
| 07/02/2014 | CN103901520A 一种顶角90°三角形槽阶梯光栅的制作方法 A method of making 90 ° apex angle of the triangular groove Echelle |
| 07/02/2014 | CN103901516A 光栅的制备方法 Preparation grating |
| 07/02/2014 | CN103897185A 感光型聚酰亚胺及负型光致抗蚀剂组合物 Photosensitive polyimide and negative type photoresist composition |
| 07/02/2014 | CN103896773A 新型丙烯酸类单体、聚合物和包含该聚合物的抗蚀剂组合物 Novel acrylic monomer, polymer and the resist composition comprising the polymer |
| 07/02/2014 | CN103896736A 用于硬掩模组合物的单体和包含单体的硬掩模组合物及使用硬掩模组合物形成图案的方法 Monomer compositions for hard mask and a hard mask composition comprises a monomer composition and the use of the hard mask pattern formation method |
| 07/02/2014 | CN103034046B 掩模板、曝光系统和曝光方法 Mask, exposure system and exposure method |
| 07/02/2014 | CN102650819B 掩模板和掩膜板的定位方法 Mask positioning method and the mask plate |
| 07/02/2014 | CN102486615B 确定光刻投影装置最佳物面的方法及用于该方法的掩模 Determine the best object plane of the lithographic projection apparatus and a method for masking the method |
| 07/02/2014 | CN102472982B 光刻用共聚物及其评价方法 Copolymer lithography and evaluation methods |
| 07/02/2014 | CN102470664B 平版印版前体和叠层 The lithographic printing plate precursor, and the laminate |
| 07/02/2014 | CN102460310B 重叠测量的方法、光刻设备、检查设备、处理设备和光刻处理单元 The method of overlapping measurements, the lithographic apparatus, inspection apparatus, lithographic apparatus and a processing unit processing |
| 07/02/2014 | CN102436144B 一种感光组合物及其在阳图热敏ctp版材中的应用 A photosensitive composition and its application in positive thermal ctp plate in |
| 07/02/2014 | CN102419520B 一种对准信号模拟发生装置 A method of aligning an analog signal generator |
| 07/02/2014 | CN102385569B 一种用于计算周期性介质傅立叶系数的方法 A method for calculating the Fourier coefficients for the periodic dielectric |
| 07/02/2014 | CN102257421B 用于引导辐射束的光学模块 The optical module for guiding the radiation beam |
| 07/02/2014 | CN102171617B 低污染光学布置 Pollution optical arrangement |
| 07/02/2014 | CN102099740B 正型感光性树脂组合物、固化膜、保护膜、绝缘膜及使用它们的半导体装置、显示器装置 The positive-type photosensitive resin composition, cured film, protective film, insulating film and a semiconductor device using them, a display device |
| 07/02/2014 | CN102084294B 多色物质和它们的用途 Multicolor materials and their uses |
| 07/02/2014 | CN102053493B 放射线敏感性组合物、保护膜、层间绝缘膜以及它们的形成方法 The radiation-sensitive composition, a protective film, an interlayer insulating film, and a method for their formation |
| 07/02/2014 | CN102016724B 用于微型光刻的光敏性硬掩模 Photosensitivity hard mask for micro-lithography |
| 07/02/2014 | CN101771130B 声体波压电薄膜换能器双面光刻制作方法 Piezoelectric thin film bulk acoustic transducer sided photolithographic fabrication method |
| 07/02/2014 | CN101528693B 肟酯系化合物、光聚合引发剂、光聚合性组合物、滤色器和液晶显示装置 Oxime ester-based compound, a photopolymerization initiator, a photopolymerizable composition for a color filter and a liquid crystal display device |
| 07/02/2014 | CN101109901B 固化性组合物、滤色器、及其制造方法 The curable composition, color filters, and manufacturing method thereof |
| 07/01/2014 | US8767185 Criss-cross writing strategy |
| 07/01/2014 | US8767183 Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell |
| 07/01/2014 | US8767182 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 07/01/2014 | US8767181 Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| 07/01/2014 | US8767179 Imaging methods in scanning photolithography and a scanning photolithography device used in printing an image of a reticle onto a photosensitive substrate |
| 07/01/2014 | US8767177 Exposure apparatus, and device manufacturing method |
| 07/01/2014 | US8767173 Optical element and projection exposure apparatus based on use of the optical element |
| 07/01/2014 | US8767170 Flow through MEMS package |
| 07/01/2014 | US8767169 Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method |
| 07/01/2014 | US8767168 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure |
| 07/01/2014 | US8765868 Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components |
| 07/01/2014 | US8765835 Epdxy resin composition having monocyclic aliphatic hydrocarbon ring |
| 07/01/2014 | US8765363 Method of forming a resist pattern with multiple post exposure baking steps |
| 07/01/2014 | US8765362 Patterning method |
| 07/01/2014 | US8765361 Reticle and manufacturing method of solid-state image sensor |
| 07/01/2014 | US8765359 Method of fabricating patterned functional substrates |
| 07/01/2014 | US8765358 Water-soluble resin composition and method of forming fine patterns by using the same |
| 07/01/2014 | US8765357 Resin and photoresist composition comprising same |
| 07/01/2014 | US8765356 Calixarene compound and photoresist composition comprising same |
| 07/01/2014 | US8765355 Radiation sensitive resin composition, method for forming a pattern, polymer and compound |
| 07/01/2014 | US8765354 Resist composition for negative development and method of forming resist pattern |
| 07/01/2014 | US8765353 Resist composition and method for producing semiconductor device |
| 07/01/2014 | US8765352 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 07/01/2014 | US8765351 Salt and photoresist composition containing the same |
| 07/01/2014 | US8765333 Color filter array having hybrid color filters and manufacturing method thereof |
| 07/01/2014 | US8765332 Green curable composition, color filter and method of producing same |
| 07/01/2014 | US8765328 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device |
| 07/01/2014 | US8765252 Thin film device with minimized spatial variation of local mean height |
| 07/01/2014 | US8764999 Sidewall image transfer pitch doubling and inline critical dimension slimming |
| 07/01/2014 | US8763527 Detecting an unsecured state of a mandrel |
| 07/01/2014 | US8763239 System for uniform structuring of substrates |
| 06/26/2014 | WO2014098173A1 Colored photosensitive composition |
| 06/26/2014 | WO2014098076A1 Composition for forming silicon-containing resist underlayer film having cyclic diester group |
| 06/26/2014 | WO2014098025A1 Bottom layer film-forming composition of self-organizing film containing styrene structure |
| 06/26/2014 | WO2014097993A1 Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound |
| 06/26/2014 | WO2014097992A1 Photosensitive resin composition, method for producing heat-resistant resin film and display device |
| 06/26/2014 | WO2014097859A1 Substrate processing device, device manufacturing system and method for manufacturing device |
| 06/26/2014 | WO2014097633A1 Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition |
| 06/26/2014 | WO2014097595A1 Photosensitive resin composition, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition |
| 06/26/2014 | WO2014097594A1 Polyimide precursor resin composition |
| 06/26/2014 | WO2014097096A1 Composition, imprinting ink and imprinting method |
| 06/26/2014 | WO2014096818A1 Curable coatings for photoimaging |
| 06/26/2014 | WO2014096662A1 Process for fabricating nanolithography masks |
| 06/26/2014 | WO2014096299A1 Lithographic apparatus and table for use in such an apparatus |
| 06/26/2014 | WO2014095864A1 Method for producing a homogeneous light distribution |
| 06/26/2014 | WO2014095724A1 Derivatives of bisacylphosphinic acid, their preparation and use as photoinitiators |
| 06/26/2014 | WO2014095266A2 Substrate support for a lithographic apparatus and lithographic apparatus |
| 06/26/2014 | WO2014095262A1 Beam delivery for euv lithography |
| 06/26/2014 | WO2014095261A1 Beam delivery for euv lithography |
| 06/26/2014 | WO2014094356A1 Photoresist remover |
| 06/26/2014 | WO2014094080A1 Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process |
| 06/26/2014 | WO2013124131A3 Inspection apparatus and method |
| 06/26/2014 | US20140179583 Peeling liquid for a resist |
| 06/26/2014 | US20140178825 Developer |
| 06/26/2014 | US20140178824 Optimizing lithographic processes using laser annealing techniques |
| 06/26/2014 | US20140178823 Photosensitive polyimide and negative type photoresist composition containing the same |
| 06/26/2014 | US20140178822 Photosensitive polysiloxane composition and uses thereof |
| 06/26/2014 | US20140178821 Resist composition, method of forming resist pattern and compound |
| 06/26/2014 | US20140178820 Resist composition, patterning process and polymer |