| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/24/2008 | WO2008009353A1 Illumination system of a microlithographic projection exposure apparatus |
| 01/24/2008 | WO2007111823A3 Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process |
| 01/24/2008 | WO2007058975A3 Polymer layer comprising silicone and at least one metal trace and a process of manufacturing the same |
| 01/24/2008 | WO2007025675A8 Aqueous solution and method for removing ionic contaminants from the surface of a workpiece |
| 01/24/2008 | US20080022244 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 01/24/2008 | US20080021223 Colorant-Containing Curable Composition, Color Filter Using The Composition, and Method For Manufacturing The Same |
| 01/24/2008 | US20080021126 Alpha-aminoketones derivatives with one or 2 hydroxyalkylaminobenzoyl groups, e.g., 2-benzyl-1-[4-(2-hydroxyethylamino)phenyl]-2-dimethylamino-1-butanone; reduced VOC emission before curing and migration and/or extraction of residual photoinitiator from cured product; high initiator efficiency; inks |
| 01/24/2008 | US20080020592 Coating with an organic antireflective coating comprising a light absorbing maleic anhydride-1,4-dioxo-5-hydroxynaphthalene copolymer, a crosslinking styrene-allylic diether copolymer, a thermal acid generator, and solvent; baking, applying photoresist, etching; ultra-fine patterns; photolithography |
| 01/24/2008 | US20080020329 Method for fabricating semiconductor device and exposure mask |
| 01/24/2008 | US20080020327 Method of formation of a damascene structure |
| 01/24/2008 | US20080020324 Immersion lithography defect reduction with top coater removal |
| 01/24/2008 | US20080020321 A terpolymer based three monomers of (alpha-lower alkyl) acrylic esters; one having acid-dissociable, dissolution-inhibiting groups, another having lactone-containing monocyclic or polycyclic groups, one having polycyclic and alicyclic hydrocarbon groups which contain polar groups; dry etching re |
| 01/24/2008 | US20080020298 Shading area of transmissivity of 0-2% at the center of a clear defect in a wiring pattern of a half tone mask; forming semitransparent areas of transmissivity of 10-25% adjacent to shading extending from inside of the edge of an imaginary pattern with no defect to the outside of the edge; accuracy |
| 01/24/2008 | US20080020294 test photomask includes first mask pattern and second mask pattern formed at center portion of first; first mask pattern is pattern with light condensing effect and nature in which exposure-dose amount to transfer object varies in dependence on focus variation, a two-dimensional Fresnel zone pattern |
| 01/24/2008 | US20080019013 Lens Made of a Crystalline Material |
| 01/24/2008 | US20080019004 Apparatus for optical beam shaping and associated methods |
| 01/24/2008 | US20080019002 Crystallization apparatus, crystallization method, and phase shifter |
| 01/24/2008 | US20080018873 Exposure apparatus and method for manufacturing device |
| 01/24/2008 | US20080018872 Method and apparatus for manufacturing diamond shaped chips |
| 01/24/2008 | US20080018871 Immersion exposure technique |
| 01/24/2008 | US20080018869 Exposure apparatus, exposure method, method for manufacturing device |
| 01/24/2008 | US20080018866 Exposure Apparatus and Device Producing Method |
| 01/24/2008 | US20080018036 Substrate-holding technique |
| 01/24/2008 | US20080017810 Correction of spatial instability of an EUV source by laser beam steering |
| 01/24/2008 | US20080017801 EUV light source |
| 01/24/2008 | US20080017312 Method and apparatus for fabricating flat panel display |
| 01/24/2008 | DE112006000540T5 Basen-multiplikative Mittel und basenreaktive härtbare Zusammensetzungen Base multiplicative agent and base reactive curable compositions |
| 01/24/2008 | DE102007034447A1 Collector for lighting system, particularly lighting system of microlithography projection illumination unit, has two reflective layers arranged in each other around collector axes |
| 01/24/2008 | DE102006033280A1 Kompositzusammensetzung für mikrostrukturierte Schichten Composite composition for micro-structured layers |
| 01/24/2008 | DE102006031995A1 Linsenrohlinge und Linsenelemente sowie Verfahren zu deren Herstellung Lens blanks, and lens elements, as well as processes for their preparation |
| 01/23/2008 | EP1881521A1 Projection optical system, exposure apparatus and exposure method |
| 01/23/2008 | EP1881520A1 Projection optical system, exposure apparatus and exposure method |
| 01/23/2008 | EP1881374A2 Inspection method and apparatus, lithographic apparatus, lithographic process line and device manufacturing method |
| 01/23/2008 | EP1881373A1 Lithographic apparatus, aberration correction device and device manufacturing method |
| 01/23/2008 | EP1881372A2 Lithographic apparatus and device manufacturing method using interferometric and maskless explosure units |
| 01/23/2008 | EP1881371A1 Process for producing radiation-sensitive resin composition |
| 01/23/2008 | EP1881370A1 Photosensitive resin composition |
| 01/23/2008 | EP1881369A2 Method for producing color filter |
| 01/23/2008 | EP1881368A2 Method for applying membrane lipids to a substrate |
| 01/23/2008 | EP1881332A2 Positioning unit for optical and/or electric test systems |
| 01/23/2008 | EP1880978A1 Modified silica particles, photosensitive composition containing same, and photosensitive lithography plate |
| 01/23/2008 | EP1880414A2 Method for resist strip in presence of regular low k and/or porous low k dielectric materials |
| 01/23/2008 | EP1880249A1 Optical system for a lithographic device |
| 01/23/2008 | EP1800186A4 An imprinted polymer support |
| 01/23/2008 | EP1751683A4 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 01/23/2008 | EP1560068B1 Barrier rib and its method of preparation |
| 01/23/2008 | EP1470446A4 Organic anti-reflective coating compositions for advanced microlithography |
| 01/23/2008 | CN101111804A Method for treating development waste liquid |
| 01/23/2008 | CN101111803A Positive dry film photoresist and composition for preparing the same |
| 01/23/2008 | CN101111471A Material for metallic-pattern formation, crosslinking monomer, and method of forming metallic pattern |
| 01/23/2008 | CN101111393A Process for producing aluminum support for material for lithographic printing plate, aluminum support for material for lithographic printing plate, and material for lithographic printing plate |
| 01/23/2008 | CN101111392A Original film for lithographic printing plate and lithographic printing method |
| 01/23/2008 | CN101110352A Method of manufacturing semiconductor device and manufacturing device thereof |
| 01/23/2008 | CN101110349A Circulation system for high refractive index liquid, pattern forming device and pattern forming method thereof |
| 01/23/2008 | CN101110156A Pulsing signal approaching method |
| 01/23/2008 | CN101109911A Pattern decomposition method for double exposure |
| 01/23/2008 | CN101109910A Inspection method and apparatus, lithographic apparatus, lithographic process line and device manufacturing method |
| 01/23/2008 | CN101109909A Lithographic apparatus, aberration correction device and device manufacturing method |
| 01/23/2008 | CN101109908A Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor |
| 01/23/2008 | CN101109907A Photo-etching machine projecting objective coma aberration original position detecting system and method thereof |
| 01/23/2008 | CN101109906A Methods of determining quality of a light source |
| 01/23/2008 | CN101109905A Electron beam etching device and method thereof |
| 01/23/2008 | CN101109904A X ray exposure machine |
| 01/23/2008 | CN101109903A Method for on-line monitoring lens astigmatism |
| 01/23/2008 | CN101109902A Photoreception output method for display apparatus |
| 01/23/2008 | CN101109901A Curable composition, color filter and process for production thereof |
| 01/23/2008 | CN101109900A Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same |
| 01/23/2008 | CN101109899A Resist composition |
| 01/23/2008 | CN101109898A Method and device for producing a three-dimensional object, and computer and data carrier useful thereof |
| 01/23/2008 | CN101109896A Mask and manufacturing method of microlens using thereof |
| 01/23/2008 | CN101109879A Liquid display device and fabrication method thereof |
| 01/23/2008 | CN101109876A Thin-film transistor LCD array substrate pixel structure and manufacturing method thereof |
| 01/23/2008 | CN101109861A Semi-penetrating semi-reflective liquid crystal display device and manufacturing method thereof |
| 01/23/2008 | CN100364061C Removing agent composition and removing/cleaning method using same |
| 01/23/2008 | CN100364047C Substrate treating apparatus |
| 01/23/2008 | CN100364041C Wafer inspection device |
| 01/23/2008 | CN100363839C First yellow light and etching method in liquid crystal display panel front section array manufacturing technology |
| 01/23/2008 | CN100363795C Method for forming pattern using printing method |
| 01/23/2008 | CN100363776C Exposure head |
| 01/23/2008 | CN100363399C Photocurable composition and mfg. method, photocurable pressure-sensitive adhesive sheet and mfg. and bonding method |
| 01/23/2008 | CN100363390C Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 01/23/2008 | CN100363343C Photoactive compounds |
| 01/22/2008 | US7321692 Method, device and computer program product for processing information in a memory |
| 01/22/2008 | US7321605 Helical optical pulse stretcher |
| 01/22/2008 | US7321468 Method and optical arrangement for beam guiding of a light beam with beam delay |
| 01/22/2008 | US7321465 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses |
| 01/22/2008 | US7321419 Exposure apparatus, and device manufacturing method |
| 01/22/2008 | US7321417 Spatial light modulator, lithographic apparatus and device manufacturing method |
| 01/22/2008 | US7321415 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 01/22/2008 | US7321126 Collector with fastening devices for fastening mirror shells |
| 01/22/2008 | US7320946 Method for generating dynamic mask pattern |
| 01/22/2008 | US7320856 Manufacturing method of pattern formed body |
| 01/22/2008 | US7320855 Depositing a photoresist substrate to form a photoresist layer on the material layer; applying a top antireflective coating and barrier layer, thereby forming a coated substrate, patternwise exposing the coated substrate to imaging radiation; removing, transferring the photoresist layer pattern |
| 01/22/2008 | US7320854 Radiation sensitive refractive index changing composition, pattern forming method and optical material |
| 01/22/2008 | US7320847 locally etching first substrate as far as protective layer to form a trench around a reversed alignment marker; forming a patterned layer on a second surface of first substrate using a lithographic projector having a front-to-back alignment system |
| 01/22/2008 | US7320283 Nanoprinting method |
| 01/22/2008 | US7320265 Article transfer system |
| 01/17/2008 | WO2008007952A2 Getter and cleaning arrangement for a lithographic apparatus |
| 01/17/2008 | WO2008007765A1 Surface position detecting apparatus, exposure apparatus and device manufacturing method |
| 01/17/2008 | WO2008007764A1 Photosensitive resin composition, layered product thereof, cured object therefrom, and method of forming pattern from the composition (3) |