| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/31/2008 | US20080026314 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition |
| 01/31/2008 | US20080026304 Color filter with colored layer on transparent substrate, plurality of colors formed in a predetermined pattern; light shielding layerformed through a wettability-variable component layer; titanium oxide photocatalyst; printing plates, lithography; polysiloxane or silicone binder |
| 01/31/2008 | US20080025888 having a layered construction made of light-curing hydrophilic plastic material based on a 3-D layer model and having a covering layer made of a hydrophobic material; for biological, chemical and medical analysis |
| 01/31/2008 | US20080024873 Metallic nano-optic lenses and beam shaping devices |
| 01/31/2008 | US20080024766 Apparatus and methods for detecting overlay errors using scatterometry |
| 01/31/2008 | US20080024747 Exposure method and apparatus, and method for fabricating device |
| 01/31/2008 | US20080023858 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/31/2008 | US20080023855 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 01/31/2008 | US20080023834 Raised Solder-Mask-Defined (SMD) Solder Ball Pads For a Laminate Electronic Circuit Board |
| 01/31/2008 | US20080023657 Extreme ultraviolet light source |
| 01/31/2008 | US20080023651 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 01/31/2008 | DE202007016104U1 Resistsystem mit einer lithographisch erzeugten Vernetzungsstruktur mit nanoporösem Erscheinungsbild Resist system with a lithographically generated network structure with nanoporous appearance |
| 01/31/2008 | DE10208785B4 Lithografieverfahren zur Fotomaskenherstellung mittels Elektronenstrahllithografie Lithography process for photomask fabrication by electron beam lithography |
| 01/31/2008 | DE102007020033A1 Verfahren zur Qualitätsbestimmung einer Lichtquelle Method for determining the quality of a light source |
| 01/31/2008 | DE102006034755A1 Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung Optical apparatus and method for correcting or improving the imaging behavior of an optical device |
| 01/31/2008 | DE102006034709A1 Beleuchtungssystem für die Mikro-Lithographie, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement Lighting system for micro-lithography projection exposure system with such an illumination system, microlithographic manufacturing method for components and produced by this process component |
| 01/31/2008 | DE10058761B4 Abbildungsvorrichtung Imaging device |
| 01/30/2008 | EP1882988A2 Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
| 01/30/2008 | EP1882987A2 System and method to compensate for critical dimension non-uniformity in a lithography system |
| 01/30/2008 | EP1882986A1 Lithographic apparatus with planar motor driven support |
| 01/30/2008 | EP1882985A2 Lithographic apparatus and device manufacturing method |
| 01/30/2008 | EP1882984A1 Multi-reflection optical systems and their fabrication |
| 01/30/2008 | EP1882983A1 Gravity compensating support for an optical element |
| 01/30/2008 | EP1882982A1 Positive resist composition and method of forming resist pattern |
| 01/30/2008 | EP1882981A1 Positive-working resist composition and method for resist pattern formation |
| 01/30/2008 | EP1882979A2 Display panel, mask and method of manufacturing the same |
| 01/30/2008 | EP1882705A1 Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing such polymer |
| 01/30/2008 | EP1497611A4 Scatterometric measurement of undercut multi-layer diffracting structures |
| 01/30/2008 | EP1171802B1 Novel photosensitive resin compositions |
| 01/30/2008 | EP0961954B1 Repetitively projecting a mask pattern using a time-saving height measurement |
| 01/30/2008 | CN201015024Y Exposure machine |
| 01/30/2008 | CN101116037A Photosensitive composition removing liquid |
| 01/30/2008 | CN101116036A 正性光致抗蚀剂组合物 Positive-working photoresist composition |
| 01/30/2008 | CN101116035A Photosensitive composition, method for forming pattern, and permanent pattern |
| 01/30/2008 | CN101116034A Compositions curable with actinic energy ray |
| 01/30/2008 | CN101114618A Photomask, active device array substrates and manufacturing method therefor |
| 01/30/2008 | CN101114578A Substrate processing method and substrate processing apparatus |
| 01/30/2008 | CN101114577A Substrate processing apparatus |
| 01/30/2008 | CN101114575A Apparatus for treating substrates |
| 01/30/2008 | CN101114569A Method and apparatus for removing contamination from substrate |
| 01/30/2008 | CN101114135A Aligning system photolithography equipment |
| 01/30/2008 | CN101114134A Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine |
| 01/30/2008 | CN101114133A Lithographic apparatus and device manufacturing method |
| 01/30/2008 | CN101114132A Projection exposure apparatus |
| 01/30/2008 | CN101114131A Electron beam irradiating method, magnetic recording medium manufactured by using the method and method for manufacturing the medium |
| 01/30/2008 | CN101114130A System and method to compensate for critical dimension non-uniformity in a lithography system |
| 01/30/2008 | CN101114129A Lithographic apparatus with planar motor driven support |
| 01/30/2008 | CN101114128A System and method for measuring power of lithographic system |
| 01/30/2008 | CN101114127A Pixel structure and manufacturing method therefor |
| 01/30/2008 | CN101114126A Method for forming ITO pattern |
| 01/30/2008 | CN101114125A Mixed type optical approximate correcting method based on regular |
| 01/30/2008 | CN101114124A Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device |
| 01/30/2008 | CN101114123A Photo-setting property composition and color filter using the composition |
| 01/30/2008 | CN101114122A Etching apparatus and method |
| 01/30/2008 | CN101114121A Method for forming pattern, and method for manufacturing liquid crystal display |
| 01/30/2008 | CN101114120A A stamper and production method thereof and imprinting process of substrate using the stamper |
| 01/30/2008 | CN101114099A Liquid crystal display and mfg. method therefor |
| 01/30/2008 | CN101114067A Heating cavity device |
| 01/30/2008 | CN101114056A Method for making rectangular aperture grating used for transforming laser bean |
| 01/30/2008 | CN101114034A Black dispersion, pigmentation composition, photosensitive transprinting material containing metal particulate |
| 01/30/2008 | CN100365764C Method for mfg. semiconductor apparatus and method for forming pattern |
| 01/30/2008 | CN100365510C Method of making metal pattern |
| 01/30/2008 | CN100365509C Positive light sensitive resin composition |
| 01/30/2008 | CN100365508C Photosensitive resin composltion, photo sensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| 01/30/2008 | CN100365507C Template for room temperature, low pressure micro-and nano-imprint lithography |
| 01/30/2008 | CN100365405C Scanner linearity tester |
| 01/30/2008 | CN100364968C Diphenyl ketone photo initiator containing sulfur and its preparing method |
| 01/29/2008 | US7325224 Method and system for increasing product yield by controlling lithography on the basis of electrical speed data |
| 01/29/2008 | US7324930 Method and apparatus for performing OPC using model curvature |
| 01/29/2008 | US7324280 Apparatus for providing a pattern of polarization |
| 01/29/2008 | US7324269 Projection optical system, exposure apparatus and device fabricating method |
| 01/29/2008 | US7324187 Illumination system and exposure apparatus |
| 01/29/2008 | US7324186 Lithographic apparatus and device manufacturing method |
| 01/29/2008 | US7323821 Device for generating and/or influencing electromagnetic radiation from a plasma |
| 01/29/2008 | US7323703 EUV light source |
| 01/29/2008 | US7323698 Thermally insulated thermophoretic plate |
| 01/29/2008 | US7323393 Method of reducing film stress on overlay mark |
| 01/29/2008 | US7323292 Coating substrates with polysilanes, then exposing to radiation and etching to form patterns used for masking; electrical and electronic apparatus such as random access or flash memory |
| 01/29/2008 | US7323291 Dual layer workpiece masking and manufacturing process |
| 01/29/2008 | US7323290 Stability, shelf-life |
| 01/29/2008 | US7323289 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 01/29/2008 | US7323288 A radiation-sensitive medium having a thermally softenable hydrophobic polymer, a hydrophilic polymer, and a binder that binds to both layers; the medium is aqueous-ineluable when coated and dried, and becomes hydrophobic when heated; lithography; latent images |
| 01/29/2008 | US7323287 Positive type resist composition and resist pattern formation method using same |
| 01/29/2008 | US7323286 Exposure latitude and line-edge roughness |
| 01/29/2008 | US7323284 Useful as chemically amplified photoresist suitable for lithography making use of ultraviolet radiation, x-rays, or charged corpuscular beams; integrated circuits; semiconductors |
| 01/29/2008 | US7323276 Substrate for photomask, photomask blank and photomask |
| 01/29/2008 | US7323275 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 01/29/2008 | US7323232 Images with high quality |
| 01/29/2008 | US7323212 Method and system of controlling dummy dispense |
| 01/29/2008 | US7323130 Magnification correction employing out-of-plane distortion of a substrate |
| 01/29/2008 | US7323063 Apparatus for changing concentration of treatment solution and treatment solution supply apparatus |
| 01/24/2008 | WO2008010981A2 A process for enhancing the resolution of a thermally transferred pattern |
| 01/24/2008 | WO2008010521A1 Photosensitive resin composition |
| 01/24/2008 | WO2008010417A1 Optical fiber amplifier, light source device, exposure device, object inspection device, and treatment device |
| 01/24/2008 | WO2008010400A1 Photosensitive surface printing plate material |
| 01/24/2008 | WO2008010317A1 Ring-opening metathesis polymers, products of hydrogenation thereof, process for production of the same and uses thereof |
| 01/24/2008 | WO2008010079A1 Antireflective coating compositions |
| 01/24/2008 | WO2008009803A2 Production of microfluidic polymeric devices by photo-assisted and/ or thermally assisted printing |
| 01/24/2008 | WO2008009608A1 Composite composition for micropatterned layers |
| 01/24/2008 | WO2008009356A1 Microlithographic projection exposure apparatus and method for correcting imaging aberrations |