| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/06/2008 | CN101120286A Image forming device and method |
| 02/06/2008 | CN101120285A Image exposing apparatus |
| 02/06/2008 | CN101120061A Compositions for articles comprising replicated microstructures |
| 02/06/2008 | CN101119851A Imaging a violet sensitive printing plate |
| 02/06/2008 | CN101118840A Manufacturing method of power semi-conductor discrete device first floor photolithography para-position making |
| 02/06/2008 | CN101118839A Coating and developing system, coating and developing method and storage medium |
| 02/06/2008 | CN101118392A Colorful optical filter resin type black matrix stripping liquid and stripping method |
| 02/06/2008 | CN101118391A Alkaline developer for photosensitive resin, image forming method using the same |
| 02/06/2008 | CN101118390A Phase conjugate image-forming photolithography system |
| 02/06/2008 | CN101118389A Method for moving air bubble |
| 02/06/2008 | CN101118388A Optical mask review method and system |
| 02/06/2008 | CN101118387A Apparatus and method for measuring Image field flexural distribution of photo-etching machine |
| 02/06/2008 | CN101118386A Optical approach effect compensation process of photoetching technology |
| 02/06/2008 | CN101118385A Image field flexural measurement method with picture synchronization collection photolithography image-forming system |
| 02/06/2008 | CN101118384A Manufacturing method for part of display device and part of display device and display device |
| 02/06/2008 | CN101118383A Preparation method of UV-barrier copper-clad plate |
| 02/06/2008 | CN101118382A Photo-sensitive composition and application |
| 02/06/2008 | CN101118381A Method of manufacturing a patterned colour conversion layer, a colour conversion filter and an organic EL display that use the colour conversion layer |
| 02/06/2008 | CN101118380A Pattern transfer method and imprint device |
| 02/06/2008 | CN101118379A Microlenses of cmos image sensor and method for fabricating the same |
| 02/06/2008 | CN101118378A Preparation method of diamond surface graphics |
| 02/06/2008 | CN101118377A Air pressure semi-suspending two free degree common foundation surface movement workstation of high speed large stroke |
| 02/06/2008 | CN101118359A Liquid crystal display and mfg. method therefor |
| 02/06/2008 | CN101118356A Thin-film transistor LCD pixel structure and manufacturing method therefor |
| 02/06/2008 | CN101118355A Thin-film transistor LCD pixel structure and manufacturing method therefor |
| 02/06/2008 | CN101118336A Multiple inter space and semi-penetrate through reflective liquid crystal display device and manufacturing method therefor |
| 02/06/2008 | CN101118295A Reflection board and liquid crystal display device |
| 02/06/2008 | CN101118290A Variable focal length X-ray compound lens and manufacturing method thereof |
| 02/06/2008 | CN100367114C Compositions substrate for removing etching residue and use thereof |
| 02/06/2008 | CN100367113C Composition for forming conjugated polymer pattern and method for forming conjugated polymer pattern using the same composition |
| 02/06/2008 | CN100367112C Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 02/06/2008 | CN100367111C Lithographic gap-filler forming composition |
| 02/06/2008 | CN100367110C Chemical amplitude increased positive corrosionproof agent composition |
| 02/06/2008 | CN100367109C Nanosize making die using spacer technique |
| 02/05/2008 | USRE40043 Positioning device having two object holders |
| 02/05/2008 | US7328425 Method and device for correcting SLM stamp image imperfections |
| 02/05/2008 | US7327582 Integrated thin film capacitor/inductor/interconnect system and method |
| 02/05/2008 | US7327467 Phase measuring method and apparatus for measuring characterization of optical thin films |
| 02/05/2008 | US7327465 Compensation for effects of beam misalignments in interferometer metrology systems |
| 02/05/2008 | US7327449 Exposure apparatus inspection method and exposure apparatus |
| 02/05/2008 | US7327438 Lithographic apparatus and method of a manufacturing device |
| 02/05/2008 | US7327435 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 02/05/2008 | US7327377 Exposure apparatus and method for exposing a photosensitive material with a plurality of exposure heads |
| 02/05/2008 | US7327013 Stencil mask with charge-up prevention and method of manufacturing the same |
| 02/05/2008 | US7326945 Dose transfer standard detector for a lithography tool |
| 02/05/2008 | US7326940 Exposure apparatus, exposure method and semiconductor device production method |
| 02/05/2008 | US7326796 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 02/05/2008 | US7326759 Compositions for solid freeform fabrication |
| 02/05/2008 | US7326673 Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates |
| 02/05/2008 | US7326646 Nitrogen-free ARC layer and a method of manufacturing the same |
| 02/05/2008 | US7326598 Method of fabricating polycrystalline silicon |
| 02/05/2008 | US7326580 Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method |
| 02/05/2008 | US7326525 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 02/05/2008 | US7326523 Low refractive index polymers as underlayers for silicon-containing photoresists |
| 02/05/2008 | US7326522 projecting patterned radiation beams having an exposure wavelength onto a target portion of a substrate, having a layer of light sensitive materials and immersion liquids, that refract the beam as it passes, allows the imaging of smaller features on the substrate |
| 02/05/2008 | US7326521 Method of imaging and developing negative-working elements |
| 02/05/2008 | US7326520 Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same |
| 02/05/2008 | US7326517 Planographic printing plate material and preparing process of planographic printing plate |
| 02/05/2008 | US7326516 Coating photoresist containing a polydihydroxyadamantyl (meth)acrylate resin, a photoacid generator; and a mixed solvent of an alkylene glycol alkyl ether carboxylate and a propylene glycol monomethyl ether; improved wear resistance, depth of focus and profile properties |
| 02/05/2008 | US7326515 Mixture of acid generator and unsaturated acrylated ester nonmer; surface and edge smoothness |
| 02/05/2008 | US7326514 Polymer containing silicon and/or boron for (extreme) ultraviolet (EUV) lithography; isoprene and/or styrene polymers hydrosilated and/or hydroborated with organosilane, dimesitylborane, and or carboranecarboxylic acid; reactive ion etch resistance, transmission; doping substrates |
| 02/05/2008 | US7326513 Positive working resist composition |
| 02/05/2008 | US7326512 A monomeric unit having an alicyclic group at a side chain, alicyclic group is highly fluorinated; has transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 mu m-1 |
| 02/05/2008 | US7326511 chemically amplified photoresist comprising compounds which cures upon the action of an acid or whose solubility is increased upon the action of an acid and photosensitive acid generators; give high resolution with good resist profile |
| 02/05/2008 | US7326510 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
| 02/05/2008 | US7326509 Composition for forming anti-reflective coating for use in lithography |
| 02/05/2008 | US7326505 Conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation, conveying the exposed substrate from the exposing position toward a processing position |
| 02/05/2008 | US7326442 Curing an organic/inorganic polymer with silicate units, metal oxide units and chromophore-substututed siloxane units; covering with a photoresist; pattern exposing to radiation to expose portions of the substrate; and etching exposed portions |
| 02/05/2008 | US7326437 Method and system for coating polymer solution on a substrate in a solvent saturated chamber |
| 02/05/2008 | US7326380 Surface and site-specific polymerization by direct-write lithography |
| 02/05/2008 | US7326353 Methyl ester; flexography; centrifuging solvent selected from terpene esters, terpene ethers, alkyl esters, substituted benzene to separate the polymer |
| 02/05/2008 | US7326310 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 02/05/2008 | US7326302 Apparatus and method for processing a substrate |
| 02/05/2008 | US7325685 Secondary latchkey mechanism and method for reticle SMIF pods |
| 02/05/2008 | US7325404 Exposure apparatus |
| 02/05/2008 | CA2276613C Photoactivatable nitrogen-containing bases based on .alpha.-amino ketones |
| 01/31/2008 | WO2008013778A2 Compensation for distortion in contact lithography |
| 01/31/2008 | WO2008013766A1 Negative-working radiation-sensitive compositions and imageable materials |
| 01/31/2008 | WO2008013706A1 Apparatus and method for conditioning an immersion fluid |
| 01/31/2008 | WO2008013443A2 Lithography system, method of heat dissipation and frame |
| 01/31/2008 | WO2008013207A1 Curable resin composition and method for forming cured coating film |
| 01/31/2008 | WO2008013140A1 Resin composition for optical material, resin film for optical material, and optical waveguide |
| 01/31/2008 | WO2008013031A1 Curable composition, cured object, color filter, and liquid-crystal display |
| 01/31/2008 | WO2008013030A1 Compound, acid generator, resist composition and method for forming resist pattern |
| 01/31/2008 | WO2008012999A1 Positive resist composition and method of forming resist pattern |
| 01/31/2008 | WO2008012336A1 Support for an optical element |
| 01/31/2008 | WO2008012111A1 Multi-reflection optical systems and their fabrication |
| 01/31/2008 | WO2008012022A1 Optical apparatus and method for correction or improvement of the imaging behaviour of an apparatus such as this |
| 01/31/2008 | WO2008011981A1 Illumination system for microlithography and projection exposure apparatus therewith |
| 01/31/2008 | WO2008011970A2 Movable workpiece support for a machine, and machining system comprising a corresponding workpiece support |
| 01/31/2008 | WO2008011766A1 Precise positioning system for dual stage switching exposure |
| 01/31/2008 | WO2007034993A8 Apparatus and method for manufacturing a photosensitive laminated body |
| 01/31/2008 | US20080027576 Defect probability calculating method and semiconductor device manufacturing method |
| 01/31/2008 | US20080026975 Aqueous alcoholic solution of (perfluoromorpholino)perfluoroisobutyric acid or 1,3-dioxoperfluoro-1,3,2-dithiazane; prevents pattern falling during formation of a fine pattern having a high aspect ratio |
| 01/31/2008 | US20080026585 Composition for removing a film, method of removing a film using the same, and method of forming a pattern using the same |
| 01/31/2008 | US20080026499 Method for forming pattern, and method for manufacturing liquid crystal display |
| 01/31/2008 | US20080026328 Method for fabricating a structure for a microelectromechanical systems (mems) device |
| 01/31/2008 | US20080026325 Adding a layer of metal to a wafer having a thin film layer and a release layer to which has been transferred a pattern from a photoresist; heating to cause deformation and cracking; applying a solvent to penetrate the cracks to reach and dissolve the release layer; andremoving the release layer |
| 01/31/2008 | US20080026324 An aluminum support having a hydrophilic surface; photosensitive layer comprising a binder polymer comprising a pigment dispersed with a dispersant which is free from a carboxyl, phosphonate, or phosphate group; antisoilants, durability, discoloration inhibition |
| 01/31/2008 | US20080026320 minimize the refractive indices difference by using a high refractive index organic component and a low refractive index inorganic component; nontoxic, inexpensive, thermal decomposition; high resolution, high compactness by exposure to light only once; butyl methacrylate-methy methacrylate copolymer |