| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/17/2008 | WO2008007762A1 Photosensitive resin composition, layered product thereof, cured object therefrom, and method of forming pattern from the composition (2) |
| 01/17/2008 | WO2008007660A1 Stage apparatus and exposure apparatus |
| 01/17/2008 | WO2008007635A1 Photosensitive, aqueous alkaline solution-soluble polyimide resin and photosensitive resin composition containing the same |
| 01/17/2008 | WO2008007633A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method |
| 01/17/2008 | WO2008007632A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method |
| 01/17/2008 | WO2008007584A1 Polyester containing terpene phenol unit |
| 01/17/2008 | WO2008007578A1 Compound, acid generator, resist composition and method for forming resist pattern |
| 01/17/2008 | WO2008007539A1 Lithographic printing original plate and lithographic printing method |
| 01/17/2008 | WO2008007521A1 Reticle holding member, reticle stage, exposure apparatus, projection exposure method and device manufacturing method |
| 01/17/2008 | WO2008006723A1 Color filter composition |
| 01/17/2008 | WO2008006265A1 Large working distance unit-magnification projection optical system |
| 01/17/2008 | WO2007001495A8 Thermal development system and method of using the same |
| 01/17/2008 | WO2006061741A3 Etchant solutions and additives therefor |
| 01/17/2008 | WO2006023037A3 Photopolymerizable silicone materials forming semipermeable membranes for sensor applications |
| 01/17/2008 | WO2005031460A3 Lithograph method and system with selective illumination of mask features separated in the frequency domain using different illumination schemes |
| 01/17/2008 | US20080014536 Colorant-Containing Curable Composition, Color Filter Using The Composition, And Method For Manufacturing The Same |
| 01/17/2008 | US20080014534 Microphotonic maskless lithography |
| 01/17/2008 | US20080014530 Graft Pattern-Forming Method, Graft Pattern Material, Lithography Method, Conductive Pattern - Forming Method, Conductive Pattern, Color Filter Producing Method, Color Filter, and Mircrolens Producing Method |
| 01/17/2008 | US20080014353 Etching insulating layer to produce opening having aspect ratio of 15:1 by supplying first gaseous etchant having fifty percent He to plasma etch reactor, and exposing insulating layer to plasma of the first gaseous etchant; reduces occurrence of twisting in openings having aspect ratio of 15:1 |
| 01/17/2008 | US20080013946 Developing method and developing unit |
| 01/17/2008 | US20080013680 Collector configured of mirror shells |
| 01/17/2008 | US20080013091 Position detecting method and apparatus |
| 01/17/2008 | US20080013061 Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 01/17/2008 | US20080013058 Pneumatic Spring Apparatus, Vibration-Proof Apparatus, Stage Apparatus and Exposure Apparatus |
| 01/17/2008 | US20080011967 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface |
| 01/17/2008 | US20080011714 Photoresist stripping solution and a method of stripping photoresists using the same |
| 01/17/2008 | US20080010756 Cyanopyridine-Based Azo Dyes |
| 01/17/2008 | DE102006032878A1 Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage Illumination system of a microlithography projection exposure apparatus |
| 01/17/2008 | DE102006032877A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
| 01/17/2008 | DE102006032810A1 Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement Illumination optics for microlithography projection exposure system, lighting system with an illumination optics, micro-lithography projection exposure system with such an illumination system, mikrolithografisches manufacturing process for components and produced by this process component |
| 01/17/2008 | DE102006032053A1 Method for periodically modifying a surface of a substrate in a sample surface for structuring e.g. semiconductors comprises producing an illuminating pattern by bending a converging input beam and superimposing resulting bent partial beams |
| 01/16/2008 | EP1879219A1 Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method |
| 01/16/2008 | EP1879217A1 Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method |
| 01/16/2008 | EP1879216A1 Liquid processing apparatus and method |
| 01/16/2008 | EP1879072A2 Original data producing method and original data producing program |
| 01/16/2008 | EP1879071A2 Illumination optics for a micro lithographic projection illumination system |
| 01/16/2008 | EP1879070A1 Composition for resist underlayer film formation for forming photocrosslinking cured resist underlayer film |
| 01/16/2008 | EP1877870A1 Non-aqueous photoresist stripper that inhibits galvanic corrosion |
| 01/16/2008 | EP1877869A2 Lithographic method for maskless pattern transfer onto a photosensitive substrate |
| 01/16/2008 | EP1877868A1 Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors |
| 01/16/2008 | EP1877867A2 Methods and apparatus for the manufacture of microstructures |
| 01/16/2008 | EP1877865A2 Nanocomposite photoresist composition for imaging thick films |
| 01/16/2008 | EP1877864A2 Nanocomposite photosensitive composition and use thereof |
| 01/16/2008 | EP1877863A2 Adjustable solubility in sacrificial layers for microfabrication |
| 01/16/2008 | EP1877530A2 Removal of high-dose ion-implanted photoresist using self-assembled monolayers in solvent systems |
| 01/16/2008 | EP1794657B1 Process for the production of a lithographic printing plate |
| 01/16/2008 | EP1640363B1 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing |
| 01/16/2008 | EP1535112A4 Reticle carrier |
| 01/16/2008 | EP1527373B1 Method for producing flexo printing forms by means of laser direct engraving |
| 01/16/2008 | EP1397392B1 Adhesive detackification method |
| 01/16/2008 | CN201007781Y System for preventing wafer inclination during baking process after exposure |
| 01/16/2008 | CN101107573A Exposure system and device |
| 01/16/2008 | CN101107572A Illumination optical apparatus and optical apparatus |
| 01/16/2008 | CN101107571A Displacement device |
| 01/16/2008 | CN101107570A Projection optical system |
| 01/16/2008 | CN101107569A Composition for forming of underlayer film for lithography that contains compound having protected carboxyl |
| 01/16/2008 | CN101107568A Composite composition for micropatterned layers having high relaxation ability, high chemical resistance and mechanical stability |
| 01/16/2008 | CN101107567A Positive-working resist composition and method for resist pattern formation |
| 01/16/2008 | CN101107566A Alkali-developable photosensitive color composition |
| 01/16/2008 | CN101107565A Pattern forming material, pattern forming apparatus and permanent pattern forming method |
| 01/16/2008 | CN101107136A Exposure visible image forming method of lithographic printing plate material, aluminum support and lithographic printing plate material |
| 01/16/2008 | CN101107126A Improved flexo processor |
| 01/16/2008 | CN101107125A Mandrels for electroforming printing screens, and electroforming apparatus |
| 01/16/2008 | CN101106164A A crossed combined dual cycle grating for quanta trap infrared detector |
| 01/16/2008 | CN101105641A Correction of off-axis translation of optical elements in an optical zoom assembly |
| 01/16/2008 | CN101105640A Lithographic apparatus and device manufacturing method |
| 01/16/2008 | CN101105639A Wave front sensor with grey filter and lithographic apparatus comprising same |
| 01/16/2008 | CN101105638A Reflective loop system producing incoherent radiation |
| 01/16/2008 | CN101105637A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN101105636A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN101105635A Exposure device and exposure method |
| 01/16/2008 | CN101105634A Mask protection film removing device and its method |
| 01/16/2008 | CN101105633A Optical approximate correction method and its photomask pattern |
| 01/16/2008 | CN101105632A Coating device and color filter production method |
| 01/16/2008 | CN101105631A Pattern forming material, pattern forming device and pattern forming method |
| 01/16/2008 | CN101105630A Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device |
| 01/16/2008 | CN101105629A Light solidifying/heat solidifying one-part welding resistant agent composition and printing circuit plate |
| 01/16/2008 | CN101105628A Light solidifying/heat solidifying one-part welding resistant agent composition |
| 01/16/2008 | CN101105627A Radiation-sensitive composition for forming a colored layer, color filter and color liquid crystal display device |
| 01/16/2008 | CN101105626A Light solidifying/heat solidifying resin composition, condensate of the same and printing circuit board |
| 01/16/2008 | CN101105625A Light solidifying composition and pattern forming method using the same |
| 01/16/2008 | CN101105624A Photomask and method of exposure |
| 01/16/2008 | CN101105615A Liquid crystal display device and method for fabricating the same |
| 01/16/2008 | CN101105595A Semi-transmission liquid crystal display device and fabricating method thereof |
| 01/16/2008 | CN101105587A Production method of double menu liquid crystal display glass substrate changing following view angle |
| 01/16/2008 | CN101105545A Novel process for producing microcolor filter array |
| 01/16/2008 | CN100362628C Self-aligning method for outskirt state phase shifting light shade |
| 01/16/2008 | CN100362431C Photoetching device, device manufacturing method and manufactured device by it |
| 01/16/2008 | CN100362430C Composition for forming anti-reflective coating for use in lithography |
| 01/16/2008 | CN100362429C Precursor composition for positive photosensitive resin and display made with the same |
| 01/16/2008 | CN100362428C Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 01/16/2008 | CN100362377C Sol-gel material derived adjustable light attenuator and its producing method |
| 01/15/2008 | US7319944 Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist |
| 01/15/2008 | US7319551 Maskless optical interferometric lithography |
| 01/15/2008 | US7319517 Wafer chuck illumination device for use in semiconductor manufacturing equipment |
| 01/15/2008 | US7319509 Attenuator for attenuating wavelengths unequal to a used wavelength |
| 01/15/2008 | US7319508 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| 01/15/2008 | US7319507 Apparatus and method for removing contaminant on original, method of manufacturing device, and original |
| 01/15/2008 | US7319505 Exposure apparatus and device fabrication method |
| 01/15/2008 | US7319283 Moving apparatus, exposure apparatus, and device manufacturing method |